Air exhaust pressure stabilizing mechanism of MPCVD (Micro Pressure Chemical Vapor Deposition) equipment

Abstract

The utility model provides an air exhaust pressure stabilizing mechanism of MPCVD (Micro Pressure Chemical Vapor Deposition) equipment, which relates to the technical field of air control and comprises a reaction bin, a fixing piece and an infusion tube, the vacuum pump is installed at the upper end of the reaction bin, the damping plate is connected to the lower end of the vacuum pump, the fixing frame is fixedly connected to the reaction bin, the liquid storage tank is clamped in the fixing frame, the fixing piece is arranged at the upper end of the reaction bin, the fixing piece penetrates into the reaction bin, and three sets of connecting pipes are connected to the fixing piece; the heating pipe is mounted at the lower end of the connecting frame, so that after the heating pipe is mounted at the lower end of the connecting frame, the environment in the reaction bin can be heated according to process requirements by utilizing the heating pipe after the heating pipe is connected with a control system; the influence of temperature change on internal gas and pressure is reduced, and the problem that an air exhaust pressure stabilizing mechanism of existing MPCVD equipment is easily interfered by temperature factors is solved.

Description

TECHNICAL FIELD

[0001] The utility model belongs to gas control technical field, more specifically, especially, it relates to a kind of pumping of MPCVD equipment's stable voltage mechanism. BACKGROUND

[0002] MPCVD equipment is extremely widely used in diamond production and many other fields, in the MPCVD equipment system, vacuum system is the core component, and pumping of stable voltage mechanism plays a decisive role in the stable operation of vacuum system, to ensure the deposition quality, must accurately control the gas pressure and gas flow in reaction cavity, create stable vacuum environment, however, the pumping of stable voltage mechanism of current MPCVD equipment is susceptible to temperature interference, when temperature changes, the internal pressure of equipment will fluctuate, in turn, adversely affect the subsequent production quality, so that the prepared product is difficult to achieve ideal standard in purity, uniformity and crystallization quality and other key indicators, so now need a kind of new pumping of stable voltage mechanism of MPCVD equipment. UTILITY MODEL CONTENTS

[0003] To solve the above technical problems, the utility model provides a kind of pumping of stable voltage mechanism of MPCVD equipment, to solve the problem that the pumping of stable voltage mechanism of existing MPCVD equipment is susceptible to temperature interference.

[0004] The utility model discloses a kind of pumping of stable voltage mechanism of MPCVD equipment, by following specific technical means:

[0005] A kind of pumping of stable voltage mechanism of MPCVD equipment, including reaction bin, fixed part, infusion tube;

[0006] The upper end of the reaction bin is provided with vacuum pump, and damping plate is connected to the lower end of vacuum pump, fixed frame is fixedly connected on the reaction bin, and liquid storage tank is clamped in the fixed frame, the fixed part is placed in the upper end of the reaction bin, and the fixed part is penetrated into the inside of the reaction bin, and three groups of connecting pipes are connected on the fixed part, gas storage tank is connected on connecting pipe, the infusion tube is placed in the inside of the reaction bin, water source interface is connected to the upper end of infusion tube, and drain pipe is connected to the lower end of water source interface, and water source interface and drain pipe are penetrated out of the reaction bin.

[0007] Further, the lower end of the reaction bin is provided with sealing interface, and electric control valve B is installed on the sealing interface.

[0008] Further, temperature sensor is installed in the inside of the reaction bin, and vacuum gauge is installed in the inside of the bottom end of the reaction bin.

[0009] Further, connecting frame is installed in the inside of the reaction bin, and heating pipe is installed on the lower end of connecting frame.

[0010] Further, the water source interface is provided with an electric control valve A, and the upper side of the water source interface is movably connected with a liquid storage tank.

[0011] Further, the three groups of connecting pipes are provided with gas flow meters and electric control valves C, and filter plates are connected in the connecting pipes.

[0012] Compared with the prior art, the utility model has the advantages of the following:

[0013] 1. The heating pipe is arranged on the lower end of the connecting frame, and the heating pipe is used to heat the environment in the reaction chamber according to the process requirements after the control system is connected, so that the influence of temperature change on the internal gas and pressure is reduced.

[0014] 2. The connecting pipes are arranged on the fixing member, the gas storage tanks are connected to the connecting pipes, and the connecting pipes are used to connect various different gases, so that the complex gas requirements in the MPCVD process are met.

[0015] 3. The filter plates are connected in the connecting pipes, and the filter plates are used to effectively filter the impurity particles and other pollutants in the gas entering the reaction chamber, so that the interference of impurities on the process is reduced, and the product quality is improved. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 is a structural schematic view of the utility model.

[0017] Figure 2 is a sectional view of the reaction chamber of the utility model.

[0018] Figure 3 is a structural schematic view of the fixing member and the connecting pipe of the utility model.

[0019] Figure 4 is a structural schematic view of the infusion pipe of the utility model.

[0020] In the drawings, the correspondence between the component names and the drawing numbers is as follows:

[0021] 1. reaction chamber; 2. vacuum pump; 3. damping plate; 4. liquid storage tank; 5. fixing frame; 6. water source interface; 601. electric control valve A; 7. drain pipe; 8. valve; 9. fixing member; 10. connecting pipe; 11. gas storage tank; 12. sealing interface; 13. electric control valve B; 14. vacuum gauge; 15. temperature sensor; 16. connecting frame; 17. infusion pipe; 18. heating pipe; 19. gas flow meter; 20. electric control valve C; 21. filter plate. DETAILED DESCRIPTION

[0022] The embodiments of the present application will be further described in detail below with reference to the drawings and examples. The following examples are used to illustrate the present application, but cannot be used to limit the scope of the present application.

[0023] Embodiments:

[0024] As shown in the accompanying Figure 1 to the accompanying Figure 4 As shown:

[0025] The utility model provides a kind of pumping and pressure stabilizing mechanism of MPCVD equipment, including reaction bin 1, fixed part 9, infusion tube 17;

[0026] The upper end of reaction bin 1 is equipped with vacuum pump 2, and damping plate 3 is connected in the lower end of vacuum pump 2, fixed frame 5 is fixedly connected on reaction bin 1, liquid storage tank 4 is clamped in fixed frame 5, fixed part 9 is placed in the upper end of reaction bin 1, and fixed part 9 is penetrated into the inside of reaction bin 1, and three groups of connecting pipes 10 are connected on fixed part 9, gas storage tank 11 is connected on connecting pipe 10, infusion tube 17 is placed in the inside of reaction bin 1, water source interface 6 is connected in the upper end of infusion tube 17, drain pipe 7 is connected in the lower end of water source interface 6, and water source interface 6 and drain pipe 7 are penetrated out of reaction bin 1.

[0027] Among them, as shown in the accompanying Figure 2 The lower end of reaction bin 1 is equipped with sealing interface 12, and electric control valve B 13 is installed on sealing interface 12, temperature sensor 15 is installed in the inside of reaction bin 1, vacuum gauge 14 is installed in the bottom end of reaction bin 1, after being connected with control system, the change of temperature and pressure in the inside of reaction bin 1 is detected by temperature sensor 15 cooperating with vacuum gauge 14, the vacuum degree in the inside of reaction bin can be measured in real time and accurately, and stable pressure environment is provided for subsequent chemical reaction.

[0028] Among them, as shown in the accompanying Figure 2 And Figure 4As shown, the inside of the reaction chamber 1 is provided with a connecting frame 16, and a heating pipe 18 is installed at the lower end of the connecting frame 16, an electric control valve A601 is installed on the water source interface 6, the upper side of the water source interface 6 is movably connected with the liquid storage tank 4, a valve 8 is installed on the drain pipe 7, after connecting with the control system, the inside of the reaction chamber 1 can be heated according to the process requirements through the heating pipe 18, cooperating with the temperature sensor 15, the temperature inside the reaction chamber 1 can be monitored in real time, and the temperature data is fed back to the control system, so that the power of the heating pipe 18 can be adjusted in time, the cooling liquid is stored in the liquid storage tank 4, the water source interface 6 is connected with an external water source, when the electric control valve A601 is opened, the water of the external water source enters the water source interface 6 and mixes with the cooling liquid in the liquid storage tank 4, the mixed cooling liquid enters the infusion pipe 17, the infusion pipe 17 is arranged in the reaction chamber 1, and the cooling liquid flows in the infusion pipe 17, so that the heat in the reaction chamber 1 is absorbed through heat exchange, thereby realizing the cooling of the inside of the reaction chamber 1, which is beneficial to realize accurate temperature control, reduce the influence of temperature change on the state of gas and reaction rate, and further affect the pressure, and provide suitable and stable temperature conditions for the MPCVD process.

[0029] As shown in the drawings, Figure 3 As shown in the drawings, three groups of connecting pipes 10 are provided with gas flow meters 19 and electric control valves C20, and filter plates 21 are connected in the connecting pipes 10, and the connecting pipes 10 connected with the gas storage tanks 11 can access a plurality of different gases, which can meet the complex gas requirements in the MPCVD process, the gas flow meters 19 and the electric control valves C20 installed on the connecting pipes 10 can accurately monitor and adjust the flow of each gas, so that the reaction gas can enter the reaction chamber 1 according to the set proportion, improve the accuracy and repeatability of the chemical reaction, and further improve the stability of the product quality.

[0030] The specific use and effect of the embodiment are as follows:

[0031] As shown in the drawings, Figures 1 to 4 As shown in the drawings, the temperature sensor 15 cooperates with the vacuum gauge 14 to detect the change of the temperature and pressure inside the reaction chamber 1, so that the vacuum degree inside the reaction chamber can be measured in real time and accurately, and a stable pressure environment is provided for the subsequent chemical reaction, three groups of connecting pipes 10 connected with the gas storage tanks 11 can access a plurality of different gases, which can meet the complex gas requirements in the MPCVD process, the gas flow meters 19 and the electric control valves C20 installed on the connecting pipes 10 can accurately monitor and adjust the flow of each gas, so that the reaction gas can enter the reaction chamber 1 according to the set proportion, improve the accuracy and repeatability of the chemical reaction, and further improve the stability of the product quality.

[0032] The parts not described in the utility model are known to those skilled in the art.

Claims

1. A mechanism for pumping and stabilizing pressure of an MPCVD apparatus, characterized in that: Including reaction bin (1), fixed part (9) and infusion tube (17); The upper end of the reaction bin (1) is provided with a vacuum pump (2), and the lower end of the vacuum pump (2) is connected with a shock absorbing plate (3). The reaction bin (1) is fixedly connected with a fixed frame (5), and the fixed frame (5) is clamped with a liquid storage tank (4) inside. The fixed part (9) is arranged at the upper end of the reaction bin (1), and the fixed part (9) penetrates into the inside of the reaction bin (1), and three groups of connecting pipes (10) are connected with the fixed part (9). The connecting pipes (10) are connected with gas storage tanks (11). The infusion tube (17) is arranged in the inside of the reaction bin (1), and the upper end of the infusion tube (17) is connected with a water source interface (6). The lower end of the water source interface (6) is connected with a drain pipe (7), and the water source interface (6) and the drain pipe (7) penetrate out of the reaction bin (1).

2. The mechanism for pumping and stabilizing pressure of an MPCVD apparatus according to claim 1, characterized in that: The lower end of the reaction bin (1) is provided with a sealing interface (12), and an electric control valve B (13) is arranged on the sealing interface (12).

3. The mechanism for pumping and stabilizing pressure of an MPCVD apparatus according to claim 1, wherein: The inside of the reaction bin (1) is provided with a temperature sensor (15), and the bottom end of the reaction bin (1) is provided with a vacuum gauge (14) inside.

4. The mechanism for pumping and stabilizing pressure of an MPCVD apparatus according to claim 1, wherein: The inside of the reaction bin (1) is provided with a connecting frame (16), and a heating pipe (18) is arranged at the lower end of the connecting frame (16).

5. The mechanism for pumping and stabilizing pressure of a MPCVD apparatus according to claim 1, wherein: The water source interface (6) is provided with an electric control valve A (601), and the upper side of the water source interface (6) is movably connected with the liquid storage tank (4). The drain pipe (7) is provided with a valve (8).

6. The mechanism for pumping and stabilizing pressure of a MPCVD apparatus according to claim 1, wherein: Three groups of the connecting pipes (10) are provided with gas flow meters (19) and electric control valves C (20), and filter plates (21) are connected in the inside of the connecting pipes (10).

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