Vacuum processing chamber and multi-chamber vacuum processing device
By setting a rotating first mating component and a workpiece loading mechanism in the vacuum processing chamber, the horizontal movement of the workpiece between chambers is realized, which solves the problems of complex equipment structure and film contamination, improves production efficiency and reduces costs.
Patent Information
- Application Number
- CN202521031759.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-23
- Publication Date
- 2026-04-21
- Estimated Expiration
- 2035-05-23
AI Technical Summary
Existing continuous sputtering coating equipment has a complex structure and high manufacturing cost. When the workpiece is transferred between chambers, it needs to be unloaded and reloaded, which increases the risk of film contamination. Multiple transfer operations lead to extended production cycles and reduced production efficiency.
The first mating component is rotatably set at the top and/or bottom of the vacuum processing chamber. The workpiece loading mechanism moves along the first direction and the workpiece frame is driven to rotate by the transmission mechanism. This avoids setting a loading device in each chamber. The workpiece moves horizontally between chambers, reducing the unloading and loading process. The positioning and limiting mechanism ensures precise mating.
It simplifies the structure of the vacuum processing chamber, reduces manufacturing costs, minimizes the risk of membrane contamination, improves production efficiency, and avoids extended production cycles.