Gas inlet pipe of reaction equipment and reaction equipment

Abstract

The utility model relates to the technical field of reaction equipment, and discloses a reaction equipment air inlet pipe and reaction equipment, the reaction equipment air inlet pipe comprises a spiral pipe body, the pipe body is suitable for being arranged in a furnace pipe of the reaction equipment along the axial direction, a flow channel is arranged in the pipe body, the pipe body comprises a first end and a second end which are oppositely arranged, the first end is suitable for facing a tube opening of the furnace tube, the second end penetrates through the furnace tube and is provided with a gas inlet communicated with the flow channel outside the furnace tube, the gas inlet is suitable for introducing reaction gas, a plurality of gas outlets are formed in the side wall of the tube body at intervals in the extending direction of the flow channel, and each gas outlet is communicated with the flow channel. The spiral tube body is arranged in the furnace tube of the reaction equipment, and the gas outlet holes are formed in the side wall of the tube body at intervals, so that reaction gas can be uniformly input into the furnace tube, uniform distribution of the reaction gas in the furnace tube is ensured, the uniformity of products is ensured, and the quality of the products is improved.

Description

Technical Field

[0001] This utility model relates to the field of reaction equipment technology, specifically to the air inlet pipe of the reaction equipment and the reaction equipment itself. Background Technology

[0002] In high-temperature reaction equipment, an inlet is typically located at one end of the furnace tube, and an outlet at the opposite end. The reaction zone is positioned in the middle of the furnace tube. Reaction gases are introduced into the furnace tube through the inlet, react with the acceptor in the reaction zone, and finally exit from the outlet.

[0003] The drawback of this structure is that the reactant gas is gradually consumed along the flow direction in the reaction zone, causing the concentration of the reactant gas to gradually decrease. The reactant gas concentration is higher on the side of the reaction zone closer to the gas inlet, resulting in a more sufficient reaction, while the reactant gas concentration is lower on the side farther from the gas inlet, making the reaction more prone to incomplete. In other words, the reactant gas distribution within the furnace tube is uneven, leading to significant differences between the products prepared in the reaction zone, poor uniformity, and poor quality. Utility Model Content

[0004] In view of this, the present invention provides a gas inlet pipe and a reaction device to solve the problem of uneven distribution of reaction gas in the furnace tube of existing reaction devices, which leads to poor product uniformity and poor quality.

[0005] In a first aspect, the present invention provides a gas inlet pipe for a reaction device, comprising: a spiral-shaped pipe body adapted to be axially disposed within a furnace tube of the reaction device; a flow channel provided inside the pipe body; the pipe body including a first end and a second end disposed opposite to each other; the first end adapted to face the opening of the furnace tube; the second end passing through the furnace tube and having a gas inlet communicating with the flow channel outside the furnace tube; the gas inlet being adapted to introduce reaction gas; and a plurality of gas outlet holes spaced apart along the extension direction of the flow channel on the sidewall of the pipe body, each of the gas outlet holes communicating with the flow channel.

[0006] Beneficial effects: This utility model sets up a spiral tube inside the furnace tube of the reaction equipment. The reaction gas is introduced into the flow channel of the tube through the air inlet on the outside of the tube. The side wall of the tube is provided with multiple air outlets that are connected to the flow channel at intervals along the extension direction of the flow channel. The reaction gas can be evenly introduced into various areas inside the furnace tube through multiple air outlets, ensuring uniform distribution of the reaction gas inside the furnace tube, reducing the difference between products caused by the difference in the concentration of the reaction gas, thereby ensuring the uniformity between products and improving product quality.

[0007] In one alternative embodiment, at least a portion of the vent holes, projected radially into the reaction zone formed by a plurality of wafers within the furnace tube, fall within the furnace tube.

[0008] Beneficial effects: By projecting part of the gas outlet holes radially into the reaction zone, the reaction gas can be directly and evenly sprayed into the reaction zone, achieving full reaction, increasing the reaction rate, and further improving the uniformity of the reaction gas.

[0009] In one alternative embodiment, each of the air outlets is oriented toward the axis of the furnace tube.

[0010] Beneficial effects: Orienting each gas outlet toward the axis of the furnace tube helps to distribute the reactant gases evenly along the axis of the furnace tube. Since the multiple wafers inside the furnace tube are generally distributed near the axis of the furnace tube, it can ensure that the reactant gases are in full contact with each wafer, improve heat exchange efficiency, and make the reaction temperature inside the furnace tube more uniform.

[0011] In one optional embodiment, the vent is a circular hole, and the diameter Φ of the vent satisfies 3mm≤Φ≤6mm.

[0012] Beneficial effects: The round orifice design of the vent facilitates the uniform discharge of reactant gases. By limiting the orifice diameter, the flow rate of the reactant gases can be precisely controlled, preventing them from flowing too fast or too slow, and further ensuring the uniform distribution of reactant gases within the furnace tube.

[0013] In one alternative embodiment, at least some of the vent holes are distributed circumferentially along the furnace tubes of the reaction apparatus.

[0014] Beneficial effect: Distributing some of the gas outlets at intervals along the circumference of the furnace tube can prevent the reactant gas from being overly concentrated or dispersed in a certain direction, thereby further improving the uniformity of the reactant gas in the furnace tube.

[0015] In one optional embodiment, the pitch L of the tube body satisfies 900mm≤L≤1100mm.

[0016] Beneficial effects: By limiting the pitch of the tube, the flow resistance of the reactant gas in the flow channel can be reduced, making the reactant gas flow more smoothly and improving the flow stability of the reactant gas.

[0017] In one alternative embodiment, a portion of the outer wall of the tube is adapted to connect with the inner wall of the furnace tube.

[0018] Beneficial effects: Connecting the tube to the furnace tube helps to securely house the tube inside the furnace tube and avoids vibration of the tube when transporting reaction gases.

[0019] Secondly, this utility model also provides a reaction apparatus, comprising:

[0020] The furnace tube has an opening at one end and is closed at the other end, with a sealing door at the opening.

[0021] A support platform is provided axially inside the furnace tube;

[0022] Multiple wafers are spaced apart on the support platform and form a reaction zone;

[0023] A gas input mechanism, located outside the furnace tube, is used to input reaction gases;

[0024] The gas inlet pipe of the aforementioned reaction equipment is axially disposed inside the furnace tube and surrounds the outside of the reaction zone, and the gas inlet is connected to the gas input mechanism.

[0025] Beneficial effects: Since the reaction equipment includes the reaction equipment inlet pipe, it has the same effect as the reaction equipment inlet pipe, so it will not be described in detail here.

[0026] In one optional embodiment, the system further includes an integrally formed carrier slurry and a temperature measuring thermocouple, wherein the carrier slurry is axially movably disposed on the furnace tube, one end of the carrier slurry passes through the tube opening and the other end is disposed inside the furnace tube, and the support platform is disposed on the carrier slurry.

[0027] Beneficial effects: Because the furnace tube has a spiral-shaped tube body, and the outer wall of the tube body is connected to the inner wall of the furnace tube, it is difficult to directly install the temperature measuring thermocouple inside the furnace tube. Integrating the temperature measuring thermocouple with the carrier slurry into a single unit facilitates installation and allows it to be placed closer to the reaction zone, resulting in more accurate test results.

[0028] In one alternative embodiment, the furnace tube is provided with an exhaust port, and the sealing door has a gap at the tube opening to form the exhaust port.

[0029] Beneficial effects: By utilizing the gap between the sealed door and the pipe opening to form an exhaust port, the structure of the furnace tube can be simplified and the operating cost reduced. Attached Figure Description

[0030] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0031] Figure 1 This is a schematic diagram of the structure of a reaction device according to an embodiment of the present invention;

[0032] Figure 2 This is a schematic diagram of a reaction apparatus according to an embodiment of the present invention;

[0033] Figure 3This is another schematic diagram of a reaction apparatus according to an embodiment of the present utility model;

[0034] Figure 4 This is a side view of a reaction apparatus according to an embodiment of the present utility model;

[0035] Figure 5 This is a schematic diagram of the structure between the gas inlet pipe and the furnace tube of a reaction device according to an embodiment of the present invention;

[0036] Figure 6 This is a schematic diagram of the relationship between the gas inlet pipe and the furnace tube of a reaction device according to an embodiment of the present invention;

[0037] Figure 7 This is a side view of the gas inlet pipe and furnace tube of a reaction device according to an embodiment of the present invention.

[0038] Explanation of reference numerals in the attached figures:

[0039] 1. Tube body; 101. Flow channel; 102. Air inlet; 103. Air outlet; 2. Furnace tube; 201. Tube opening; 202. Sealing door; 3. Support platform; 4. Wafer; 5. Carrier paste; 6. Thermocouple. Detailed Implementation

[0040] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0041] The following is combined Figures 1 to 7 The following describes embodiments of the present invention.

[0042] According to an embodiment of the present invention, in one aspect, a gas inlet pipe for a reaction device is provided, comprising: a spiral-shaped pipe body 1, which is adapted to be disposed axially within a furnace tube 2 of the reaction device, a flow channel 101 is provided inside the pipe body 1, and the pipe body 1 includes a first end and a second end disposed opposite to each other, the first end being adapted to face the pipe opening 201 of the furnace tube 2, and the second end passing through the furnace tube 2 and having a gas inlet 102 communicating with the flow channel 101 outside the furnace tube 2, the gas inlet 102 being adapted to introduce reaction gas, and a plurality of gas outlet holes 103 being provided at intervals along the extension direction of the flow channel 101 on the side wall of the pipe body 1, each gas outlet hole 103 being respectively connected to the flow channel 101.

[0043] In this embodiment of the invention, a spiral tube 1 is installed inside the furnace tube 2 of the reaction equipment. Reaction gas is input into the flow channel 101 of the tube 1 through the air inlet 102 on the outside of the tube 1. A plurality of air outlets 103 connected to the flow channel 101 are provided at intervals on the side wall of the tube 1 along the extension direction of the flow channel 101. The reaction gas can be evenly input into various areas inside the furnace tube 2 through the multiple air outlets 103, ensuring uniform distribution of reaction gas inside the furnace tube 2, reducing the difference between products caused by the difference in reaction gas concentration, thereby ensuring the uniformity between products and improving product quality.

[0044] Specifically, the gas inlet pipe of the reaction equipment is used to uniformly deliver reaction gas into the furnace tube 2 of the reaction equipment. The reaction gas selection needs to be based on the specific reaction. The axial direction of the furnace tube 2 is as follows: Figure 3 As shown by arrow A in the diagram. Figure 1 As shown, tube 1 extends axially along furnace tube 2. Flow channel 101 extends from the second end to the first end, and the first end is closed.

[0045] In one embodiment, such as Figure 2 and Figure 3 As shown, at least a portion of the vent holes 103, projected radially into the reaction zone formed by multiple wafers 4 within the furnace tube 2. The radial direction of the furnace tube 2 is as follows: Figure 3 As shown by arrow B in the diagram, the radial projection of part of the gas outlet 103 onto the reaction zone of the furnace tube 2 allows the reaction gas to be directly and evenly sprayed into the reaction zone, achieving a full reaction, increasing the reaction rate, and further improving the uniformity of the reaction gas.

[0046] Furthermore, in one embodiment, each vent 103 is oriented towards the axis of the furnace tube 2. Orienting the vents 103 towards the axis of the furnace tube 2 helps to uniformly distribute the reactant gases along the axial direction of the furnace tube 2. Since the multiple wafers 4 inside the furnace tube 2 are generally distributed near the axis of the furnace tube 2, it can be ensured that the reactant gases are in full contact with each wafer 4, thereby improving heat exchange efficiency and making the reaction temperature inside the furnace tube 2 uniformly distributed.

[0047] Furthermore, in one embodiment, the pore density of the vent 103 in the reaction zone is greater than that in the non-reaction zone, in order to fill the reaction gas consumed in the reaction zone and allow the product to react fully in the reaction zone.

[0048] It should be noted that the shape of the air outlet 103 is not limited in this embodiment of the utility model, and any shape can be selected as needed.

[0049] In one embodiment, the vent 103 is a circular hole, and the diameter Φ of the vent 103 satisfies 3mm ≤ Φ ≤ 6mm. For example, the diameter Φ of the vent 103 is 3mm, 4mm, 5mm, 6mm, etc. The circular shape of the vent 103 facilitates the uniform discharge of the reaction gas. By limiting the diameter of the vent 103, the flow rate of the reaction gas can be precisely controlled, avoiding excessively fast or slow flow, and further ensuring uniform distribution of the reaction gas within the furnace tube 2.

[0050] In other embodiments, the vent 103 can also be configured as a strip-shaped hole, an elliptical hole, etc., as needed.

[0051] In one embodiment, such as Figure 4 and Figure 7 As shown, at least some of the gas outlets 103 are distributed circumferentially along the furnace tube 2 of the reaction equipment. Distributing some of the gas outlets 103 circumferentially along the furnace tube 2 can prevent the reaction gas from being overly concentrated or dispersed in a certain direction, thereby further improving the uniformity of the reaction gas in the furnace tube 2.

[0052] In one embodiment, the pitch L of the tube body 1 satisfies 900mm ≤ L ≤ 1100mm. For example, the pitch L of the tube body 1 can be 900mm, 950mm, 1000mm, 1100mm, etc. By limiting the pitch of the tube body 1, the flow resistance of the reactant gas in the flow channel 101 can be reduced, making the reactant gas flow more smoothly through the flow channel 101 and improving the flow stability of the reactant gas. In addition, the number of turns of the tube body 1 can be one turn, two turns, three turns, etc.

[0053] In one embodiment, such as Figure 5 and Figure 6 As shown, part of the outer wall of the tube 1 is adapted to connect with the inner wall of the furnace tube 2. Connecting the tube 1 to the furnace tube 2 helps to securely house the tube 1 inside the furnace tube 2 and prevents the tube 1 from vibrating when transporting reaction gases.

[0054] It should be noted that the present invention does not limit the connection method between the tube body 1 and the furnace tube 2. It can be a snap-fit ​​fixing structure, such as a snap-fit ​​connection, which is convenient for quick installation and disassembly. It can also be a fastening fixing structure, such as a fastener, which can be a bolt, screw or the like, for a firm connection.

[0055] Compared to snap-fit ​​fixing structures, fastening fixing structures are more robust. In one possible implementation, part of the outer wall of the tube 1 is welded to the inner wall of the furnace tube 2.

[0056] According to an embodiment of the present invention, on the other hand, as... Figure 1 and Figure 2As shown, a reaction apparatus is also provided, mainly comprising: a furnace tube 2, a support platform 3, multiple wafers 4, a gas input mechanism, and a reaction apparatus inlet pipe. One end of the furnace tube 2 has an opening 201, which is closed at the other end, and a sealing door 202 is provided at the opening 201. The support platform 3 is axially positioned inside the furnace tube 2. Multiple wafers 4 are spaced apart on the support platform 3, forming a reaction zone. The gas input mechanism is located outside the furnace tube 2 and is used to input reaction gases. The body 1 of the reaction apparatus inlet pipe is axially positioned inside the furnace tube 2 and surrounds the outside of the reaction zone; the inlet 102 is connected to the gas input mechanism.

[0057] Since the reaction equipment includes an air inlet pipe, which has the same effect as the air inlet pipe, it will not be described in detail here.

[0058] Specifically, the gas input mechanism can be selected from any existing structure as needed, and this embodiment of the present invention does not impose too many restrictions on this.

[0059] In one embodiment, such as Figure 1 and Figure 2 As shown, the reaction equipment also includes an integrally formed carrier slurry 5 and a temperature measuring thermocouple 6. The carrier slurry 5 is movably mounted on the furnace tube 2 along the axial direction. One end of the carrier slurry 5 passes through the tube opening 201, and the other end is located inside the furnace tube 2. The support platform 3 is mounted on the carrier slurry 5.

[0060] Because the furnace tube 2 has a spiral tube 1 inside, and the outer wall of the tube 1 is connected to the inner wall of the furnace tube 2, it is difficult to directly install the temperature measuring thermocouple 6 inside the furnace tube 2. Integrating the temperature measuring thermocouple 6 with the carrier slurry 5 into a single unit facilitates installation of the temperature measuring thermocouple 6 and brings it closer to the reaction zone, resulting in more accurate detection results.

[0061] Specifically, the carrier paste 5 is movably mounted on the furnace tube 2 via a transverse mechanism, allowing it to move back and forth along the axial direction of the furnace tube 2 to place the support platform 3 along with the wafer 4 into or remove it from the furnace tube 2. The transverse mechanism can employ any existing structure, such as an electric push rod or a telescopic cylinder.

[0062] In one embodiment, the furnace tube 2 is provided with an exhaust port. The sealing door 202 leaves a gap at the tube opening 201 to form the exhaust port. Using the gap between the sealing door 202 and the tube opening 201 to form the exhaust port simplifies the structure of the furnace tube 2 and reduces the cost of use.

[0063] Furthermore, in one embodiment, the carrier slurry 5 can also be movably installed on the closed door 202, and the installation gap between the carrier slurry 5 and the closed door 202 can also serve as an exhaust port.

[0064] The working principle of this utility model embodiment is as follows:

[0065] Taking the phosphorus doping process of POCl3 (phosphorus oxychloride) as an example, the carrier paste 5 is a SiC (silicon carbide) paste.

[0066] The gas input mechanism inputs the reaction gas into the gas inlet 102. The reaction gas enters the flow channel 101 and flows along the flow channel 101. The reaction gas is input into each area of ​​the furnace tube 2 from multiple gas outlets 103.

[0067] Traditional reaction equipment uses a furnace tube 2 with one end for gas inlet and the other for gas outlet, resulting in a product uniformity of over 4.5%. The product manufactured using the reaction equipment of this embodiment reduces the uniformity to below 3%, thus significantly improving product uniformity and quality. The uniformity is calculated as (maximum product parameter value - minimum product parameter value) / (2 × average product parameter value); a smaller value indicates better uniformity. Product parameters can be conventional parameters such as resistance values.

[0068] To achieve the basic functions of the reaction apparatus, the reaction apparatus in this embodiment may also include other necessary modules or components, such as a control system and wiring. It should be noted that any suitable existing structure can be selected from the other necessary modules or components included in the reaction apparatus. To clearly and concisely illustrate the technical solution provided in this embodiment, the above-mentioned parts will not be repeated here, and the accompanying drawings have also been simplified accordingly. However, it should be understood that the scope of this utility model is not limited thereto.

[0069] Although embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of the present invention, and such modifications and variations all fall within the scope defined by the appended claims.

Claims

1. An inlet pipe for a reaction apparatus, characterized in that, include: A spiral tube (1) is provided, which is adapted to be installed axially inside the furnace tube (2) of the reaction equipment. The tube (1) has a flow channel (101) inside. The tube (1) includes a first end and a second end arranged opposite to each other. The first end is adapted to face the opening (201) of the furnace tube (2). The second end passes through the furnace tube (2) and has an air inlet (102) outside the furnace tube (2) that communicates with the flow channel (101). The air inlet (102) is adapted to introduce reaction gas. The sidewall of the tube (1) is provided with a plurality of air outlets (103) at intervals along the extension direction of the flow channel (101). Each air outlet (103) is connected to the flow channel (101).

2. The gas inlet pipe of the reaction equipment according to claim 1, characterized in that, At least a portion of the vent (103) is projected radially into the reaction zone formed by a plurality of wafers (4) within the furnace tube (2).

3. The gas inlet pipe of the reaction equipment according to claim 2, characterized in that, Each of the air outlets (103) is oriented toward the axis of the furnace tube (2).

4. The gas inlet pipe of the reaction equipment according to claim 3, characterized in that, The air outlet (103) is a round hole, and the diameter Φ of the air outlet (103) satisfies 3mm≤Φ≤6mm.

5. The gas inlet pipe of the reaction equipment according to claim 3, characterized in that, At least some of the vent holes (103) are distributed circumferentially along the furnace tube (2) of the reaction equipment.

6. The gas inlet pipe of the reaction equipment according to any one of claims 1 to 5, characterized in that, The pitch L of the tube body (1) satisfies 900mm≤L≤1100mm.

7. The gas inlet pipe of the reaction equipment according to any one of claims 1 to 5, characterized in that, A portion of the outer wall of the tube (1) is adapted to connect with the inner wall of the furnace tube (2).

8. A reaction apparatus, characterized in that, include: The furnace tube (2) has a pipe opening (201) at one end and is closed at the other end. A sealing door (202) is provided at the pipe opening (201). A support platform (3) is provided axially inside the furnace tube (2); Multiple wafers (4) are spaced apart on the support stage (3) and form a reaction zone; A gas input mechanism is located outside the furnace tube (2) and is used to input reaction gases; The gas inlet pipe of the reaction equipment according to any one of claims 1 to 7, wherein the pipe body (1) is arranged axially inside the furnace tube (2) and surrounds the outside of the reaction zone, and the gas inlet (102) is connected to the gas input mechanism.

9. The reaction apparatus according to claim 8, characterized in that, It also includes an integrally formed carrier slurry (5) and a temperature measuring thermocouple (6). The carrier slurry (5) is movably disposed on the furnace tube (2) along the axial direction. One end of the carrier slurry (5) passes through the tube opening (201), and the other end is disposed inside the furnace tube (2). The support platform (3) is disposed on the carrier slurry (5).

10. The reaction apparatus according to claim 8, characterized in that, The furnace tube (2) is provided with an exhaust port, and the sealing door (202) leaves a gap at the tube opening (201) to form the exhaust port.

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