Flushing and spin-drying machine
By introducing an adjustment mechanism into the wafer spin dryer to change the direction of nitrogen purging, the problem of incomplete drying of microstructures and deep and narrow trench areas by traditional equipment has been solved, achieving a more comprehensive wafer drying effect.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-16
- Publication Date
- 2026-04-14
AI Technical Summary
Existing wafer spin dryers do not dry wafers with fine structures or deep and narrow trenches thoroughly, and traditional nitrogen purging cannot effectively cover them, resulting in residual liquid.
Design a washing and spin-drying machine. By introducing an adjustment mechanism into the nitrogen drying device, the direction of nitrogen blowing is changed, so that the nitrogen can blow obliquely onto the wafer surface and avoid being blocked by the support frame. The synchronous or grouped oscillation of the air vanes is achieved by using air vanes and control components to change the air outlet channel and enhance the drying effect.
It improves the drying effect on microstructures and deep, narrow trench areas, ensuring more thorough drying of the wafer surface and reducing the need for subsequent drying processes.
Smart Images
Figure CN224124529U_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the technical field of wafer washing equipment, and in particular relates to a washing and drying machine. Background Technology
[0002] A wafer is a silicon wafer used to manufacture silicon semiconductor circuits; its raw material is silicon.
[0003] The wafer manufacturing process requires cleaning and drying of the wafers. Failure to clean them will severely affect the product yield. Therefore, a key piece of equipment for cleaning and drying wafers—the wafer spin dryer—has emerged. A typical wafer spin dryer includes components such as a cavity, servo motor, water spray device, nitrogen drying device, and solenoid valve. The wafers are arranged in parallel along one direction within the cavity.
[0004] Wafer spin dryers use centrifugal force generated by high-speed rotation perpendicular to the wafer alignment direction to quickly remove moisture and residues from the wafer surface, reducing the risk of contamination. The specific steps are as follows:
[0005] 1. Place the wafer to be processed into the clamp of the spin dryer, ensure that the wafer is fixed and stable, start the spin dryer, and the wafer will start to rotate at high speed;
[0006] 2. Under high-speed rotation, the liquid on the wafer surface is thrown off the wafer surface by centrifugal force and flies towards the inner wall of the spin dryer;
[0007] 3. After the spin-drying process is completed, the spin dryer gradually slows down until it stops, and then the dried wafer is taken out.
[0008] However, existing wafer spin dryers may not achieve the desired drying effect for some wafers with fine structures or deep and narrow trenches. This is because the nitrogen purging of traditional spin dryers is set on one side of the cylinder, and the gas is sprayed directly from the fixed nozzle, which cannot reach these wafers with fine structures or deep and narrow trenches.
[0009] In addition, some areas (such as the edges or support parts of the wafer) may not be blown in place, resulting in a small amount of residual liquid. This can also lead to incomplete drying. Although the spin dryer can remove most of the moisture from the wafer surface, subsequent drying is still required. Utility Model Content
[0010] The technical problem to be solved by this utility model is to provide a washing and spin-drying machine to overcome the shortcomings of the existing technology in that the drying process does not thoroughly clean the wafer surface.
[0011] The technical solution adopted by this utility model to solve its technical problem is:
[0012] A washing and spin-drying machine includes a cavity, in which a nitrogen drying device is disposed. The nitrogen drying device has an air outlet, and an adjustment mechanism is installed in the air outlet. The adjustment mechanism is used to guide the nitrogen drying device to blow along the wafer alignment direction, so as to change the problem of fixed nitrogen blowing angle in existing nitrogen drying devices.
[0013] In existing technologies, the edges or support areas of wafers are often blocked during nitrogen purging, making it difficult to reach these areas during forward purging.
[0014] The above technical solution changes the direction of nitrogen blowing, allowing nitrogen to be blown obliquely onto the wafer surface without being blocked by the support frame that holds the wafer in place, thus enabling the wafer to be dried more thoroughly.
[0015] Furthermore, the adjustment mechanism includes a fan blade and a control component. The fan blade is movably connected inside the cavity and located at the air outlet. The control component is connected to the fan blade in a transmission manner. The control component is used to adjust the fan blade so that the fan blade swings along the wafer alignment direction. In this way, the space formed between the fan blades becomes the air outlet channel of the nitrogen drying device's air outlet.
[0016] Furthermore, it also includes an installation component, which includes a fixed frame, a rotating component, and a connecting frame. The upper or lower end of the fan blade is rotatably connected to the fixed frame via the rotating component. There are two connecting frames, which are fixed at both ends of the fixed frame respectively. The fixed frame is fixed in the cavity via the connecting frames. The adjustment mechanism adjusts the swing direction of the fan blade, while the installation component fixes the adjustment mechanism in the cavity, while allowing the fan blade to swing.
[0017] Furthermore, there are several air blades, and the nitrogen drying device has multiple air outlets. Each of the air blades is connected to the control component for transmission. In actual use, there are often multiple air outlets, and the air blades are installed according to the number of air outlets.
[0018] Furthermore, the control component controls multiple blades to swing synchronously; or, the blades are arranged in groups, with several blades in each group swinging synchronously.
[0019] Furthermore, the control assembly includes an adjustment bracket, on which several fan blades are pivotally connected and evenly distributed.
[0020] Furthermore, the control assembly also includes a drive device, which includes a linear drive mechanism and a drive rod. A moving track is provided in the cavity to allow the drive rod to move linearly along the wafer alignment direction. One end of the drive rod is connected to the back of the adjustment bracket, and the other end is connected to the drive end of the linear drive mechanism. The linear drive mechanism is installed outside the cavity, or it can be directly installed inside the nitrogen drying device and share the space with the nitrogen drying device.
[0021] There are two connecting frames, which are fixed at both ends of the fixed frame. The fixed frame is installed in the cavity through the connecting frames. The fixed frame can be fixed in the cavity by any connection method. The fan blade is driven by the linkage component and rotates under the fixed frame as a rotating component.
[0022] Furthermore, the rotating component is located on the end face of the fan blade away from the linkage assembly, which allows the fan blade to be adjusted over a wider range.
[0023] Furthermore, the fan blades are also equipped with static electricity elimination components. The static electricity elimination components are installed using the fan blade mechanism, making reasonable use of space.
[0024] Preferably, the static electricity elimination component includes a discharge electrode disposed on the surface of the air vane. The discharge electrode ionizes the surrounding air through tip discharge, forming ions required to neutralize static electricity. The high-voltage electric field is used to ionize the air, generating a large number of positive and negative ions. These ions interact with the static charge on the surface of the object, thereby achieving static electricity neutralization. This efficiently removes static electricity while ensuring the safe operation of the equipment. A discharge electrode can be disposed on each air vane, or on several air vanes, and the discharge electrode is disposed at the corresponding position of the air outlet.
[0025] The beneficial effects of this utility model are:
[0026] 1. By changing the blowing path of the nitrogen drying device's air outlet, the direction of nitrogen blowing toward the wafer can be changed, thereby increasing the purging range. Nitrogen from different directions can be blown onto the microstructures or deep and narrow trenches on the wafer from different angles, thus improving the drying effect.
[0027] 2. Nitrogen gas can be blown obliquely onto the wafer surface, and the nitrogen gas will not be blocked by the support frame, which helps to improve the drying effect of the wafer. Attached Figure Description
[0028] The technical solution of this application will be further described below with reference to the accompanying drawings and embodiments.
[0029] Figure 1 This is a three-dimensional structural diagram of an embodiment of this application;
[0030] Figure 2 This is a three-dimensional structural diagram from another perspective of an embodiment of this application;
[0031] Figure 3 This is a schematic diagram of the structure installed in the cavity according to an embodiment of this application;
[0032] Figure 4 This is a schematic diagram of the existing technology structure.
[0033] The attached figures are labeled as follows:
[0034] 1. Cavity; 2. Nitrogen drying device; 3. Adjustment mechanism; 3.1. Fan blades; 3.2. Linkage assembly; 3.21. Adjustment bracket; 3.22. Drive device; 3.221. Linear drive mechanism; 3.222. Drive rod; 3.223. Moving track; 3.3. Mounting assembly; 3.31. Fixing frame; 3.32. Rotating component; 3.33. Connecting frame; 3.4. Air outlet duct; 3.5. Static electricity elimination assembly. Detailed Implementation
[0035] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other.
[0036] In the description of this application, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting the scope of protection of this application. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.
[0037] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art will understand the specific meaning of the above terms in this application based on the specific circumstances.
[0038] The technical solution of this application will now be described in detail with reference to the accompanying drawings and embodiments.
[0039] Example 1
[0040] Combined with appendix Figure 1-4This embodiment provides a washing and spin-drying machine, including a cavity 1, wherein the cavity 1 has a nitrogen drying device 2, the nitrogen drying device 2 has one or more air outlets; the cavity 1 is provided with an adjustment mechanism 2, which is used to guide the nitrogen drying device 2 to blow along the wafer arrangement direction, so as to change the problem of fixed nitrogen blowing angle in the existing nitrogen drying device 2.
[0041] The adjustment mechanism 3 includes a fan blade 3.1, a control component 3.2, and an installation component 3.3;
[0042] The air vane 3.1 is movably connected inside the cavity 1 and located at the air outlet. The control component 3.2 is connected to the air vane 3.1 for transmission. The control component 3.2 is used to adjust the air vane so that the air vane 3.1 swings along the wafer alignment direction.
[0043] The mounting component 3.3 includes a fixed frame 3.31, a rotating component 3.32, and a connecting frame 3.33. The upper or lower end of the fan blade 3.1 is rotatably connected to the fixed frame 3.31 via the rotating component 3.32. There are two connecting frames 3.33, which are fixed at both ends of the fixed frame 3.31 respectively. The fixed frame 3.31 is fixed in the cavity 1 via the connecting frames 3.33.
[0044] Control component 3.2 controls multiple vanes 3.1 to oscillate synchronously; or, the vanes 3.1 are arranged in groups, with several vanes 3.1 within each group oscillating synchronously.
[0045] When the nitrogen drying device 2 has multiple air outlets, there are several air vanes 3.1. Each air vane 3.1 is connected to the control component 3.2. In actual use, there are often multiple air outlets. The air vanes are installed according to the number of air outlets. The air vanes 3.1 are located at the center between the air outlets of adjacent nitrogen drying devices 2. Part of the air vane 3.1 extends into the air outlet and part of it extends in front of the air outlet and is arranged along the wafer arrangement direction. The space formed between two opposing air vanes 3.1 is the air outlet channel 3.4 of the air outlet of the nitrogen drying device 2. When all the air vanes 3.1 swing in one direction, the air outlet channel 3.4 will be changed, thereby changing the air outlet direction of the nitrogen drying device 2.
[0046] The control component 3.2 controls multiple vanes 3.1 to swing synchronously; or, the vanes 3.1 are set in groups, with several vanes in each group swinging synchronously.
[0047] Furthermore, the control component 3.2 includes an adjustment bracket 3.21, on which several wind vanes are pivotally connected and evenly distributed.
[0048] Preferably, the control component 3.2 further includes a drive device 3.22, enabling the product of this utility model to be electrically driven. The drive device 3.22 can be a cylinder, electric cylinder, pneumatic cylinder, or a linear slide, etc., capable of linear movement. The drive device 3.22 drives the adjusting bracket 3.21 to move linearly within the cavity 1. The linear movement of the adjusting bracket 3.21 within the cavity 1 causes the end of the fan blade 3.1 near the drive device 3.22 to swing. The swinging of the fan blade 3.1 changes the air outlet channel 3.4, thereby changing the air outlet direction of the nitrogen drying device 2.
[0049] The driving device 3.22 includes a linear driving mechanism 3.221 and a driving rod 3.222. A moving track 3.223 is provided in the cavity 1 to allow the driving rod 3.222 to move linearly along the wafer arrangement direction. One end of the driving rod 3.222 is connected to the back of the adjusting bracket 3.21, and the other end is connected to the driving end of the linear driving mechanism 3.221. The linear driving mechanism 3.221 is installed outside the cavity 1, or it can be directly installed inside the nitrogen drying device 2 and share the space with the nitrogen drying device 2.
[0050] Furthermore, there are two connecting frames 3.31, which are respectively fixed at both ends of the fixed frame 3.33. The fixed frame 3.33 is installed in the cavity 1 through the connecting frames 3.31. The fixed frame 3.33 can be fixed in the cavity 1 by any connection method. The fan blade 3.1 is controlled by the control component 3.2 and rotates under the fixed frame as a rotating component. The rotating component 3.32 is set on the end face of the fan blade 3.1 away from the control component 3.2, so that the fan blade 3.1 can be adjusted within a larger range.
[0051] In specific implementation of this utility model:
[0052] When the nitrogen drying device is activated and the drive unit is set to reciprocating motion, the drive unit moves the drive rod linearly, which in turn moves the adjusting bracket linearly. The adjusting bracket then causes the air vanes to swing left and right. This changes the airflow path at the outlet of the nitrogen drying device, directing the airflow to the wafers in the chamber in a left-right direction. This ensures that the wafers with fine structures, deep or narrow trenches, edges, or support structures are all cleaned and dried evenly and quickly, improving wafer processing efficiency.
[0053] Example 2
[0054] In addition to the above structure, the fan blades are also equipped with static electricity elimination components. The static electricity elimination components are installed using the fan blade mechanism, making reasonable use of space. The static electricity elimination components include discharge electrodes, which are set on the surface of the fan blades. The discharge electrodes ionize the surrounding air through tip discharge, forming ions required to neutralize static electricity. The high-voltage electric field is used to ionize the air, generating a large number of positive and negative ions. These ions interact with the static charge on the surface of the object, thereby achieving static electricity neutralization. This efficiently removes static electricity while ensuring the safe operation of the equipment. Discharge electrodes can be set on each fan blade, or on several fan blades, and the discharge electrodes are set at the corresponding positions of the air outlet.
[0055] In specific implementation of this utility model:
[0056] The high-speed rotation of wafer washing and spin-drying machines generates static electricity, which poses a risk of attracting particles or damaging the equipment. Therefore, a discharge electrode is added to the air vane. On the one hand, the ions released by the discharge electrode are blown into the cavity by the air inlet, accelerating the fusion of ions with the gas in the cavity and achieving a good static neutralization effect. On the other hand, this structural design simplifies the structure, saves space, and brings more functions that are beneficial to wafer washing and spin-drying.
[0057] Based on the above-described preferred embodiments according to this application, and through the foregoing description, those skilled in the art can make various changes and modifications without departing from the technical concept of this application. The technical scope of this application is not limited to the contents of the specification, but must be determined according to the scope of the claims.
Claims
1. A rinsing and spin-drying machine, comprising a cavity, wherein a nitrogen drying device is disposed within the cavity, characterized in that, The nitrogen drying device has an air outlet, and an adjustment mechanism is provided inside the air outlet. The adjustment mechanism is used to guide the nitrogen drying device to blow along the wafer alignment direction. The adjustment mechanism includes a fan blade and a control component. The fan blade is movably connected to the cavity and located at the air outlet. The control component is drivenly connected to the fan blade. The control component is used to adjust the fan blade so that the fan blade swings along the wafer alignment direction.
2. The rinsing and spin-drying machine according to claim 1, characterized in that, It also includes an installation component, which includes a fixed frame, a rotating component, and a connecting frame. The upper or lower end of the fan blade is rotatably connected to the fixed frame via the rotating component. There are two connecting frames, which are fixed at both ends of the fixed frame respectively. The fixed frame is fixed in the cavity via the connecting frames.
3. A rinsing and spin-drying machine according to claim 2, characterized in that, There are several air vanes, and the nitrogen drying device has multiple air outlets. Each air vane is connected to the control component via a transmission mechanism.
4. A rinsing and spin-drying machine according to claim 3, characterized in that, The control component controls multiple fan blades to swing synchronously. Alternatively, the air vanes are arranged in groups, with several vanes in each group oscillating synchronously.
5. A rinsing and spin-drying machine according to claim 2, characterized in that, The control component includes an adjustment bracket, and several of the fan blades are pivotally connected to the adjustment bracket and are evenly distributed.
6. A rinsing and spin-drying machine according to claim 2, characterized in that, The control component also includes a drive device, which includes a linear drive mechanism and a drive rod. A moving track is provided in the cavity to allow the drive rod to move linearly along the wafer alignment direction. One end of the drive rod is connected to the back of the adjustment bracket, and the other end is connected to the drive end of the linear drive mechanism. The linear drive mechanism is installed outside the cavity.
7. A rinsing and spin-drying machine according to claim 2, characterized in that, The rotating component is located on the end face of the fan blade away from the linkage assembly.
8. A rinsing and spin-drying machine according to claim 2, characterized in that, The fan blade is also equipped with an electrostatic elimination component.
9. A rinsing and spin-drying machine according to claim 8, characterized in that, The static electricity elimination component includes a discharge electrode disposed on the surface of the air vane. The discharge electrode ionizes the surrounding air through tip discharge, forming ions required to neutralize static electricity.