Textile structure and protection device

By setting discretely distributed photocatalytic coating films on textiles and arranging them in an alternating pattern, combined with antistatic coils, the hardness problem caused by existing textile coatings is solved, achieving a soft feel and a multifunctional textile structure.

CN224130637UActive Publication Date: 2026-04-17NAIKUSHI HOME TEXTILES (ZHEJIANG) CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
NAIKUSHI HOME TEXTILES (ZHEJIANG) CO LTD
Filing Date
2025-05-23
Publication Date
2026-04-17

AI Technical Summary

Technical Problem

Existing textiles become stiff after using photocatalytic materials, affecting their flexibility and user experience, and the coating method has issues with water resistance.

Method used

The coating adopts a discretely distributed upper and lower photocatalytic coating film structure. The coating film has a small area and a large spacing, and is arranged in an alternating manner. Antistatic coils are set between the films to ensure flexibility and antibacterial effect, and to avoid the increase in hardness caused by the overall coating.

Benefits of technology

It produces textiles that are comfortable to the touch, flexible, and breathable, suitable for home and daily necessities, with self-cleaning and antibacterial functions, and adaptable to various deformation needs.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of textile products, in particular to a textile structure and a protective device, which comprise a textile base material layer, the upper surface of the textile base material layer is connected with a plurality of upper photocatalytic coating films which are distributed discretely, and the lower surface of the textile base material layer is connected with a plurality of lower photocatalytic coating films. The lower surface of the textile base material layer is connected with a plurality of lower photocatalytic coating films which are distributed in a discrete mode, and the fabric is comfortable in hand feeling, clean and antibacterial.
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Description

Technical Field

[0001] This utility model relates to the field of textile product technology, and in particular to a textile structure and protective device. Background Technology

[0002] There are many types and styles of functional textiles available, and more and more textiles with antibacterial, deodorizing and self-cleaning functions are emerging, which are usually referred to as textiles with photocatalytic materials.

[0003] For example, Chinese patent application number 202411244297.6 discloses a method for preparing textiles with high efficiency and long-lasting visible light photocatalytic properties and a textile with photocatalytic properties. The method improves the photocatalytic performance and reduces the tendency of aggregation by modifying the nitrobenzoic acid end group of graphitic carbon nitride. The modified gC is treated with a ball mill and an ultrasonic cell pulverizer in combination with a dispersant and deionized water.

[0004] For example, Chinese patent application number 201911144190.3 discloses a method for preparing a durable photocatalytic self-healing super-dual-hydrophobic UV-resistant textile. The method involves mixing a precursor and a solvent, and using a sol-gel method. After the precursor is hydrolyzed and condensed to form a SiO2 sol, a photocatalyst, fluorosilane, and hexane are added. After the reaction is completed, the mixture is dried under normal pressure and pulverized to obtain fluorosilicone polymer-modified nanocomposite aerogel particles. The fluorosilicone polymer-modified nanocomposite aerogel particles, organosilicon polymers, and solvent are mixed and stirred to obtain a mixed dispersion of fluorosilicone polymer-modified nanocomposite aerogel particles and organosilicon polymers. The textile is then immersed in the above mixed dispersion, and after padding and drying, a durable photocatalytic self-healing super-dual-hydrophobic UV-resistant textile is obtained.

[0005] Existing textile manufacturing technologies typically involve overall immersion to form the photocatalytic coating, resulting in a consistent presence of photocatalytic material throughout the product. Other methods involve coating the textile substrate with a photocatalytic layer applied by spraying or coating, but these also rarely completely cover the substrate. However, current technologies use crosslinking agents to maintain washability, resulting in a large amount of crosslinking agent in the impregnation or coating. Excessive use of crosslinking agents can lead to a stiff feel in the textile and, to some extent, negatively impact the efficiency of the photocatalytic particles. Utility Model Content

[0006] The purpose of this invention is to provide a textile structure that is comfortable to the touch and clean and antibacterial.

[0007] The above-mentioned objective of this utility model is achieved through the following technical solution: a textile structure, including a textile substrate layer, wherein a plurality of upper photocatalytic coating films are connected to the upper surface of the textile substrate layer in a discrete distribution, and a plurality of lower photocatalytic coating films are connected to the lower surface of the textile substrate layer in a discrete distribution.

[0008] As a preferred embodiment of this invention, the area of ​​the superimposed image formed by the overlapping of the projections of all the upper photocatalytic coating films in the vertical direction with the projections of all the lower photocatalytic coating films in the vertical direction is less than or equal to 20% of the total area of ​​all the upper photocatalytic coating films and also less than or equal to 20% of the total area of ​​all the lower photocatalytic coating films.

[0009] As a preferred embodiment of this invention, the area of ​​the upper photocatalytic coating film is less than or equal to 1 square centimeter, and the area of ​​the lower photocatalytic coating film is less than or equal to 1 square centimeter.

[0010] As a preferred embodiment of this invention, the spacing between adjacent photocatalytic coating films is greater than or equal to 2 mm.

[0011] As a preferred embodiment of this invention, the upper photocatalytic coating film is circular, rhomboid, or hexagonal, and the lower photocatalytic coating film is circular, rhomboid, or hexagonal.

[0012] As a preferred embodiment of this invention, the total area of ​​the upper and lower photocatalytic coating films is 50%-90% of the area of ​​the textile substrate layer.

[0013] As a preferred embodiment of this invention, the textile substrate layer comprises two or more textile fabric pieces arranged vertically, and the peripheries of all the textile fabric pieces are sewn together with sewing thread.

[0014] As a preferred embodiment of this invention, the upper photocatalytic coating film is located on the upper surface of the uppermost textile fabric piece, and the lower photocatalytic coating film is located on the lower surface of the lowermost textile fabric piece. The upper and lower photocatalytic coating films are staggered in the upper and lower projection planes. An upper antistatic thread surrounds the sewing coil around the outer periphery of the upper photocatalytic coating film, and the upper antistatic thread surrounds the sewing coil on each textile fabric piece. Similarly, a lower antistatic thread surrounds the sewing coil around the outer periphery of the lower photocatalytic coating film, and the lower antistatic thread surrounds the sewing coil on each textile fabric piece.

[0015] As a preferred embodiment of this invention, a conductive fiber bundle is sewn between the upper antistatic thread surrounding the sewing coil and the lower antistatic thread surrounding the sewing coil.

[0016] A textile protective device includes the aforementioned textile structure, wherein peripheral connectors for mounting and connecting to the protected product are connected to the peripheral portion of the textile structure.

[0017] The beneficial effects of this invention are as follows: While ensuring self-cleaning, antibacterial, and deodorizing functions, the overall textile structure is more flexible, will not stiffen, and has a comfortable feel. It can be better used in home products and other fields, including everyday items, many of which require antibacterial functions. Furthermore, since many situations require bending or deformation, this structural design is less prone to damage and also provides better breathability. Attached Figure Description

[0018] Figure 1 This is a three-dimensional structural diagram of the disassembled state of the textile structure in Example 1;

[0019] Figure 2 yes Figure 1 A schematic diagram of the three-dimensional structure from a lower perspective;

[0020] Figure 3 yes Figure 1 A schematic diagram of the three-dimensional structure after the upper and lower parts of the central structure are stitched together.

[0021] Figure 4 yes Figure 3 A schematic diagram of the three-dimensional structure from a lower perspective;

[0022] Figure 5 This is a three-dimensional structural schematic diagram of the textile protective device of Example 2. Detailed Implementation

[0023] The present invention will be further described in detail below with reference to the accompanying drawings.

[0024] This specific embodiment is merely an explanation of the present utility model and is not intended to limit the present utility model. After reading this specification, those skilled in the art can make modifications to this embodiment without contributing any inventive step, but such modifications are protected by patent law as long as they fall within the scope of the claims of the present utility model.

[0025] Example 1, such as Figure 1-4As shown, a textile structure includes a textile substrate layer 1, which can be made of woven fabric, knitted fabric, non-woven fabric, warp-knitted suede, corduroy, plush, or other fabrics. Multiple upper photocatalytic coating films 11 are discretely distributed on the upper surface of the textile substrate layer 1, and multiple lower photocatalytic coating films 12 are discretely distributed on the lower surface of the textile substrate layer 1. This is the most significant design feature of this application: the coating is fragmented and discrete, rather than being applied as a whole in existing technologies. This creates gaps between adjacent upper photocatalytic coating films 11 and adjacent lower photocatalytic coating films 12, forming areas in the textile substrate layer 1 that are easily bent and deformed, resulting in a less rigid overall structure and a softer feel.

[0026] Specifically, the area of ​​the superimposed shadow formed by the overlapping of the projections of all the upper photocatalytic coating films 11 and all the lower photocatalytic coating films 12 in the vertical direction is less than or equal to 20% of the total area of ​​all the upper photocatalytic coating films 11 and less than or equal to 20% of the total area of ​​all the lower photocatalytic coating films 12. The purpose of this setting is to reduce the simultaneous presence of upper photocatalytic coating films 11 and lower photocatalytic coating films 12 on the upper and lower parts of the textile substrate layer 1. That is, the projections of the upper photocatalytic coating films 11 and lower photocatalytic coating films 12 are staggered as much as possible in the horizontal projection plane. This is also for better feel and to reduce the situation where the coating film is present on the upper and lower parts at the same time, resulting in a large thickness in the part and making many local parts feel hard and difficult to bend and deform.

[0027] The thickness of both the upper photocatalytic coating film 11 and the lower photocatalytic coating film 12 can be controlled between 200-500 nanometers. The area of ​​the upper photocatalytic coating film 11 is less than or equal to 1 square centimeter, and the area of ​​the lower photocatalytic coating film 12 is less than or equal to 1 square centimeter, preferably around 0.5 square centimeters. Smaller area structures will yield better results.

[0028] Furthermore, the spacing between adjacent upper photocatalytic coating films 11 is greater than or equal to 2 mm, and can be controlled at around 4 mm. Such a spacing is more suitable. Of course, the spacing between adjacent lower photocatalytic coating films 12 is also preferably greater than or equal to 2 mm.

[0029] Preferably, the upper photocatalytic coating film 11 is circular, rhomboid, or hexagonal, and the lower photocatalytic coating film 12 is circular, rhomboid, or hexagonal. Such shapes are relatively simple and practical.

[0030] Here, we introduce some of the processing techniques for the above-mentioned structure. We need a masking spraying fixture with a panel covering the textile substrate layer 1 and discrete round holes, diamond holes or hexagonal holes on the panel. These holes are for the photocatalytic coating to be sprayed onto the textile substrate layer 1 to form the upper photocatalytic coating film 11 or the lower photocatalytic coating film 12.

[0031] Preferably, the total area of ​​the upper photocatalytic coating film 11 and the lower photocatalytic coating film 12 is 50%-90% of the area of ​​the textile substrate layer 1, with 85% being more suitable. Here, the area is calculated only on one side; that is, even if both the upper and lower photocatalytic coating films 11 and 12 are placed on one side of the textile substrate layer 1, they will not cover the entire surface. This ratio allows for a staggered arrangement, with a portion of the photocatalytic coating film remaining on either the upper or lower side of each section. This improves practicality.

[0032] Furthermore, the textile substrate layer 1 includes two or more textile fabric pieces 10 arranged vertically, with multiple textile fabric pieces 10 stacked on top of each other, and the peripheries of all the textile fabric pieces 10 are sewn together with sewing thread. Of course, to further enhance the connection, the middle area of ​​the textile fabric pieces 10 can also be sewn vertically to strengthen the connection effect. As mentioned above, the textile fabric pieces 10 can be woven fabric, knitted fabric, non-woven fabric, warp-knitted suede fabric, corduroy fabric, plush fabric, etc.

[0033] Furthermore, the upper photocatalytic coating film 11 is located on the upper surface of the uppermost textile fabric piece 10, and the lower photocatalytic coating film 12 is located on the lower surface of the lowermost textile fabric piece 10. The upper photocatalytic coating film 11 and the lower photocatalytic coating film 12 are staggered in the upper and lower projection planes. This design means that the upper photocatalytic coating film 11 and the lower photocatalytic coating film 12 do not overlap vertically. Moreover, an upper antistatic thread surrounds the sewing coil 110 around the upper photocatalytic coating film 11. The upper antistatic thread surrounds the sewing coil 110 and is sewn onto each textile fabric piece 10. The upper antistatic thread surrounds the sewing coil 110, which is a conventional antistatic thread bundle sewn vertically and wraps around the coil, primarily serving to stabilize the structural connection and provide antistatic effects. Similarly, a lower antistatic thread surrounds the sewing coil 120 around the lower photocatalytic coating film 12 and is sewn onto each textile fabric piece 10. Of course, the textile substrate layer 1 can also be made of just a piece of textile fabric 10 with photocatalytic coating films on the upper and lower sides, which also has good results.

[0034] Furthermore, a conductive fiber bundle 130 is sewn between the upper antistatic thread surrounding the sewing coil 110 and the lower antistatic thread surrounding the sewing coil 120. The antistatic mechanism of the antistatic thread is to dissipate most of the generated static electricity through moisture absorption, which is a leakage effect. The antistatic mechanism of the conductive fiber is mainly that when the conductive fiber is close to a charged body, it uses the electric field to induce its own corona discharge, thereby neutralizing the static electricity, which is a discharge effect. Therefore, this structure means that when the ambient humidity is low, the antistatic ability of the upper antistatic thread surrounding the sewing coil 110 and the lower antistatic thread surrounding the sewing coil 120 will decrease. At this time, the conductive fiber bundle 130 can be used to assist in the discharge.

[0035] Example 2, as Figure 5 As shown, a textile protective device includes a textile structure as described in Embodiment 1. The periphery of the textile structure is connected to peripheral connectors 2 for installation and connection to the protected product. The peripheral connectors 2 can be zippers, Velcro, or plastic clips for easy disassembly. They are mainly connected around the periphery of the textile substrate layer 1, for example, by sewing the peripheral connectors 2 around the periphery of the textile substrate layer 1. These peripheral connectors 2 can be used to connect to food protective covers or daily necessities such as quilts for protection. Their antibacterial properties are very suitable for daily life. Of course, they can also be used in other situations requiring antibacterial and deodorizing properties.

[0036] The above description is merely a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this utility model, and these modifications or substitutions should all be covered within the protection scope of this utility model. Therefore, the protection scope of this utility model should be determined by the scope of the claims.

Claims

1. A textile construction characterized in that, It includes a textile substrate layer (1), on the upper surface of which are connected a plurality of upper photocatalytic coating films (11) in a discrete distribution, and on the lower surface of which are connected a plurality of lower photocatalytic coating films (12) in a discrete distribution.

2. A textile construction according to claim 1, characterised in that, The area of ​​the superimposed shadow formed by the overlapping of the projections of all the upper photocatalytic coating films (11) in the vertical direction with the projections of all the lower photocatalytic coating films (12) in the vertical direction is less than or equal to 20 percent of the total area of ​​all the upper photocatalytic coating films (11) and also less than or equal to 20 percent of the total area of ​​all the lower photocatalytic coating films (12).

3. A textile construction according to claim 1, wherein, The area of ​​the upper photocatalytic coating film (11) is less than or equal to 1 square centimeter, and the area of ​​the lower photocatalytic coating film (12) is less than or equal to 1 square centimeter.

4. A textile construction according to claim 1, wherein, The spacing between adjacent photocatalytic coating films (11) is greater than or equal to 2 mm.

5. A textile structure according to claim 1, characterized in that, The upper photocatalytic coating film (11) is in the shape of a circle, a rhombus or a hexagon, and the lower photocatalytic coating film (12) is in the shape of a circle, a rhombus or a hexagon.

6. A textile construction according to claim 1, wherein, The total area of ​​the upper photocatalytic coating film (11) and the lower photocatalytic coating film (12) is 50%-90% of the area of ​​the textile substrate layer (1).

7. A textile construction according to claim 1, wherein, The textile substrate layer (1) includes two or more textile fabric pieces (10) arranged vertically, and the periphery of all the textile fabric pieces (10) is sewn together with sewing thread.

8. A textile construction according to claim 7, characterised in that, The upper photocatalytic coating film (11) is located on the upper surface of the uppermost textile piece (10), and the lower photocatalytic coating film (12) is located on the lower surface of the lowermost textile piece (10). The upper photocatalytic coating film (11) and the lower photocatalytic coating film (12) are arranged alternately in the upper and lower projection planes. The upper photocatalytic coating film (11) is surrounded by an upper antistatic thread surrounding the sewing coil (110), and the upper antistatic thread surrounding the sewing coil (110) is sewn onto each textile piece (10). The lower photocatalytic coating film (12) is surrounded by a lower antistatic thread surrounding the sewing coil (120), and the lower antistatic thread surrounding the sewing coil (120) is sewn onto each textile piece (10).

9. A textile construction according to claim 8, characterised in that, A conductive fiber bundle (130) is sewn between the upper antistatic thread surrounding the sewing coil (110) and the lower antistatic thread surrounding the sewing coil (120).

10. A textile protection device characterized in that, The textile structure includes any one of claims 1-9, wherein a peripheral connector (2) for mounting and connecting to the protected product is connected to the peripheral portion of the textile structure.

Citation Information

Patent Citations

  • Preparation method of durable photocatalytic self-repairing super-amphiphobic anti-ultraviolet textile

    CN111005231A

  • Preparation method of textile with efficient and durable visible light catalytic performance and textile with photocatalytic performance

    CN118996840A