Atomizing core for atomizing device and atomizing device

Abstract

The embodiment of the utility model provides an atomizing core for an atomizing device and the atomizing device. The atomizing core comprises a substrate, a first electrode and a second electrode, wherein the substrate comprises two opposite surfaces; the through holes are formed to penetrate through the two surfaces and are suitable for an atomizing substrate of the atomizing device to flow from one surface to the other surface in the two surfaces; and a pair of electrodes disposed on at least one of the two surfaces; and at least one heat-generating film disposed on at least one of the two surfaces and coupled between the pair of electrodes, in which a roughness of a through-hole region in which at least the plurality of through-holes are disposed in the at least one of the two surfaces is set between 50 nm and 900 nm. Therefore, the wetting effect on the atomization substrate, the binding force of the heating film and the reliability of the atomization device can be improved.

Description

Technical Field

[0001] The exemplary embodiments disclosed herein generally relate to the field of atomizing devices, and particularly to atomizing cores and atomizing devices for use in atomizing devices. Background Technology

[0002] An atomizing device is a device that atomizes an atomizing substrate to form an aerosol. An atomizing device includes an atomizing coil. The performance of the atomizing coil directly affects the vapor production and user experience of the atomizing device. The atomizing coil heats the atomizing substrate to its evaporation point using a heating element, causing it to fully atomize into tiny gas particles. However, existing atomizing coils suffer from problems such as low atomization efficiency, weak adhesion of the heating film, and the risk of electrode detachment. Utility Model Content

[0003] The purpose of this disclosure is to provide an atomizing core and atomizing device for use in an atomizing apparatus, so as to at least partially solve the above-mentioned problems and / or other potential problems of conventional atomizing cores.

[0004] In a first aspect of this disclosure, an atomizing core for an atomizing device is provided. The atomizing core includes: a substrate having two opposing surfaces; a plurality of through holes formed through the two surfaces and adapted to allow an atomizing matrix of the atomizing device to flow from one surface to the other; a pair of electrodes disposed on at least one of the two surfaces; and at least one heating film disposed on at least one of the two surfaces and coupled between the pair of electrodes, wherein the roughness of the through-hole region of at least one of the two surfaces having the plurality of through holes is set between 50 nm and 900 nm.

[0005] In the embodiments of this disclosure, the surface roughness of the substrate has a significant impact on the adhesion of the heating film and the atomization efficiency. On the one hand, a substrate surface with a certain roughness can significantly enhance the adhesion to the heating film, reduce the risk of heating film detachment, and improve the reliability of the atomization device. Simultaneously, controlling the atomization surface roughness to below 1 μm allows for more uniform adhesion of the heating film and a suitable thickness (e.g., 200 nm-500 nm), further improving the reliability of the heating film. On the other hand, the rough surface formed after the heating film adhesion is beneficial for the wetting of the atomization matrix, improving atomization efficiency. Furthermore, for embodiments where the suction surface has a predetermined roughness, increasing the roughness can also increase the contact area between the substrate and the atomization matrix, enhancing adsorption and retention capabilities, and significantly improving wetting effect and atomization efficiency.

[0006] In some embodiments, the two surfaces of the atomizing core include: an inhalation surface arranged adjacent to a receiving cavity for containing the atomizing matrix; and an atomizing surface arranged on a side opposite to the inhalation surface.

[0007] In some embodiments, the roughness of the through-hole region of the atomizing surface is set between 200 nm and 800 nm.

[0008] In some embodiments, the roughness of the through-hole region of the inhalation surface and the atomizing surface is set between 200 nm and 800 nm.

[0009] In some embodiments, the thickness of at least one heating film is between 200 nm and 500 nm.

[0010] In some embodiments, at least one heating film includes a heating film disposed on an atomizing surface.

[0011] In some embodiments, the roughness of the through-hole region of at least one surface is set between 50 nm and 900 nm by at least one of etching, corrosion, sandblasting, grinding or laser processing.

[0012] In some embodiments, at least one heating film includes a heating film disposed on an atomizing surface.

[0013] In some embodiments, at least one heating film includes a pair of heating films disposed on an inhalation surface and an atomizing surface, respectively, and wherein the atomizing core further includes a conductor disposed in at least one of a plurality of through holes and adapted to conduct a conductive connection between a pair of electrodes and at least one heating film.

[0014] In some embodiments, a pair of electrodes are respectively arranged on an inhalation surface and an atomizing surface; and a first heating film of a pair of heating films is coupled to a first electrode of the pair of electrodes, and the first heating film covers at least a first portion of the inhalation surface, the first heating film including a plurality of first through holes aligned with through holes in the first portion of the region; and a second heating film of a pair of heating films is coupled to a second electrode of the pair of electrodes, and the second heating film covers at least a second portion of the atomizing surface, the second heating film including a plurality of second through holes aligned with through holes in the second portion of the region.

[0015] In some embodiments, a pair of electrodes are respectively arranged on an inhalation surface and an atomizing surface; and a first heating film of a pair of heating films is coupled between a first electrode and a second electrode of the pair of electrodes, and the first heating film covers at least a first portion of the inhalation surface, the first heating film including a plurality of first through holes aligned with through holes in the first portion of the region; and a second heating film of a pair of heating films is coupled between a first electrode and a second electrode of the pair of electrodes, and the second heating film covers at least a second portion of the atomizing surface, the second heating film including a plurality of second through holes aligned with through holes in the second portion of the region.

[0016] In some embodiments, a pair of electrodes are respectively disposed on an inhalation surface or an atomizing surface; and a first heating film of a pair of heating films at least covers a first portion of the inhalation surface, the first heating film including a plurality of first through holes aligned with through holes in the first portion of the inhalation surface, and a second heating film of a pair of heating films including: a first heating portion coupled to a first electrode of the pair of electrodes, and the first heating portion at least covers a second portion of the atomizing surface, the first heating portion including a plurality of second through holes aligned with through holes in the second portion of the inhalation surface; and a second heating portion coupled to a second electrode of the pair of electrodes, and the second heating portion at least covers a third portion of the atomizing surface, the second heating portion including a plurality of third through holes aligned with through holes in the third portion of the inhalation surface.

[0017] It should be understood that the content described in this content section is not intended to limit the key or essential features of the embodiments of this disclosure, nor is it intended to restrict the scope of this disclosure. Other features of this disclosure will become readily apparent from the following description. Attached Figure Description

[0018] The above and other features, advantages, and aspects of the embodiments of this disclosure will become more apparent from the accompanying drawings and the following detailed description. In the drawings, the same or similar reference numerals denote the same or similar elements, wherein:

[0019] Figures 1 to 4 A schematic diagram of the structure of an atomizing core according to some embodiments of the present disclosure is shown;

[0020] Figure 5A It shows Figure 1 An enlarged view of part A in the middle; and

[0021] Figure 5B It shows Figure 1 A magnified view of section B. Detailed Implementation

[0022] Embodiments of this disclosure will now be described in more detail with reference to the accompanying drawings. While some embodiments of this disclosure are shown in the drawings, it should be understood that this disclosure can be implemented in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of this disclosure. It should be understood that the accompanying drawings and embodiments of this disclosure are for illustrative purposes only and are not intended to limit the scope of protection of this disclosure.

[0023] It should be noted that the headings of any section / subsection provided herein are not limiting. Various embodiments are described throughout this document, and embodiments of any type may be included under any section / subsection. Furthermore, embodiments described in any section / subsection may be combined in any way with any other embodiments described in the same section / subsection and / or different sections / subsections.

[0024] In the description of embodiments of this disclosure, the term "comprising" and similar terms should be understood as open-ended inclusion, i.e., "including but not limited to". The term "based on" should be understood as "at least partially based on". The term "one embodiment" or "the embodiment" should be understood as "at least one embodiment". The term "some embodiments" should be understood as "at least some embodiments". Other explicit and implicit definitions may also be included below. The terms "first", "second", etc., may refer to different or the same objects. Other explicit and implicit definitions may also be included below.

[0025] As briefly mentioned earlier, existing atomizer cores suffer from problems such as low atomization efficiency, weak adhesion of the heating film, and the risk of electrode detachment. Specifically, in existing atomizer cores, the atomizing matrix mainly atomizes at or within the through-hole, resulting in low atomization efficiency. The atomizer core uses a dense porous substrate as its base, such as porous glass or porous sapphire. The substrate surface is smooth with low roughness, which easily leads to weak adhesion between the substrate surface and the heating film, posing a risk of detachment at the electrode positions and causing atomizer core failure.

[0026] To address, or at least partially address, the aforementioned problems or other potential problems of existing atomizing cores, embodiments of this disclosure provide an atomizing core for an atomizing device and a solution for the atomizing device itself. According to various embodiments of this disclosure, the atomizing core includes a substrate and at least one heating film. Further, the substrate includes two opposing surfaces, a plurality of through-holes, and a pair of electrodes. The plurality of through-holes are formed to penetrate the two surfaces and are adapted to allow the atomizing matrix of the atomizing device to flow from one surface to the other. The pair of electrodes is disposed on at least one of the two surfaces. Further, at least one heating film is disposed on at least one of the two surfaces and coupled between the pair of electrodes. Further, the roughness of the through-hole region on at least one of the two surfaces, where the plurality of through-holes are disposed, is set between 50 nm and 900 nm.

[0027] The surface roughness design of the substrate plays a crucial role in the adhesion performance and atomization efficiency of the heating film. A rough surface significantly enhances the adhesion of the heating film, reducing the risk of detachment. Furthermore, when the roughness is controlled below 1 μm, the heating film can adhere more uniformly and be thinner (e.g., 200 nm-500 nm), thereby improving the reliability of the heating film. In addition, the rough surface formed after the heating film adheres facilitates the wetting of the atomization matrix, improving atomization efficiency. For structures with roughened suction surfaces, the contact area between the substrate and the atomization matrix can be further increased, enhancing adsorption and retention capabilities, and significantly improving wetting effect and atomization efficiency.

[0028] The structure of the atomizing device will be described below. In embodiments of this disclosure, the atomizing device includes a power supply, a circuit unit, and an atomizing core 100. Through the cooperation of the power supply, the circuit unit, and the atomizing core 100, the atomizing device aims to heat and atomize the atomizing substrate, thereby providing an efficient and stable atomization effect. Furthermore, temperature control and protection mechanisms ensure the safety and reliability of the atomization process.

[0029] Furthermore, the power supply for the atomizing device provides the necessary electrical energy. The power supply can be a rechargeable battery, an external power adapter, or other suitable power source; this is not specifically limited in the embodiments of this disclosure. The voltage and current provided by the power supply are used to drive the atomizing coil 100. The voltage and current output by the power supply can be adjusted according to the requirements of the circuit unit to meet the power requirements for heating the atomizing coil 100.

[0030] Furthermore, the circuit unit is used to regulate the current supplied by the power source to control the temperature of the atomizing core 100. In some embodiments, the circuit unit includes a temperature control circuit, a power regulation circuit, etc., to ensure that the atomizing core 100 can be heated stably during operation and to automatically cut off power in abnormal situations to protect the device. Thus, through the regulation of the circuit unit, the intensity and duration of the current can be precisely adjusted, thereby regulating the temperature of the atomizing core 100 and controlling the atomization process.

[0031] Furthermore, the atomizing core 100 is used to convert electrical energy supplied by the power source into heat energy, which is used to heat the atomizing substrate to achieve atomization. The atomizing substrate can be a liquid oil or other substances suitable for atomization.

[0032] During the operation of the atomizing device, the power supply provides electrical energy to the circuit unit, which adjusts the output current according to the user-set operating mode. This current is conducted to the atomizing core 100, causing it to heat up and generate heat. The atomizing matrix evaporates during the heating process to form atomized gas. The circuit unit can monitor the temperature of the atomizing core 100 in real time to ensure it remains within a preset range, preventing excessively high or low temperatures from affecting the atomization effect.

[0033] In this way, the circuit unit can achieve precise temperature control, ensuring that the atomizing core 100 operates within a suitable temperature range and improving the stability of the atomization effect. By adjusting the current, the atomizing device can adapt to different types of atomizing media to meet the needs of different users.

[0034] The following will combine Figures 1 to 5B The atomizing core 100 according to an embodiment of the present disclosure is described below. Figures 1 to 4 A schematic diagram of the structure of an atomizing core 100 according to some embodiments of the present disclosure is shown. Figure 5A It shows Figure 1 An enlarged view of part A in the middle, and Figure 5B It shows Figure 1 An enlarged view of section B. (See image.) Figures 1 to 4 As shown, the atomizing core 100 of this embodiment generally includes a substrate 110 and at least one heating film 130, aiming to achieve a highly efficient and uniform atomization effect. The specific implementation details are described below:

[0035] Furthermore, the substrate 110 of the atomizing core 100 includes two opposing surfaces, a plurality of through holes 1101, and a pair of electrodes 120. Furthermore, the substrate 110 can be made of a material with high temperature resistance and excellent insulation properties, such as glass, sapphire, ceramic, or polymer materials; however, the embodiments disclosed herein do not specifically limit this.

[0036] In some embodiments, the two surfaces include an intake surface 101 and an atomizing surface 102. The intake surface 101 is arranged adjacent to a receiving cavity for containing the atomized matrix, and the atomizing surface 102 is arranged on the side opposite to the intake surface. The atomizing surface 102, located on the opposite side of the intake surface 101, is the surface that directly performs the atomization function. Both the intake surface 101 and the atomizing surface 102 may be provided with heating films for converting the atomized matrix conducted through the intake surface 101 into an aerosol through preheating and heating. Furthermore, the atomizing surface 102 is arranged in the outlet path facing the atomizing device to ensure that the generated aerosol can be output to the user's inhalation port. In some embodiments, at least one heating film is arranged on the atomizing surface. Further, a plurality of through holes 1101 are formed on the substrate 110, the through holes 1101 being formed to penetrate both surfaces and adapted to allow the atomized matrix of the atomizing device to flow from one surface to the other. The size and distribution of these through holes 1101 can be arranged according to actual atomization requirements to ensure smooth and uniform liquid flow.

[0037] For example, the suction surface 101 can guide the atomizing matrix from the receiving cavity to multiple through holes 1101 of the substrate 110. The atomizing matrix flows along the multiple through holes 1101 to the atomizing surface 102, where it is rapidly vaporized into an aerosol under the heating action of the heating film on the atomizing surface 102.

[0038] Furthermore, a pair of electrodes 120 are arranged on at least one of the two surfaces to provide electrical energy to the heating film. The electrodes can be made of a highly conductive metallic material, such as copper, aluminum, or nickel alloy, and are fixed to the surface of the substrate 110 by processes such as deposition, sputtering, or printing; this is not specifically limited in the embodiments of this disclosure. In this way, a reliable connection between the electrodes 120 and the power supply can be ensured, and a uniform distribution of current in the heating film can be achieved. In some embodiments, the pair of electrodes 120 of the atomizing core 100 are respectively connected to a power supply and a circuit unit. The power supply provides electrical energy to the electrodes through the circuit unit, and the current flows through the electrodes to the pair of heating films, thereby heating the atomizing matrix.

[0039] Furthermore, at least one heating film 130 of the atomizing core 100 is disposed on at least one of the two surfaces and coupled between a pair of electrodes 120. Heating is achieved through electrical coupling between the electrodes 120, causing the atomizing matrix to rapidly evaporate and transform into a gaseous state, forming an aerosol. The heating film material can be selected from conductive ceramics, carbon-based materials, or metal alloy thin films, etc., which have good thermal conductivity and high temperature resistance. The embodiments of this disclosure do not specifically limit the choice of heating film material.

[0040] The heating films on the top and bottom sides can be made of the same or different materials to meet different functional requirements, such as single-sided high-efficiency heating or double-sided temperature control. The geometry, thickness, and coverage of the heating film can be selected according to the required heating area ratio, and no specific limitation is made in this embodiment. Optionally, a temperature sensor can monitor the real-time temperature of the heating film and feed it back to the circuit unit for fine control.

[0041] According to an embodiment of the present disclosure, the roughness of the through-hole region on at least one of the two surfaces of the substrate 110 of the atomizing core, wherein at least a plurality of through holes are provided, is set between 50 nm and 900 nm. Figure 5A and Figure 5B As shown.

[0042] Figure 5AA partially enlarged view is shown after the heating film 1301 is attached to the atomizing surface 102 with a predetermined roughness. The roughness of the atomizing surface 102 significantly promotes the adhesion performance of the heating film 1301. Compared with a smooth surface, the atomizing surface 102 with a certain roughness can significantly enhance the adhesion to the heating film 1301. This enhanced adhesion can effectively reduce the risk of the heating film 1301 falling off during use, thereby significantly improving the overall reliability of the atomizing device. At the same time, when the roughness of the atomizing surface 102 is controlled below 1 μm (1000 nm), the heating film 1301 can be attached more uniformly, and the thickness of the heating film 1301 can be kept within a relatively thin range. For example, in some embodiments, the thickness of the heating film can be controlled between 200 nm and 500 nm. This thin and uniform adhesion method not only improves the adhesion of the heating film 1301, but also further enhances the conductivity and reliability of the heating film 1301.

[0043] After the heating film 1301 is attached to the atomizing surface 102 with a certain roughness, a certain rough structure will be formed on its surface, such as... Figure 5A As shown, this rough structure facilitates the wetting of the atomizing matrix on the heating film 1301. Improved wetting properties allow the atomizing matrix to be more evenly distributed on the surface of the heating film 1301, thereby increasing atomization efficiency. This design not only optimizes the atomization process but also ensures the high efficiency and stability of the atomizing device during use, further enhancing the overall performance of the product.

[0044] In some embodiments, the roughness of the through-hole region of the intake surface can be set between 50 nm and 800 nm only. This setting facilitates the wetting effect of the atomizing matrix on the intake surface, thereby facilitating the entry of the atomizing matrix into the through-hole through the intake surface, i.e., facilitating the flow of the atomizing matrix.

[0045] For an embodiment in which a predetermined roughness is set on the suction surface 101 of the two surfaces, such as Figure 5B As shown, the increased roughness significantly improves the contact area between the suction surface 101 and the atomizing matrix. This increased contact area significantly enhances the adsorption and retention capacity of the atomizing matrix on the substrate surface. The stronger adsorption capacity not only contributes to the uniform distribution of the atomizing matrix but also further improves its wetting effect, thereby significantly improving the flow performance of the atomizing matrix. This design can significantly improve the performance of the atomizing device in practical applications, making it more suitable for various application scenarios.

[0046] In summary, optimizing the surface roughness of the substrate significantly improves not only the adhesion and reliability of the heating film but also the wetting effect and atomization efficiency of the atomizing matrix. This design substantially enhances product performance and user experience in practical applications. Through this optimized design, the atomizing device becomes more stable and efficient during use, meeting the needs of diverse users.

[0047] In some embodiments, the roughness of the through-hole regions on both surfaces can be set between 50 nm and 800 nm. This setting, on the one hand, as mentioned above, facilitates the wetting effect of the atomizing matrix on the suction surface, thereby facilitating the entry of the atomizing matrix into the through-holes via the suction surface, i.e., promoting the flow of the atomizing matrix. On the other hand, it also facilitates the adhesion of the heating film to the atomizing surface, reducing the risk of detachment, and allows for more uniform adhesion and a suitable thickness (e.g., 200 nm-500 nm), further improving the reliability of the heating film. Furthermore, the rough surface formed after the heating film adheres is beneficial for the wetting of the atomizing matrix, improving atomization efficiency.

[0048] In some embodiments, the roughness of at least one surface via region is set between 50 nm and 900 nm by at least one of etching, corrosion, or laser processing. In some embodiments, alternatively or additionally, the roughness may also be prepared by processes such as sandblasting or grinding. This is not specifically limited in the embodiments of this disclosure.

[0049] Etching is a process that removes a portion of a material's surface using chemical or physical methods. Typically, it involves exposing the material to acidic or alkaline solutions, or using plasma etching, to create fine, uneven structures on the surface, thereby controlling roughness. Corrosion, on the other hand, refers to the process of dissolving or removing a material's surface through a chemical reaction, usually in the presence of acidic, alkaline solutions or oxidizing agents. This process can precisely remove a portion of the surface, creating the desired roughness.

[0050] Sandblasting is a process that involves propelling abrasive particles at high speed onto the surface of an object, using the impact force of the particles to remove the surface layer and create a rough or textured surface. Sandblasting allows for the adjustment of roughness and is commonly used for surface treatment of metals or other hard materials. Grinding is a process that uses abrasive tools to mechanically grind the surface of a material. By using abrasive particles of different grit sizes, the roughness of the material surface can be gradually changed to achieve the desired fineness or roughness. Laser processing utilizes the high energy density of a laser beam to irradiate the surface of a material, instantly heating and evaporating or ablating the material to create fine structures or roughness on the surface.

[0051] Furthermore, the heating film 1301 of the atomizing core according to embodiments of this disclosure can be arranged in various ways. For example, in some embodiments, the heating film may consist of only one heating film arranged on the atomizing surface, such as... Figure 1 As shown.

[0052] Specifically, such as Figure 1 As shown, in some embodiments, a pair of electrodes 120 are respectively disposed on the atomization surface 102 of the substrate 110. Further, the pair of electrodes 120 may be disposed at both ends of the substrate 110. Specifically, the pair of electrodes 120 includes a first electrode 1201 and a second electrode 1202. The first electrode 1201 is disposed at one end of the substrate 110, and the second electrode 1202 is disposed at the end opposite to the first electrode 1201. The first electrode 1201 and the second electrode 1202 are respectively disposed on the atomization surface.

[0053] Furthermore, a first heating film 1301 is disposed on the atomizing surface 102 and coupled between the first electrode 1201 and the second electrode 1202. The first heating film 1301 includes a plurality of first through holes 1303, which are aligned with through holes 1101 on the atomizing surface 102 to ensure that the atomizing matrix can flow to the first heating film 1301 through the through holes 1101, thereby achieving atomization.

[0054] exist Figure 1 In the illustrated embodiment, the roughness of the via region of the atomizing surface 102, where at least one via is provided, is set to between 50 nm and 900 nm. On one hand, a substrate surface with a certain roughness can significantly enhance the adhesion to the heating film, reduce the risk of the heating film detaching, and improve the reliability of the atomizing device. Simultaneously, controlling the roughness of the atomizing surface to below 1 μm allows for more uniform adhesion of the heating film and a suitable thickness (e.g., 200 nm-500 nm), further improving the reliability of the heating film. On the other hand, the rough surface formed after the heating film adheres is beneficial for wetting the atomizing matrix, improving atomization efficiency.

[0055] In some embodiments, alternatively or additionally, the heating film 1301 may also be disposed on both the inhalation surface 101 and the atomizing surface 102, such as Figures 2 to 4 As shown. Placing the heating film on the intake surface 101 allows for preheating of the atomizing matrix, thereby increasing the fluidity of the relatively viscous atomizing matrix. To achieve this configuration, a conductor 140 is provided in at least one of the multiple through holes to conduct a conductive connection between a pair of electrodes and at least one heating film.

[0056] The following will combine Figures 2 to 4 To describe how these examples are arranged. For example... Figure 2As shown, in some embodiments, a pair of electrodes 120 are respectively disposed on the intake surface 101 and the atomizing surface 102 of the substrate 110. Further, the pair of electrodes 120 may be disposed at both ends of the substrate 110. Specifically, the pair of electrodes 120 includes a first electrode 1201 and a second electrode 1202. The first electrode 1201 is disposed at one end of the substrate 110, and the second electrode 1202 is disposed at the end opposite to the first electrode 1201. The first electrode 1201 and the second electrode 1202 are respectively disposed on the intake surface and the atomizing surface. Further, the first electrode 1201 is disposed on the intake surface 101 to provide electrical energy to the first heating film 1301 of the pair of heating films 130 disposed on the intake surface 101. Further, the second electrode 1202 is disposed on the atomizing surface 102 to provide electrical energy to the second heating film 1302 of the pair of heating films 130 disposed on the atomizing surface 102.

[0057] This not only enables distributed power supply to the circuit, but also ensures that the heating films of the inhalation surface 101 and the atomizing surface 102 work independently or in concert, allowing for flexible adjustment of temperature and heating power as needed.

[0058] Furthermore, the pair of heating films 130 includes a first heating film 1301 and a second heating film 1302. The first heating film 1301 is coupled to the first electrode 1201 and covers a first portion of the suction surface 101, for heating the suction surface 101 to improve the liquid transfer efficiency and preheating effect.

[0059] Furthermore, the first heating film 1301 includes a plurality of first through holes 1303, which are aligned with through holes 1101 in the first part of the suction surface 101 to ensure that the atomizing matrix can flow from the suction surface 101 to the atomizing surface 102 through the through holes 1101.

[0060] Optionally, the material of the first heating film 1301 can be a material that is resistant to high temperatures and has good electrical conductivity, such as a metal film or conductive ceramic, which can provide a stable heating effect under low power conditions and reduce energy loss.

[0061] Furthermore, the second heating film 1302 is coupled to the second electrode 1202 and covers a second portion of the atomizing surface 102 to heat the atomizing matrix transmitted to the atomizing surface 102, thereby achieving rapid atomization.

[0062] Furthermore, the second heating film 1302 includes a plurality of second through holes 1304, which are aligned with the through holes 1101 in the second part of the atomizing surface 102 to allow the atomizing matrix transmitted from the suction surface 101 to pass smoothly, while ensuring the heating uniformity and atomization efficiency of the second heating film 1302.

[0063] Optionally, the material of the second heating film 1302 can be the same as or different from that of the first heating film 1301, depending on the requirements. For example, if a higher atomization temperature is required, a metal-based material with stronger thermal conductivity can be selected; if enhanced safety is required, a low-melting-point material with a fusing function can be selected. The embodiments of this disclosure do not specifically limit this.

[0064] When the atomizing device is running, current is transmitted through a pair of electrodes 120 to the first heating film 1301 and the second heating film 1302, respectively. The first heating film 1301 heats the intake surface 101, preheating the atomizing matrix, improving its fluidity, and reducing condensation. Through the through-hole 1101, the preheated atomizing matrix is ​​transferred from the intake surface 101 to the atomizing surface 102, where it rapidly vaporizes into an aerosol under the heating action of the second heating film 1302.

[0065] In some embodiments, the conductor 140 passes through the corresponding through-hole 1101 and couples between the first heating film 1301 and the second heating film 1302. The conductor 140 enables electrical connection between the suction surface 101 and the atomizing surface 102, further improving heating uniformity and energy transfer efficiency.

[0066] Specifically, the conductor 140 passes through the corresponding through hole 1101 and is coupled to the first heating film 1301 on the intake surface 101 and the second heating film 1302 on the atomizing surface 102. The conductor 140 is not only used for electrical conduction, but also helps in heat transfer, thereby improving the heating efficiency of the entire atomizing core 100.

[0067] In some embodiments, on the inhalation surface 101, the conductor 140 is coupled to the side of the first heating film 1301 away from the first electrode 1201. On the atomizing surface 102, the conductor 140 is coupled to the side of the second heating film 1302 away from the second electrode 1202.

[0068] This arrangement ensures that current flows through the conductor 140, forming a continuous conductive path between the first heating film 1301 and the second heating film 1302, thereby achieving a series operation mode for the two heating films.

[0069] Through this series operation mode, the first heating film 1301 and the second heating film 1302 can jointly complete the double-sided heating of the atomizing core 100. Current first enters the first heating film 1301 through the first electrode 1201 to preheat the atomizing matrix on the intake surface 101. The preheated atomizing matrix is ​​then transmitted to the atomizing surface 102 through the through-hole 1101, and the conductor 140 transfers the current to the second heating film 1302. Upon receiving the current, the second heating film 1302 further heats the atomizing matrix and completes the atomization process. This arrangement not only reduces circuit complexity but also controls the temperature distribution of the two heating films, meeting different power requirements.

[0070] Optionally, the conductor 140 can be made of a material with high electrical conductivity, such as copper, silver, or conductive ceramics, while also possessing strong mechanical strength and high-temperature resistance. The conductor 140 can be fabricated by filling the through-hole 1101 with a metal paste and forming a conductive connection through high-temperature sintering. In some alternative embodiments, a conductive layer can be deposited on the wall of the through-hole 1101 using metal plating technology and then connected to the heating film or electrode by welding or bonding.

[0071] Furthermore, the shape and size of the conductor 140 are selected according to the size of the through hole 1101 and the structural requirements of the atomizing core 100 to ensure reliable electrical conductivity and heat transfer.

[0072] like Figure 3 As shown, in some embodiments, a pair of electrodes 120 are respectively disposed on the suction surface 101 and the atomizing surface 102 of the substrate 110. Further, the pair of electrodes 120 may be disposed at both ends of the substrate 110. Specifically, the pair of electrodes 120 includes a first electrode 1201 and a second electrode 1202, with the first electrode 1201 disposed at one end of the substrate 110 and the second electrode 1202 disposed at the end opposite to the first electrode 1201.

[0073] Furthermore, the first electrode 1201 includes a first sub-electrode 1203 and a second sub-electrode 1204. The first sub-electrode 1203 is disposed on the intake surface 101 and is used to provide electrical energy to the first heating film 1301 disposed on the intake surface 101. The second sub-electrode 1204 is disposed on the atomizing surface 102 and is used to provide electrical energy to the second heating film 1302 disposed on the atomizing surface 102.

[0074] Furthermore, the second electrode 1202 includes a third sub-electrode 1205 and a fourth sub-electrode 1206. The third sub-electrode 1205 is disposed on the intake surface 101 and is used to provide electrical energy to the first heating film 1301 disposed on the intake surface 101. The fourth sub-electrode 1206 is disposed on the atomizing surface 102 and is used to provide electrical energy to the second heating film 1302 disposed on the atomizing surface 102.

[0075] This distributed electrode ensures that the heating films of the inhalation surface 101 and the atomizing surface 102 can be heated independently and work together to improve the atomization effect of the atomizing core 100.

[0076] Furthermore, the first heating film 1301 is coupled between the first sub-electrode 1203 and the third sub-electrode 1205, covering a first portion of the inhalation surface 101, for heating and pre-treating the atomizing matrix in that region.

[0077] Furthermore, the first heating film 1301 includes a plurality of first through holes 1303, which are aligned with the through holes 1101 in the first part of the suction surface 101 to ensure that the atomizing matrix can pass through the first heating film 1301 without affecting its heating effect.

[0078] Furthermore, the second heating film 1302 is coupled between the second sub-electrode 1204 and the fourth sub-electrode 1206, covering at least a second portion of the atomizing surface 102, for further heating the atomizing matrix transmitted from the inhalation surface 101, thereby achieving full atomization.

[0079] Furthermore, the second heating film 1302 includes a plurality of second vias 1304, which are aligned with the through holes 1101 in the second part of the atomizing surface 102 to ensure that the atomizing matrix transmitted from the first heating film 1301 can pass through the second heating film 1302.

[0080] In this manner, both the first heating film 1301 and the second heating film 1302 are connected between the first electrode 1201 and the second electrode 1202. In this parallel circuit configuration, the heating power of the first heating film 1301 and the second heating film 1302 can be adjusted independently as needed, thereby achieving precise temperature control of the atomizing core 100. Simultaneously, the dual-sided heating of the inhalation surface 101 and the atomizing surface 102 ensures that the atomizing matrix is ​​heated uniformly and fully evaporated, improving atomization efficiency.

[0081] In addition, the number, size and arrangement of the first through hole 1303 and the second through hole 1304 can be selected according to the actual needs of the atomizing device to maximize the smoothness of atomization matrix transmission and heating uniformity.

[0082] In some embodiments, a pair of conductors 140 includes a first conductor 1401 and a second conductor 1402. The first conductor 1401 passes through a corresponding through-hole 1101 and connects to the first sub-electrode 1203 and the second sub-electrode 1204, thereby achieving electrical conductivity between the suction surface 101 and the atomizing surface 102. This arrangement ensures that the first electrode 1201 forms a continuous electrical connection path between the two heating films, meeting the requirement of double-sided heating.

[0083] Furthermore, the second conductor 1402 passes through the corresponding through hole 1101 to connect the third sub-electrode 1205 and the fourth sub-electrode 1206, thereby achieving electrical conductivity of the second electrode 1202 between the intake surface 101 and the atomizing surface 102. This arrangement ensures that the second electrode 1202 can provide a reliable current loop between the intake surface 101 and the atomizing surface 102.

[0084] In other words, through the arrangement of the first conductor 1401 and the second conductor 1402, the first electrode 1201 and the second electrode 1202 form an efficient electrical circuit between the inhalation surface 101 and the atomizing surface 102. Specifically, the first conductor 1401 and the second conductor 1402 correspond to the two sets of sub-electrodes of the first electrode 1201 and the second electrode 1202, respectively, ensuring seamless electrical connection between the two pairs of sub-electrodes.

[0085] In this way, through the arrangement of the distributed electrodes and conductors 140, the twin electrode structure of the first electrode 1201 and the second electrode 1202 ensures synchronous heating between the inhalation surface 101 and the atomizing surface 102, thereby improving the working efficiency of the atomizing core 100.

[0086] like Figure 4 As shown, in some embodiments, a pair of electrodes 120 are arranged on the intake surface 101 or the atomizing surface 102 of the substrate 110. Further, the pair of electrodes 120 may be arranged on the intake surface 101 or the atomizing surface 102 of the substrate 110. Specifically, the pair of electrodes 120 includes a first electrode 1201 and a second electrode 1202. The first electrode 1201 is arranged at one end of the substrate 110, and the second electrode 1202 is arranged at the end opposite to the first electrode 1201, and the first electrode 1201 and the second electrode 1202 are located on the same side. Further, the first electrode 1201 and the second electrode 1202 are simultaneously arranged on the atomizing surface 102 to provide electrical energy to the second heating film 1302 arranged on the atomizing surface 102. Further, the second heating film 1302 provides electrical energy to the first heating film 1301 arranged on the intake surface 101 via a conductor 140.

[0087] This not only enables distributed power supply to the circuit, but also ensures that the heating films of the inhalation surface 101 and the atomizing surface 102 work independently or in concert, allowing for flexible adjustment of temperature and heating power as needed.

[0088] Furthermore, the first heating film 1301 covers at least a first portion of the inhalation surface 101 for preheating the atomizing matrix, thereby improving the subsequent atomization effect.

[0089] Furthermore, the first heating film 1301 includes a plurality of first through holes 1303, which are aligned with the through holes 1101 in the first portion region, so that the atomizing matrix can flow from the suction surface 101 to the atomizing surface 102, thereby preventing interference with the flowability and heating effect of the atomizing matrix.

[0090] Further, the second heating film 1302 includes a first heating portion 1305 and a second heating portion 1306, respectively covering different regions of the atomizing surface 102. Specifically, the first heating portion 1305 is coupled to the first electrode 1201 of a pair of electrodes 120. Further, the first heating portion 1305 covers at least a second portion of the atomizing surface 102 for heating the atomizing matrix in the second portion region to achieve atomization. Further, the first heating portion 1305 includes a plurality of second through holes 1304, which are aligned with the through holes 1101 in the second portion region to ensure that the atomizing matrix can pass through effectively and be heated uniformly.

[0091] Furthermore, the second heating portion 1306 is coupled to the second electrode 1202 of the pair of electrodes 120. The second heating portion 1306 at least covers a third portion of the atomizing surface 102, further heating the atomizing matrix to achieve complete atomization.

[0092] Furthermore, the second heating portion 1306 includes a plurality of third through holes 1307, which are aligned with the through holes 1101 in the third portion region. In this way, the first heating film 1301 on the suction surface 101 preheats the atomizing substrate, bringing it to a suitable temperature before it enters the atomizing surface 102. The second heating film 1302 on the atomizing surface 102, through a partitioned arrangement (i.e., the first heating portion 1305 and the second heating portion 1306), heats and atomizes the substrate in stages in different regions, ensuring uniform and efficient atomization.

[0093] In this way, the first heating part 1305 and the second heating part 1306 of the second heating film 1302 are coupled to different electrodes, so that the power and temperature of each heating area can be controlled independently, thereby adapting to different atomization requirements.

[0094] In some embodiments, the first conductor 1401 of the pair of conductors 140 passes through a corresponding through-hole 1101 and connects between the first heating film 1301 and the first heating portion 1305 of the second heating film 1302. Further, one end of the first conductor 1401 is coupled to the first heating film 1301 on the suction surface 101, and the other end is coupled to the first heating portion 1305 of the second heating film 1302 on the atomizing surface 102. The first conductor 1401 establishes a conductive path between the first heating film 1301 and the first heating portion 1305.

[0095] Furthermore, the second conductor 1402 of the pair of conductors 140 passes through the corresponding through hole 1101 and connects between the second heating portion 1306 of the first heating film 1301 and the second heating film 1302. Further, one end of the second conductor 1402 is coupled to the first heating film 1301 on the suction surface 101, and the other end is coupled to the second heating portion 1306 of the second heating film 1302 on the atomizing surface 102. The second conductor 1402 establishes a conductive path between the first heating film 1301 and the second heating portion 1306, enabling current to drive the second heating portion 1306 and fulfill the heating requirements of different areas of the atomizing surface 102.

[0096] In this way, the first conductor 1401 and the second conductor 1402 are respectively connected to different heating areas, thereby realizing the distribution and heating of current between the inhalation surface 101 and the atomizing surface 102. This allows the heating power and temperature of each heating area to be independently controlled, adapting to various atomization needs. Furthermore, by changing the positions of the first conductor 1401 and the second conductor 1402, the heating power distribution in different areas can be achieved, thus meeting the needs of various atomization devices.

[0097] In some embodiments, the first conductor 1401 of a pair of conductors 140 passes through the through-hole 1101 and is connected between the first heating film 1301 and the first heating portion 1305, with the connection position located on the side away from the first electrode 1201; while the second conductor 1402 of the pair of conductors 140 passes through another through-hole 1101 and is connected between the first heating film 1301 and the second heating portion 1306, with the connection position located on the side away from the second electrode 1202. This arrangement ensures effective electrical connection between the first heating film 1301 and the first heating portion 1305, and between the first heating film 1301 and the second heating portion 1306, ensuring that current can be conducted to each heating area, thereby driving these heating films to heat up.

[0098] Various implementations of this disclosure have been described above. These descriptions are exemplary and not exhaustive, nor are they limited to the disclosed implementations. Many modifications and variations will be apparent to those skilled in the art without departing from the scope and spirit of the described implementations. The terminology used herein is chosen to best explain the principles, practical applications, or improvements to technology in the market, or to enable others skilled in the art to understand the various implementations disclosed herein.

Claims

1. An atomizing core for an atomizing device, characterized by, Comprising: a substrate (110) comprising: two opposite surfaces; a plurality of through-holes (1101) formed through the two surfaces and adapted for a flow of an atomized substrate of the atomization device from one of the two surfaces to the other surface; and a pair of electrodes (120) arranged on at least one of the two surfaces; at least one heating film (130) arranged on at least one of the two surfaces and coupled between the pair of electrodes (120), wherein a roughness of at least a through-hole region of the plurality of through-holes (1101) in at least one of the two surfaces is set between 50 nm and 900 nm.

2. The atomization core according to claim 1, wherein the two surfaces comprise: an inhalation face (101) arranged adjacent to a receiving cavity for receiving an atomized substrate; and an atomization face (102) arranged on a side opposite to the inhalation face (101).

3. The atomization core according to claim 2, wherein a roughness of the through-hole region of the atomization face (102) is set between 200 nm and 800 nm.

4. The atomization core according to claim 2, wherein a roughness of the through-hole region of the inhalation face (101) and the atomization face (102) is set between 200 nm and 800 nm.

5. The atomization core according to any one of claims 1-4, wherein a thickness of the at least one heating film (130) is between 200 nm and 500 nm.

6. The atomization core according to any one of claims 2-4, wherein the at least one heating film (130) comprises a heating film (130) arranged on the atomization face (102).

7. The atomization core according to any one of claims 1-4, wherein the roughness of the through-hole region of the at least one surface is set between 50 nm and 900 nm by at least one of an etching, an etching, a sandblasting, a polishing, or a laser processing process.

8. The atomization core according to any one of claims 2-4, wherein the at least one heating film comprises one heating film arranged on the atomization face.

9. The atomization core according to any one of claims 2-4, wherein the at least one heating film comprises a pair of heating films arranged on the inhalation face and the atomization face, respectively, and wherein the atomization core further comprises: a conducting body (140) arranged in at least one of the plurality of through-holes and adapted for conducting an electrical connection between the pair of electrodes and the at least one heating film.

10. The atomization core according to claim 9, wherein the pair of electrodes are arranged on the inhalation face (101) and the atomization face (102), respectively; and ​ a first heating film (1301) of the pair of heating films is coupled to a first electrode (1201) of the pair of electrodes, and covers at least a first partial area of the inhalation face, the first heating film (1301) comprises a plurality of first through holes which are aligned with the through holes in the first partial area, and a second heating film (1302) of the pair of heating films is coupled to a second electrode (1202) of the pair of electrodes, and covers at least a second partial area of the atomization face, the second heating film (1302) comprises a plurality of second through holes which are aligned with the through holes in the second partial area.

11. The atomization core according to claim 9, wherein the pair of electrodes are arranged on the inhalation face and the atomization face, respectively; and a first heating film (1301) of the pair of heating films (130) is coupled between a first electrode (1201) and a second electrode (1202) of the pair of electrodes (120), and covers at least a first partial area of the inhalation face (101), the first heating film (1301) comprises a plurality of first through holes (1303) which are aligned with the through holes (1101) in the first partial area, and a second heating film (1302) of the pair of heating films (130) is coupled between a first electrode (1201) and a second electrode (1202) of the pair of electrodes (120), and covers at least a second partial area of the atomization face (102), the second heating film (1302) comprises a plurality of second through holes (1304) which are aligned with the through holes (1101) in the second partial area.

12. The atomization core according to claim 9, wherein the pair of electrodes are arranged on the inhalation face (101) or the atomization face (102), respectively; and a first heating film (1301) of the pair of heating films (130) covers at least a first partial area of the inhalation face (101), the first heating film (1301) comprises a plurality of first through holes (1303) which are aligned with the through holes (1101) in the first partial area, and a second heating film (1302) of the pair of heating films (130) comprises: a first heating portion (1305) which is coupled to a first electrode (1201) of the pair of electrodes (120), and covers at least a second partial area of the atomization face (102), the first heating portion (1305) comprises a plurality of second through holes (1304) which are aligned with the through holes (1101) in the second partial area; and a second heating portion (1306) which is coupled to a second electrode (1202) of the pair of electrodes (120), and covers at least a third partial area of the atomization face (102), the second heating portion (1306) comprises a plurality of third through holes (1307) which are aligned with the through holes (1101) in the third partial area. A second heating portion (1306) coupled to a second electrode (1202) of the pair of electrodes (120), and the second heating portion (1306) covers at least a third partial area of the atomization face (102), and the second heating portion (1306) comprises a plurality of third via holes (1307) aligned with the through holes (1101) in the third partial area.

13. An atomising device characterised in that Comprising: a power supply; a circuit unit; and The atomization core according to any one of claims 1-12, a pair of electrodes of the atomization core coupled to the power supply and the circuit unit, adapted to power the atomization core, regulate the temperature of the atomization core via the circuit unit, and atomize the atomization substrate.

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