Integrated electrostatic chuck cleaning equipment

Abstract

The utility model relates to integrated electrostatic chuck cleaning equipment which comprises a first cleaning tank, a second cleaning tank and a third cleaning tank which are sequentially connected. The first cleaning tank is used for soaking the electrostatic chuck and comprises a liquid supply port which is formed in the bottom of the first cleaning tank and is used for inputting cleaning liquid into the first cleaning tank to a set liquid level height; the heating rod is arranged at the top of the side wall of the first cleaning tank, obliquely extends downwards to the position below the liquid level height of the cleaning liquid and conducts conduction heating on the cleaning liquid in the first cleaning tank; the plurality of low-frequency ultrasonic vibrators are uniformly arranged at the bottom of the first cleaning tank at intervals and form an array; the second cleaning tank is provided with a plurality of water guns for washing the electrostatic chuck; and the third cleaning tank is provided with a plurality of drying devices for drying the electrostatic chuck. According to the electrostatic chuck cleaning device, a plurality of cleaning devices which are single in function and used in multiple procedures in the electrostatic chuck cleaning process are integrated, and the electrostatic chuck cleaning efficiency can be remarkably improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to semiconductor parts cleaning equipment technical field, concretely is a kind of integrated electrostatic chuck cleaning equipment. BACKGROUND

[0002] As the key clamping component in semiconductor wafer manufacturing process, the surface cleanliness of electrostatic chuck directly affects wafer processing yield, however, in the long-term high-load operation process, electrostatic chuck surface will adsorb a large number of dust particles or deposit ionic compounds. If such contaminants are not cleaned in time, they will be transferred to the wafer surface in subsequent processes to cause defects, and may also cause physical damage to the surface structure of the electrostatic chuck, ultimately leading to problems such as reduced wafer processing yield or shortened electrostatic chuck service life.

[0003] The existing electrostatic chuck cleaning scheme generally adopts a multi-process segmented processing mode, and multiple single-function professional cleaning equipment are used to perform different cleaning steps in this process. Since various types of equipment are often distributed in independent stations, and single equipment can only process specific types of contaminants, the cleaning process involves multiple transfers and positioning, and the process connection is complicated. This decentralized operation mode not only increases the equipment footprint, but also causes the overall cleaning efficiency to be low due to process interruption.

[0004] Therefore, it is urgent to design an integrated electrostatic chuck cleaning equipment that can overcome the above-mentioned defects, realize one-stop execution of electrostatic chuck cleaning, make the electrostatic chuck cleaning process coherent, and significantly improve the electrostatic chuck cleaning efficiency.

[0005] It should be understood that the above statements only provide background technology related to the utility model, and do not necessarily constitute prior art. CONTENT OF THE UTILITY MODEL

[0006] Based on the foregoing technical problems, the purpose of the utility model is to provide an integrated electrostatic chuck cleaning equipment, which integrates multiple single-function cleaning equipment used in the multi-process electrostatic chuck cleaning process, realizes one-stop execution of electrostatic chuck cleaning, makes the electrostatic chuck cleaning process coherent, and significantly improves the electrostatic chuck cleaning efficiency.

[0007] In order to achieve the above-mentioned purpose, the utility model provides an integrated electrostatic chuck cleaning equipment, which comprises a first cleaning tank, a second cleaning tank and a third cleaning tank connected in sequence.

[0008] The first cleaning tank performs immersion treatment on the electrostatic chuck, and comprises a liquid inlet arranged at the bottom of the first cleaning tank and configured to input cleaning liquid into the tank to a set liquid level height, a heating rod arranged at the top of the side wall of the first cleaning tank and extending downwardly to below the liquid level of the cleaning liquid, and a plurality of low-frequency ultrasonic transducers arranged at the bottom of the first cleaning tank and forming an array.

[0009] The second cleaning tank is provided with a plurality of water guns to perform flushing treatment on the electrostatic chuck, and the third cleaning tank is provided with a plurality of drying devices to perform drying treatment on the electrostatic chuck.

[0010] Optionally, the first cleaning tank further comprises a liquid level float arranged at the side wall of the first cleaning tank and located at the position of the liquid level of the cleaning liquid, and the liquid level float is wirelessly connected to the heating rod.

[0011] Optionally, the first cleaning tank further comprises a temperature probe wirelessly connected to the heating rod and having a detection end extending below the liquid level of the cleaning liquid, and the temperature probe is configured to preset a heating temperature threshold and monitor the temperature of the cleaning liquid in the first cleaning tank in real time.

[0012] Optionally, the first cleaning tank further comprises a transparent cover plate arranged at the top of the first cleaning tank and sealingly fitted with the first cleaning tank.

[0013] Optionally, the first cleaning tank further comprises an ultrasonic device control box arranged outside the tank and electrically connected to the low-frequency ultrasonic transducers arranged in the tank through a high-frequency cable to control the low-frequency ultrasonic transducers to vibrate and drive the cleaning liquid to vibrate synchronously to clean the surface of the electrostatic chuck.

[0014] Optionally, the second cleaning tank specifically comprises normal-pressure water guns, high-pressure water guns and DI water high-pressure water guns arranged outside the tank, and the side wall of the second cleaning tank is provided with first, second and third connecting holes.

[0015] The first connecting hole is connected with the output end of the normal pressure water gun, and via the first connecting hole, the normal pressure water gun performs normal pressure flushing to the surface of the electrostatic chuck placed in the second cleaning tank; the second connecting hole is connected with the output end of the low pressure water gun, and via the second connecting hole, the high pressure water gun performs high pressure flushing to the surface of the electrostatic chuck placed in the second cleaning tank; the third connecting hole is connected with the output end of the DI water high pressure water gun, and via the third connecting hole, the DI water high pressure water gun performs DI water high pressure flushing to the surface of the electrostatic chuck placed in the second cleaning tank.

[0016] Optionally, the third cleaning tank specifically comprises: a hot air drying gun and a nitrogen gun arranged outside the tank, and the sidewall of the third cleaning tank is provided with a fourth connecting hole and a fifth connecting hole at intervals.

[0017] The fourth connecting hole is connected with the output end of the hot air drying gun, and via the fourth connecting hole, the hot air drying gun blows hot air to the surface of the electrostatic chuck placed in the third cleaning tank; the fifth connecting hole is connected with the output end of the nitrogen gun, and via the fifth connecting hole, the nitrogen gun blows nitrogen to the surface of the electrostatic chuck placed in the third cleaning tank.

[0018] Optionally, the third cleaning tank further comprises a telescopic magnifying glass arranged at the top of the sidewall of the third cleaning tank.

[0019] Optionally, the middle part of the first cleaning tank is provided with a first in-tank support, the middle part of the second cleaning tank is provided with a second in-tank support, and the middle part of the third cleaning tank is provided with a third in-tank support, which are respectively used for bearing the electrostatic chuck.

[0020] Optionally, the bottom of the first cleaning tank is provided with a first drain port, a first drain pipeline connected with the drain port, and a first valve arranged on the first drain pipeline.

[0021] The bottom of the second cleaning tank is provided with a second drain port, a second drain pipeline connected with the drain port, and a second valve arranged on the second drain pipeline; the bottom of the third cleaning tank is provided with a third drain port, a third drain pipeline connected with the drain port, and a third valve arranged on the third drain pipeline.

[0022] The first drain pipeline, the second drain pipeline, and the third drain pipeline are arranged in parallel and connected with a wastewater collection port.

[0023] Compared with the prior art, the integrated electrostatic chuck cleaning equipment can integrate multiple single-function cleaning devices used in multiple processes in the electrostatic chuck cleaning process in the same device, so that the transfer of the electrostatic chuck in different tanks of the same device is more convenient and fast, one-stop execution of electrostatic chuck cleaning can be realized, the electrostatic chuck cleaning process is coherent, the electrostatic chuck cleaning efficiency is significantly improved, and the integrated electrostatic chuck cleaning equipment has great practical value. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 It is a top view of the electrostatic chuck cleaning equipment of the utility model;

[0025] Figure 2 It is a drainage structure schematic view of the electrostatic chuck cleaning equipment of the utility model.

[0026] BRIEF DESCRIPTION OF DRAWINGS:

[0027] 1-First cleaning tank, 2-Second cleaning tank, 3-Third cleaning tank, 11-Liquid supply port, 12-Heating rod, 13-Liquid level float, 14-Temperature probe, 15-Low-frequency ultrasonic transducer, 16-Transparent cover plate, 17-First drain port, 18-First valve, 21-First connecting hole, 22-Second connecting hole, 23-Third connecting hole, 24-Second drain port, 25-Second valve, 31-Fourth connecting hole, 32-Fifth connecting hole, 33-Telescopic magnifying glass, 34-Third drain port, 35-Third valve, Wastewater collection port 36. DETAILED DESCRIPTION

[0028] The utility model is further described in combination with the accompanying drawings. Figure 1 to the accompanying drawings Figure 2 The utility model is further described in combination with the accompanying drawings.

[0029] It should be noted that the drawings are greatly simplified and use non-precise scales, and are only used to conveniently and clearly assist in explaining the purposes of the embodiments of the utility model, and are not used to limit the conditions of the embodiments of the utility model, so they do not have technical substantive significance, any modification of structure, change of proportional relationship or adjustment of size, as long as it does not affect the effects and purposes that can be achieved by the utility model, should still fall within the scope of the technical content disclosed by the utility model.

[0030] Unless otherwise defined, all technical and scientific terms used in the application's specification are intended to have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the application's specification is for describing particular embodiments only and is not intended to be limiting of the application. The use of the terms "and / or" includes any and all combinations of one or more of the associated listed items.

[0031] As shown in Figure 1 The utility model provides a kind of integrated electrostatic chuck cleaning equipment, including first cleaning tank 1, second cleaning tank 2 and third cleaning tank 3 connected in sequence.

[0032] Wherein, the first cleaning tank 1 includes:

[0033] Liquid supply port 11 is arranged at the bottom of the first cleaning tank 1, and external cleaning liquid is connected by pump to supply liquid to the tank to the set liquid level height;Heating rod 12 is arranged at the top of the side wall of the first cleaning tank 1, and extends downwardly below the liquid level of the cleaning liquid, and conducts heating to the cleaning liquid in the first cleaning tank 1;Liquid level float 13 is arranged on the side wall of the first cleaning tank 1, and is wirelessly connected with the heating rod 12, and the height position of the liquid level float 13 is set to the liquid level of the cleaning liquid, when the liquid level of the cleaning liquid entering the first cleaning tank 1 through the liquid supply port 11 reaches the position of the liquid level float 13, it sends a control signal to the heating rod 12 to trigger the heating rod 12 to start and heat the cleaning liquid in the tank;A plurality of low-frequency ultrasonic transducers 15 are uniformly and spacedly arranged at the bottom of the first cleaning tank 1 and form an array;First in-tank support (not shown in the figure) is arranged at the middle part of the first cleaning tank 1, and is used for carrying the electrostatic chuck.

[0034] It can be understood that the electrostatic chuck is placed on the first in-tank support, the cleaning liquid is added to the height position of the liquid level float 13 through the liquid supply port 11, and the cleaning liquid is heated to the required temperature by the heating rod 12, and the electrostatic chuck is subjected to soaking process, and then the vibration of the low-frequency ultrasonic transducer 15 is used to promote the cleaning liquid to clean the surface of the electrostatic chuck at low frequency.

[0035] Further, the first cleaning tank 1 further includes a temperature probe 14 arranged adjacent to the heating rod 12 and wirelessly connected with the heating rod 12, and the detection end thereof extends below the liquid level of the cleaning liquid, for presetting the heating temperature threshold and monitoring the temperature of the cleaning liquid in the tank of the first cleaning tank 1 in real time;When the temperature probe 14 detects that the temperature of the cleaning liquid in the tank reaches the preset threshold, it sends a control signal to the heating rod 12 to trigger the heating rod 12 to stop heating.

[0036] Further, the first cleaning tank 1 further comprises a transparent cover plate 16 arranged on the top of the first cleaning tank 1, and the transparent cover plate 16 is in sealed cooperation with the first cleaning tank 1; when the electrostatic chuck is immersed in the first cleaning tank 1 at a constant temperature, the transparent cover plate 16 is in a closed state to maintain the temperature stability in the tank until the immersion process is completed.

[0037] Further, the first cleaning tank 1 further comprises an ultrasonic device control box (not shown in the figure) arranged outside the tank, which is electrically connected with the low-frequency ultrasonic vibrator 15 arranged in the tank through a high-frequency cable; wherein the ultrasonic device control box controls the low-frequency ultrasonic vibrator 15 to generate vibration, and drives the cleaning liquid to vibrate synchronously, thereby cleaning the surface of the electrostatic chuck placed on the support in the first tank.

[0038] Wherein, the second cleaning tank 2 is provided with multiple water guns for washing the electrostatic chuck, specifically including normal pressure water guns, high pressure water guns and DI water (Deionized Water, deionized water) high pressure water guns arranged outside the tank, and the side wall of the second cleaning tank 2 is provided with a first connecting hole 21, a second connecting hole 22 and a third connecting hole 23 at intervals; the first connecting hole 21 connects the output end of the normal pressure water gun, and the normal pressure water gun is used to wash the surface of the electrostatic chuck placed in the second cleaning tank 2 at normal pressure through the first connecting hole 21, for preliminary removal of large particle contaminants on the surface of the electrostatic chuck; the second connecting hole 22 connects the output end of the high pressure water gun, and the high pressure water gun is used to wash the surface of the electrostatic chuck placed in the second cleaning tank 2 at high pressure through the second connecting hole 22, for fine removal of chemical contaminants on the surface of the electrostatic chuck or helium pores and small electrode area; the third connecting hole 23 connects the output end of the DI water high pressure water gun, and the DI water high pressure water gun is used to wash the surface of the electrostatic chuck placed in the second cleaning tank 2 at high pressure through the third connecting hole 23, for thorough removal of residual particles and ions on the surface of the electrostatic chuck.

[0039] Further, the second cleaning tank 2 further comprises a second tank support (not shown in the figure) arranged in the middle of the second cleaning tank 2, for carrying the electrostatic chuck.

[0040] The third cleaning tank 3 is provided with a plurality of drying devices for drying the electrostatic chuck, specifically including a hot air drying gun and a nitrogen gun arranged outside the tank, and the side wall of the third cleaning tank 3 is provided with a fourth connecting hole 31 and a fifth connecting hole 32 at intervals; the fourth connecting hole 31 is connected with the output end of the hot air drying gun, so that the hot air drying gun blows hot air to the surface of the electrostatic chuck placed in the third cleaning tank 3 through the fourth connecting hole 31, for accelerating the evaporation speed of the liquid on the surface of the electrostatic chuck and reducing the drying time; the fifth connecting hole 32 is connected with the output end of the nitrogen gun, so that the nitrogen gun blows nitrogen to the surface of the electrostatic chuck placed in the third cleaning tank 3 through the fifth connecting hole 32, for removing the residual moisture in the narrow gap of the electrode and the helium hole of the electrostatic chuck.

[0041] Further, the third cleaning tank 3 further comprises a telescopic magnifying glass 33 arranged at the top of the side wall of the third cleaning tank 3, which can provide adjustable magnification and focal length to more clearly observe whether there are residual contaminants on the surface of the electrostatic chuck, and ensure complete cleaning.

[0042] Further, the third cleaning tank 3 further comprises a third tank inner support (not shown in the figure) arranged in the middle of the third cleaning tank 3 for carrying the electrostatic chuck.

[0043] Further, as shown in the figure, Figure 2 The bottom of the first cleaning tank 1, the second cleaning tank 2 and the third cleaning tank 3 is provided with an independent drainage structure, each drainage structure comprises: a first drainage port 17 arranged at the bottom of the first cleaning tank 1, a second drainage port 24 arranged at the bottom of the second cleaning tank 2 and a third drainage port 34 arranged at the bottom of the third cleaning tank 3; a first valve 18, a second valve 25 and a third valve 35 arranged correspondingly on each drainage port; and a first drainage pipeline, a second drainage pipeline and a third drainage pipeline connected with each drainage port correspondingly. Wherein, each drainage pipeline adopts a multi-way parallel structure to independently connect the drainage of each cleaning tank to a wastewater collection port 36, so as to realize classified discharge and centralized treatment of the cleaning waste liquid.

[0044] It should be noted that the specific cleaning process of the electrostatic chuck of the utility model is as follows:

[0045] S1, place the electrostatic chuck in the second cleaning tank 2, select the normal pressure water gun to flush to preliminarily remove the large particle contaminants on the surface of the electrostatic chuck, and then select the high pressure water gun to flush to finely remove the chemical contaminants on the surface of the electrostatic chuck or the helium hole and the narrow area of the electrode;

[0046] S2, the electrostatic chuck is transferred to the first cleaning tank 1, and the transparent cover plate 16 is closed, the cleaning liquid with the concentration suitable for the electrostatic chuck is injected into the cleaning tank 1 through the liquid inlet 11 to the set liquid level of the liquid level float 13, the heating rod 12 is triggered to heat the cleaning liquid to the preset threshold, and the electrostatic chuck is soaked for 2min-4min, so that the adhesion of the pollutants on the surface of the electrostatic chuck is reduced;

[0047] S3, the low-frequency ultrasonic vibrator 15 is started, and the surface of the electrostatic chuck is intensively cleaned for 8min-15min;

[0048] S4, the electrostatic chuck is transferred to the second cleaning tank 2 again, the DI water high-pressure water gun is switched to wash the surface of the electrostatic chuck, and the ion pollution and chemical residues on the surface of the electrostatic chuck are removed;

[0049] S5, the electrostatic chuck is transferred to the third cleaning tank 3, the hot air drying gun is started to remove most of the water on the surface of the electrostatic chuck, and then the nitrogen gun is switched to blow the gap and the electrode area of the electrostatic chuck, and the telescopic magnifying glass 33 is observed during the period until the final drying, so that the cleaning process of the electrostatic chuck is completed.

[0050] In summary, the integrated electrostatic chuck cleaning equipment can integrate multiple single-function cleaning devices used in multiple processes in the cleaning process of the electrostatic chuck in the same device, so that the transfer of the electrostatic chuck in different tanks of the same device is more convenient and fast, thereby realizing one-stop execution of the electrostatic chuck cleaning, making the electrostatic chuck cleaning process coherent, significantly improving the electrostatic chuck cleaning efficiency, and having great practical value.

[0051] Although the content of the utility model has been described in detail through the above preferred embodiments, it should be recognized that the above description should not be considered as limiting the utility model. After reading the above content, various modifications and alternatives of the utility model will be obvious to those skilled in the art. Therefore, the protection scope of the utility model should be limited by the appended claims.

Claims

1. An integrated electrostatic chuck cleaning apparatus, comprising: The first cleaning tank, the second cleaning tank and the third cleaning tank are sequentially connected. The first cleaning tank performs soaking treatment on the electrostatic chuck, and comprises: a liquid supply port arranged at the bottom of the first cleaning tank and configured to input cleaning liquid into the tank to a set liquid level; a heating rod arranged at the top of the side wall of the first cleaning tank and extending downwardly to below the liquid level of the cleaning liquid, and configured to conductively heat the cleaning liquid in the first cleaning tank; a plurality of low-frequency ultrasonic transducers arranged at the bottom of the first cleaning tank and forming an array; the second cleaning tank is provided with a plurality of water guns for performing flushing treatment on the electrostatic chuck; the third cleaning tank is provided with a plurality of drying devices for performing drying treatment on the electrostatic chuck.

2. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein The first cleaning tank further comprises a liquid level float arranged at the side wall of the first cleaning tank and located at the position of the liquid level of the cleaning liquid, and wirelessly connected with the heating rod, and when the liquid level of the cleaning liquid in the first cleaning tank reaches the position of the liquid level float through the liquid supply port, the liquid level float sends a control signal to the heating rod to trigger the heating rod to start and heat the cleaning liquid in the tank.

3. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein The first cleaning tank further comprises a temperature probe wirelessly connected with the heating rod and having a detection end extending to below the liquid level of the cleaning liquid, and configured to preset a heating temperature threshold and monitor the temperature of the cleaning liquid in the first cleaning tank in real time; wherein when the temperature probe detects that the temperature of the cleaning liquid reaches the preset threshold, the temperature probe sends a control signal to the heating rod to trigger the heating rod to stop heating.

4. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein The first cleaning tank further comprises a transparent cover plate arranged at the top of the first cleaning tank and sealingly fitted with the first cleaning tank.

5. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein The first cleaning tank further comprises an ultrasonic device control box arranged outside the tank and electrically connected with the low-frequency ultrasonic transducers arranged in the tank through a high-frequency cable, and configured to control the low-frequency ultrasonic transducers to vibrate and drive the cleaning liquid to vibrate synchronously, so as to perform low-frequency cleaning on the surface of the electrostatic chuck.

6. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein The second cleaning tank specifically comprises: atmospheric water guns, high-pressure water guns and DI water high-pressure water guns arranged outside the tank, and first, second and third connecting holes arranged at the side wall of the second cleaning tank; the first connecting hole is connected with the output end of the atmospheric water gun, and the atmospheric water gun flushes the surface of the electrostatic chuck placed in the second cleaning tank through the first connecting hole; the second connecting hole is connected with the output end of the low-pressure water gun, and the high-pressure water gun flushes the surface of the electrostatic chuck placed in the second cleaning tank through the second connecting hole; the third connecting hole is connected with the output end of the DI water high-pressure water gun, and the DI water high-pressure water gun flushes the surface of the electrostatic chuck placed in the second cleaning tank through the third connecting hole.

7. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein The third cleaning tank specifically comprises: hot air drying guns and nitrogen guns arranged outside the tank, and fourth and fifth connecting holes arranged at the side wall of the third cleaning tank; the fourth connecting hole is connected with the output end of the hot air drying gun, and the hot air drying gun blows hot air to the surface of the electrostatic chuck placed in the third cleaning tank through the fourth connecting hole; the fifth connecting hole is connected with the output end of the nitrogen gun, and the nitrogen gun blows nitrogen to the surface of the electrostatic chuck placed in the third cleaning tank through the fifth connecting hole. The fifth connecting hole connects the output end of the nitrogen gun, and nitrogen gas is blown to the surface of the electrostatic chuck placed in the third cleaning tank through the fifth connecting hole.

8. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein, The third cleaning tank further comprises a telescopic magnifying glass arranged on the top of the side wall of the third cleaning tank.

9. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein The middle part of the first cleaning tank is provided with a first in-tank support, the middle part of the second cleaning tank is provided with a second in-tank support, and the middle part of the third cleaning tank is provided with a third in-tank support, which are respectively used for carrying the electrostatic chuck.

10. The integrated electrostatic chuck cleaning apparatus of claim 1, wherein, The first cleaning tank is provided with a first drain port at the bottom, a first drain pipeline connected with the drain port, and a first valve arranged on the first drain pipeline. The second cleaning tank is provided with a second drain port at the bottom, a second drain pipeline connected with the drain port, and a second valve arranged on the second drain pipeline. The third cleaning tank is provided with a third drain port at the bottom, a third drain pipeline connected with the drain port, and a third valve arranged on the third drain pipeline. The first drain pipeline, the second drain pipeline, and the third drain pipeline are arranged in parallel and connected with a waste water collecting port.

Images