Photoresist baking device

Abstract

The utility model discloses a photoresist baking device which comprises a working platform, the upper surface of the working platform is fixedly connected with a negative pressure box, the left side and the right side of the negative pressure box are both fixedly connected with limiting blocks, the lower surfaces of the limiting blocks are fixedly connected with limiting elastic pieces, the lower surfaces of the limiting blocks are provided with guide blocks, and the guide blocks are fixedly connected with the limiting elastic pieces. And the guide blocks are fixedly connected with the side wall of the working platform, sliding rods are slidably connected to the inner surfaces of the guide blocks, and positioning elastic pieces are fixedly connected to the upper surfaces of the sliding rods. The limiting elastic piece has the beneficial effects that the buffering effect can be provided, vibration and abrasion caused when the limiting block moves or is impacted by external force are reduced, the service life of the device is prolonged, the positioning elastic piece has the beneficial effects that certain elastic support can be provided for the sliding rod, it is ensured that the sliding rod is kept stable in the moving process, and the service life of the device is prolonged. And accurate positioning force is provided when a preset position is reached, so that the positioning precision and reliability of the device are further improved, and the operation efficiency of the device is improved.

Description

Technical Field

[0001] This utility model relates to the field of photoresist technology, specifically a photoresist baking device. Background Technology

[0002] Semiconductor manufacturing is the process of producing integrated circuits (ICs), which involves multiple steps, including design, photolithography, etching, ion implantation, and chemical vapor deposition (CVD). These steps together determine the performance and function of the final chip. Photolithography is one of the most critical steps in semiconductor manufacturing. It involves transferring circuit patterns from a photomask onto a silicon wafer. This process requires the use of photoresist as a medium. In the photolithography process, after the photoresist is coated on the surface of the silicon wafer, it needs to be baked (also known as post-exposure baking, PEB).

[0003] To ensure uniform baking, photoresist baking equipment may need to extend the baking time or increase the baking cycle, which will increase equipment downtime and reduce the overall operating efficiency of the equipment. Utility Model Content

[0004] The purpose of this invention is to provide a photoresist baking device. The beneficial effect of the limiting spring is that it can provide a buffering effect, reduce the vibration and wear of the limiting block when it moves or is subjected to external impact, and extend the service life of the device. The beneficial effect of the positioning spring is that it can provide a certain elastic support for the sliding rod, ensure that the sliding rod remains stable during movement, and provide accurate positioning force when it reaches the predetermined position, thereby further improving the positioning accuracy and reliability of the device.

[0005] To achieve the above objectives, a photoresist baking apparatus is provided, comprising: a working platform; a negative pressure box fixedly connected to the upper surface of the working platform; limit blocks fixedly connected to both sides of the negative pressure box; limit springs fixedly connected to the lower surface of the limit blocks; a guide block provided on the lower surface of the limit blocks, and the guide block being fixedly connected to the side wall of the working platform; a sliding rod slidably connected to the inner surface of the guide block; and a positioning spring fixedly connected to the upper surface of the sliding rod. The limit blocks and guide blocks ensure stable operation of the negative pressure box, while the limit springs and positioning springs provide buffering and precise positioning, improving the stability and accuracy of the apparatus.

[0006] According to the aforementioned photoresist baking apparatus, the negative pressure chamber has side wall vents and a top vent. The side wall vents are distributed on the left and right sides of the inner surface of the negative pressure chamber, and the opening of the top vent is parallel to the inner surface of the negative pressure chamber. The uniform distribution of negative pressure through the side wall and top vents ensures firm adhesion of the photoresist substrate, prevents displacement, and improves baking uniformity and product quality.

[0007] According to the aforementioned photoresist baking apparatus, an exhaust pipe is fixedly connected to the rear side of the negative pressure chamber, and exhaust pipes are fixedly connected to both the left and right sides of the rear surface of the exhaust pipe. The exhaust pipe and exhaust pipes efficiently discharge gas, maintain a stable negative pressure environment, and ensure that the photoresist substrate remains in a fixed position during the baking process.

[0008] According to the aforementioned photoresist baking apparatus, linear motors are fixedly connected to both the left and right sides of the upper surface of the working platform, and a moving base is fixedly connected to the output end of the linear motor. The linear motor drives the moving base to achieve precise linear motion, ensuring accurate positioning of the transfer tray and the photoresist substrate, and improving the operating efficiency of the apparatus.

[0009] According to the aforementioned photoresist baking apparatus, the moving base is fixedly connected to a connecting seat by fastening bolts. A connecting plate is fixedly connected to the side wall of the connecting seat, and a support plate is fixedly connected to the center of the rear surface of the connecting plate. The connecting seat and support plate have a stable structure, ensuring that the transfer tray and sealing plate remain balanced during movement, thus improving the stability and reliability of the apparatus.

[0010] According to the aforementioned photoresist baking apparatus, a sealing plate is fixedly connected to the outer surface of the support plate, the sealing plate and a sliding rod are fixedly connected, and a transfer tray is fixedly connected to the rear surface of the support plate. The sealing plate and the sliding rod cooperate to ensure the sealing of the negative pressure chamber, and the transfer tray accurately carries and transfers the photoresist substrate, improving baking efficiency.

[0011] According to the aforementioned photoresist baking apparatus, a heating plate is installed inside the negative pressure chamber, and the heating plate is adapted to a transfer tray. A controller is fixedly connected to the upper surface of the work platform. The adaptation of the heating plate and the transfer tray ensures uniform heating of the photoresist substrate, and the controller precisely controls the temperature and operating process, improving production efficiency and product quality.

[0012] Compared with the prior art, the beneficial effects of this utility model are:

[0013] This utility model is equipped with a limiting block, a limiting spring, a guide block, a sliding rod, and a positioning spring. The limiting spring provides a buffering effect, reducing vibration and wear of the limiting block during movement or when subjected to external impact, thus extending the service life of the device. The positioning spring provides elastic support for the sliding rod, ensuring its stability during movement and providing accurate positioning force when it reaches the predetermined position, further improving the positioning accuracy and reliability of the device.

[0014] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0015] The present invention will be further described below with reference to the accompanying drawings and embodiments;

[0016] Figure 1 This is a perspective view of a photoresist baking apparatus according to the present invention;

[0017] Figure 2 This is a front view of a photoresist baking apparatus according to the present invention;

[0018] Figure 3 This is a cross-sectional perspective view of a photoresist baking apparatus according to the present invention;

[0019] Figure 4 This utility model Figure 3 Enlarged view of the structure at point A in the middle.

[0020] In the diagram: 1. Working platform; 2. Negative pressure box; 3. Side wall exhaust port; 4. Top exhaust port; 5. Exhaust pipe; 6. Exhaust pipe; 7. Heating plate; 8. Linear motor; 9. Controller; 10. Moving part seat; 11. Connecting seat; 12. Fastening bolt; 13. Connecting plate; 14. Support plate; 15. Sealing plate; 16. Sliding rod; 17. Guide block; 18. Positioning spring; 19. Limiting block; 20. Limiting spring; 21. Transfer plate. Detailed Implementation

[0021] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present utility model.

[0022] Please see Figures 1-4 This utility model provides a technical solution: a photoresist baking device, comprising: a working platform 1, a negative pressure box 2 fixedly connected to the upper surface of the working platform 1, the negative pressure box 2 being used to provide a negative pressure environment to fix the photoresist substrate, limit blocks 19 fixedly connected to both the left and right sides of the negative pressure box 2, the limit blocks 19 being used to limit the movement range of the negative pressure box 2, limit springs 20 fixedly connected to the lower surface of the limit blocks 19, the limit springs 20 being used to buffer the impact force of the limit blocks 19, a guide block 17 provided on the lower surface of the limit blocks 19, the guide block 17 being used to guide the movement direction of the limit blocks 19, and the guide block 17 being fixedly connected to the side wall of the working platform 1, the fixed connection of the guide block 17 ensuring its stability, a sliding rod 16 slidably connected to the inner surface of the guide block 17, the sliding rod 16 being used to slide within the guide block 17 to achieve positioning, and a positioning spring 18 fixedly connected to the upper surface of the sliding rod 16, the positioning spring 18 being used to provide the positioning force of the sliding rod 16.

[0023] The negative pressure chamber 2 has side wall air extraction holes 3 and top air extraction holes 4 inside. These holes are used to evenly distribute negative pressure. The side wall air extraction holes 3 are distributed on both the left and right sides of the inner surface of the negative pressure chamber 2, ensuring uniform negative pressure. The opening of the top air extraction holes 4 is parallel to the inner surface of the negative pressure chamber 2, ensuring uniform airflow. An air extraction pipe 5 is fixedly connected to the rear side of the negative pressure chamber 2, used to connect to external air extraction equipment. Air outlet pipes 6 are fixedly connected to both the left and right sides of the rear surface of the air extraction pipe 5, used to discharge gas during the air extraction process. Linear motors 8 are fixedly connected to both the left and right sides of the upper surface of the work platform 1, used to drive the linear motion of the moving base 10. The output end of the linear motor 8 is fixedly connected to the moving base 10, which supports the connecting seat 11. The moving base 10 is fixedly connected to the connecting seat 11 by fastening bolts 12. The base 11 is used to connect the connecting plate 13. The connecting plate 13 is fixedly connected to the side wall of the connecting base 11. The connecting plate 13 is used to support the support plate 14. The support plate 14 is fixedly connected to the middle of the rear surface of the connecting plate 13. The support plate 14 is used to fix the sealing plate 15. The sealing plate 15 is fixedly connected to the outer surface of the support plate 14. The sealing plate 15 is used to seal the internal space of the negative pressure box 2. The sealing plate 15 and the sliding rod 16 are fixedly connected. The fixed connection of the sealing plate 15 ensures that it moves synchronously with the sliding rod 16. The rear surface of the support plate 14 is fixedly connected to the transfer plate 21. The transfer plate 21 is used to carry and transfer the photoresist substrate. The negative pressure box 2 is equipped with a heating plate 7. The heating plate 7 is used to heat the photoresist substrate. The heating plate 7 and the transfer plate 21 are compatible. The compatibility of the heating plate 7 and the transfer plate 21 ensures that the photoresist substrate is heated evenly. The upper surface of the working platform 1 is fixedly connected to the controller 9. The controller 9 is used to control the operation of the entire device.

[0024] Working principle: The photoresist substrate to be processed is placed on the transfer tray 21, ensuring that the substrate is centered and stable. The controller 9 adjusts the position of the transfer tray 21 to align it with the heating plate 7. The negative pressure system is activated, and air is drawn from the inside of the negative pressure chamber 2 through the suction pipe 5 and the exhaust pipe 6, creating negative pressure in the side wall suction holes 3 and the top suction hole 4. Under the action of negative pressure, the photoresist substrate is firmly adsorbed onto the transfer tray 21, ensuring that it will not move during the heating process. The controller 9 sets the temperature and heating time of the heating plate 7 and starts the heating program. The heating plate 7 begins to heat, and the heat is evenly transferred to the photoresist substrate to reach the required baking temperature. During the heating process, the linear motor... 8 drives the sub-base 10 and the connecting base 11, which in turn moves the connecting plate 13 and the support plate 14. Under the guidance of the guide block 17, the sealing plate 15 and the sliding rod 16 on the support plate 14 ensure the precise positioning of the transfer plate 21 and the photoresist substrate. After heating is completed, the controller 9 automatically shuts off the heating plate 7 and stops heating. The negative pressure system continues to run for a period of time to ensure that the photoresist substrate remains stable during the cooling process. After cooling to a safe temperature, the negative pressure system is shut off, the processed photoresist substrate is taken out, and the transfer plate 21, the heating plate 7 and other components are reset to their initial positions by the controller 9. The inside of the work platform 1 and the negative pressure box 2 is cleaned to ensure that there are no residues and to prepare for the next use.

[0025] The embodiments of the present utility model have been described in detail above with reference to the accompanying drawings. However, the present utility model is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present utility model.

Claims

1. A photoresist baking apparatus, comprising: A working platform (1) is provided, wherein a negative pressure box (2) is fixedly connected to the upper surface of the working platform (1), characterized in that: a limiting block (19) is fixedly connected to both the left and right sides of the negative pressure box (2), a limiting spring (20) is fixedly connected to the lower surface of the limiting block (19), a guide block (17) is provided on the lower surface of the limiting block (19), and the guide block (17) is fixedly connected to the side wall of the working platform (1), a sliding rod (16) is slidably connected to the inner surface of the guide block (17), and a positioning spring (18) is fixedly connected to the upper surface of the sliding rod (16).

2. The photoresist baking apparatus as described in claim 1, characterized in that: The negative pressure box (2) has a side wall air extraction hole (3) and a top air extraction hole (4) inside. The side wall air extraction holes (3) are distributed on the left and right sides of the inner surface of the negative pressure box (2), and the opening of the top air extraction hole (4) is parallel to the inner surface of the negative pressure box (2).

3. The photoresist baking apparatus as described in claim 2, characterized in that: The rear side of the negative pressure box (2) is fixedly connected to an air extraction pipe (5), and the left and right sides of the rear surface of the air extraction pipe (5) are fixedly connected to air outlet pipes (6).

4. The photoresist baking apparatus as described in claim 1, characterized in that: Linear motors (8) are fixedly connected to both the left and right sides of the upper surface of the working platform (1), and the output end of the linear motor (8) is fixedly connected to a moving base (10).

5. The photoresist baking apparatus as described in claim 4, characterized in that: The moving base (10) is fixedly connected to a connecting seat (11) by fastening bolts (12). A connecting plate (13) is fixedly connected to the side wall of the connecting seat (11). A support plate (14) is fixedly connected to the middle of the rear surface of the connecting plate (13).

6. The photoresist baking apparatus as described in claim 5, characterized in that: A sealing plate (15) is fixedly connected to the outer surface of the support plate (14), and the sealing plate (15) is fixedly connected to the sliding rod (16). A transfer plate (21) is fixedly connected to the rear surface of the support plate (14).

7. The photoresist baking apparatus as described in claim 6, characterized in that: The negative pressure box (2) is equipped with a heating plate (7), which is compatible with the transfer plate (21). The upper surface of the working platform (1) is fixedly connected with a controller (9).

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