Waste gas treatment equipment for reactive ion etching machine
By adopting a multi-row sealing plate and extraction box structure in the waste gas treatment equipment of the reactive ion etching machine, convenient replacement of filter media and dual filtration are achieved, solving the problems of time-consuming filter media replacement and poor filtration effect, and improving the efficiency and effect of waste gas purification.
Patent Information
- Application Number
- CN202520428723.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-12
- Publication Date
- 2026-02-24
- Estimated Expiration
- 2035-03-12
AI Technical Summary
Existing plasma etching machine exhaust gas treatment equipment is time-consuming to replace filter media and can only filter once, resulting in poor filtration effect.
Design a waste gas treatment device for reactive ion etching machine, which adopts a multi-row sealing plate and extraction box structure. The filter material is divided into three parts, and the gas passes through multiple filtrations, including activated carbon, non-woven fabric and ceramic particles, to achieve dual filtration.
It facilitates filter media replacement, ensures effective exhaust gas purification, achieves double filtration, and improves purification efficiency and effectiveness.
Smart Images

Figure CN223930949U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to a waste gas treatment device for reactive ion etching machines, belonging to the field of etching machines. Background Technology
[0002] Plasma etching machines, also known as plasma etching machines, plasma planar etching machines, plasma etching equipment, plasma surface treatment instruments, and plasma cleaning systems, employ various methods to treat their exhaust gases, ensuring effective purification and environmental compliance.
[0003] Physical adsorption method: This method uses adsorbents such as activated carbon to adsorb harmful gases such as fluorides and chlorides in waste gas, thereby achieving purification.
[0004] Chemical absorption method: This method involves a chemical absorbent reacting with harmful gases in the waste gas to form harmless substances. It is suitable for treating nitrogen oxides and other harmful substances.
[0005] Plasma treatment: This method uses plasma to ionize waste gas, decomposing harmful gases into harmless substances. It is suitable for treating a variety of harmful gases.
[0006] The patent, CN221693094U, is a utility model patent for a plasma etching machine with environmentally friendly waste gas treatment function. While it effectively solves the problem of poor flue gas treatment efficiency in traditional plasma etching machines, failing to adequately adsorb and filter harmful substances, thus reducing the overall treatment effect, this device can conveniently treat the flue gas generated by the plasma etching machine, improving treatment efficiency while ensuring the treatment effect. However, in actual use, replacing the filter material is time-consuming, and it only filters once, potentially leading to poor filtration results. Therefore, improvements have been made. Utility Model Content
[0007] The purpose of this invention is to solve the above-mentioned problems in the background art and provide a reactive ion etching machine exhaust gas treatment device.
[0008] The technical solution adopted by this utility model to achieve the above objectives is as follows:
[0009] A reactive ion etching machine exhaust gas treatment device includes a housing; an air inlet and an air outlet are provided on the side of the housing; an induced draft fan is provided on the air inlet; an isolation box is fixedly connected inside the housing; a perforation communicating with the isolation box is provided on the side of the housing; a partition plate I is fixedly connected to the top of the side of the isolation box, and the other end of the partition plate I is fixedly connected to the inner wall of the housing; a partition plate II is fixedly connected to the bottom of the side of the isolation box, and the other end of the partition plate II is fixedly connected to the inner wall of the housing; an air inlet is provided at the center of the top of the isolation box, an air outlet I is provided at the center of the bottom of the isolation box, and air outlets II are provided on both sides of the air outlet I; a through hole I is provided on the partition plate II, and a through hole II is provided at the top of the side of the isolation box; the air outlet I communicates with the through hole I through a pipe; multiple rows of sealing plates perpendicular to the perforations are fixedly connected inside the isolation box; and a suction box is provided inside the isolation box.
[0010] Compared with the prior art, the advantages of this utility model are: this utility model not only facilitates the replacement of filter materials, but also allows for two-stage filtration of exhaust gas during purification, ensuring that the purified exhaust gas meets the standards. Attached Figure Description
[0011] Figure 1 This is a front view of a reactive ion etching machine exhaust gas treatment device according to this utility model;
[0012] Figure 2 This is a cross-sectional view of the outer casing of a reactive ion etching machine exhaust gas treatment device according to this utility model;
[0013] Figure 3 yes Figure 2 A cross-sectional view along the AA direction;
[0014] Figure 4 This is a side sectional view of the extraction box of a reactive ion etching machine exhaust gas treatment device according to this utility model.
[0015] In the diagram: 1. Outer shell; 2. Partition plate I; 3. Air inlet; 4. Exhaust fan; 5. Isolation box; 6. Air inlet hole; 7. Through hole II; 8. Extraction box; 81. Side plate; 82. Mesh plate; 83. Handle; 9. Sealing plate; 10. Partition plate II; 11. Through hole I; 12. Pipe; 13. Air outlet; 14. Air outlet II; 15. Air outlet I; 16. Perforation. Detailed Implementation
[0016] The technical solutions of this utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of this utility model. Obviously, the described embodiments are only some embodiments of the utility model, not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are within the protection scope of this utility model.
[0017] Specific implementation method one: as follows Figure 1-4 As shown, this embodiment describes a reactive ion etching machine exhaust gas treatment device, including a housing 1; the housing 1 has an air inlet 3 and an air outlet 13 on its side; an induced draft fan 4 is provided on the air inlet 3; an isolation box 5 is fixedly connected inside the housing 1; a perforation 16 communicating with the isolation box 5 is provided on the side of the housing 1; a partition plate I2 is fixedly connected to the top side of the isolation box 5, and the other end of the partition plate I2 is fixedly connected to the inner wall of the housing 1; a partition plate II 10 is fixedly connected to the bottom side of the isolation box 5. The other end of the partition plate II10 is fixedly connected to the inner wall of the outer shell 1; the top center of the isolation box 5 is provided with an air inlet 6, the bottom center of the isolation box 5 is provided with an air outlet I15, and the two sides of the air outlet I15 are provided with air outlets II14; the partition plate II10 is provided with a through hole I11, and the top side of the isolation box 5 is provided with a through hole II7; the air outlet I15 is connected to the through hole I11 through a pipe 12; multiple rows of sealing plates 9 perpendicular to the through hole 16 are fixedly connected inside the isolation box 5; the isolation box 5 is provided with a pumping box 8.
[0018] The sealing plate 9 has three rows: upper, middle, and lower. There is a gap between two adjacent rows of sealing plates 9, and there are two sealing plates 9 in each row. A gap is left between the bottom row of sealing plates 9 and the isolation box 5 for the pumping box 8 to slide.
[0019] The extraction box 8 includes a mesh plate 82 and a side plate 81; the side plate 81 is fixedly connected to the upper end of the mesh plate 82. After the mesh plate 82 is inserted into the isolation box 5 through the perforation 16, it slides in fit with the gap between the two rows of adjacent sealing plates 9.
[0020] A sealing gasket is provided at the contact point between the sealing plate 9 and the mesh plate 82. This prevents the exhaust gas from moving laterally, which would reduce the filtration effect.
[0021] The air inlet 6 and air outlet I15 are located in the gap between the nearest row of sealing plates 9.
[0022] A handle 83 is fixedly connected to the outer wall of the side plate 81. This facilitates pulling and installing the extraction box 8, and thus makes it easier to replace the filter media.
[0023] The working principle of this utility model is as follows: When using this device, the extraction box 8 is inserted into the isolation box 5 through the through hole 16, and the sealing plate 9 divides the filter material in the extraction box 8 into three parts: left, middle and right. There are at least three extraction boxes 8, and each of them is filled with filter materials such as activated carbon, non-woven fabric, and ceramic particles.
[0024] Start the induced draft fan 4 to draw gas into the outer casing 1. The gas entering the outer casing 1 enters between the two sealing plates 9 in each row through the air inlet 6 and passes through the filter material in the corresponding extraction box 8 for filtration. After passing through the mesh plate 82 at the bottom of the bottom extraction box 8, it is discharged from the air outlet I 15 into the pipe 12, and then enters the isolation box 5 again after passing through the through hole I 11 and through hole II 7. It then moves downward through the gap between each sealing plate 9 and the side plate 81 until it passes through the bottom extraction box 8 and is discharged from the air outlet II 14. Finally, it is discharged to the outside of the outer casing 1 through the air outlet 13, completing the filtration.
Claims
1. A waste gas treatment device for a reactive ion etching machine, characterized in that: Includes an outer shell (1); the outer shell (1) has an air inlet (3) and an air outlet (13) on its side; an exhaust fan (4) is provided on the air inlet (3); an isolation box (5) is fixedly connected inside the outer shell (1); the outer shell (1) has a perforation (16) communicating with the isolation box (5) on its side; a partition plate I (2) is fixedly connected to the top side of the isolation box (5), and the other end of the partition plate I (2) is fixedly connected to the inner wall of the outer shell (1); a partition plate II (10) is fixedly connected to the bottom side of the isolation box (5), and the other end of the partition plate II (10) is fixedly connected to... On the inner wall of the outer shell (1); an air inlet (6) is provided at the top center of the isolation box (5), an air outlet I (15) is provided at the bottom center of the isolation box (5), and air outlets II (14) are provided on both sides of the air outlet I (15); a through hole I (11) is provided on the partition plate II (10), and a through hole II (7) is provided at the top of the side of the isolation box (5); the air outlet I (15) is connected to the through hole I (11) through a pipe (12); multiple rows of sealing plates (9) perpendicular to the perforation (16) are fixedly connected inside the isolation box (5); a pumping box (8) is provided inside the isolation box (5).
2. The reactive ion etching machine exhaust gas treatment equipment according to claim 1, characterized in that: The sealing plate (9) has three rows: upper, middle and lower. There is a gap between two adjacent rows of sealing plates (9), and there are two sealing plates in each row (9).
3. The reactive ion etching machine exhaust gas treatment equipment according to claim 2, characterized in that: The extraction box (8) includes a mesh plate (82) and a side plate (81); the side plate (81) is fixedly connected to the upper end of the mesh plate (82). After the mesh plate (82) is inserted into the isolation box (5) through the perforation (16), it slides in fit with the gap between the two rows of adjacent sealing plates (9).
4. The reactive ion etching machine exhaust gas treatment equipment according to claim 1 or 3, characterized in that: A sealing gasket is provided at the position where the sealing plate (9) contacts the mesh plate (82).
5. The reactive ion etching machine exhaust gas treatment equipment according to claim 4, characterized in that: The air inlet (6) and air outlet I (15) are located in the gap between the nearest row of sealing plates (9).
6. The reactive ion etching machine exhaust gas treatment equipment according to claim 3, characterized in that: A handle (83) is fixedly connected to the outer wall of the side plate (81).
Citation Information
Patent Citations
Plasma etching machine with environment-friendly waste gas treatment function
CN221693094U