Graphitization furnace and heat treatment system

Abstract

The utility model relates to a graphitization furnace and a heat treatment system, and the graphitization furnace comprises a furnace body which is provided with a reaction cavity, and the furnace body is provided with a feed inlet communicated with the reaction cavity along a first direction; the first electrode and the second electrode are opposite in polarity, penetrate through the furnace body in the second direction intersecting with the first direction and are arranged in the first direction in a spaced mode, and the parts, located in the reaction cavity, of the first electrode and the second electrode are each provided with a discharging channel communicated with the reaction cavity in a penetrating mode in the first direction. In the process that materials move in the reaction cavity, the materials can sequentially pass through the discharging channel of the first electrode and the discharging channel of the second electrode, meanwhile, the parts, located in the reaction cavity, of the first electrode and the second electrode form a parallel electric field in the first direction, and in the process that the materials sequentially pass through all the discharging channels, the parallel electric field is formed. And the parallel electric field can uniformly heat the material, so that the graphitization degree is more thorough, and the consistency of the product is improved.

Description

Technical Field

[0001] This application relates to the field of graphitization technology, and in particular to a graphitization furnace and heat treatment system. Background Technology

[0002] The carbon atoms in carbonaceous materials are arranged irregularly. Only through high-temperature heat treatment, causing the carbon atoms to recrystallize and rearrange in an ordered manner, can the crystalline structure of graphite be presented. This results in graphite possessing many of its excellent properties, such as significantly improved electrical and thermal conductivity, better chemical and thermal stability, reduced impurities, lower hardness, and easier machining. The function of a graphitization furnace is to transform carbonaceous materials into artificial graphite materials, enabling their better application in industrial manufacturing.

[0003] However, in the current graphitization furnace, the current density distribution of the internal electric field is relatively dispersed during use, which makes it difficult to heat the material in a concentrated manner. Furthermore, the electric field distribution area is not concentrated, resulting in incomplete graphitization of the material and poor product consistency. Utility Model Content

[0004] Therefore, it is necessary to provide a graphitization furnace and heat treatment system to address the problems that the current density distribution of the internal electric field in the current graphitization furnace is relatively dispersed, which makes it difficult to concentrate the heating of materials, and the non-concentrated electric field distribution area leads to incomplete graphitization of materials and poor product consistency.

[0005] In a first aspect, this application provides a graphitization furnace, including a furnace body and a first electrode and a second electrode with opposite polarities; the furnace body has a reaction chamber, and a feed port communicating with the reaction chamber is opened on the furnace body along a first direction; the first electrode and the second electrode respectively penetrate the furnace body along a second direction intersecting the first direction, and are spaced apart along the first direction, and the portions of the first electrode and the second electrode located in the reaction chamber are both provided with a feeding channel communicating with the reaction chamber through the first direction.

[0006] With the above structure, the material can pass through the feeding channels of the first electrode and the second electrode in sequence in the reaction chamber. The portions of the first electrode and the second electrode located in the reaction chamber form a parallel electric field along the first direction. As the material passes through each feeding channel in sequence, the parallel electric field can uniformly heat the material, making its graphitization more thorough and improving the consistency of the product.

[0007] According to one or more embodiments, the first electrode includes a first feeding area and a first extension area. The first extension area is disposed through the furnace body and is located on opposite sides of the first feeding area along a second direction. The first feeding area is located in the reaction chamber and is constructed as a hollow annular structure.

[0008] The above structure allows the material to pass smoothly through the first feeding zone and be heated in the parallel electric field between the first and second electrodes, thus enabling the material to be graphitized smoothly.

[0009] According to one or more embodiments, the second electrode includes a second feeding area and a second extension area. The second extension area is disposed through the furnace body and is located on opposite sides of the second feeding area along a second direction. The second feeding area is located in the reaction chamber and is constructed as a hollow annular structure.

[0010] With the above structure, the second feeding zone is set with the same hollow ring structure as the first feeding zone. This not only allows the material to pass through the second feeding zone smoothly, but also creates a more uniform parallel electric field between the first and second feeding zones, which heats the material evenly and improves product consistency.

[0011] According to one or more embodiments, in a plane perpendicular to the first direction, the projection of the first unloading area and the projection of the second unloading area at least partially overlap.

[0012] The above structure enables the formation of a parallel electric field between the first and second feeding zones, which heats the passing materials uniformly and improves product consistency.

[0013] According to one or more embodiments, in a plane perpendicular to the first direction, the ratio between the projected area of ​​the first feeding area and the projected area of ​​the second feeding area is in the range of 1:1 to 1:1.5.

[0014] Based on this, by setting the ratio between the projected area of ​​the first feeding zone and the projected area of ​​the second feeding zone within the above range, a uniform parallel electric field can be smoothly formed between the first feeding zone and the second feeding zone, thereby improving the uniformity of material heating and enhancing product consistency.

[0015] According to one or more embodiments, in a plane perpendicular to the first direction, the ratio between the projected area of ​​the first feeding area and the projected area of ​​the second feeding area ranges from 1:1.1 to 1:1.2. This further improves the uniformity of the parallel electric field between the first and second feeding areas, thereby enhancing product consistency.

[0016] According to one or more embodiments, in a plane perpendicular to the first direction, the ratio between the inner diameter and the outer diameter of the first feeding area is in the range of 1:1.3 to 1:4.5; and / or, in a plane perpendicular to the first direction, the ratio between the inner diameter and the outer diameter of the second feeding area is in the range of 1:1.3 to 1:4.5.

[0017] Based on this, the ratio between the inner diameter and outer diameter of the first feeding zone is set to the above range, and the ratio between the inner diameter and outer diameter of the second feeding zone is set to the above range, so that the current density passing through the first and second feeding zones can meet the production requirements, and the material can pass through each feeding channel more smoothly to achieve feeding.

[0018] According to one or more embodiments, in a plane perpendicular to the first direction, the ratio of the inner diameter to the outer diameter of the first feeding zone ranges from 1:1.4 to 1:3.2; and / or, in a plane perpendicular to the first direction, the ratio of the inner diameter to the outer diameter of the second feeding zone ranges from 1:1.4 to 1:3.2. This allows for a better balance between the current density in the first and second feeding zones and the material feeding speed, effectively improving production capacity.

[0019] According to one or more embodiments, in the first direction, the ratio between the distance between the first electrode and the second electrode and the height of the reaction chamber ranges from 1:1.05 to 1:6.8.

[0020] Based on this, by setting the ratio between the distance between the first electrode and the second electrode to the height of the reaction chamber within the range mentioned above, the residence time of the material between the first electrode and the second electrode can be better controlled, allowing the material to be heated more thoroughly and improving the degree of graphitization of the material.

[0021] According to one or more embodiments, in the first direction, the ratio between the distance between the first electrode and the second electrode and the height of the reaction chamber ranges from 1:1.1 to 1:3.5. This allows for better control of the time required for uniform heating of the material, improving product consistency.

[0022] According to one or more embodiments, in the first direction, the ratio between the height of the first electrode and the height of the second electrode ranges from 1:1.1 to 1:1.9.

[0023] Based on this, setting the ratio between the height of the first electrode and the height of the second electrode to the above range can make the structure of the first electrode and the second electrode more stable, and the current formed between the first electrode and the second electrode more stable, thereby improving the uniformity and stability of the electric field and better heating the material uniformly.

[0024] According to one or more embodiments, in the first direction, the ratio between the height of the first electrode and the height of the second electrode ranges from 1:1.2 to 1:1.45. This further improves the stability and density of the current formed between the first and second electrodes, enhancing product consistency.

[0025] According to one or more embodiments, in the first direction, the ratio between the height of the first electrode and the height of the reaction chamber ranges from 1:1.8 to 1:8.4.

[0026] This improves the overall stability of the graphitization furnace and ensures that the current density on the first and second electrodes meets production requirements.

[0027] According to one or more embodiments, in the first direction, the ratio between the height of the first electrode and the height of the reaction chamber ranges from 1:2.3 to 1:4.5. This further improves the overall structural stability of the graphitization furnace and increases the current density on the first and second electrodes.

[0028] According to one or more embodiments, the furnace body is further provided with a discharge port communicating with the reaction chamber, and the discharge port and the inlet are respectively located on opposite sides of the reaction chamber along the first direction; the graphitization furnace also includes a cooling component, which is communicated with the discharge port.

[0029] Therefore, the cooling component is connected to the discharge port so that the material can smoothly enter the cooling component after being discharged from the discharge port, and the cooling component is used to cool the graphitized material.

[0030] Secondly, this application also provides a heat treatment system, including the graphitization furnace described above.

[0031] In the graphitization furnace and heat treatment system described above, as the material moves within the reaction chamber, it can sequentially pass through the feeding channels of the first electrode and the second electrode. Simultaneously, the portions of the first and second electrodes located within the reaction chamber form a parallel electric field along the first direction. As the material sequentially passes through each feeding channel, the parallel electric field can uniformly heat the material, making its graphitization more thorough and improving product consistency. Attached Figure Description

[0032] Figure 1 This is a schematic diagram of the overall structure of a graphitization furnace according to one or more embodiments.

[0033] Figure 2 This is a cross-sectional view of a graphitization furnace according to one or more embodiments.

[0034] Figure 3 for Figure 2 Sectional view along the AA or BB direction.

[0035] Figure 4 This is a schematic diagram of the structure of the first electrode and the second electrode in a graphitization furnace according to one or more embodiments.

[0036] Explanation of reference numerals in the attached drawings: 100, graphitization furnace; 10, furnace body; 20, first electrode; 30, second electrode; 11, reaction chamber; 12, feed inlet; 13, discharge channel; 14, discharge outlet; 21, first discharge zone; 22, first extension zone; 31, second discharge zone; 32, second extension zone; a, first direction; b, second direction; 2, hopper; 3, feed pipe; 4, material shut-off valve; 5, DC transformer. Detailed Implementation

[0037] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.

[0038] In the description of this application, it should be understood that if terms such as "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" appear, these terms indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0039] Furthermore, where the terms "first" and "second" appear, these terms are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, where the term "multiple" appears, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0040] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0041] In this application, unless otherwise expressly specified and limited, the use of descriptions such as "above" or "below" the second feature indicates that the first and second features are in direct contact or indirect contact via an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. Similarly, "below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0042] It should be noted that if an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. If an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. If so, the terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used in this application are for illustrative purposes only and do not represent the only possible implementation.

[0043] Currently, judging from market trends, battery applications are becoming increasingly widespread. Batteries are not only used in energy storage systems such as hydropower, thermal power, wind power, and solar power plants, but also extensively used in electric vehicles such as electric bicycles, electric motorcycles, and electric cars, as well as in other fields. With the continuous expansion of battery applications, market demand is also constantly increasing.

[0044] Carbonaceous materials are a key component of battery structures. The carbon atoms in these materials are irregularly arranged; only through high-temperature heat treatment, causing recrystallization and a rearrangement of the carbon atoms, can they exhibit the crystalline structure of graphite, thus acquiring graphite's excellent electrical and thermal conductivity, as well as its chemical and thermal stability. Therefore, carbonaceous materials need to be converted into artificial graphite materials using a graphitization furnace, enabling their application in the production of battery anode materials.

[0045] In other words, a key step in the production process of carbon anode materials is graphitization. Graphitization refers to the transformation of carbon atoms from a random, irregular arrangement to a regularly arranged hexagonal planar network structure, i.e., graphite microcrystalline structure, at high temperatures. The purpose is to obtain graphite's high electrical and thermal conductivity, corrosion resistance, and abrasion resistance. During graphitization, the higher the temperature, the more complete the development of the graphite microcrystalline structure, thus increasing the degree of graphitization. The equipment used to complete graphitization is the graphitization furnace.

[0046] In current graphitization furnace structures, an umbrella-shaped or cone-shaped electric field is typically formed inside the furnace body to graphitize the material after it passes through this field. However, due to the low density and dispersed distribution of this electric field, not all the material can pass through the core heating zone, resulting in incomplete graphitization and poor product consistency.

[0047] Based on the above considerations, to address the problems of dispersed current density distribution in the internal electric field of current graphitization furnaces, which hinders concentrated heating of materials and results in incomplete graphitization and poor product consistency due to the unconcentrated electric field distribution, one or more embodiments of this application provide a graphitization furnace in which materials, during their movement within the reaction chamber, sequentially pass through the feeding channels of the first and second electrodes. Simultaneously, the portions of the first and second electrodes located within the reaction chamber form parallel electric fields along a first direction. As the materials sequentially pass through each feeding channel, the parallel electric fields uniformly heat the materials, resulting in more thorough graphitization and improved product consistency.

[0048] See Figure 1 The graphitization furnace 100 is vertically arranged and mainly includes a furnace body 10 and various functional units disposed on the furnace body 10. Specifically, the graphitization furnace 100 may include a feeding unit, a DC power supply unit, and a cooling and discharging unit.

[0049] The feeding unit mainly includes a hopper 2 and a feed pipe 3. The hopper 2 is located above the furnace body 10 and is connected to the feed inlet 12 on the furnace body 10 via the feed pipe 3. Optionally, a material shut-off valve 4 can be installed at the connection between the hopper 2 and the feed pipe 3 to control the flow of material in the material channel.

[0050] Furthermore, the material entering the graphitization furnace 100 is a graphitizable carbonaceous material, such as petroleum coke, coal coke, and asphalt. After entering the graphitization furnace 100, the material undergoes four stages: preheating, calcination, graphitization, and cooling to complete the graphitization process and obtain the negative electrode material product. Volatile exhaust gas is released during the process.

[0051] The DC power supply unit may include a first electrode 20, a second electrode 30, and a DC transformer 5. One of the first electrode 20 and the second electrode 30 may be a positive electrode, and the other a negative electrode. The DC transformer 5 supplies power to the furnace body 10. The positive and negative electrodes can apply voltage to the material passing between them. DC current flows from the positive terminal of the DC transformer 5 through the material, which releases Joule heat due to its own resistance, maintaining the furnace core temperature above 3000℃, thus creating a stable temperature field between the positive and negative electrodes. The current flowing through the material returns from the negative electrode to the negative terminal of the DC transformer 5, forming a current flow loop.

[0052] It should be noted that the positive and negative electrodes can be graphite electrodes.

[0053] The cooling discharge unit is mainly used to cool the graphitized material. Therefore, the cooling discharge unit is connected to the discharge port 14 of the furnace body 10 so that the graphitized material can smoothly enter the cooling discharge unit from the discharge port 14 so as to output the graphitized material.

[0054] like Figure 2 As shown, one embodiment of this application provides a graphitization furnace 100, including a furnace body 10 and a first electrode 20 and a second electrode 30 with opposite polarities. The furnace body 10 has a reaction chamber 11, and a feed inlet 12 communicating with the reaction chamber 11 is opened on the furnace body 10 along a first direction a. The first electrode 20 and the second electrode 30 respectively penetrate the furnace body 10 along a second direction b intersecting the first direction a, and are spaced apart along the first direction a. The portions of the first electrode 20 and the second electrode 30 located in the reaction chamber 11 are both provided with a feeding channel 13 communicating with the reaction chamber 11 along the first direction a.

[0055] It should be noted that the graphitization furnace 100 refers to a device capable of heating carbonaceous materials, causing the randomly arranged carbon atoms to rearrange in an orderly manner, presenting the crystalline structure of graphite. The furnace body 10 is the main part of the graphitization furnace 100. The interior of the furnace body 10 is hollow to form a reaction chamber 11, which can accommodate materials and provide reaction space for the materials.

[0056] The furnace body 10 is also provided with a feed inlet 12, which can be located above the furnace body 10 and communicate with the reaction chamber 11. In this way, when material is put in through the feed inlet 12, the material can fall into the reaction chamber 11 under the action of gravity.

[0057] When the feed inlet 12 is located above the furnace body 10, the first direction a is the vertical direction, and the feed inlet 12 is located in the vertical direction.

[0058] Furthermore, the second direction b is perpendicular to the first direction a, that is, the second direction b can be set to a horizontal direction.

[0059] The first electrode 20 and the second electrode 30 have opposite polarities. When the first electrode 20 is set as a positive electrode, the second electrode 30 is a negative electrode, and vice versa.

[0060] The first electrode 20 and the second electrode 30 penetrate the furnace body 10 horizontally, and are vertically spaced apart. That is, the first electrode 20 is located above the second electrode 30, or the second electrode 30 is located above the first electrode 20.

[0061] Furthermore, both the first electrode 20 and the second electrode 30 within the reaction chamber 11 are provided with a feeding channel 13, which extends vertically and communicates with the reaction chamber 11. When the first electrode 20 is positioned above the second electrode 30, after the material is fed into the reaction chamber 11 through the feed inlet 12, it falls slowly under its own gravity and passes sequentially through the feeding channel 13 on the first electrode 20, the reaction chamber 11 between the first electrode 20 and the second electrode 30, and the feeding channel 13 on the second electrode 30.

[0062] With the above structure, the material can pass through the feeding channel 13 of the first electrode 20 and the feeding channel 13 of the second electrode 30 in the reaction chamber 11 in sequence. The portions of the first electrode 20 and the second electrode 30 located in the reaction chamber 11 form a parallel electric field along the first direction a. As the material passes through each feeding channel 13 in sequence, the parallel electric field can heat the material uniformly, making its graphitization more thorough and improving the consistency of the product.

[0063] like Figure 2 Figure 3 As shown, in some embodiments, the first electrode 20 includes a first feeding area 21 and a first extension area 22. The first extension area 22 is disposed through the furnace body 10 and is located on opposite sides of the first feeding area 21 along the second direction b. The first feeding area 21 is located in the reaction chamber 11 and is constructed as a hollow annular structure.

[0064] Specifically, the second electrode 30 includes a first feeding area 21 and a first extension area 22 that are sequentially arranged and connected to each other along the second direction b, and the first extension area 22 is located on opposite sides of the first feeding area 21.

[0065] The first extension zone 22 extends horizontally through the furnace body 10, and the first feeding zone 21 is located inside the reaction chamber 11 and has a hollow annular structure. The hollow part of the first feeding zone 21 extends vertically and communicates with the reaction chamber 11 to form a feeding channel 13.

[0066] The first extension area 22 is connected horizontally to the opposite sides of the first feeding area 21. On the one hand, it can provide a supporting foundation for the first feeding area 21, so that the first feeding area 21 is stably set in the reaction chamber 11. On the other hand, the first extension area 22 can also be electrically connected to an external device, such as an electrical connection to a DC transformer 5, to form a current loop.

[0067] Thus, through the above structure, the material can pass smoothly through the first feeding zone 21 and be heated in the parallel electric field between the first electrode 20 and the second electrode 30, so that the material can be graphitized smoothly.

[0068] In some embodiments, the second electrode 30 includes a second feeding area 31 and a second extension area 32. The second extension area 32 is disposed through the furnace body 10 and is located on opposite sides of the second feeding area 31 along the second direction b. The second feeding area 31 is located in the reaction chamber 11 and is constructed as a hollow annular structure.

[0069] Specifically, the second extension zone 32 is horizontally connected to the opposite sides of the second feeding zone 31, and the second extension zone 32 is disposed through the furnace body 10. The second feeding zone 31 is located inside the reaction chamber 11 and has a hollow annular structure. The hollow part of the second feeding zone 31 is vertically penetrated and communicates with the reaction chamber 11 to form another feeding channel 13.

[0070] The second extension zone 32 can provide a supporting foundation for the second feeding zone 31, so that the second feeding zone 31 can be more stably set in the reaction chamber 11. On the other hand, the second extension zone 32 can also be electrically connected to an external device, such as a DC transformer 5, to form a current loop.

[0071] With the above structure, the second feeding zone 31 is set as a hollow ring structure with the same structure as the first feeding zone 21. This not only allows the material to pass through the second feeding zone 31 smoothly, but also allows a more uniform parallel electric field to be formed between the first feeding zone 21 and the second feeding zone 31, so as to heat the material evenly and improve product consistency.

[0072] In some embodiments, in a plane perpendicular to the first direction a, the projection of the first unloading area 21 at least partially overlaps with the projection of the second unloading area 31.

[0073] Specifically, the first direction 'a' is vertical, and the plane perpendicular to the first direction 'a' is the horizontal plane. Within the horizontal plane, the projection of the first feeding area 21 and the projection of the second feeding area 31 at least partially overlap, thereby enabling the formation of a parallel electric field between the first feeding area 21 and the second feeding area 31, which uniformly heats the passing material.

[0074] The above structure enables the formation of a parallel electric field between the first feeding zone 21 and the second feeding zone 31, which heats the passing materials uniformly and improves product consistency.

[0075] In some embodiments, in a plane perpendicular to the first direction a, the ratio between the projected area of ​​the first feeding area 21 and the projected area of ​​the second feeding area 31 is in the range of 1:1 to 1:1.5.

[0076] Specifically, within the horizontal plane, the projected area of ​​the first feeding area 21 is its cross-sectional area, and the projected area of ​​the second feeding area 31 is its cross-sectional area. The ratio between the cross-sectional areas of the first feeding area 21 and the second feeding area 31 will affect whether a parallel electric field can be successfully formed between them.

[0077] As a specific embodiment, the ratio between the projected area of ​​the first feeding area 21 and the projected area of ​​the second feeding area 31 can be, but is not limited to, set to 1:1, 1:1.1, 1:1.2, 1:1.3, 1:1.4, or 1:1.5. Wherein, different ratios between the projected areas of the first feeding area 21 and the second feeding area 31 result in different shapes of the parallel electric field formed between the first feeding area 21 and the second feeding area 31.

[0078] Based on this, by setting the ratio between the projected area of ​​the first feeding zone 21 and the projected area of ​​the second feeding zone 31 within the above range, a uniform parallel electric field can be smoothly formed between the first feeding zone 21 and the second feeding zone 31, thereby improving the uniformity of material heating and enhancing product consistency.

[0079] Furthermore, in a plane perpendicular to the first direction a, the ratio between the projected area of ​​the first feeding area 21 and the projected area of ​​the second feeding area 31 is in the range of 1:1.1 to 1:1.2.

[0080] As a specific embodiment, the ratio between the projected area of ​​the first feeding area 21 and the projected area of ​​the second feeding area 31 can be, but is not limited to, set to 1:1, 1:1.1, or 1:1.2.

[0081] This can further improve the uniformity of the parallel electric field between the first feeding zone 21 and the second feeding zone 31, and further enhance the consistency of the product.

[0082] In some embodiments, in a plane perpendicular to the first direction a, the ratio between the inner diameter D1 and the outer diameter D2 of the first feeding area 21 ranges from 1:1.3 to 1:4.5. And / or, in a plane perpendicular to the first direction a, the ratio between the inner diameter D1 and the outer diameter D2 of the second feeding area 31 ranges from 1:1.3 to 1:4.5.

[0083] As a specific embodiment, the ratio between the inner diameter D1 and the outer diameter D2 of the first feeding zone 21 can be, but is not limited to, set to 1:1.3, 1:1.5, 1:2, 1:2.5, 1:3, 1:3.5, 1:4, or 1:4.5; the ratio between the inner diameter D1 and the outer diameter D2 of the second feeding zone 31 can be, but is not limited to, set to 1:1.3, 1:1.5, 1:2, 1:2.5, 1:3, 1:3.5, 1:4, or 1:4.5. Different ratios between the inner diameter D1 and the outer diameter D2 of the first feeding zone 21 result in different current densities passing through the first feeding zone 21, and also different diameters of the loading / unloading channels 13 of the first feeding zone 21; similarly, different ratios between the inner diameter D1 and the outer diameter D2 of the second feeding zone 31 result in different current densities passing through the second feeding zone 31, and also different diameters of the loading / unloading channels 13 of the second feeding zone 31.

[0084] In other words, within the horizontal plane, the ratio between the inner diameter and the outer diameter of the first feeding area 21 will affect the current density passing through the first feeding area 21, as well as the diameter of the feeding channel 13 of the first feeding area 21, and thus affect the feeding speed.

[0085] Similarly, in the horizontal plane, the ratio between the inner diameter and the outer diameter of the second feeding zone 31 will affect the current density passing through the second feeding zone 31, as well as the diameter of the feeding channel 13 of the second feeding zone 31, and thus affect the feeding speed.

[0086] Based on this, the ratio between the inner diameter and outer diameter of the first feeding area 21 is set to the above range, and the ratio between the inner diameter and outer diameter of the second feeding area 31 is set to the above range, so that the current density passing through the first feeding area 21 and the second feeding area 31 can meet the production requirements, and the material can pass through each feeding channel 13 more smoothly to achieve feeding.

[0087] Furthermore, in a plane perpendicular to the first direction a, the ratio between the inner diameter and the outer diameter of the first feeding area 21 ranges from 1:1.4 to 1:3.2. And / or, in a plane perpendicular to the first direction a, the ratio between the inner diameter and the outer diameter of the second feeding area 31 ranges from 1:1.4 to 1:3.2.

[0088] As a specific embodiment, the ratio between the inner diameter and the outer diameter of the first feeding area 21 can be, but is not limited to, set to 1:1.4, 1:1.6, 1:1.8, 1:2, 1:2.2, 1:2.4, 1:2.6, 1:2.8, 1:3, or 1:3.2.

[0089] This allows for a better balance between the current density in the first feeding zone 21 and the material feeding speed in the second feeding zone 31, effectively increasing production capacity.

[0090] like Figure 2 and Figure 4 As shown, in some embodiments, in the first direction a, the ratio between the distance H1 between the first electrode 20 and the second electrode 30 and the height H2 of the reaction chamber 11 ranges from 1:1.05 to 1:6.8.

[0091] Specifically, in the vertical direction, the height of the reaction chamber 11 refers to the distance between the top and bottom walls of the reaction chamber 11. The ratio between the distance between the first electrode 20 and the second electrode 30 and the height of the reaction chamber 11 will affect the residence time of the material between the first electrode 20 and the second electrode 30, that is, affect the time for the material to be uniformly heated.

[0092] In a specific embodiment, the ratio between the distance between the first electrode 20 and the second electrode 30 and the height of the reaction chamber 11 can be, but is not limited to, set to 1:1.05, 1:1.6, 1:2.2, 1:2.8, 1:3.4, 1:4, 1:4.6, 1:5.2, 1:5.8, 1:6.4, or 1:6.8. Wherein, different ratios between the distance between the first electrode 20 and the second electrode 30 and the height of the reaction chamber 11 result in different residence times of the material between the first electrode 20 and the second electrode 30.

[0093] Based on this, by setting the ratio between the distance between the first electrode 20 and the second electrode 30 and the height of the reaction chamber 11 to the range mentioned above, the residence time of the material between the first electrode 20 and the second electrode 30 can be better controlled, so that the material is heated more thoroughly and the degree of graphitization of the material can be improved.

[0094] Furthermore, in the first direction a, the ratio between the distance between the first electrode 20 and the second electrode 30 and the height of the reaction chamber 11 ranges from 1:1.1 to 1:3.5.

[0095] As a specific embodiment, the ratio between the distance between the first electrode 20 and the second electrode 30 and the height of the reaction chamber 11 can be, but is not limited to, set to 1:1.1, 1:1.5, 1:2, 1:2.5, 1:3, or 1:3.5.

[0096] This allows for better control over the time required for uniform heating of materials, thus improving product consistency.

[0097] In some embodiments, in the first direction a, the ratio between the height H3 of the first electrode 20 and the height H4 of the second electrode 30 ranges from 1:1.1 to 1:1.9.

[0098] Specifically, in the vertical direction, the height of the first electrode 20 refers to its thickness, and the height of the second electrode 30 refers to its thickness. The ratio of the heights of the first electrode 20 and the second electrode 30 will affect the stability and density of the current formed between the first electrode 20 and the second electrode 30, thereby affecting the uniformity and stability of the electric field.

[0099] As a specific embodiment, the ratio between the heights of the first electrode 20 and the second electrode 30 can be, but is not limited to, set to 1:1.1, 1:1.3, 1:1.5, 1:1.7, or 1:1.9. Different ratios between the heights of the first electrode 20 and the second electrode 30 result in different stability and density of the current formed between them.

[0100] Based on this, setting the ratio between the height of the first electrode 20 and the height of the second electrode 30 to the above range can make the structure of the first electrode 20 and the second electrode 30 more stable, and the current formed between the first electrode 20 and the second electrode 30 more stable, thereby improving the uniformity and stability of the electric field and better heating the material uniformly.

[0101] Furthermore, in the first direction a, the ratio between the height of the first electrode 20 and the height of the second electrode 30 ranges from 1:1.2 to 1:1.45.

[0102] As a specific embodiment, the ratio between the heights of the first electrode 20 and the second electrode 30 can be, but is not limited to, set to 1:1.2, 1:1.25, 1:1.3, 1:1.35, 1:1.4, or 1:1.45.

[0103] This can further improve the stability and density of the current formed between the first electrode 20 and the second electrode 30, and enhance product consistency.

[0104] In some embodiments, in the first direction a, the ratio between the height H3 of the first electrode 20 and the height H2 of the reaction chamber 11 ranges from 1:1.8 to 1:8.4.

[0105] In a specific embodiment, the ratio between the height of the first electrode 20 and the height of the reaction chamber 11 can be, but is not limited to, 1:1.8, 1:2.4, 1:3, 1:3.6, 1:4.2, 1:4.8, 1:5.4, 1:6, 1:6.6, 1:7.2, 1:7.8, or 1:8.4. Different ratios between the height of the first electrode 20 and the height of the reaction chamber 11 result in different stability and density of the current formed between the first electrode 20 and the second electrode 30.

[0106] Specifically, in the vertical direction, the height ratio of the first electrode 20 to the reaction chamber 11 can be combined with the height ratio of the first electrode 20 and the second electrode 30 to obtain the height ratio of the first electrode 20, the second electrode 30, and the reaction chamber 11. This improves the overall structural stability of the graphitization furnace 100 and ensures that the current density on the first electrode 20 and the second electrode 30 meets production requirements.

[0107] Furthermore, in the first direction a, the ratio between the height of the first electrode 20 and the height of the reaction chamber 11 ranges from 1:2.3 to 1:4.5.

[0108] As a specific embodiment, the ratio between the height of the first electrode 20 and the height of the reaction chamber 11 can be, but is not limited to, set to 1:2.3, 1:2.5, 1:2.7, 1:2.9, 1:3.1, 1:3.3, 1:3.5, 1:3.7, 1:3.9, 1:4.1, 1:4.3, or 1:4.5.

[0109] This can further improve the overall structural stability of the graphitization furnace 100 and increase the current density on the first electrode 20 and the second electrode 30.

[0110] In some embodiments, the furnace body 10 is further provided with a discharge port 14 communicating with the reaction chamber 11, and the discharge port 14 and the feed port 12 are respectively located on opposite sides of the reaction chamber 11 along the first direction a. The graphitization furnace 100 also includes a cooling assembly (not shown in the figure), which is in communication with the discharge port 14.

[0111] Specifically, the feed inlet 12 is located at the top of the furnace body 10, and the discharge outlet 14 is vertically opposite to the feed inlet 12 and located at the bottom of the furnace body 10. In this way, the material is put in through the feed inlet 12 and, under its own gravity, can slowly fall into the reaction chamber 11 and finally be discharged from the reaction chamber 11 through the discharge outlet 14.

[0112] Furthermore, after the material undergoes graphitization treatment in the reaction chamber 11, it has a high temperature. Therefore, the cooling component is connected to the discharge port 14 so that the material can smoothly enter the cooling component after being discharged from the discharge port 14, and the cooling component is used to cool the graphitized material.

[0113] Based on the same concept as the graphitization furnace 100 described above, this application also provides a heat treatment system including the graphitization furnace 100 as described above.

[0114] According to one or more embodiments, in specific use, the material is put in through the feed inlet 12, and the material falls slowly, passing sequentially through the feeding channel 13 on the first electrode 20, the reaction chamber 11 between the first electrode 20 and the second electrode 30, and the feeding channel 13 on the second electrode 30. During this process, the parallel electric field formed between the first electrode 20 and the second electrode 30 can heat the material, so that the heating process of the material can be more uniform and thorough, improve the graphitization degree of the material, and improve the consistency of the product.

[0115] After the material passes through the feeding channel 13, it is discharged from the discharge port 14 to the cooling component, where it is cooled.

[0116] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0117] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A graphitization furnace characterized by, The furnace body has a reaction cavity, and a feeding port is formed in the furnace body in a first direction and communicates with the reaction cavity. The first electrode and the second electrode are opposite in polarity, and are arranged through the furnace body in a second direction intersecting the first direction and are spaced apart in the first direction. The first electrode and the second electrode are both provided with a discharging passage in the reaction cavity in the first direction and communicate with the reaction cavity. The first electrode comprises a first discharging area and a first extension area. The first extension area is arranged through the furnace body and is located on opposite sides of the first discharging area in the second direction. The first discharging area is located in the reaction cavity and is configured as a hollow ring structure. The second electrode comprises a second discharging area and a second extension area. The second extension area is arranged through the furnace body and is located on opposite sides of the second discharging area in the second direction. The second discharging area is located in the reaction cavity and is configured as a hollow ring structure.

2. The graphitization furnace of claim 1, wherein In a plane perpendicular to the first direction, the projection of the first discharging area at least partially overlaps the projection of the second discharging area.

3. The graphitization furnace of claim 2, wherein, In a plane perpendicular to the first direction, the ratio of the projection area of the first discharging area to the projection area of the second discharging area ranges from 1:1 to 1:1.

5.

4. The graphitization furnace of claim 3, wherein In a plane perpendicular to the first direction, the ratio of the projection area of the first discharging area to the projection area of the second discharging area ranges from 1:1.1 to 1:1.

2.

5. The graphitization furnace of claim 4, wherein, In a plane perpendicular to the first direction, the ratio of the inner diameter to the outer diameter of the first discharging area ranges from 1:1.3 to 1:4.

5.

6. The graphitization furnace of claim 5, wherein, In a plane perpendicular to the first direction, the ratio of the inner diameter to the outer diameter of the second discharging area ranges from 1:1.3 to 1:4.

5.

7. The graphitization furnace of claim 3, wherein In a plane perpendicular to the first direction, the ratio of the inner diameter to the outer diameter of the first discharging area ranges from 1:1.4 to 1:3.

2. In a plane perpendicular to the first direction, the ratio of the inner diameter to the outer diameter of the second discharging area ranges from 1:1.4 to 1:3.

2.

8. The graphitization furnace of claim 7, wherein, In the first direction, the ratio of the distance between the first electrode and the second electrode to the height of the reaction cavity ranges from 1:1.05 to 1:6.

8. In the first direction, the ratio of the distance between the first electrode and the second electrode to the height of the reaction cavity ranges from 1:1.1 to 1:3.

5.

9. The graphitization furnace of claim 1, wherein, In the first direction, the ratio of the height of the first electrode to the height of the second electrode ranges from 1:1.1 to 1:1.

9.

10. The graphitization furnace of claim 9, wherein, In the first direction, the ratio of the height of the first electrode to the height of the second electrode ranges from 1:1.2 to 1:1.

45.

11. The graphitization furnace of claim 1, wherein In the first direction, the ratio of the height of the first electrode to the height of the reaction cavity ranges from 1:1.8 to 1:8.

4.

12. The graphitization furnace of claim 11, wherein, In the first direction, the ratio of the height of the first electrode to the height of the reaction cavity ranges from 1:2.3 to 1:4.

5.

13. The graphitization furnace of claim 11 or 12, characterized in that, ​ 14. The graphitization furnace of claim 13, wherein, ​ 15. The graphitization furnace of claim 1, wherein, The furnace body is further provided with a discharge port in communication with the reaction cavity, the discharge port and the feeding port are respectively located at opposite sides of the reaction cavity along the first direction. The graphitization furnace further comprises a cooling assembly in communication with the discharge port.

16. A thermal processing system, comprising: A graphitization furnace comprising any one of claims 1-15.

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