Plasma surface treatment device
By introducing a drive component and a rotating ring structure into the plasma surface treatment device, and adjusting the cyclic reciprocating movement distance of the ionization head, the flexibility problem of processing different material widths and ranges is solved, achieving uniform processing and resource optimization.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-29
- Publication Date
- 2026-04-07
AI Technical Summary
Existing plasma surface treatment equipment lacks flexibility when processing materials of different widths or ranges, resulting in uneven treatment effects or waste of resources.
By setting a drive assembly and a rotating ring structure on the base, the reciprocating movement distance of the ionization head can be adjusted by using a motor and a rotating threaded column, thus achieving flexible adjustment of the ionization head.
It improves the flexibility of plasma surface treatment equipment, ensures uniformity and efficiency of treatment, and avoids waste of resources.
Smart Images

Figure CN224091975U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of surface treatment technology, and more specifically, to a plasma surface treatment device. Background Technology
[0002] Plasma surface treatment equipment is a device that uses plasma technology to modify, clean, activate, and coat material surfaces. It generates plasma in a vacuum or specific atmosphere, which then reacts physically or chemically with the material surface, thereby improving its surface properties, such as increasing adhesion, enhancing corrosion resistance, and altering surface energy. This equipment is widely used in electronics, medical, automotive, and aerospace fields, offering advantages such as excellent treatment results, environmental friendliness, and high efficiency.
[0003] For example, Chinese Patent Publication No. CN202020946955.7 discloses a plasma surface treatment device, comprising a plasma generator, an ionization head support, and a fixed base. The plasma generator includes a generator main unit, a power transmission line, and an ionization head connected in sequence. The generator main unit provides power to the ionization head through the power transmission line, and the ionization head ionizes air to form a plasma flow. The ionization head support is mounted on the fixed base, and the ionization head is mounted on the ionization head support. The fixed base has a cuboid structure, and the generator main unit is installed inside the fixed base. The workpiece is placed on the upper surface of the fixed base, and the plasma flow generated by the ionization head discharges performs surface treatment on the workpiece. A conveyor belt is installed on the upper surface of the fixed base, and the workpiece is placed on the conveyor belt. Tracks are provided on both sides of the conveyor belt, which can adjust the position of the ionization head according to the shape and size of the workpiece, enabling large-area surface treatment of the workpiece surface.
[0004] However, in the above-mentioned technical solutions, the cyclic reciprocating movement distance of the ionization head (i.e., plasma nozzle) in existing plasma surface treatment devices is usually fixed. This results in a lack of flexibility in the equipment when processing materials of different widths or processing ranges. When the material width is wide or the processing range is large, the fixed movement distance may not be able to cover the entire area to be treated, thus affecting the uniformity and integrity of the treatment effect. Conversely, when the material width is narrow or the processing range is small, the fixed movement distance may lead to resource waste and reduced efficiency. Utility Model Content
[0005] The main objective of this invention is to provide a plasma surface treatment device that can effectively solve the problems in the background art.
[0006] To achieve the above objectives, the technical solution adopted by this utility model is as follows: a plasma surface treatment device, including a base, a conveyor belt and two support plates are provided on the base, a first cover and a second cover are respectively fixedly provided on the two support plates, a rotating ring and a driving assembly are provided between the first cover and the second cover, a through groove is provided on one side of the second cover, a plurality of support rods are provided on one side of the base, a sliding rod is provided on the support rod, and an ionization head is slidably provided on the sliding rod.
[0007] Preferably, the rotating ring is rotatably connected to the first cap and the second cap.
[0008] Preferably, the drive assembly has a motor fixedly mounted on the first cover, a first rotating column on the motor, a rotating disk on the first rotating column, a mounting frame fixedly mounted on the rotating disk, a slider slidably mounted in the inner cavity of the mounting frame, a rotating threaded column threaded on the slider, and a knob fixedly mounted on one side of the rotating threaded column.
[0009] Preferably, a second rotating column is provided on the side of the slider away from the rotating disk, a push rod is provided on the second rotating column, and a third rotating column is provided on the side of the push rod away from the second rotating column.
[0010] Preferably, the rotating threaded column is rotatably connected to the mounting frame, the second rotating column is rotatably connected to the push rod, and one side of the push rod passes through the through groove.
[0011] Preferably, one side of the rotating threaded column rotates through the rotating ring, and the third rotating column is rotatably connected to the ionization head.
[0012] Compared with the prior art, the present invention has the following beneficial effects:
[0013] (1) When using this utility model, first turn the knob, the knob drives the rotating threaded column to rotate, the position of the slider is changed by rotating the threaded column, the movable distance of the push rod is changed by changing the position of the slider, and then the cyclic reciprocating movement distance of the ionization head is adjusted by changing the movable distance of the push rod. The cyclic reciprocating movement distance of the ionization head can be adjusted according to the width of the material and the processing range, so that the cyclic reciprocating movement distance of the ionization head can change accordingly with the width of the material and the processing range, thereby improving the flexibility of the equipment. Attached Figure Description
[0014] Figure 1 This is a schematic diagram of the structure of a plasma surface treatment device according to the present invention;
[0015] Figure 2 This is a schematic diagram of the drive component in a plasma surface treatment device according to the present invention;
[0016] Figure 3 This is a side view of the driving component in a plasma surface treatment device according to the present invention.
[0017] In the diagram: 1. Base; 2. Conveyor belt; 3. Support plate; 4. First cover; 5. Second cover; 6. Rotating ring; 7. Drive assembly; 701. Motor; 702. First rotating column; 703. Rotating disc; 704. Mounting frame; 705. Slider; 706. Rotating threaded column; 707. Knob; 708. Second rotating column; 709. Push rod; 7010. Third rotating column; 8. Through groove; 9. Support rod; 10. Slide rod; 11. Ionization head. Detailed Implementation
[0018] The technical solutions of this utility model will be clearly and completely described below with reference to the embodiments of this utility model. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of this utility model.
[0019] like Figure 1 As shown, a plasma surface treatment device includes a base 1, on which a conveyor belt 2 and two support plates 3 are provided. A first cover 4 and a second cover 5 are respectively fixedly provided on the two support plates 3. A rotating ring 6 and a driving assembly 7 are provided between the first cover 4 and the second cover 5. A through groove 8 is provided on one side of the second cover 5. A plurality of support rods 9 are provided on one side of the base 1. A sliding rod 10 is provided on the support rod 9. An ionization head 11 is slidably provided on the sliding rod 10.
[0020] like Figure 2 and Figure 3 As shown, in another embodiment of the present invention, the driving assembly 7 is fixedly mounted on the first cover 4 with a motor 701, the motor 701 is provided with a first rotating column 702, the first rotating column 702 is provided with a rotating disk 703, the rotating disk 703 is fixedly provided with a mounting frame 704, the mounting frame 704 is slidably provided with a slider 705 in the inner cavity of the mounting frame 704, the slider 705 is threaded with a rotating threaded column 706, and a knob 707 is fixedly provided on one side of the rotating threaded column 706;
[0021] A second rotating column 708 is provided on the side of the slider 705 away from the rotating disk 703, a push rod 709 is provided on the second rotating column 708, and a third rotating column 7010 is provided on the side of the push rod 709 away from the second rotating column 708.
[0022] When the ionization head 11 needs to move cyclically, the motor 701 drives the rotating disk 703 to rotate through the first rotating column 702, and the rotating disk 703 drives the mounting frame 704 to rotate, so that the mounting frame 704 rotates around the first rotating column 702. The slider 705 follows the mounting frame 704 to rotate. The slider 705 drives the push rod 709 to move through the second rotating column 708, and the push rod 709 drives the ionization head 11 to move through the third rotating column 7010, so that the ionization head 11 moves cyclically. The cyclically moving ionization head 11 performs uniform treatment on the surface of the material.
[0023] When the reciprocating movement distance of the ionization head 11 needs to be adjusted according to the width of the material and the processing range, first turn the knob 707. The knob 707 drives the rotating threaded column 706 to rotate. By turning the threaded column 706, the position of the slider 705 is changed. By changing the position of the slider 705, the movable distance of the push rod 709 is changed. Then, by changing the movable distance of the push rod 709, the reciprocating movement distance of the ionization head 11 is adjusted, so that the reciprocating movement distance of the ionization head 11 can be changed accordingly with the width of the material and the processing range, improving the flexibility of the equipment.
[0024] The working principle of this plasma surface treatment device:
[0025] In use, first rotate knob 707, which drives rotating threaded column 706 to rotate. Rotating threaded column 706 changes the position of slider 705, thereby changing the movable distance of push rod 709. Changing the movable distance of push rod 709 then adjusts the cyclic reciprocating movement distance of ionization head 11. The cyclic reciprocating movement distance of ionization head 11 is adjusted according to the width of the material and the processing range. After adjustment, motor 701 drives rotating disk 703 to rotate via first rotating column 702. Rotating disk 703 drives mounting frame 704 to rotate, causing the mounting... The frame 704 rotates around the first rotating column 702, and the slider 705 rotates with the mounting frame 704. The slider 705 drives the push rod 709 to move through the second rotating column 708, and the push rod 709 drives the ionization head 11 to move through the third rotating column 7010, so that the ionization head 11 moves cyclically. Then, the material is placed on the conveyor belt 2, and the conveyor belt 2 moves the material to below the ionization head 11. The cyclically moving ionization head 11 is used to uniformly treat the surface of the material. The cyclically moving distance of the ionization head 11 can be changed accordingly with the width of the material and the processing range, which improves the flexibility of the equipment.
[0026] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation of the present invention. For those skilled in the art, other variations or modifications can be made based on the above description. It is impossible to exhaustively list all the implementation methods here. All obvious variations or modifications derived from the technical solutions of the present invention are still within the protection scope of the present invention.
Claims
1. A plasma surface treatment apparatus, comprising a base (1), characterized in that: The base (1) is provided with a conveyor belt (2) and two support plates (3). A first cover (4) and a second cover (5) are fixedly provided on the two support plates (3). A rotating ring (6) and a drive assembly (7) are provided between the first cover (4) and the second cover (5). A through groove (8) is provided on one side of the second cover (5). Several support rods (9) are provided on one side of the base (1). A sliding rod (10) is provided on the support rod (9). An ionization head (11) is slidably provided on the sliding rod (10).
2. The plasma surface treatment apparatus according to claim 1, characterized in that: The rotating ring (6) is rotatably connected to the first cover (4) and the second cover (5).
3. The plasma surface treatment apparatus according to claim 2, characterized in that: The drive assembly (7) has a motor (701) fixedly mounted on the first cover (4). The motor (701) has a first rotating column (702) and a rotating disk (703) on the first rotating column (702). The rotating disk (703) has a fixed mounting frame (704). The mounting frame (704) has a slider (705) slidably mounted in the inner cavity of the mounting frame (704). The slider (705) has a rotating threaded column (706) threaded on it. A knob (707) is fixedly mounted on one side of the rotating threaded column (706).
4. The plasma surface treatment apparatus according to claim 3, characterized in that: A second rotating column (708) is provided on the side of the slider (705) away from the rotating disk (703), a push rod (709) is provided on the second rotating column (708), and a third rotating column (7010) is provided on the side of the push rod (709) away from the second rotating column (708).
5. The plasma surface treatment apparatus according to claim 4, characterized in that: The rotating threaded column (706) is rotatably connected to the mounting frame (704), and the second rotating column (708) is rotatably connected to the push rod (709). One side of the push rod (709) passes through the through groove (8).
6. The plasma surface treatment apparatus according to claim 5, characterized in that: The rotating threaded column (706) rotates through the rotating ring (6) on one side, and the third rotating column (7010) is rotatably connected to the ionization head (11).
Citation Information
Patent Citations
Plasma surface treatment device
CN212293721U