Mask cleaning equipment capable of preventing sputtering

Abstract

The utility model belongs to the field of mask plate cleaning, and particularly relates to mask plate cleaning equipment capable of preventing sputtering, which comprises a cleaning cavity; the support plate table is used for horizontally bearing the mask plate; the rotating motor is arranged in the cleaning cavity and used for driving the carrier plate table to rotate around a vertical axis; the anti-sputtering cover is made of a polytetrafluoroethylene material, is cylindrical and is vertically arranged, the anti-sputtering cover is provided with a plurality of through holes which penetrate through the inside and the outside and are arranged in an array mode, and the friction coefficient of the inner cylinder wall surface and the outer cylinder wall surface of the anti-sputtering cover is 0.04-0.1; wherein the carrier plate table is arranged in the anti-sputtering cover, and the carrier plate table and the inner wall surface of the anti-sputtering cover are arranged at an interval. According to the utility model, the problem that liquid splashes to the wall surface of the cavity, accumulates and then rebounds to pollute the mask is solved.

Description

Technical Field

[0001] This utility model belongs to the field of mask cleaning, and in particular relates to a mask cleaning device that can prevent splashing. Background Technology

[0002] In the semiconductor manufacturing field, mask cleaning equipment is a key piece of equipment to ensure the precision of photolithography processes. During the cleaning process, the mask is first placed in the cleaning chamber, and a columnar cleaning solution is sprayed from above the mask, followed by the spraying of deionized water. Then, the mask is driven to rotate at a certain speed. Centrifugal force will cause the liquid on the mask surface to be flung away and splash onto the chamber wall. Since the liquid has poor fluidity on the chamber wall, it is very easy for the liquid to adhere to and accumulate on the chamber wall. As liquid accumulates on the chamber wall, the liquid that splashes onto the chamber wall later will impact the liquid that was originally accumulated on the chamber wall. Some of the liquid will bounce back onto the mask surface under the impact, contaminating the mask surface and thus affecting the cleaning quality.

[0003] In addition, residual droplets formed by liquid splashing onto the cavity walls require additional cleaning steps, which not only prolongs the cleaning time per cycle but also increases equipment operating costs due to frequent cavity maintenance. Utility Model Content

[0004] The purpose of this invention is to address the shortcomings of existing technologies by providing a mask cleaning device that can prevent splashing, thereby solving the problems of secondary pollution and high maintenance costs in the deionized water cleaning process of existing mask cleaning devices.

[0005] To address the aforementioned problems, this utility model provides a mask cleaning device capable of preventing splashing, comprising:

[0006] Cleaning chamber;

[0007] A carrier platform is used to horizontally support the mask.

[0008] A rotary motor is located inside the cleaning chamber and is used to drive the carrier plate to rotate around a vertical axis;

[0009] The splash shield is made of polytetrafluoroethylene and is cylindrical and vertically installed. The splash shield has multiple through holes arranged in an array, and the friction coefficient of the inner and outer cylindrical walls of the splash shield is 0.04-0.1.

[0010] The carrier plate platform is disposed inside the splash shield and is spaced apart from the inner wall of the splash shield.

[0011] Optionally, the cleaning chamber is provided with a splash-proof section at a location corresponding to the carrier plate, and the diameter of the splash-proof section gradually increases from top to bottom.

[0012] Optionally, a vertical motor is further included for driving the rotary motor to move up and down.

[0013] Optionally, a support structure is arranged inside the sputtering-proof cover to enhance the structural strength.

[0014] Optionally, the support structure is in a mesh shape.

[0015] Optionally, a cleaning tank is further included.

[0016] The cleaning cavity is formed in the cleaning tank.

[0017] The cleaning tank is formed with a tank neck which is in abutment with the cleaning cavity.

[0018] The upper end of the sputtering-proof cover is connected to the tank neck.

[0019] Optionally, the sputtering-proof cover is detachably connected to the tank neck.

[0020] Optionally, a plurality of water spraying openings are formed in the inner wall of the tank neck and are arranged to be downwardly inclined, and the water spraying openings are used for spraying deionized water to the mask plate.

[0021] Optionally, an opening is formed in the inner wall of the tank neck for the spray arm to penetrate, and the spray arm is used for spraying cleaning liquid to the mask plate.

[0022] Based on the structure of the utility model, in the specific use process, first, the mask plate to be cleaned is horizontally placed on the carrier plate table which is located inside the sputtering-proof cover and maintains an annular interval space with the inner wall of the sputtering-proof cover, second, after the rotary motor is started, the carrier plate table is uniformly rotated around the vertical axis, the mask plate is synchronously rotated with the carrier plate table to generate a centrifugal field, at the same time, the external cleaning system sprays columnar cleaning liquid and deionized water into the cover through the through hole, the cleaning liquid and deionized water vertically or obliquely impact the surface of the mask plate, dissolve and peel off the surface contaminants, third, with the high-speed rotation of the mask plate, the surface liquid is thrown out along the radial direction under the action of the centrifugal force and is thrown to the inner wall of the sputtering-proof cover, wherein, since the sputtering-proof cover is made of polytetrafluoroethylene material, its extremely low friction coefficient of 0.04-0.1 makes the liquid splashed to the inner wall of the sputtering-proof cover difficult to adhere and quickly slide down to the bottom of the cleaning cavity along the smooth inner wall, the liquid cannot be accumulated on the wall surface, avoiding the problem that in the background art, the liquid splashed to the wall surface of the cavity is accumulated and rebounds to contaminate the mask plate, at the same time, for the liquid passing through the through hole, there is no rebounding situation, further reducing the sputtering risk, reducing the cleaning and maintenance frequency of the wall surface of the cavity, improving the cleaning quality and equipment operation efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0023] In order to make the technical scheme in the embodiments of the present utility model more clearly understood, the drawings needed in the embodiments will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present utility model, and other drawings can also be obtained according to these drawings without creative labor for those skilled in the art.

[0024] Figure 1 is the sectional view of the mask cleaning equipment capable of preventing sputtering provided by the embodiments of the present utility model, wherein the through hole of the sputtering prevention cover is not shown;

[0025] Figure 2 is the cut-open and flat structure schematic diagram of the sputtering prevention cover provided by the embodiments of the present utility model.

[0026] Explanation of reference numerals:

[0027] 100 cleaning cavity; 101 sputtering prevention cavity section;

[0028] 200 carrier plate table;

[0029] 310 rotating motor; 320 vertical motor

[0030] 400 sputtering prevention cover; 401 through hole;

[0031] 500 cleaning barrel; 510 barrel neck; 5101 gap;

[0032] 610 water spraying port; 620 jet arm. DETAILED DESCRIPTION

[0033] In order to make the technical scheme in the embodiments of the present utility model more clearly understood, the drawings needed in the embodiments will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present utility model, and other drawings can also be obtained according to these drawings without creative labor for those skilled in the art.

[0034] The embodiments of the present utility model provide a mask cleaning equipment capable of preventing sputtering.

[0035] Please refer to Figure 1 and Figure 2 The mask cleaning equipment capable of preventing sputtering comprises a cleaning cavity 100, a carrier plate table 200, a rotating motor 310 and a sputtering prevention cover 400.

[0036] The cleaning cavity 100 is an operation space for cleaning the mask. The carrier plate table 200 is used for horizontally bearing the mask. It needs to be explained here that in the specific embodiments, the carrier plate table 200 is provided with a limiting structure for limiting the movement of the mask, so as to avoid the movement during the rotation.

[0037] The rotary motor 310 is arranged in the cleaning cavity 100 and is used to drive the carrier plate table 200 to rotate around a vertical axis.

[0038] The splash-proof cover 400 is made of polytetrafluoroethylene (PTFE) material and is in a cylindrical shape and vertically arranged.

[0039] The carrier plate table 200 is arranged in the splash-proof cover 400 and is arranged in a spaced manner with the inner wall of the splash-proof cover 400.

[0040] Based on the structure of the utility model, in the specific use process, first, the mask to be cleaned is horizontally placed on the carrier plate table 200, the carrier plate table 200 is located in the splash-proof cover 400, and an annular spacing space is kept with the inner wall of the splash-proof cover 400, secondly, after the rotary motor 310 is started, the carrier plate table 200 is uniformly rotated around the vertical axis, the mask is synchronously rotated with the carrier plate table 200 to generate a centrifugal field, at the same time, the external cleaning system sprays columnar cleaning liquid and deionized water into the cover through the through holes 401, the cleaning liquid and the deionized water vertically or obliquely impact the surface of the mask, dissolve and peel off the surface contaminants, thirdly, with the high-speed rotation of the mask, the surface liquid (including cleaning waste liquid and peeled contaminants) is thrown out along the radial direction under the action of the centrifugal force and is thrown to the inner wall of the splash-proof cover 400, wherein, since the splash-proof cover 400 is made of polytetrafluoroethylene material, the extremely low friction coefficient of 0.04-0.1 makes the liquid splashed to the inner wall of the splash-proof cover 400 difficult to adhere and quickly slide down to the bottom of the cleaning cavity 100 along the smooth inner wall, the liquid cannot be accumulated on the wall, the problem that the liquid splashed to the wall of the cavity is accumulated and rebounded to contaminate the mask in the background art is avoided, at the same time, for the liquid passing through the through holes 401, there is no rebounding condition, the splash risk is further reduced, the cleaning and maintenance frequency of the wall of the cavity is reduced, and the cleaning quality and the equipment operation efficiency are improved.

[0041] It should be noted that the size of the splash-proof cover 400 and the through holes 401 is set according to the need, the distance between the carrier plate table 200 and the splash-proof cover 400 is usually between 10cm-20cm, of course, it is not limited to this, but is also set according to the need.

[0042] In the embodiment of the utility model, the cleaning cavity 100 is provided with the splash-proof cavity section 101 at the corresponding position of the carrier plate table 200, and the cavity diameter of the splash-proof cavity section 101 is gradually expanded from top to bottom. Based on this structure design, when the splash-proof cover 400 is detached, splash-proof can be realized through the splash-proof cavity section 101. Specifically, when the liquid splashed by the mask plate rotation reaches the splash-proof cavity section 101, the gradually expanded cavity diameter makes the cross-sectional area of the cavity gradually increase, the angle and speed of the liquid impacting the cavity wall change, and the reflection force component generated along the gradually expanded wall surface is more converted into the downward flow trend, instead of vertical rebound. Compared with the traditional straight cylinder cavity, the gradually expanded structure guides the splashing liquid to slide along the cavity wall to the liquid accumulation area by using the wall inclination angle, thereby reducing the liquid retention and secondary splash on the cavity wall.

[0043] In the embodiment of the utility model, the mask plate cleaning equipment capable of preventing splash also includes a vertical motor 320, which is used to drive the rotating motor 310 to move up and down. When different areas or different precision cleaning of the mask plate is required, the vertical motor 320 drives the carrier plate table 200 to adjust the position along the vertical axis up and down, so that the distance between the mask plate and the upper jet arm 620 or the water jet opening 610 dynamically changes. For example, in the pre-cleaning stage, the carrier plate table 200 can be raised to the position close to the jet arm 620, so that the high-concentration cleaning liquid uniformly covers the mask plate at a closer jet distance; in the rinsing stage, the carrier plate table 200 is lowered to the position away from the water jet opening 610, and the liquid is flushed by using the gravity and centrifugal force of the deionized water, thereby reducing the kinetic energy of the splashing liquid. This height adjustment function cooperates with the rotating motion, so that the cleaning parameters can be adjusted according to the stain characteristics of different areas such as the edge and center of the mask plate, thereby avoiding the problem of excessive liquid splashing at the edge caused by cleaning at a fixed position. At the same time, the relative position between the splash-proof cover 400 and the jet area is adjustable by vertical movement, so that the movement path of the splashing liquid in the cover is more controllable by adjusting the height in real time during the jet process, thereby further enhancing the splash-proof effect, and the cleaning requirements of mask plates of different sizes can be met, the versatility of the equipment and the flexibility of the cleaning process are improved, the possibility of liquid splashing to the cavity wall is reduced from the motion control level, and the subsequent cleaning difficulty is reduced.

[0044] In the embodiment of the utility model, the splash-proof cover 400 is internally provided with a support structure for enhancing the structural strength. Although the polytetrafluoroethylene material has excellent corrosion resistance and low friction characteristics, the pure cylindrical structure may be deformed under the centrifugal force generated by long-term high-speed rotation and the impact of liquid, thereby affecting the splash-proof performance.

[0045] Further, the support structure is in a mesh shape. The mesh-shaped support structure is distributed in the interior of the splash-proof cover 400 in the form of a grid interlaced with warp and weft, forms a uniform mechanical support, disperses the external impact force to the entire cover, and avoids deformation or damage caused by local stress concentration.

[0046] For example, Figure 1As shown in the utility model embodiment, the sputtering-preventing mask cleaning device further comprises a cleaning barrel 500;

[0047] The cleaning cavity 100 is formed in the cleaning barrel 500

[0048] The cleaning barrel 500 is formed with a barrel neck 510 which is in butt joint with the cleaning cavity 100.

[0049] The upper end of the sputtering-preventing cover 400 is connected to the barrel neck 510.

[0050] The cleaning barrel 500 serves as the carrier of the cleaning cavity 100, and can be replaced and adapted according to different sizes of masks, thereby improving the versatility of the device.

[0051] Further, the sputtering-preventing cover 400 and the barrel neck 510 are detachably connected, facilitating disassembly, maintenance and replacement.

[0052] As Figure 1 shown in the utility model embodiment, a plurality of downwardly inclined water spray openings 610 are circumferentially formed in the inner wall of the barrel neck 510, and the water spray openings 610 are used for spraying deionized water to the mask. The water spray openings 610 directly exist as the functional structure of the inner wall of the barrel neck 510, and do not need to be additionally installed with a spray head assembly, thereby eliminating the connection gap between the traditional spray head and the cavity wall surface, avoiding the liquid leakage and splashing risk caused by the loosening or sealing failure of the spray head, and simultaneously simplifying the device assembly process and reducing the maintenance cost of the parts.

[0053] In the utility model embodiment, the inner wall of the barrel neck 510 is formed with an aperture 5101 for deepening the spray arm 620, wherein the spray arm 620 is used for spraying the cleaning liquid to the mask. The aperture 5101 directly penetrates the side wall of the barrel neck 510 and is aligned with the mask area inside the sputtering-preventing cover 400, so that the spray arm 620 can be deepened into the core cleaning space without penetrating the entire wall of the cleaning barrel 500, thereby avoiding the complex sealing connection between the spray pipe and the cavity wall surface in the traditional design. In addition, the spray arm 620 is an independent assembly, and its pipeline and driving mechanism are not rigidly connected with the cleaning barrel 500, but are only in butt joint with the space through the aperture 5101, so that the spray arm 620 can be calibrated, replaced or pipeline cleaned alone without emptying the cleaning barrel 500 or interrupting the operation of other systems during disassembly.

[0054] The above is only a preferred embodiment of the utility model, and is not used to limit the utility model, and any modification, equivalent replacement or improvement made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.

Claims

1. A sputter-preventable reticle cleaning apparatus, characterized by, The utility model relates to a mask cleaning device, comprising: a cleaning cavity; a carrier plate table for horizontally supporting a mask; a rotating motor arranged in the cleaning cavity and used to drive the carrier plate table to rotate around a vertical axis; a sputtering-proof cover made of polytetrafluoroethylene material and vertically arranged in a cylindrical shape, the sputtering-proof cover is provided with a plurality of through holes arranged in an array and penetrating the inner and outer walls, and the friction coefficient of the inner and outer wall surfaces of the sputtering-proof cover is 0.04-0.1; wherein the carrier plate table is arranged in the sputtering-proof cover and is spaced apart from the inner wall of the sputtering-proof cover.

2. The sputter-preventable reticle cleaning apparatus of claim 1, wherein, The cleaning cavity is provided with a sputtering-proof cavity section corresponding to the carrier plate table, and the cavity diameter of the sputtering-proof cavity section is gradually expanded from top to bottom.

3. The sputter-preventable reticle cleaning apparatus of claim 1, wherein, Further comprising a vertical motor used to drive the rotating motor to move up and down.

4. The sputter-preventable reticle cleaning apparatus of claim 1, wherein, The sputtering-proof cover is internally provided with a support structure for enhancing the structural strength.

5. The sputter-preventable reticle cleaning apparatus of claim 4, wherein, The support structure is in a mesh shape.

6. The sputter-preventable reticle cleaning apparatus of claim 1, wherein, Further comprising a cleaning barrel; The cleaning cavity is formed in the cleaning barrel; The cleaning barrel is formed with a barrel neck for abutting against the cleaning cavity; The upper end of the sputtering-proof cover is connected to the barrel neck.

7. The sputter-resistant reticle cleaning apparatus of claim 6, wherein, The sputtering-proof cover and the barrel neck are detachably connected.

8. The sputter-preventable reticle cleaning apparatus of claim 6, wherein, The inner wall of the barrel neck is circumferentially provided with a plurality of water spray openings obliquely arranged downward, and the water spray openings are used to spray deionized water to the mask.

9. The sputter-preventable reticle cleaning apparatus of claim 6, wherein, The inner wall of the barrel neck is provided with an opening for the spray arm to penetrate, wherein the spray arm is used to spray cleaning liquid to the mask.

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