Edge air inlet device and plasma etching equipment

Abstract

The utility model discloses an edge air inlet device and plasma etching equipment. The edge air inlet device comprises an air uniformizing component, an air spraying component and a driving component, the gas uniformizing component is provided with a gas uniformizing cavity, a mounting hole is formed in the corresponding side wall of the gas uniformizing cavity, the gas spraying component is provided with a gas spraying channel, the gas inlet end of the gas spraying component is located in the gas uniformizing cavity, the gas outlet end of the gas spraying component penetrates through the mounting hole, and the gas spraying channel is communicated with the gas uniformizing cavity; the driving component is configured to be capable of driving the air injection component to pitch so as to adjust the inclination angle of the air injection channel relative to the horizontal direction. When the edge air inlet device is applied, the uniformity of plasma distribution in the reaction chamber can be improved.

Description

Technical Field

[0001] This application relates to the field of plasma etching technology, specifically to an edge air intake device and plasma etching equipment. Background Technology

[0002] During semiconductor etching, process gases need to be introduced into the reaction chamber. There are two main methods for gas introduction into the reaction chamber: center gas introduction and edge gas introduction. Specifically, edge gas introduction involves installing lateral gas nozzles on the side of the reaction chamber to introduce gas from the side.

[0003] Currently, in edge-inlet mode, the air intake direction of the side-inlet nozzle is fixed and uncontrollable. This results in an uneven distribution of process gas entering the reaction chamber from the side, which in turn leads to an uneven distribution of the generated plasma, deviating from the preset standard. Consequently, the surface uniformity of the wafer is poor and the production yield is low.

[0004] Therefore, how to provide a solution to overcome or alleviate the above-mentioned defects remains a technical problem that urgently needs to be solved by those skilled in the art. Utility Model Content

[0005] The purpose of this application is to provide an edge-inlet device to improve the uniformity of plasma distribution inside the reaction chamber. Another purpose of this application is to provide a plasma etching apparatus.

[0006] To solve the above-mentioned technical problems, this application provides an edge air intake device, which includes an air distribution component, an air jet component, and a drive component;

[0007] The gas equalization component has a gas equalization chamber, and the side wall of the gas equalization chamber is provided with a mounting hole. The jet component has a jet channel, the air inlet of the jet component is located in the gas equalization chamber, the air outlet of the jet component passes through the mounting hole, and the jet channel is connected to the gas equalization chamber.

[0008] The drive component is configured to drive the jet component to pitch, thereby adjusting the tilt angle of the jet passage relative to the horizontal direction.

[0009] The edge gas inlet device provided in this application is equipped with a gas equalization component, a jetting component, and a driving component. The inlet end of the jetting component is located in the gas equalization chamber, and the outlet end passes through the mounting hole provided in the corresponding wall of the gas equalization chamber. The driving component is configured to drive the jetting component to pitch, thereby adjusting the tilt angle of the jetting channel of the jetting component relative to the horizontal direction. In use, the jetting component can be driven to pitch by the driving component to adjust the jetting direction of the jetting component. This is beneficial for adjusting the distribution of process gas in the reaction chamber, improving the uniformity of the process gas distribution in the reaction chamber, thereby improving the uniformity of the generated plasma distribution, and helping to ensure the surface uniformity and production yield of the wafer.

[0010] Optionally, the drive component includes a push rod;

[0011] The push rod passes through the wall corresponding to the gas equalization chamber and is sealed to the gas equalization component. The end of the push rod is connected to the jet component. The push rod is used to push or pull the jet component to drive the jet component to rotate about the horizontal axis relative to the side wall and pitch.

[0012] Optionally, the push rod and the jet component are hinged.

[0013] Optionally, the portion of the push rod that extends out of the gas equalization component and the outer surface of the gas equalization component are sealed together by a first bellows.

[0014] Optionally, the driving component is a cylinder;

[0015] The cylinder has a cylinder barrel and a piston rod, the piston rod forming the push rod, the cylinder barrel being open at one end in the direction of the push rod extension, and a first flange being provided at one end of the first bellows, the first flange being connected to and sealing the open end of the cylinder barrel.

[0016] Optionally, a first sealing ring is fitted onto the portion of the jet component located inside the mounting hole, and the outer peripheral wall of the first sealing ring abuts against the inner peripheral wall corresponding to the mounting hole.

[0017] Optionally, the first sealing ring is an O-ring.

[0018] Optionally, the outer peripheral wall of the jet component is provided with an annular step, and the step surface of the annular step and the side wall are sealed and connected by a second bellows.

[0019] Optionally, the second bellows includes a second bellows section and a third flange and a fourth flange located at both ends of the second bellows section, respectively;

[0020] A second sealing ring is provided between the end face of the third flange and the stepped surface, and a third sealing ring is provided between the end face of the fourth flange and the side wall.

[0021] Optionally, the gas equalization component is annular, the gas equalization chamber is arranged around the axis of the gas equalization component, and there are multiple jet components, which are evenly spaced along the circumference of the gas equalization component.

[0022] Optionally, the gas equalization component includes an upper gas equalization section and a lower gas equalization section;

[0023] Both the upper and lower gas equalization sections are annular. The upper gas equalization section has a downward-facing upper gas equalization groove, and the lower gas equalization section has an upward-facing lower gas equalization groove. The lower end face of the upper gas equalization section abuts against the upper end face of the lower gas equalization section, and the upper and lower gas equalization grooves are connected to form the gas equalization cavity.

[0024] Optionally, a fourth annular sealing ring is provided between the upper gas equalizing part and the lower gas equalizing part on the outside of the gas equalizing cavity; and / or, a fifth annular sealing ring is provided between the upper gas equalizing part and the lower gas equalizing part on the inside of the gas equalizing cavity.

[0025] This application also provides a plasma etching apparatus, the plasma etching apparatus including a reaction chamber and the edge air intake device;

[0026] The gas equalization component is located on the side of the reaction chamber, and the jet channel is connected to the reaction chamber.

[0027] Optionally, the plasma etching apparatus further includes a dielectric window;

[0028] The gas equalization component is annular and is disposed between the medium window and the reaction chamber. The lower end face of the gas equalization component abuts against the upper end face of the reaction chamber, and the upper end face of the gas equalization component abuts against the lower end face of the medium window.

[0029] Optionally, a seventh annular sealing ring is provided between the gas equalization component and the reaction chamber; and / or, an eighth annular sealing ring is provided between the gas equalization component and the medium window. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of the edge air intake device provided in the embodiment of this application, located in the reaction chamber.

[0031] Figure 2 for Figure 1 A magnified view of a portion of the image;

[0032] Figure 3 for Figure 2 The diagram shows a structural schematic of an edge air intake device that adjusts the air intake direction upwards.

[0033] Figure 4 for Figure 2 The diagram shows a structural schematic of an edge air intake device that adjusts the air intake direction downwards.

[0034] Figure 5 for Figure 1 The shown is a cross-sectional view of the edge air intake device along the axial direction of the jet component.

[0035] The reference numerals in the above figures are explained as follows:

[0036] 1-Gas equalization component, 1a-Gas equalization chamber, 1a1-Upper gas equalization groove, 1a2-Lower gas equalization groove, 1b-Side wall, 1c-Mounting hole, 1d-Push rod channel, 1e-Air inlet, 11-Upper gas equalization part, 12-Lower gas equalization part;

[0037] 2-Jet component, 2a-Jet passage, 2b-Annular step, 21-Inlet section, 22-Jet section;

[0038] 3-Drive component, 31-Push rod, 32-Cylinder, 33-First drive port, 34-Second drive port;

[0039] 4-Intake components, 4a-Intake passage;

[0040] 51-First bellows, 511-First bellows section, 512-First flange, 513-Second flange, 52-Second bellows, 521-Second bellows section, 522-Third flange, 523-Fourth flange;

[0041] 6-Media window;

[0042] 7-Reaction chamber;

[0043] 81-First sealing ring, 82-Second sealing ring, 83-Third sealing ring, 84-Fourth sealing ring, 85-Fifth sealing ring, 86-Sixth sealing ring, 87-Seventh sealing ring, 88-Eighth sealing ring, 89-Ninth sealing ring. Detailed Implementation

[0044] To enable those skilled in the art to better understand the present application, the present application will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0045] It should be noted that in this application, the terms "first" and "second" are used only to facilitate the description of two or more structures or components that are identical or similar in structure and / or function, and do not indicate any special limitation on order and / or importance.

[0046] In this application, unless otherwise expressly specified and limited, the term "connection" should be interpreted broadly. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection or an indirect connection through an intermediate medium; it can also refer to the internal connection between two components; it can be a mechanical connection or a communication connection. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0047] Please refer to Figure 1 , Figure 1 This is a schematic diagram of the edge air intake device provided in the embodiment of this application, located in the reaction chamber.

[0048] In the embodiments provided in this application, the edge air intake device includes an air equalization component 1, an air jet component 2, and a driving component 3. The air equalization component 1 has an air equalization chamber 1a, and a mounting hole 1c is provided on the side wall 1b corresponding to the air equalization chamber 1a. The air jet component 2 has an air jet channel 2a, with the air inlet end of the air jet component 2 located in the air equalization chamber 1a and the air outlet end of the air jet component 2 passing through the mounting hole 1c. The air jet channel 2a and the air equalization chamber 1a are connected. The driving component 3 is configured to drive the air jet component 2 to pitch, thereby adjusting the tilt angle of the air jet channel 2a relative to the horizontal direction. The horizontal direction described in this application refers to... Figure 1 Based on.

[0049] It is easy to understand that the edge air intake device provided in this application embodiment is used to intake air from the side into the reaction chamber 7 of the plasma etching equipment. The side wall 1b of the jet component 2 should be the wall corresponding to the inner side of the gas equalization chamber 1a, that is, the side wall near the reaction chamber 7. Specifically, the process gas first enters the gas equalization chamber 1a, and then enters the jet channel 2a through the air intake end of the jet component 2 in the gas equalization chamber 1a. Subsequently, it is ejected from the air outlet end of the jet component 2 and enters the reaction chamber 7. Finally, plasma can be generated inside the reaction chamber 7 to etch the wafer carried on the wafer stage. The inner diameter of the mounting hole 1c can be larger than the outer diameter of the part of the jet component 2 located inside the mounting hole 1c, so as to provide space for the pitch of the jet component 2.

[0050] The edge air intake device provided in this embodiment of the application is provided with a gas equalization component 1, a jet component 2 and a driving component 3. The air inlet end of the jet component 2 is located in the gas equalization chamber 1a of the gas equalization component 1, and the air outlet end of the jet component 2 passes through the mounting hole 1c on the corresponding side wall 1b of the gas equalization chamber 1a. The driving component 3 is configured to drive the jet component 2 to pitch, so as to adjust the tilt angle of the jet channel 2a relative to the horizontal direction. In use, the jet component 2 can be driven to pitch by the driving component 3 to adjust the direction of the jet component 2 spraying process gas. This is beneficial to improve the uniformity of the process gas distribution inside the reaction chamber 7, thereby improving the uniformity of the plasma distribution generated inside the reaction chamber 7, and thus improving the surface uniformity and product yield of the plasma-etched wafer.

[0051] In addition, the direction of the process gas injected by the jet component 2 can be adjusted, which is also beneficial to regulate the chamber pressure of the reaction chamber 7 and improve the stability of the chamber pressure.

[0052] Please refer to this as well. Figure 2 , Figure 2 for Figure 1 A magnified view of a portion of the image.

[0053] In actual setup, the specific structure of drive component 3 is not limited.

[0054] In the embodiments provided in this application, the driving component 3 includes a push rod 31; the push rod 31 penetrates the wall portion corresponding to the air distribution chamber 1a and is sealed to the air distribution component 1; the end of the push rod 31 is connected to the jet component 2; the push rod 31 is used to push or pull the jet component 2 to drive the jet component 2 to rotate relative to the side wall 1b around a horizontal axis and pitch. The end of the push rod 31 is the forward end in its extending direction, corresponding to... Figure 2 The upper part of the middle.

[0055] Thus, by controlling the linear displacement of the push rod 31, the jet component 2 can be pushed or pulled, thereby driving the jet component 2 to rotate relative to the side wall 1b around the horizontal axis, so as to quickly adjust the tilt angle of the jet channel 2a, that is, adjust the jet direction of the jet component 2. This makes the structure of the edge air intake device simpler and also helps to improve the efficiency of jet direction adjustment of the jet component 2.

[0056] Specifically, in this embodiment, the push rod 31 can be hinged to the jet component 2. This makes the process of the push rod 31 driving the jet component 2 to rotate smoother and more stable, which helps improve the stability of the jet direction adjustment operation of the jet component 2.

[0057] Furthermore, the connection position between the push rod 31 and the jet component 2 is not limited.

[0058] In the embodiments of this application, such as Figure 2As shown, the push rod 31 is connected to the part of the jet component 2 near the air intake end. This makes it easier to control the rotation of the jet component 2 by pushing or pulling the jet component 2 with the push rod 31.

[0059] In actual settings, such as Figure 2 As shown, the wall of the uniform air chamber 1a may be provided with a push rod channel 1d. The push rod 31 passes through the push rod channel 1d from the outside to the inside and is inserted into the uniform air chamber 1a. The push rod 31 can reciprocate along the axial direction in the push rod channel 1d to push or pull the jet component 2 to pitch.

[0060] In actual setup, a sealing structure can be used between the push rod 31 and the air distribution component 1 to ensure the smooth movement of the push rod 31 while ensuring the air distribution component 1 is sealed. The specific sealing structure is not limited.

[0061] In this embodiment, the portion of the push rod 31 that protrudes from the gas equalization component 1 and the outer surface of the gas equalization component 1 are sealed together by the first bellows 51.

[0062] Among them, such as Figure 2 As shown, the first bellows 51 may include a first corrugated section 511 and the aforementioned first flange 512 and second flange 513 respectively disposed at both ends of the first corrugated section 511. The push rod 31 passes through the first bellows 51 and the push rod channel 1d in sequence and enters the air distribution chamber 1a. The inner circumferential surface corresponding to the inner hole of the first bellows 51 can fit against the outer circumferential surface of the push rod 31, and the second flange 513 abuts against the outer surface of the air distribution component 1. In this way, the sealing between the push rod 31 and the air distribution component 1 can be relatively guaranteed during the movement, so as to ensure the stability of the jet direction adjustment process.

[0063] Furthermore, a sixth sealing ring 86 can be provided between the end face of the second flange 513 and the outer surface of the gas equalization component 1. For example... Figure 2 As shown, annular grooves can be provided on the end face of the second flange 513 and the outer surface of the gas equalization component 1, respectively. The annular grooves can be arranged around the push rod channel 1d. The two ends of the sixth sealing ring 86 abut against the bottom walls of the two annular grooves, which can improve the sealing between the push rod 31 and the gas equalization component 1.

[0064] In actual setup, the direction of movement of push rod 31 is not limited, as long as it is not parallel to the horizontal direction.

[0065] like Figure 2 As shown in the embodiment of this application, the push rod 31 can move in a direction that is approximately parallel to the vertical direction. In this way, the process of the push rod 31 driving the jet component 2 to rotate is more stable and controllable, making the adjustment of the jet direction more stable and controllable.

[0066] In actual setup, in the initial state of push rod 31, that is, when push rod 31 neither pushes nor pulls jet component 2, the tilt angle of jet channel 2a relative to the horizontal direction is unlimited.

[0067] In the embodiments of this application, such as Figure 2 As shown, in the initial state of push rod 31, the tilt angle of the axis of jet channel 2a relative to the horizontal direction is zero, that is, it is parallel to the horizontal direction. In this way, the adjustment process of the tilt angle of jet channel 2a is more controllable.

[0068] Please refer to this as well. Figure 3 and Figure 4 , Figure 3 for Figure 2 The diagram shows the structure of the edge air intake device that adjusts the air intake direction upwards. Figure 4 for Figure 2 The diagram shows the structure of the edge air intake device that adjusts the air intake direction downwards.

[0069] In actual installation, the position of the push rod 31 on the air equalization component 1 is not limited. It can be set on the upper part of the air equalization component 1, the side part of the air equalization component 1, or the lower part of the air equalization component 1.

[0070] like Figure 2 As shown, in this embodiment, the push rod 31 is located at the lower part of the gas equalization component 1, that is, the push rod channel 1d is located on the bottom wall corresponding to the gas equalization chamber 1a. At this time, as... Figure 3 As shown, the push rod 31 retracts from top to bottom, which pulls the jet component 2 downward to rotate it downward, i.e., "tilts," causing the jet channel 2a to tilt upward, as shown. Figure 4 As shown, the push rod 31 extends from bottom to top, which pushes the jet component 2 upward to rotate, or "tilt," causing the jet channel 2a to tilt downward. In this way, the tilt angle of the jet channel 2a can be quickly adjusted to adjust the jet direction of the jet component 2.

[0071] In actual setup, the push rod 31 can be manually pushed to extend or retract, or other power sources such as cylinders, electric cylinders, or motors can be used to drive the push rod 31 to extend or retract. This application does not impose any restrictions on this.

[0072] like Figure 2 As shown, in this embodiment, the driving component 3 is a cylinder; the cylinder has a cylinder barrel 32 and a piston rod, with the piston rod forming a push rod 31. Thus, by using a cylinder as a power source, the extension and retraction of the push rod 31 can be efficiently controlled, thereby improving the efficiency of the jet direction adjustment of the jet component 2. Furthermore, the position and speed of the extension and retraction of the push rod 31 can be precisely controlled, thereby improving the accuracy of the jet direction adjustment of the jet component 2.

[0073] Specifically, the piston of the cylinder can be set independently, and the push rod 31 can be connected to the piston, or as follows: Figure 2 The piston is configured as an annular boss structure surrounding the outer peripheral wall of the push rod 31, but the specific configuration is not limited.

[0074] like Figure 2 As shown, the cylinder 32 can be connected in sequence along the axial direction to a first drive port 33 and a second drive port 34. The first drive port 33 and the second drive port 34 are respectively connected to an external air source. The first end of the push rod 31 is located inside the cylinder 32, and the end extends out of the cylinder 32. When in use, the external air source is used as a power source to push or pull the push rod 31 to move.

[0075] Furthermore, such as Figure 2 As shown in this embodiment, the cylinder 32 is open at one end in the direction of the push rod 31's extension, and a first flange 512 is provided at one end of the first bellows 51. The first flange 512 is connected to and seals the open end of the cylinder 32. Thus, using the first bellows 51 as the end cap of the cylinder 32 not only ensures the sealing performance of the cylinder 32 but also saves manufacturing costs and simplifies the structure of the drive component 3.

[0076] In the embodiments provided in this application, such as Figure 2 As shown, the portion of the jet component 2 located inside the mounting hole 1c is fitted with a first sealing ring 81, and the outer peripheral wall of the first sealing ring 81 abuts against the corresponding inner peripheral wall of the mounting hole 1c. This not only improves the sealing performance between the jet component 2 and the gas equalization component 1, making the rotation of the jet component 2 less likely to affect the sealing performance of the reaction chamber 7, but also reduces wear between the jet component 2 and the gas equalization component 1 during rotation, thus extending their service life. Furthermore, it makes the rotation of the jet component 2 more stable and controllable, which is beneficial for further improving the stability and controllability of the jet direction adjustment of the jet component 2.

[0077] In actual setup, the structure of the first sealing ring 81 is not limited.

[0078] like Figure 2 As shown in the embodiment of this application, the first sealing ring 81 is an O-ring. In this way, the contact between the jet component 2 and the O-ring is a line contact, and the jet component 2 can rotate around the center line of the contact position with the O-ring. This makes the rotation of the jet component 2 more stable and easier to control, which is beneficial to improving the stability and accuracy of the jet direction adjustment of the jet component 2.

[0079] In actual setup, the specific structure of jet component 2 is not limited.

[0080] like Figure 2As shown in the embodiment of this application, the outer peripheral wall of the jet component 2 is provided with an annular step 2b, and the step surface of the annular step 2b and the side wall 1b are sealed and connected by a second bellows 52.

[0081] Specifically, the jet component 2 may include an intake section 21 and a jet section 22 connected to each other along the axial direction. The jet passage 2a passes through the intake section 21 and the jet section 22 along the axial direction. The outer diameter of the jet section 22 is smaller than the outer diameter of the intake section 21, so as to form the aforementioned annular step 2b on the outer peripheral wall of the jet component 2. At this time, the aforementioned step surface of the annular step 2b is also the end face of the intake section 21 near the jet section 22.

[0082] In this way, by cleverly utilizing the flexibility of the second corrugated pipe 52, the second corrugated pipe 52 can deform as it follows the rotation of the jet component 2, making it less likely for the rotation of the jet component 2 to affect the sealing performance of the air distribution component 1. Both of these features also make the structure of the jet component 2 simpler and more compact, which helps to reduce the installation space of the jet component 2.

[0083] Furthermore, such as Figure 2 As shown, the second bellows 52 includes a second bellows section 521 and a third flange 522 and a fourth flange 523 located at both ends of the second bellows section 521, respectively. A second sealing ring 82 is provided between the end face of the third flange 522 and the stepped face, and a third sealing ring 83 is provided between the end face of the fourth flange 523 and the side wall 1b. In this way, the sealing performance between the jetting component 2 and the air distribution component 1 can be further improved.

[0084] It is worth mentioning that, compared to the edge air intake structure in related technologies, where internal machining defects or special process gas corrosion can easily lead to the generation of particulate matter inside the air intake structure, and the edge air intake structure has poor sealing, making it easy for these particulate matter to enter the reaction chamber and reduce the uniformity of air intake, the edge air intake device provided in the above embodiment of this application seals the part of the jet component 2 located inside the uniform air chamber 1a and the corresponding side wall 1b of the uniform air chamber 1a through the second bellows 52, and provides a second sealing ring 82 and a second sealing ring 83 between the two ends of the second bellows 52 and the jet component 2 and the side wall 1b, respectively. Three sealing rings 83 are used to seal the contact positions between the second bellows 52 and the jet component 2, and between the second bellows 52 and the side wall 1b, respectively. At the same time, a first sealing ring 81 is provided between the part of the jet component 2 located inside the mounting hole 1c and the inner peripheral wall corresponding to the mounting hole 1c to seal the position between the jet component 2 and the mounting hole 1c. This can greatly improve the sealing performance between the jet component 2 and the gas equalization component 1. Even if the gas equalization component 1 produces particulate foreign matter due to processing defects or corrosion by process gas, the process gas is not likely to enter the reaction chamber 7, thereby relatively ensuring the uniformity of the gas intake of the edge air intake device.

[0085] Please refer to this as well. Figure 5 , Figure 5 for Figure 1 The shown is a cross-sectional view of the edge air intake device along the axial direction of the jet component.

[0086] In actual setup, the gas equalization component 1 can be a block structure. In this case, multiple gas equalization components 1 can be arranged around the circumference of the reaction chamber 7. Of course, it can also be arranged as follows: Figure 5 As shown, the gas equalization component 1 is configured as a ring structure. At this time, multiple jet components 2 can be integrated around the gas equalization component 1. The gas equalization component 1 is located on the top of the reaction chamber 7. This application does not limit this.

[0087] When the gas equalization component 1 is annular, the number and structure of the gas equalization chambers 1a are unlimited.

[0088] In the embodiments provided in this application, such as Figure 5 As shown, there is one gas equalization chamber 1a arranged around the axis of the gas equalization component 1, and multiple jetting components 2 are arranged at uniform intervals along the circumference of the gas equalization component 1. At this time, the aforementioned side wall 1b is the inner ring wall surface of the gas equalization component 1, and the multiple jetting components 2 are specifically arranged at uniform intervals along the circumference of this inner ring wall surface.

[0089] It is not difficult to understand, such as Figure 2 and Figure 5 As shown, the edge air intake device may further include an air intake component 4, which has an air intake channel 4a. The air intake component 4 is located outside the gas equalization component 1, and the wall corresponding to the gas equalization chamber 1a is also provided with an air intake hole 1e. The air intake channel 4a is connected to the gas equalization chamber 1a through the air intake hole 1e. In use, the air intake component 4 can be connected to an external gas source to supply process gas to the gas equalization chamber 1a.

[0090] In this way, multiple jet components 2 share a single gas equalization chamber 1a, and at least one air intake component 4 can be used to intake the gas equalization chamber 1a. The process gas entering the gas equalization chamber 1a is evenly distributed to each jet component 2 for jetting, making the structure of the edge air intake device simpler and the manufacturing cost lower. It can also improve the uniformity of gas equalization in the gas equalization chamber 1a and the uniformity of gas intake from the edge air intake device into the reaction chamber 7. With the help of the drive component 3 to drive the jet components 2 to adjust the jetting direction, the uniformity of process gas distribution and high-pressure stability inside the reaction chamber 7 can be improved to a large extent, thereby greatly improving the surface uniformity of the wafer and the product yield.

[0091] The annular air-regulating chamber 1a can be supplied with air through one air intake component 4, or through two air intake components 4, or as follows: Figure 1 and Figure 5As shown, air is introduced through multiple air intake components 4. At this time, the multiple air intake components 4 can be evenly distributed along the circumference of the gas equalization component 1. Specifically, the top wall corresponding to the gas equalization chamber 1a can be evenly spaced along the circumference with multiple air intake holes 1e. Each air intake hole 1e is connected to an air intake component 4, so that air can be introduced from the circumference of the gas equalization component 1 into the gas equalization chamber 1a. This can improve the uniformity of the process gas inside the gas equalization chamber 1a, thereby further improving the uniformity of the gas equalization component 1 and further improving the uniformity of the air intake of the edge air intake device.

[0092] Of course, there can be multiple uniform air chambers 1a. For example, one uniform air chamber 1a can be provided for each jet component 2, and one air intake component 4 can be configured for each uniform air chamber 1a.

[0093] In specific settings, the position of the air intake component 4 on the air distribution component 1 is not limited, such as... Figure 2 As shown, the air intake component 4 can be positioned above the air distribution component 1 to supply air to the air distribution component 1 from above. At this time, the lower end face of the air intake component 4 can abut against the upper end face of the air distribution component 1, and an annular ninth sealing ring 89 can be provided between the two to improve the sealing performance between them.

[0094] In actual installation, the air distribution component 1 can be integrally molded, or it can be like... Figure 2 The design is shown as a modular assembly, but the specific details are not limited.

[0095] In the embodiments provided in this application, please refer to Figure 1 and Figure 2 It is understood that the gas equalization component 1 includes an upper gas equalization part 11 and a lower gas equalization part 12; both the upper gas equalization part 11 and the lower gas equalization part 12 are annular. The upper gas equalization part 11 is provided with a downward-facing upper gas equalization groove 1a1, and the lower gas equalization part 12 is provided with an upward-facing lower gas equalization groove 1a2. The lower end face of the upper gas equalization part 11 abuts against the upper end face of the lower gas equalization part 12, and the upper gas equalization groove 1a1 and the lower gas equalization groove 1a2 are connected to form a gas equalization cavity 1a.

[0096] Thus, the air distribution component 1 is formed by connecting the upper air distribution part 11 and the lower air distribution part 12, which makes the installation and disassembly of the jet component 2 more convenient.

[0097] Specifically, the jet component 2 can be located in the upper air distribution section 11 or the lower air distribution section 12, and this application does not limit it in this regard.

[0098] like Figure 2 As shown in the embodiment of this application, the driving component 3 is disposed at the lower part of the air equalization component 1. At this time, the height of the lower air equalization component 12 can be set higher than the height of the upper air equalization component 11, and the mounting hole 1c can be disposed on the inner side wall of the lower air equalization component 12 so as to dispose of the jet component 2 in the lower air equalization component 12.

[0099] Furthermore, such as Figure 2 As shown, an annular fourth sealing ring 84 is provided on the outer side of the air-uniformation chamber 1a between the upper air-uniformation part 11 and the lower air-uniformation part 12, and an annular fifth sealing ring 85 is provided on the inner side of the air-uniformation chamber 1a between the upper air-uniformation part 11 and the lower air-uniformation part 12. In this way, the contact position between the upper air-uniformation part 11 and the lower air-uniformation part 12 can be sealed, so as to ensure the sealing performance of the air-uniformation part 1 while ensuring that the jet component 2 can be easily disassembled and assembled.

[0100] In the embodiments provided in this application, a plasma etching apparatus is also provided. The plasma etching apparatus includes a reaction chamber 7 and an edge air intake device in all the above embodiments; a gas equalization component 1 is disposed on the side of the reaction chamber 7, and a jet channel 2a communicates with the reaction chamber 7. The plasma etching apparatus provided in this application has all the beneficial effects of the edge air intake device in all the above embodiments because it includes the edge air intake device in all the above embodiments, and will not be described in detail here.

[0101] In actual installation, the edge air intake device can be located outside the reaction chamber 7 or above the reaction chamber 7, and there is no specific restriction.

[0102] like Figure 2 As shown in the embodiments provided in this application, the plasma etching apparatus further includes a dielectric window 6; the gas equalization component 1 is annular and is disposed between the dielectric window 6 and the reaction chamber 7, with the lower end face of the gas equalization component 1 abutting against the upper end face of the reaction chamber 7, and the upper end face of the gas equalization component 1 abutting against the lower end face of the dielectric window 6. Thus, the structure of the plasma etching apparatus is relatively compact, which is beneficial for saving installation space.

[0103] Specifically, the connection method between the gas equalization component 1 and the medium window 6, and between the gas equalization component 1 and the reaction chamber 7, is not limited. For example, it can be a press-fit connection, which can improve the reliability and stability of the connection between the gas equalization component 1 and the medium window 6, and between the gas equalization component 1 and the reaction chamber 7.

[0104] Furthermore, please combine Figure 2 It is understood that a seventh annular sealing ring 87 is provided between the gas distribution component 1 and the reaction chamber 7, and an eighth annular sealing ring 88 is provided between the gas distribution component 1 and the dielectric window 6. In this way, the sealing performance between the gas distribution component 1 and the dielectric window 6 and between the gas distribution component 1 and the reaction chamber 7 can be improved, thereby further improving the sealing performance of the entire plasma etching equipment and ensuring the smooth progress of the gas intake process and the etching process.

[0105] This document uses specific examples to illustrate the principles and implementation methods of this application. The descriptions of the embodiments above are only for the purpose of helping to understand the apparatus and core ideas of this application. It should be noted that those skilled in the art can make several improvements and modifications to this application without departing from the principles of this application, and these improvements and modifications also fall within the protection scope of the claims of this application.

Claims

1. An edge air intake device, characterized in that, The edge air intake device includes an air distribution component (1), an air jet component (2), and a drive component (3). The gas equalization component (1) has a gas equalization chamber (1a), and the side wall (1b) corresponding to the gas equalization chamber (1a) is provided with a mounting hole (1c). The jet component (2) has a jet channel (2a), the air inlet of the jet component (2) is located in the gas equalization chamber (1a), and the air outlet of the jet component (2) passes through the mounting hole (1c). The jet channel (2a) and the gas equalization chamber (1a) are connected. The drive component (3) is configured to drive the jet component (2) to pitch in order to adjust the tilt angle of the jet channel (2a) relative to the horizontal direction.

2. The edge air intake device according to claim 1, characterized in that, The drive component (3) includes a push rod (31); The push rod (31) passes through the wall corresponding to the gas equalization chamber (1a) and is sealed to the gas equalization component (1). The end of the push rod (31) is connected to the jet component (2). The push rod (31) is used to push or pull the jet component (2) to drive the jet component (2) to rotate about the horizontal axis relative to the side wall (1b) and pitch.

3. The edge air intake device according to claim 2, characterized in that, The push rod (31) and the jet component (2) are hinged.

4. The edge air intake device according to claim 2, characterized in that, The portion of the push rod (31) that extends out of the gas equalization component (1) and the outer surface of the gas equalization component (1) are sealed together by a first corrugated pipe (51).

5. The edge air intake device according to claim 4, characterized in that, The driving component (3) is a cylinder; The cylinder has a cylinder barrel (32) and a piston rod, the piston rod forming the push rod (31), the cylinder barrel (32) is open at one end in the extension direction of the push rod (31), and a first flange (512) is provided at one end of the first bellows (51), the first flange (512) is connected to and seals the open end of the cylinder barrel (32).

6. The edge air intake device according to any one of claims 1 to 5, characterized in that, The portion of the jet component (2) located inside the mounting hole (1c) is fitted with a first sealing ring (81), and the outer peripheral wall of the first sealing ring (81) abuts against the inner peripheral wall corresponding to the mounting hole (1c).

7. The edge air intake device according to claim 6, characterized in that, The first sealing ring (81) is an O-ring.

8. The edge air intake device according to any one of claims 1 to 5, characterized in that, The outer peripheral wall of the jet component (2) is provided with an annular step (2b), and the step surface of the annular step (2b) and the side wall (1b) are sealed and connected by a second bellows (52).

9. The edge air intake device according to claim 8, characterized in that, The second bellows (52) includes a second bellows section (521) and a third flange (522) and a fourth flange (523) located at both ends of the second bellows section (521); A second sealing ring (82) is provided between the end face of the third flange (522) and the stepped surface, and a third sealing ring (83) is provided between the end face of the fourth flange (523) and the side wall (1b).

10. The edge air intake device according to any one of claims 1 to 5, characterized in that, The gas equalization component (1) is annular, and the gas equalization chamber (1a) is arranged around the axis of the gas equalization component (1). There are multiple jet components (2), and the multiple jet components (2) are evenly spaced along the circumference of the gas equalization component (1).

11. The edge air intake device according to claim 10, characterized in that, The gas equalization component (1) includes an upper gas equalization part (11) and a lower gas equalization part (12). Both the upper gas equalization section (11) and the lower gas equalization section (12) are annular. The upper gas equalization section (11) is provided with a downward-facing upper gas equalization groove (1a1), and the lower gas equalization section (12) is provided with an upward-facing lower gas equalization groove (1a2). The lower end face of the upper gas equalization section (11) abuts against the upper end face of the lower gas equalization section (12). The upper gas equalization groove (1a1) and the lower gas equalization groove (1a2) are connected to form the gas equalization cavity (1a).

12. The edge air intake device according to claim 11, characterized in that, A fourth annular sealing ring (84) is provided between the upper gas equalizing part (11) and the lower gas equalizing part (12) on the outside of the gas equalizing cavity (1a); and / or, a fifth annular sealing ring (85) is provided between the upper gas equalizing part (11) and the lower gas equalizing part (12) on the inside of the gas equalizing cavity (1a).

13. A plasma etching apparatus, characterized in that, The plasma etching apparatus includes a reaction chamber (7) and an edge air intake device as described in any one of claims 1 to 12; The gas equalization component (1) is located on the side of the reaction chamber (7), and the jet channel (2a) is connected to the reaction chamber (7).

14. The plasma etching apparatus according to claim 13, characterized in that, The plasma etching apparatus also includes a dielectric window (6). The gas equalization component (1) is annular and is located between the medium window (6) and the reaction chamber (7). The lower end face of the gas equalization component (1) abuts against the upper end face of the reaction chamber (7), and the upper end face of the gas equalization component (1) abuts against the lower end face of the medium window (6).

15. The plasma etching apparatus according to claim 14, characterized in that, A seventh annular sealing ring (87) is provided between the gas equalization component (1) and the reaction chamber (7); and / or, an eighth annular sealing ring (88) is provided between the gas equalization component (1) and the medium window (6).

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