Remote monitoring system for dry etching equipment
By introducing a remote monitoring system into the dry etching equipment, and using a signal conversion module and controller to achieve real-time remote monitoring of EPD signals, the problem of cumbersome operation in the existing technology is solved, and the monitoring efficiency is improved.
Patent Information
- Application Number
- CN202520786751.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-23
- Publication Date
- 2026-02-24
- Estimated Expiration
- 2035-04-23
AI Technical Summary
In existing dry etching equipment, the endpoint curve (EPD curve) needs to be queried at the machine end, which is cumbersome and cannot achieve real-time monitoring and query.
Design a remote monitoring system for dry etching equipment, including an EPD module, a signal conversion module, and a controller. The signal conversion module converts the EPD signal into a signal that can be received by the controller and acquired by the terminal in real time to achieve remote monitoring.
It enables real-time remote monitoring of dry etching equipment, simplifies the operation process, and improves monitoring efficiency.
Smart Images
Figure CN223941256U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of semiconductor etching equipment technology, specifically relating to a remote monitoring system for dry etching equipment. Background Technology
[0002] With the rapid development of semiconductor technology, the integration density of integrated circuits is increasing, and the demand for high-precision semiconductor devices is also growing. Etching technology has become a crucial technology in integrated circuit manufacturing. Dry etching technology, as an etching technology with many advantages, has been widely used in the manufacturing of high-precision semiconductor devices.
[0003] In the existing technology, the endpoint curve (EPD curve) on an 8-inch dry etching equipment (DPS METAL) needs to be queried at the machine end of the dry etching equipment, and a series of codes need to be entered when querying, which is relatively cumbersome and cannot achieve real-time monitoring and query. Utility Model Content
[0004] The purpose of this invention is to provide a remote monitoring system for dry etching equipment, which enables real-time remote monitoring of the EPD curve of the dry etching equipment.
[0005] This utility model provides a remote monitoring system for a dry etching apparatus, comprising: a dry etching apparatus, the dry etching apparatus including an EPD module, a signal conversion module, and a controller; the EPD module is used to acquire and store a first EPD signal during the etching process, the first EPD signal including an endpoint curve and its corresponding amplitude voltage signal; the signal conversion module is used to convert the first EPD signal into a second EPD signal; the EPD module and the signal conversion module are connected; the controller is used to monitor the operating status of the dry etching apparatus, the controller is connected to the signal conversion module, and is used to receive the second EPD signal in real time; and a terminal, the terminal integrating an FDC module, the terminal being connected to the dry etching apparatus, and used to acquire the second EPD signal in real time.
[0006] Furthermore, the controller is built into the gas holder module.
[0007] Furthermore, the controller is a mass flow controller.
[0008] Furthermore, the signal conversion module is a DC conversion module, and both the first EPD signal and the second EPD signal are DC voltage signals.
[0009] Furthermore, the first EPD signal is a 15V DC voltage signal, and the second EPD signal is a 5V DC voltage signal.
[0010] Furthermore, the EPD module and the signal conversion module are connected via signal lines.
[0011] Furthermore, the terminal is a computer in a fault detection and classification system, and the computer is used to acquire and display the second EPD signal.
[0012] Furthermore, the terminal is connected to the dry etching equipment via an EAP signal line.
[0013] Furthermore, the controller and the signal conversion module are connected via signal lines.
[0014] The beneficial effects of this utility model are:
[0015] The remote monitoring system for dry etching equipment of this invention transmits the EPD signal from the EPD module to the controller by setting a signal conversion module. The FDC module of the terminal will acquire the data from the controller in real time, thereby realizing real-time remote monitoring of the EPD curve of the dry etching equipment. Attached Figure Description
[0016] To more clearly illustrate the technical solutions of the embodiments of this disclosure, the accompanying drawings of the embodiments will be briefly described below. Obviously, the drawings described below only relate to some embodiments of this disclosure and are not intended to limit this disclosure.
[0017] Figure 1 A simplified block diagram of a remote monitoring system for dry etching equipment is shown. Detailed Implementation
[0018] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. All other embodiments obtained by those skilled in the art based on the described embodiments of this disclosure without creative effort are within the scope of protection of this disclosure.
[0019] Before proceeding with the detailed description below, it may be advantageous to define certain words and phrases used throughout this disclosure. The term “connection” and its derivatives refer to any direct or indirect communication or connection between two or more elements, regardless of whether those elements are physically in contact with each other. The terms “transmit,” “receive,” and “communication” and their derivatives cover both direct and indirect communication. The terms “comprising” and “including” and their derivatives mean including but not limited to. The term “or” is inclusive, meaning and / or. The term “controller” refers to any device, system, or part thereof that controls at least one operation. Such a controller may be implemented in hardware, or a combination of hardware and software and / or firmware. The functionality associated with any particular controller may be centralized or distributed, local or remote. The terms “first,” “second,” and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different components.
[0020] Definitions of other specific words and phrases are provided throughout this disclosure. Those skilled in the art will understand that, in many, if not most, cases, such definitions apply to the prior and future use of the words and phrases thus defined.
[0021] This disclosure provides a remote monitoring system for a dry etching apparatus, comprising: a dry etching apparatus, the dry etching apparatus including an EPD module, a signal conversion module, and a controller; the EPD module being used to acquire and store a first EPD signal during the etching process, the first EPD signal including an endpoint curve (i.e., an EPD curve) and its corresponding amplitude voltage signal; the signal conversion module being used to convert the first EPD signal into a second EPD signal; the EPD module and the signal conversion module being connected; the controller being used to monitor the operating status of the dry etching apparatus, the controller being connected to the signal conversion module and being used to receive the second EPD signal in real time; and a terminal, the terminal integrating an FDC module, the terminal being connected to the dry etching apparatus and being used to acquire the second EPD signal in real time.
[0022] This embodiment of the disclosure achieves real-time remote monitoring of the EPD signal of the dry etching equipment by transmitting the EPD signal from the EPD module to other fixed devices in the dry etching equipment that can be monitored in real time by a terminal. This solves the problem that the original equipment's EPD module could not connect to the FDC module.
[0023] Figure 1 A simplified block diagram of a remote monitoring system for dry etching equipment is shown.
[0024] like Figure 1As shown in the embodiments of this disclosure, the remote monitoring system 100 for dry etching equipment includes: a dry etching equipment 10 and a terminal 20. The dry etching equipment 10 includes: an EPD module 11, a signal conversion module 12, and a controller 13.
[0025] EPD module 11 is used to acquire and store the first EPD signal during the etching process. EPD module 11 has the same structure and function as the endpoint detection (EPD) module in existing dry etching equipment; for example, EPD module 11 is the EPD module in existing dry etching equipment. The first EPD signal includes the endpoint curve and its corresponding amplitude voltage signal.
[0026] The signal conversion module 12 is connected to the EPD module 11. The signal conversion module 12 is used to convert the first EPD signal into a second EPD signal, thereby matching the voltage with the controller 13. Since the output signal of the EPD module 11 does not match the input signal in the controller 13, the signal conversion module 12 needs to convert the output signal of the EPD module 11 before it can be received by the controller 13.
[0027] In some examples, the signal conversion module 12 is a DC conversion module, the first EPD signal output from the output terminal of the EPD module 11 is a DC voltage signal, and the second EPD signal converted by the signal conversion module 12 is a DC voltage signal.
[0028] In some examples, the voltage value of the first EPD signal is higher than that of the second EPD signal. For example, the first EPD signal is a 15V DC voltage signal and the second EPD signal is a 5V DC voltage signal. The DC conversion module converts the 15V DC voltage signal output by the EPD module 11 into a 5V DC voltage signal.
[0029] In some examples, the signal conversion module 12 and the EPD module 11 are connected by a signal line. For example, the output of the EPD module 11 is connected to the input of the signal conversion module 12 by a signal line.
[0030] Controller 13 is used to monitor the operating status of the dry etching equipment. In this disclosure, controller 13 is a controller in the dry etching equipment 10, such as one of the controllers in the dry etching equipment 10 that needs to be monitored and controlled during the processing of the gas supply system, control system, and exhaust gas treatment system. This controller is idle in existing dry etching equipment 10 prior to this application. Controller 13 is connected to signal conversion module 12, and controller 13 is used to receive the second EPD signal (i.e., the EPD signal converted by signal conversion module 12). Connecting signal conversion module 12 to controller 13, since controller 13 is in an unused state in the dry etching equipment, will not affect the data acquisition of the etching process.
[0031] In some examples, the controller 13 is built into the gas box module. Specifically, the controller 13 is a mass flow controller (MFC), and the signal conversion module 12 is connected to an idle mass flow controller in the gas box module. For example, the gas box module is an existing gas box module in a dry etching equipment. The gas box module has multiple mass flow controllers. In actual applications, several mass flow controllers are selected according to process requirements, and the extra mass flow controllers are idle. The signal conversion module 12 then selects an idle mass flow controller to connect to. It can be understood that the controller 13 can also be an idle controller in the control system or exhaust gas treatment system of the dry etching equipment 10, that is, as long as the signal conversion module 12 is connected to an idle controller in the dry etching equipment 10, this disclosure embodiment does not limit this.
[0032] In some examples, the signal conversion module 12 is connected to the controller 13 via a signal line. For example, the output of the signal conversion module 12 is connected to the input of the controller 13 via a signal line.
[0033] Terminal 20 integrates an FDC module (Fault Detection and Classification), and is connected to dry etching equipment 10. Terminal 20 is used to acquire the second EPD signal in real time.
[0034] In some examples, terminal 20 is a computer in a fault detection and classification system, which is used to acquire and display the second EPD signal.
[0035] In some examples, terminal 20 includes a central controller and a computer, which are connected. The central controller integrates an FDC module (Fault Detection and Classification). Specifically, the central controller is an equipment control system, a production workshop monitoring center, etc. In the prior art, the equipment control system or the production workshop monitoring center integrates an FDC system. The FDC system on the equipment control system or the production workshop monitoring center mainly monitors and analyzes the operating status and process parameters of the production equipment. For example, the production workshop monitoring center collects data from all sensors or controllers in the dry etching equipment in real time. The FDC system acquires this data in real time. Since each mass flow controller has a corresponding SVID (Status Variable Identifier), the received EPD signal can be determined based on the SVID corresponding to the mass flow controller connected to the signal conversion module 12 (the data corresponding to the SVID of the mass flow controller connected to the signal conversion module 12 is the EPD signal), thereby indirectly acquiring the EPD curve (i.e., the endpoint curve or EPD curve) of each wafer.
[0036] In some examples, terminal 20 is connected to dry etching equipment 10 via an EAP signal line. For example, the output of the communication module of dry etching equipment 10 is connected to the input of the communication module of terminal 20 via an EAP signal line.
[0037] In some examples, the computer and the main controller can be connected via wired connections (such as Ethernet or USB), wireless connections (such as WiFi or Bluetooth), serial connections (such as RS-232 or RS-485), or industrial bus connections (such as CAN bus).
[0038] According to the remote monitoring system for dry etching equipment according to the embodiments of this disclosure, the EPD signal in the EPD module of the dry etching equipment is transmitted to the controller through a signal conversion module. The terminal obtains the data in the controller in real time and thus obtains the EPD signal in real time. Therefore, it is possible to realize real-time remote monitoring of the EPD signal of the dry etching equipment and to quickly review and analyze past data.
[0039] The text and accompanying drawings in this disclosure are provided by way of example only to aid in understanding this disclosure. They should not be construed as limiting the scope of this disclosure in any way. Although certain embodiments and examples have been provided, it will be apparent to those skilled in the art, based on the content disclosed herein, that changes can be made to the illustrated embodiments and examples without departing from the scope of this disclosure.
[0040] Although this disclosure has been described with reference to exemplary embodiments, various changes and modifications may be suggested to those skilled in the art. This disclosure is intended to cover such changes and modifications that fall within the scope of the appended claims.
[0041] Nothing described in this disclosure should be construed as implying that any particular element, step, or function is an essential element that must be included within the scope of the claims. The scope of the patent subject matter is defined only by the claims.
Claims
1. A remote monitoring system for a dry etching apparatus, characterized in that, include: A dry etching apparatus, comprising an EPD module, a signal conversion module, and a controller. The EPD module is used to acquire and store the first EPD signal during the etching process. The first EPD signal includes the endpoint curve and its corresponding amplitude voltage signal. The signal conversion module is used to convert the first EPD signal into a second EPD signal, and the EPD module is connected to the signal conversion module. A controller is used to monitor the operating status of the dry etching equipment. The controller is connected to the signal conversion module and is used to receive the second EPD signal in real time. as well as The terminal integrates an FDC module and is connected to the dry etching equipment for real-time acquisition of the second EPD signal.
2. The remote monitoring system for dry etching equipment according to claim 1, characterized in that, The controller is built into the gas holder module.
3. The remote monitoring system for dry etching equipment according to claim 1, characterized in that, The controller is a mass flow controller.
4. The remote monitoring system for dry etching equipment according to claim 1, characterized in that, The signal conversion module is a DC conversion module, and both the first EPD signal and the second EPD signal are DC voltage signals.
5. The remote monitoring system for dry etching equipment according to claim 1, characterized in that, The first EPD signal is a 15V DC voltage signal, and the second EPD signal is a 5V DC voltage signal.
6. The remote monitoring system for dry etching equipment according to claim 1, characterized in that, The EPD module and the signal conversion module are connected via a signal line.
7. The remote monitoring system for dry etching equipment according to claim 1, characterized in that, The terminal is a computer in the fault detection and classification system, and the computer is used to acquire and display the second EPD signal.
8. The remote monitoring system for dry etching equipment according to claim 1, characterized in that, The terminal is connected to the dry etching equipment via an EAP signal line.
9. The remote monitoring system for dry etching equipment according to claim 1, characterized in that, The controller and the signal conversion module are connected via a signal line.