Micro-flow constant control polishing solution supply device

Abstract

The embodiment of the utility model provides a micro-flow constant control polishing solution supply device, and relates to the technical field of polishing devices. The micro-flow constant control polishing liquid supply device comprises a liquid storage tank, a constant pressure pump flush with the ground is installed on the right side of the liquid storage tank, the output end of the constant pressure pump communicates with the bottom of an inner cavity of the liquid storage tank through a pipeline, and an anti-solidification assembly is arranged on the outer surface of the liquid storage tank and comprises two fixing boxes. And the bottom of the fixed box is fixedly connected with a mounting box. According to the technical scheme, by arranging the anti-solidification assembly, the polishing solution can be continuously or periodically mixed and stirred uniformly in the storage process, and the phenomena of layering, precipitation or solidification and the like caused by long-time standing of the polishing solution are effectively prevented. By means of operation of the assembly, good fluidity and component uniformity of the polishing solution are kept, and the stability of the follow-up solution supply process is remarkably improved.

Description

Technical Field

[0001] This utility model relates to the field of polishing device technology, and in particular to a polishing liquid supply device with constant microfluidic control. Background Technology

[0002] A diamond slurry supply system is a device specifically designed for the precise control and supply of slurry during machining, particularly suitable for high-precision polishing operations using diamond as an abrasive. It is crucial for ensuring processing quality, improving efficiency, and reducing material waste. A microfluidic constant-control slurry supply system is one such technology, ensuring a predetermined flow rate and pressure of slurry at all times during chemical mechanical polishing (CMP), thereby achieving efficient and uniform treatment of the polishing pad or wafer surface. This system not only enhances the stability and consistency of the polishing process but also significantly improves surface finish precision and product yield, making it an indispensable part of achieving high-quality surface treatment.

[0003] Existing polishing slurry supply systems, when storing polishing slurry for extended periods, often lack effective agitation, leading to stagnation and sedimentation. This is particularly problematic at low temperatures or during prolonged storage, where components may precipitate or clump, reducing or even eliminating fluidity. This not only affects the uniformity and effectiveness of the polishing slurry but also makes it prone to pipe blockages and supply disruptions when it needs to be withdrawn for later use. Consequently, it impacts the continuity and stability of the entire polishing process, increases equipment maintenance frequency and operating costs, and renders the system inconvenient to use. Utility Model Content

[0004] The purpose of this invention is to provide a polishing slurry supply device with constant microfluidic control, which can avoid the problems of existing polishing slurry supply devices lacking an effective stirring process, which can easily lead to solidification or sedimentation of the polishing slurry after long-term storage, resulting in reduced fluidity or even blockage of pipelines, affecting the performance and process stability, and increasing maintenance costs.

[0005] This utility model provides a microfluidic constant-control polishing slurry supply device, including a storage tank. A constant-pressure pump flush with the ground is installed on the right side of the storage tank. The output end of the constant-pressure pump is connected to the bottom of the inner cavity of the storage tank through a pipe. An anti-coagulation component is provided on the outer surface of the storage tank. The anti-coagulation component includes two fixed boxes. An installation box is fixedly connected to the bottom of the fixed box. A first motor is fixedly connected to the inner cavity of the installation box. A sliding rod is installed in the inner cavity of the fixed box. The output shaft of the first motor is fixedly connected to the top end of the sliding rod.

[0006] In one specific implementation, a movable plate is movably connected to the outer surface of the slide rod, and both the left and right sides of the movable plate are slidably connected to the inner cavity of the fixed box.

[0007] In one specific implementation, a fixing rod is fixedly connected to the top of the movable plate, and the top end of the fixing rod extends through to the outside of the top of the fixed box and is fixedly connected to a push plate.

[0008] In one specific implementation, a placement plate is fixedly connected to one side of the push plate, and connecting plates are fixedly connected to both the left and right sides of the placement plate.

[0009] In one specific implementation, a welding box is fixedly connected to the top of the connecting plate, and a second motor is installed inside the welding box.

[0010] In one specific implementation, the output shaft of the second motor is fixedly connected to a rotating rod, the bottom end of which extends into the inner cavity of the storage tank.

[0011] In one specific implementation, a long rod is fixedly connected to the bottom of both the connecting plate and the push plate, and a disc is fixedly connected to the bottom end of the rotating rod. The bottom end of the long rod penetrates into the inner cavity of the storage tank and is rotatably connected to the outer surface of the disc.

[0012] In one specific implementation, three cleaning plates are fixedly connected to the bottom of the disc, and the cleaning plates are in contact with the inner wall of the storage tank. Several stirring rods are fixedly connected to the bottom of the disc, and several stirring blades are fixedly connected to the outer surface of the stirring rods.

[0013] The beneficial effects of this application are as follows: By incorporating an anti-coagulation component, the polishing slurry can be continuously or periodically mixed and stirred uniformly during storage, effectively preventing stratification, sedimentation, or coagulation due to prolonged standing. The operation of this component not only maintains the good fluidity and compositional uniformity of the polishing slurry but also significantly improves the stability of the subsequent slurry supply process, reduces the risk of pipeline blockage, thereby ensuring the continuity and reliability of the entire polishing process and improving equipment efficiency and ease of operation. Attached Figure Description

[0014] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

[0015] Figure 1 This is a three-dimensional schematic diagram of the overall structure of an embodiment of the present utility model;

[0016] Figure 2 This is a three-dimensional schematic diagram of the disassembled fixed box structure according to an embodiment of the present utility model;

[0017] Figure 3 This is a three-dimensional side view sectional view of the liquid storage tank structure according to an embodiment of the present utility model;

[0018] Figure 4 This is a three-dimensional schematic diagram of the placement plate structure according to an embodiment of the present utility model;

[0019] Figure 5 This is a three-dimensional schematic diagram of the slide bar structure according to an embodiment of the present utility model;

[0020] Figure 6 This is a three-dimensional schematic diagram of the disk structure according to an embodiment of the present utility model;

[0021] Figure 7 This is a three-dimensional schematic diagram of the movable plate structure according to an embodiment of the present utility model.

[0022] Icons: 1. Storage tank; 2. Constant pressure pump; 3. Anti-coagulation component; 31. Fixing box; 32. Mounting box; 33. First motor; 34. Slide rod; 35. Moving plate; 36. Fixing rod; 37. Push plate; 38. Placement plate; 39. Connecting plate; 310. Welding box; 311. Second motor; 312. Rotating rod; 313. Long rod; 314. Disc; 315. Cleaning plate; 316. Stirring rod; 317. Stirring blade. Detailed Implementation

[0023] Existing polishing slurry supply devices lack an effective stirring process, leading to solidification or sedimentation of the slurry during prolonged storage, reduced fluidity, and even pipe blockage. This negatively impacts performance, process stability, and increases maintenance costs. Therefore, the inventors have developed a microfluidic constant-control polishing slurry supply device. Through an anti-solidification component, the device continuously or periodically stirs the slurry during storage, preventing stratification, sedimentation, or solidification and maintaining its fluidity and uniformity. This not only improves supply stability and reduces the risk of blockage but also enhances the continuity of the polishing process and the ease of equipment operation, thus resolving the aforementioned shortcomings.

[0024] The following detailed description, in conjunction with the accompanying drawings, outlines some embodiments of the present invention. Unless otherwise specified, the following embodiments and features can be combined with each other.

[0025] Please refer to Figures 1 to 7This utility model provides a microfluidic constant-control polishing slurry supply device, including a storage tank 1. A feed pipe is installed on the top of the storage tank 1, and a constant-pressure pump 2, flush with the ground, is installed on the right side of the storage tank 1. The constant-pressure pump 2 also includes a mounting frame, a pressure sensor, and a metering device, thus forming a microfluidic constant-control process for transmitting the polishing slurry. The outlet end of the constant-pressure pump 2 is connected to external diamond polishing or grinding equipment, facilitating the input of polishing slurry to polish or grind diamonds, thereby improving the polishing or grinding effect. The output end of the constant-pressure pump 2 is connected to the bottom of the inner cavity of the storage tank 1 through a pipe. A ventilation pipe is connected to the outer surface of the storage tank 1 to extract harmful gases from the polishing slurry stored for a long time. An anti-coagulation component 3 is provided on the outer surface of the storage tank 1, comprising two fixing boxes 31, both of which are fixed to the outer surfaces of the front and rear sides of the storage tank 1. The bottom of the fixed box 31 is fixedly connected to the mounting box 32. The inner cavity of the mounting box 32 is fixedly connected to the first motor 33. The inner cavity of the fixed box 31 is equipped with a slide rod 34. The slide rod 34 located on the front side is rotatably connected to the inner cavity of the fixed box 31. The outer surface of the slide rod 34 is provided with external threads. The output shaft of the first motor 33 is fixedly connected to the top of the slide rod 34. The outer surface of the slide rod 34 is movably connected to a moving plate 35. The area where the moving plate 35 on the front side contacts the front slide rod 34 is provided with a matching internal thread. The left and right sides of the moving plate 35 are slidably connected to the inner cavity of the fixed box 31. The top of the moving plate 35 is fixedly connected to a fixed rod 36. The top of the fixed rod 36 extends to the outer side of the top of the fixed box 31 and is fixedly connected to a push plate 37. One side of the push plate 37 is fixedly connected to a placement plate 38. The left and right sides of the placement plate 38 are fixedly connected to connecting plates 39. The top of the connecting plate 39 is fixedly connected to a welding box 310.

[0026] Please refer to Figures 2 to 7 The inner cavity of the welding box 310 is equipped with a second motor 311. The output shaft of the second motor 311 is fixedly connected to a rotating rod 312. The bottom end of the rotating rod 312 penetrates into the inner cavity of the storage tank 1, and the area where the rotating rod 312 penetrates into the storage tank 1 is sealed. The bottom of the connecting plate 39 and the push plate 37 are both fixedly connected to a long rod 313. The bottom end of the rotating rod 312 is fixedly connected to a disc 314. The bottom end of the long rod 313 penetrates into the inner cavity of the storage tank 1 and is rotatably connected to the outer surface of the disc 314. The bottom of the disc 314 is fixedly connected to three cleaning plates 315, and the cleaning plates 315 are in contact with the inner wall of the storage tank 1. The bottom of the disc 314 is fixedly connected to several stirring rods 316, and the outer surface of the stirring rods 316 is fixedly connected to several stirring blades 317.

[0027] Specifically, when the polishing liquid is stored for an extended period, the second motor 311 is activated. This motor drives the rotating rod 312 to rotate, which in turn drives the disc 314 to rotate. The disc 314 further drives the cleaning plate 315, the stirring rod 316, and the stirring blades 317 to rotate synchronously, ensuring that the stirring blades 317 thoroughly mix the polishing liquid and prevent solidification due to prolonged standing. Simultaneously, the cleaning plate 315, during its rotation, stirs the polishing liquid around the inner cavity of the storage tank 1 and scrapes away any residue adhering to the inner wall of the storage tank 1, achieving both cleaning and uniform mixing. Before stirring, the first motor 33 can be started. The first motor 33 drives the slide bar 34 to rotate. The slide bar 34 drives the moving plate 35 and the fixed rod 36 to move synchronously. The fixed rod 36 further pushes the push plate 37, the placement plate 38, the connecting plate 39 and the welding box 310 to move together, thereby driving the second motor 311, the rotating rod 312 and the disc 314 to move up and down as a whole, so as to achieve uniform stirring of polishing liquid at different heights, prevent the polishing liquid from being in a static state, and facilitate subsequent use.

[0028] In summary, the working principle of the microfluidic constant control polishing slurry supply device of this utility model embodiment is as follows: First, the polishing slurry stored in the storage tank 1 for a long time can be stirred to prevent solidification due to stagnation during storage. Specifically, the anti-solidification component 3 can be operated to uniformly stir the polishing slurry, and the inner wall of the storage tank 1 can be cleaned during stirring for easy use. When the polishing slurry needs to be used, the constant pressure pump 2 can be started to extract the polishing slurry for external use. For example, when it is necessary to remove uneven parts of the surface during diamond grinding and polishing, the polishing slurry and polishing equipment can be used for lubrication and removal, thereby improving the overall effect of diamond grinding and polishing.

[0029] The above are merely preferred embodiments of this utility model and are not intended to limit the scope of this utility model. Various modifications and variations can be made to this utility model by those skilled in the art. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

Claims

1. A polishing slurry supply device with constant microfluidic control, characterized in that, Including liquid storage tank (1), the right side of liquid storage tank (1) is installed with ground level constant pressure pump (2), the output end of constant pressure pump (2) is communicated with the bottom of the inner chamber of liquid storage tank (1) through pipeline, the outer surface of liquid storage tank (1) is equipped with anti-freezing assembly (3), anti-freezing assembly (3) contains two fixed boxes (31), the bottom of fixed box (31) is fixedly connected with installation box (32), the inner chamber of installation box (32) is fixedly connected with first motor (33), the inner chamber of fixed box (31) is installed with slide rod (34), the output shaft of first motor (33) is fixedly connected with the top of slide rod (34).

2. The polishing solution supply device of claim 1, wherein The outer surface of slide rod (34) is movably connected with moving plate (35), and the left and right sides of moving plate (35) are slidably connected with the inner chamber of fixed box (31).

3. The polishing solution supply device of claim 2, wherein The top of moving plate (35) is fixedly connected with fixed rod (36), and the top of fixed rod (36) penetrates to the outside of the top of fixed box (31) and is fixedly connected with push plate (37).

4. The polishing solution supply device of claim 3, wherein One side of push plate (37) is fixedly connected with placing plate (38), and the left and right sides of placing plate (38) are fixedly connected with connecting plate (39).

5. The polishing solution supply device of claim 4, wherein The top of connecting plate (39) is fixedly connected with welding box (310), and the inner chamber of welding box (310) is installed with second motor (311).

6. The polishing solution supply device of claim 5, wherein The output shaft of second motor (311) is fixedly connected with rotating rod (312), and the bottom of rotating rod (312) penetrates to the inner chamber of liquid storage tank (1).

7. The polishing solution supply device of claim 6, wherein The bottom of connecting plate (39) and push plate (37) is fixedly connected with long rod (313), the bottom of rotating rod (312) is fixedly connected with disc (314), and the bottom of long rod (313) penetrates to the inner chamber of liquid storage tank (1) and is rotatably connected with the outer surface of disc (314).

8. The polishing solution supply device of claim 7, wherein The bottom of disc (314) is fixedly connected with three cleaning plates (315), and the cleaning plates (315) are in contact with the inner wall of liquid storage tank (1), and the bottom of disc (314) is fixedly connected with a plurality of stirring rods (316), and the outer surface of stirring rod (316) is fixedly connected with a plurality of stirring blades (317).

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