Reaction system and transportation system of chemical vapor deposition equipment

Abstract

The utility model relates to the field of vapor deposition, in particular to a chemical vapor deposition equipment reaction system and transportation system, and the transportation system comprises a reaction container, a first transportation line, a second transportation line and a reversing device. The reaction container is used for providing a reaction space for a chemical vapor deposition reaction. The first conveying line is perpendicular to the second conveying line, and the reaction container moves along the first conveying line or the second conveying line under the action of external driving force. The reversing device is connected with the first conveying line and the second conveying line and comprises a rotating table. The reaction container can be moved to the rotating table from the first conveying line, and is moved to the second conveying line after the direction of the reaction container is changed by the rotating table. Transportation of the reaction container is achieved through the first transportation line and the second transportation line, and the reaction container can be positioned through the reversing device, so that an external gas supply assembly can be smoothly in butt joint with the reaction container to achieve gas supply.

Description

Technical Field

[0001] This patent relates to the field of chemical vapor deposition, and in particular to a chemical vapor deposition equipment reaction system and transport system. Background Technology

[0002] Silicon carbide is a representative ceramic material that has been widely used in various industrial fields due to its excellent physical, chemical and electrical properties.

[0003] In recent years, with the active progress in the development of semiconductor processing components using silicon carbide materials, the importance of silicon carbide materials has been increasing. In particular, silicon carbide materials are widely used as components for etching processes in semiconductor processing due to their high plasma resistance.

[0004] Silicon carbide used in semiconductor etching processes is manufactured using traditional methods. However, because this method cannot meet the required quality and performance standards, chemical vapor deposition (CVD) is now employed.

[0005] Chemical vapor deposition (CVD) of silicon carbide uses a mixture of Si-containing gases such as SiH4, SiCl2, and SiCl4, and C-containing gases such as C2H2, CH4, and C3H8, or CH3SiCl3, CH3SiH3, (CH3)3SiH, etc., as the feed gas. Some deposition methods using single-wafer raw materials suffer from low productivity due to the fact that the process is carried out in a batch furnace.

[0006] To improve reaction efficiency, the intermittent heating furnace needs to be replaced with a continuous one, but how to transport the reaction vessel within the continuous reaction system has become a major challenge. Utility Model Content

[0007] In order to solve or at least partially solve the above-mentioned technical problems, this patent provides a chemical vapor deposition equipment reaction system and usage method, as well as a transportation system.

[0008] This patent provides a transport system comprising: a reaction vessel, a first transport line, a second transport line, and a reversing device. The reaction vessel provides the reaction space for a chemical vapor deposition reaction. The first and second transport lines are arranged perpendicularly to each other, and the reaction vessel moves along either the first or second transport line under the action of an external driving force. The reversing device is connected to both the first and second transport lines and includes a rotating platform. A limiting member is disposed on the rotating platform to restrict the movement of the reaction vessel. The reaction vessel can move from the first transport line to the rotating platform, change its orientation on the rotating platform, and then move to the second transport line.

[0009] Preferably, both the first and second transport lines include a transport track. The reaction vessel is placed on the transport track and moves along the transport track under the action of an external driving force.

[0010] Preferably, the reversing device further includes a reversing track. The reversing track is disposed on the rotary table and rotates with the rotary table; the reversing track is used to guide the reaction vessel moving to the reversing device. The reversing track rotates and adjusts its orientation under the action of the rotating body, and the reversing track is respectively connected to the transport track on the first transport line or the second transport line.

[0011] Preferably, the reversing device further includes a positioning part. The positioning part is disposed on the reversing track, and a positioning groove is provided on the side of the positioning part facing the reversing track and the transport track. After the reaction vessel moves to the reversing device, it moves along the reversing track and gets into the positioning groove.

[0012] Preferably, the rotary table is circular, and the ends of the reversing track are arc-shaped, with the arcs concentric with the rotary table, and the ends of the transport track matching the ends of the reversing track.

[0013] Preferably, the reversing device further includes a hydraulic drive mechanism, which is rotatably connected to the rotary table to drive the rotation of the rotary table.

[0014] Preferably, a positioning element is provided at the bottom of the rotary table; the reversing device also includes a base. Both the hydraulic drive mechanism and the rotary table are mounted on the base, which also has two limiting bosses. The line connecting the two limiting bosses and the center of the base is perpendicular to each other. The limiting bosses will abut against the positioning element after the rotary table has rotated 90°, thereby limiting the rotation of the rotary table.

[0015] Preferably, the transport system further includes two traction mechanisms. The two traction mechanisms are respectively disposed on the first transport line and the second transport line. Each traction mechanism includes a telescopic push-pull rod and a pushing part. The telescopic push-pull rod is extendable along the length of the first and second transport lines, and the pushing part is connected to the end of the telescopic push-pull rod and can be engaged with a mating part disposed on the outer surface of the reaction vessel. The telescopic push-pull rod extends and retracts to push or pull the reaction vessel along the first or second transport line.

[0016] Preferably, the pulling mechanism further includes: a base and a rotary motor base disposed on the first transport line and the second transport line, the rotary motor being connected to the base, and the end of the telescopic push-pull rod away from the pushing part being connected to the rotary motor.

[0017] An embodiment of this application also discloses a chemical vapor deposition (CVD) equipment reaction system, which includes the aforementioned transport system. The reaction system further includes a reaction chamber. The reaction chamber is located at the connection between the first transport line and the second transport line, and a rotary table is located within the reaction chamber.

[0018] Compared to existing technologies, the first and second transport lines of this application can be used to transport the reaction vessel, allowing it to complete the vapor deposition process via different stations. Furthermore, the first and second transport lines are arranged perpendicularly to each other, with the gas injection station for the reaction vessel located at their intersection. This ensures precise positioning of the reaction vessel at the intersection, preventing it from missing its target position when the first and second transport lines are aligned. A reversing device is located at the intersection of the first and second transport lines, changing the orientation of the reaction vessel that was originally moving along the first transport line, allowing it to move along the second transport line to complete the reaction process. Attached Figure Description

[0019] To more clearly illustrate the embodiments of this patent, the relevant drawings will be briefly described below. It should be understood that the drawings described below are only for illustrating some embodiments of this patent, and those skilled in the art can obtain many other technical features and connections not mentioned herein based on these drawings.

[0020] Figure 1 This is a three-dimensional schematic diagram of a transportation system according to an embodiment of this patent;

[0021] Figure 2 This is a three-dimensional schematic diagram of a transportation system according to an embodiment of this patent;

[0022] Figure 3 This is a three-dimensional schematic diagram of a chemical vapor deposition equipment reaction system according to an embodiment of this patent;

[0023] Figure 4 This is a three-dimensional schematic diagram of a chemical vapor deposition equipment reaction system according to an embodiment of this patent;

[0024] Figure 5 This is a three-dimensional schematic diagram of a transportation system according to an embodiment of this patent;

[0025] Figure 6 This is a three-dimensional schematic diagram of a typical chemical vapor deposition (CVD) equipment reaction system.

[0026] Explanation of reference numerals in the attached figures:

[0027] 1. First transport line; 11. Transport track; 2. Second transport line; 3. Reversing device; 31. Rotary table; 32. Hydraulic drive mechanism; 33. Base; 34. Reversing track; 35. Positioning part; 4. Reaction chamber; 5. Pulling mechanism; 51. Telescopic push-pull rod; 52. Pushing part; 6. Reaction container. Detailed Implementation

[0028] The patent will now be described in detail with reference to the accompanying drawings.

[0029] refer to Figure 6 The image shows the reaction system of a chemical vapor deposition (CVD) system. The system has three stations where the reaction vessel undergoes pretreatment, gas supply, and heating, respectively. As the reaction vessel passes through the three stations sequentially, the CVD process is completed. Simultaneously, through… Figure 6 It is easy to see that gates are installed between the three stations to isolate them from each other and prevent mutual interference during the reaction. Therefore, in order for the reaction vessel to successfully complete chemical vapor deposition, it is necessary for the reaction vessel to pass through the three stations sequentially to complete the chemical vapor deposition process.

[0030] Furthermore, we can see that a docking pipe is installed on the side wall of the reaction vessel. When the reaction vessel is in the second station, this docking pipe is used to connect to the gas supply equipment. This docking process is crucial because it determines whether the reaction vessel can be successfully connected to the gas supply equipment. In short, the orientation of the reaction vessel needs to facilitate docking with the gas supply equipment. To ensure a smooth docking between the gas supply line and the reaction vessel, the side wall of the reaction vessel should be perpendicular to the gas supply line of the gas supply equipment. This allows the gas to enter the reaction vessel smoothly and efficiently, meeting the gaseous conditions required for the reaction.

[0031] In view of this, the present invention provides a transportation system to solve the above problems.

[0032] First Implementation Method

[0033] refer to Figure 3 , Figure 4 The present patent provides a transport system comprising: a reaction vessel, a first transport line, a second transport line, and a reversing device. The reaction vessel provides the reaction space for a chemical vapor deposition reaction. The first and second transport lines are arranged perpendicularly to each other, and the reaction vessel moves along either the first or second transport line under the action of an external driving force. The reversing device is connected to both the first and second transport lines and includes a rotating platform. A limiting member is disposed on the rotating platform to restrict the movement of the reaction vessel. The reaction vessel can move from the first transport line to the rotating platform, change its orientation via the rotating platform, and then move to the second transport line.

[0034] pass Figure 1It can be seen that a reaction chamber is set on both the first and second transport lines, and a connecting pipe is installed in the reaction chamber at the junction of the first and second transport lines. Specifically, during the system reaction process, the reaction vessel will first move along the first transport line under the action of external force. After the reaction vessel completes the reaction in the reaction chamber, it will gradually move to the reaction chamber located at the junction of the first and second transport lines under the action of external force. Since the reaction vessel needs to connect with the external pipeline during the reaction in this reaction chamber, the positioning of the reaction vessel is particularly important after it reaches the reaction position. The reaction vessel needs to stop accurately at the target position to avoid deviations during stopping that could cause the reaction vessel to fail to connect with the external pipeline.

[0035] In this application, the reaction position is located at the intersection of the first and second transport lines. This means that after the reaction vessel moves from the first transport line to the reversing device, the first and second transport lines are not interconnected, and therefore the reaction vessel will not move directly from the first transport line to the second transport line. When the reaction vessel moves to the rotary table of the reversing device, the limiting component on the rotary table will prevent further movement of the reaction vessel, thereby ensuring that the reaction vessel stops at the accurate docking position and avoiding any deviation in the position of the reaction vessel. Furthermore, the rotary table can stably support the reaction vessel, preventing it from tipping over and ensuring the stability of the reaction vessel when docking with external pipelines, thus guaranteeing docking accuracy.

[0036] After the reaction vessels complete docking and reaction within the reaction chamber, the rotary table will rotate the reaction vessels, aligning their movement with the second transport line. At this point, under external force, the reaction vessels can be moved to the second transport line by the reversing device. Furthermore, because the reaction vessels have changed direction, the limiting components will be located behind the direction of movement, thus not affecting the movement of the reaction vessels and allowing them to continue completing the remaining reaction processes.

[0037] In addition, refer to Figure 1 , Figure 2 , Figure 3 , Figure 4 Both the first and second transport lines shown include a transport track. The reaction vessel is placed on the transport track and moves along the transport track under the action of an external driving force.

[0038] Since the reaction vessel needs to move along the first and second transport lines respectively, passing through different reaction chambers, it is essential to ensure the accuracy of the reaction vessel's direction during movement to guarantee its smooth passage through each chamber. The reaction vessel is driven by external forces along the first and second transport lines. If the external forces acting on the reaction vessel are uneven or the point of application of the forces is off, the direction of movement of the reaction vessel may change slightly. Therefore, the design of the transport tracks guides the movement of the reaction vessel, ensuring its correct direction of movement and guaranteeing that the reaction vessel arrives at its predetermined position accurately without deviation. Simultaneously, if... Figure 3 and Figure 4 As shown, rollers are continuously installed on the transport track, which helps to reduce the friction experienced by the reaction vessel as it moves along the track, improves transport efficiency, and saves energy consumption.

[0039] To further optimize the transport process of reaction vessels, high-precision guiding systems can be used in the transport tracks, reducing maintenance costs. The choice of roller material is crucial for minimizing friction; materials with low coefficients of friction, such as PTFE-coated rollers or ceramic rollers, are typically used. These materials not only reduce friction but also withstand high temperatures and chemical corrosion.

[0040] Furthermore, refer to Figure 3 and Figure 4 The reversing device also includes a reversing track. The reversing track is mounted on the rotating platform and rotates with the platform; the reversing track guides the reaction vessel moving to the reversing device. Under the action of the rotating body, the reversing track rotates to adjust its orientation, and it connects with the transport tracks on the first or second transport line, respectively.

[0041] After the reaction vessel moves to the reversing device, it needs to connect with external pipelines at the reversing device to complete the reaction. Specifically, during the reaction process, the reaction vessel first needs to move along the first transport line to the reversing device, and after the reaction is completed, it is moved from the reversing device to the second transport line. Therefore, the reaction vessel needs to transition between the reversing device and the first and second transport lines during its movement. During the transition movement, the orientation of the reaction vessel is very likely to change due to external forces, especially when the force is uneven or the transition is not smooth. Such bumps may cause the attitude of the reaction vessel at the reversing device to change.

[0042] The reversing track guides the reaction vessel after it moves onto the reversing device, ensuring its correct orientation. Furthermore, since the reversing track can connect with the transport track, both tracks guide the reaction vessel throughout the transition, whether it moves from the first transport line to the reversing device or from the reversing device to the second transport line, thus ensuring accurate orientation throughout the process.

[0043] Second Implementation Method

[0044] In the first embodiment, by staggering the first and second transport lines and ensuring they are not connected, the problem of inaccurate positioning of the reaction vessel during the reaction process is solved. However, during transport, the reaction vessel requires external force to move; this external force may cause the reaction vessel to sway, affecting its connection with external pipelines.

[0045] In view of this, the improvement of the second embodiment of this application compared with the first embodiment is that, referring to Figure 3 , Figure 4 The reversing device also includes a positioning part. The positioning part is set on the reversing track, and a positioning groove is provided on the side of the positioning part facing the reversing track and the transport track. After the reaction vessel moves to the reversing device, it moves along the reversing track and gets into the positioning groove.

[0046] After the reaction vessel moves from the first transport line to the reversing device, it needs to be precisely positioned to connect with the external pipeline and initiate the reaction. The positioning unit restricts the reaction vessel from moving further in its original direction of motion. When the reaction vessel is engaged in the positioning slot, the slot acts on the vessel and corrects its orientation. The sides of the positioning slot restrict the lateral sway of the reaction vessel and act on both sides, adjusting the vessel to a position for precise connection with the external pipeline. Furthermore, since the reaction vessel's orientation on the first transport line is opposite to its orientation on the second transport line, the positioning unit does not interfere with the subsequent movement of the reaction vessel.

[0047] In addition, the rotary table is circular, and the ends of the reversing track are arc-shaped, with the arcs concentric with the rotary table, and the ends of the transport track matching the ends of the reversing track.

[0048] The circular rotary table ensures that no gaps form between the rotary table and the first and second transport lines during rotation. Furthermore, its location at the bottom of the reaction chamber helps improve the chamber's sealing. Simultaneously, the circular rotary table requires a smaller maximum rotation radius, thus reducing the overall size of the reversing device. Additionally, the reversing track fits tightly with the rotary table, preventing collisions or friction with other external equipment during rotation.

[0049] Meanwhile, the reversing device also includes a hydraulic drive mechanism, which is rotatably connected to the rotary table to drive the rotation of the rotary table.

[0050] The rotary table needs to change the orientation of the reaction vessel so that it can move along both the first and second transport lines. Since the hydraulic drive mechanism can move large objects, and the reaction vessel has a large mass, it is necessary to use a hydraulic drive mechanism to rotate the rotary table. Furthermore, because the first and second transport lines are perpendicular to each other, the rotation angle of the rotary table needs precise control. Specifically, the piston rod of the hydraulic cylinder is connected to the rotary table; when the piston rod extends or retracts, it drives the rotary table to rotate around its axis. By precisely controlling the opening and closing of the hydraulic valves, the rotation speed and direction of the rotary table can be precisely controlled, thereby achieving the reversing operation of the reaction vessel.

[0051] In addition, a positioning element is provided at the bottom of the rotary table; the reversing device also includes a base. Both the hydraulic drive mechanism and the rotary table are mounted on the base, which also has two limiting bosses. The line connecting the two limiting bosses and the center of the base is perpendicular to each other. The limiting bosses will abut against the positioning element after the rotary table has rotated 90°, thus limiting the rotation of the rotary table.

[0052] Since the angle between the first and second transport lines is 90°, the rotary table only needs to rotate 90° to meet the requirement of changing the orientation of the reaction vessel. The interaction between the limiting boss and the positioning element ensures that the rotary table's rotational freedom is only 90°. Even if there is a slight deviation in the rotation angle of the hydraulic drive mechanism, the physical limiting between the limiting boss and the positioning element ensures the precise steering of the rotary table, achieving a dual physical and digital control steering safety system.

[0053] In addition, the transport system also includes two traction mechanisms. These two traction mechanisms are respectively installed on the first transport line and the second transport line. Each traction mechanism includes a telescopic push-pull rod and a pushing part. The telescopic push-pull rod can extend along the length of the first and second transport lines, and the pushing part is connected to the end of the telescopic push-pull rod and can be engaged with a mating part located on the outer surface of the reaction vessel. The telescopic push-pull rod extends and retracts to push or pull the reaction vessel along the first or second transport line.

[0054] The traction mechanism acts on the reaction vessel to move it along either the first or second transport line. The telescopic push-pull rod can precisely control its extension and retraction length, thus achieving precise control over the movement distance of the reaction vessel. Simultaneously, the pushing part engages with the mating part on the outer surface of the reaction vessel, preventing the traction mechanism from easily separating from the reaction vessel during pushing and pulling, ensuring stability during the movement of the reaction vessel. Furthermore, the telescopic push-pull rod can push the reaction vessel during extension and pull it during retraction, adapting to the needs of pushing the reaction vessel as it moves from the first transport line to the reversing device, and pulling the reaction vessel as it moves from the reversing device to the second transport line, respectively.

[0055] Furthermore, the traction mechanism also includes: a base and a rotary motor base set on the first transport line and the second transport line, the rotary motor connected to the base, and the end of the telescopic push-pull rod away from the push part connected to the rotary motor.

[0056] By incorporating a rotary motor, the telescopic push-pull rod can rotate, thereby rotating the pushing part located at its end. Specifically, the telescopic push-pull rod drives the pushing part to engage with the docking part outside the reaction vessel. Rotating the telescopic push-pull rod to rotate the pushing part further locks it in place with the docking part, increasing the stability of the connection between the pulling mechanism and the reaction vessel and preventing separation between them during the pulling process.

[0057] Rotary motors typically employ servo motors, enabling high-precision angle control. The rotational speed of the telescopic push-pull rod is controlled by adjusting the motor's rotation speed to adapt to different operational needs. Equipped with feedback devices such as encoders or rotary transformers, the rotation angle is monitored in real time to ensure accurate positioning. The telescopic push-pull rod may feature a multi-stage telescopic design to provide a longer extension range and higher load-bearing capacity, while maintaining excellent sealing performance to prevent dust and moisture from entering the internal mechanical structure. In addition to high-strength alloy steel, stainless steel or other corrosion-resistant materials may be used to enhance durability.

[0058] The connection between the pushing part and the docking part can be achieved in various ways. Besides magnetic adsorption, mechanical locking devices such as snap-fits or pins can be used to ensure a secure connection. Pushing parts designed with automatic alignment functions can automatically adjust their position upon contact with the docking part, reducing manual intervention. A cushioning material, such as polyurethane or rubber, can be placed between the pushing part and the docking part to absorb vibration and impact.

[0059] Third Implementation Method

[0060] A third embodiment of this application also discloses a chemical vapor deposition (CVD) equipment reaction system, which includes the aforementioned transport system. The reaction system further includes a reaction chamber. The reaction chamber is located at the connection between the first transport line and the second transport line, and a rotary table is located within the reaction chamber.

[0061] By placing the reaction chamber at the connection between the first and second transport lines, the reaction vessel can be precisely positioned after being moved into the reaction chamber and connected to the external pipelines, ensuring the smooth progress of the chemical vapor deposition reaction.

[0062] Meanwhile, the rotary table is located inside the reaction chamber. After the reaction vessel completes its reaction, the rotary table can adjust the orientation of the reaction vessel inside the reaction chamber to prevent the rotation of the reaction vessel from affecting the orientation of the reaction chamber.

[0063] Finally, it should be noted that those skilled in the art will understand that many technical details have been presented in the embodiments of this patent to facilitate a better understanding of the invention. However, even without these technical details and various variations and modifications based on the above embodiments, the technical solutions claimed in the claims of this patent can be substantially achieved. Therefore, in practical applications, various changes can be made to the above embodiments in form and detail without departing from the spirit and scope of this patent.

Claims

1. A transport system, characterized in that, The transportation system comprises: a reaction container for providing a reaction space for a chemical vapor deposition reaction; a first transportation line and a second transportation line, the first transportation line and the second transportation line are arranged perpendicularly to each other, and the reaction container moves along the first transportation line or the second transportation line under the action of an external driving force; a reversing device connected to the first transportation line and the second transportation line respectively, the reversing device comprises: a rotating table, a limiting member is arranged on the rotating table to limit the movement of the reaction container, the reaction container can be moved to the rotating table from the first transportation line, changed direction on the rotating table, and then moved to the second transportation line.

2. The transport system of claim 1, wherein, The first transportation line and the second transportation line both comprise: a transportation track, the reaction container is placed on the transportation track, and the reaction container moves along the transportation track under the action of an external driving force.

3. The transport system of claim 2, wherein, The reversing device further comprises: a reversing track arranged on the rotating table and rotating with the rotating table; the reversing track is used for guiding the reaction container moving to the reversing device; The reversing track rotates and adjusts the direction under the action of the rotating table, and the reversing track is connected to the transportation track on the first transportation line or the second transportation line respectively.

4. The transport system of claim 3, wherein, The reversing device further comprises: a positioning part arranged on the reversing track, the positioning part is provided with a positioning groove on the side facing the side where the reversing track is connected to the transportation track; After the reaction container moves to the reversing device, the reaction container moves along the reversing track and is clamped into the positioning groove.

5. The transport system of claim 3, wherein, The rotating table is circular; The end of the reversing track is in the shape of a circular arc, the circular arc is concentric with the rotating table, and the end of the transportation track is matched with the end of the reversing track.

6. The transport system of claim 1, wherein, The reversing device further comprises: a hydraulic driving mechanism connected to the rotating table to drive the rotation of the rotating table.

7. The transport system of claim 6, wherein, The bottom of the rotating table is provided with a positioning member; The reversing device further comprises: a base, the hydraulic driving mechanism and the rotating table are arranged on the base, and two limiting bosses are further arranged on the base, and the connecting lines of the two limiting bosses and the center of the base are perpendicular to each other; The limiting bosses abut against the positioning member after the rotating table rotates by 90°, so as to limit the rotation of the rotating table.

8. The transport system of claim 7, wherein, The transportation system further comprises: two pulling mechanisms arranged on the first transportation line and the second transportation line respectively; The pulling mechanism comprises: a telescopic push-pull rod capable of extending along the length direction of the first transportation line and the second transportation line; a pushing part connected to the end of the telescopic push-pull rod and capable of being combined with the abutting part on the outer surface of the reaction container; The telescopic push-pull rod is telescopic to push or pull the reaction container to move along the first transportation line or the second transportation line.

9. The transport system of claim 8, wherein, The pulling mechanism further comprises: a base arranged on the first transportation line and the second transportation line; a rotating motor connected to the base, and one end of the telescopic push-pull rod away from the pushing part is connected to the rotating motor.

10. A chemical vapor deposition apparatus reaction system characterized by comprising: It comprises a transport system as claimed in any of claims 1-9; The reaction system further comprises: a reaction chamber, which is arranged at the connection of the first transport line and the second transport line, and in which the rotary table is located.

Images