Filtering and purifying equipment for recovering copper from waste etching liquid

By designing a combination of purification tank, agitation device and ion exchange resin dosing module, the problem of resource waste and environmental pollution in the treatment of waste etching solution in circuit board manufacturing is solved, and efficient copper recovery and purification are achieved.

CN223951114UActive Publication Date: 2026-02-27SUZHOU WUZHONG SOLID WASTE TREATMENT CO LTD +1
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Patent Information

Application Number
CN202520443699.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-03-14
Publication Date
2026-02-27
Estimated Expiration
2035-03-14

AI Technical Summary

Technical Problem

Existing technologies are insufficient to effectively handle the large amounts of high-copper etching waste liquid generated during circuit board manufacturing, leading to resource waste and environmental pollution.

Method used

Design a filtration and purification device that includes a purification tank, a waste etching solution agitation device, an ion exchange resin dosing module, and a precipitation filter plate. The purification efficiency is improved by agitating the waste etching solution and adding dense ion exchange resin.

Benefits of technology

It enables efficient recovery and purification of copper from waste etching solutions, reducing resource waste and environmental pollution, and improving processing efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

The filtering and purifying equipment for recovering the copper from the waste etching liquid comprises a purifying pond, a waste etching liquid stirring device is arranged in the middle of the purifying pond, and the waste etching liquid stirring device is used as an executing part for preventing the activity of internal elements in the waste etching liquid from being reduced after the waste etching liquid is stood and preventing the purifying capacity from being reduced; an ion exchange resin feeding module is arranged corresponding to the waste etching liquid stirring device, the ion exchange resin feeding module comprises a plurality of ion exchange resin feeding columns which are uniformly arranged, and ion exchange resin outlets are uniformly formed in the ion exchange resin feeding columns; a precipitation filter plate is arranged at the bottom of the purification tank and is obliquely arranged, and precipitation filter holes are uniformly formed in the precipitation filter plate.
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Description

TECHNICAL FIELD

[0001] The utility model relates to environmental protection technology and its using equipment, specifically, it is a kind of filtering and purification equipment for recycling copper from waste etching liquid. BACKGROUND

[0002] Etching is an important process of printed circuit board manufacturing, and a large amount of high-copper etching waste liquid is generated in the production process of circuit board factory. Etching waste liquid is a dangerous liquid waste, containing a large amount of copper, chlorine and other pollution components. If it is directly discharged into the environment without strict treatment, it will not only cause waste and loss of resources, but also cause great harm to human beings and the natural environment.

[0003] The copper ions in etching waste liquid have high recycling value. In the current situation of increasing resource shortage and increasingly severe environment, how to strictly and properly handle such a large amount of waste liquid is a very important problem.

[0004] Therefore, it is necessary to provide a kind of filtering and purification equipment for recycling copper from waste etching liquid to solve the above problems. INVENTION CONTENTS

[0005] The utility model aims at providing a kind of filtering and purification equipment for recycling copper from waste etching liquid.

[0006] Technical scheme as follows:

[0007] A kind of filtering and purification equipment for recycling copper from waste etching liquid, including purification pool, waste etching liquid stirring device is arranged in the middle of purification pool, waste etching liquid stirring device is used to avoid the internal element activity reduction of waste etching liquid standing to avoid the execution piece of reducing purification capacity;Corresponding waste etching liquid stirring device is provided with ion exchange resin feeding module, and ion exchange resin feeding module includes several uniformly arranged ion exchange resin feeding columns, and ion exchange resin outlet is uniformly provided on ion exchange resin feeding column;The bottom of purification pool is provided with sedimentation filter plate, and the sedimentation filter plate is arranged obliquely, and the sedimentation filter hole is uniformly provided on it.

[0008] Further, the waste etching liquid stirring device includes a rotating actuator, and the rotating actuator is connected to a rotating body.

[0009] Further, the rotating actuator is formed by a motor reducer combination, and the rotating body is a fan blade or a propeller.

[0010] Further, the ion exchange resin feeding column is arranged at a density of not less than 10 per square meter.

[0011] Further, the ion exchange resin outlet is directly not more than 4 cm, and the setting density is not more than 20 per square meter.

[0012] Further, the ion exchange resin feeding module is connected with the lifting driving member through the connecting frame.

[0013] Further, a descending limit plate is arranged in the purification tank corresponding to the ion exchange resin feeding module.

[0014] Further, the slope of the sedimentation filter plate is 15-35°, and the diameter of the sedimentation filter hole is not greater than 3 mm.

[0015] Compared with the prior art, the waste etching liquid stirring is performed by avoiding the purification capacity reduction execution member, and the feeding of the dense ion exchange resin is simultaneously performed, so that the efficient waste etching liquid recovery copper filtering and purification structure is formed. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 is a structural schematic diagram of the utility model. DETAILED DESCRIPTION

[0017] Embodiment:

[0018] Please refer to Figure 1 The embodiment shows a waste etching liquid recovery copper filtering and purification equipment, which comprises a purification tank 1, a waste etching liquid stirring device 2 arranged in the middle of the purification tank 1, the waste etching liquid stirring device 2 is used as an avoiding purification capacity reduction execution member for avoiding the activity reduction of internal elements of the waste etching liquid standing; an ion exchange resin feeding module 3 is arranged corresponding to the waste etching liquid stirring device 2, the ion exchange resin feeding module 3 comprises a plurality of uniformly arranged ion exchange resin feeding columns 31, and ion exchange resin outlets are uniformly arranged on the ion exchange resin feeding columns 31; a sedimentation filter plate 4 is arranged at the bottom of the purification tank 1, and the sedimentation filter plate 4 is arranged obliquely and uniformly provided with sedimentation filter holes.

[0019] The waste etching liquid stirring device 2 comprises a rotating execution member 21, and the rotating execution member 21 is connected with a rotating body 22.

[0020] The rotating execution member 21 is formed by a motor reducer combination, and the rotating body 22 is a fan blade or a propeller.

[0021] The ion exchange resin feeding column 31 is arranged at a density of not less than 10 per square meter.

[0022] The ion exchange resin outlet is directly not greater than 4 cm, and is arranged at a density of not greater than 20 per square meter.

[0023] The ion exchange resin feeding module 3 is connected with a lifting driving member 6 through a connecting frame 5.

[0024] A descending limit plate 7 is arranged in the purification tank 1 corresponding to the ion exchange resin feeding module 3.

[0025] The sedimentation filter plate 4 has an inclination of 15-35 degrees and a sedimentation filter hole diameter of not more than 3mm.

[0026] Compared with the prior art, the filter and purification structure for efficient recovery of copper from waste etching liquid is formed by avoiding the execution of the purification capacity reducing element, stirring the waste etching liquid, and cooperating with the feeding of the dense ion exchange resin.

[0027] For ordinary skilled in the art, without departing from the premise of the utility model creates the creative concept, can also make a number of deformation and improvement, these all belong to the protection scope of the utility model.

Claims

1. A filtration and purification device for recovering copper from waste etching solution, characterized in that: The system includes a purification tank, in the middle of which is a waste etching solution agitation device. This device is used to prevent the waste etching solution from becoming static and reducing the activity of internal elements, thus preventing a decrease in purification capacity. Corresponding to the waste etching solution agitation device is an ion exchange resin dosing module, which includes several evenly arranged ion exchange resin dosing columns, each with an evenly distributed ion exchange resin outlet. At the bottom of the purification tank is a sedimentation filter plate, which is angled and has evenly distributed sedimentation filter holes.

2. The filtration and purification equipment for recovering copper from waste etching solution according to claim 1, characterized in that: The waste etching solution agitation device includes a rotating actuator, which is connected to a rotating body.

3. The filtration and purification equipment for recovering copper from waste etching solution according to claim 2, characterized in that: The rotating actuator is formed by a combination of a motor and a reducer, and the rotating body is a fan blade or a propeller.

4. The filtration and purification equipment for recovering copper from waste etching solution according to claim 3, characterized in that: The density of ion exchange resin dosing columns should be no less than 10 columns per square meter.

5. The filtration and purification equipment for recovering copper from waste etching solution according to claim 4, characterized in that: The outlet of the ion exchange resin should be no more than 4cm wide, and the density should not exceed 20 units per square meter.

6. The filtration and purification equipment for recovering copper from waste etching solution according to claim 5, characterized in that: The ion exchange resin dispensing module is connected to the lifting drive unit via a connecting frame.

7. The filtration and purification equipment for recovering copper from waste etching solution according to claim 6, characterized in that: The purification tank is equipped with a descent limit plate for the corresponding ion exchange resin dosing module.

8. The filtration and purification equipment for recovering copper from waste etching solution according to claim 7, characterized in that: The slope of the sedimentation filter plate is 15-35°, and the diameter of the sedimentation filter holes is no more than 3mm.