Large vacuum chamber with double-layer gas uniform flow structure

Abstract

The utility model relates to the field of photovoltaic equipment, and discloses a large vacuum chamber provided with a double-layer gas flow equalizing structure, and the double-layer gas flow equalizing structure comprises a pipeline box, and an upper flow equalizing assembly and a lower flow equalizing assembly which are arranged on the upper surface and the lower surface of the pipeline box. The pipeline box is located in the middle inside the cavity. The air inlet pipe comprises an upper-layer air inlet pipe and a lower-layer air inlet pipe which independently control air inlet. The upper flow uniformizing assembly sequentially comprises a first sealing ring, a diffusion flow uniformizing plate, a second sealing ring and a net-shaped flow uniformizing plate from bottom to top. Diffusion flow-uniformizing holes are formed in the diffusion flow-uniformizing plate, the diffusion flow-uniformizing holes are dispersed from the center hole to the periphery in a corrugated mode, and the farther the diffusion flow-uniformizing holes are away from the center hole, the denser the diffusion flow-uniformizing holes are. And the center of the diffusion uniform flow plate is positioned above the upper-layer air inlet. And uniformly distributed net-shaped flow uniformizing holes are formed in the net-shaped flow uniformizing plate. According to the utility model, the vacuum breaking efficiency can be improved, the gas distribution uniformity of the chamber can be improved, the silicon wafer falling rate can be reduced, and the yield can be improved.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic equipment, and in particular to a large vacuum chamber with a double-layer gas uniform flow structure. Background Technology

[0002] PECVD or PVD equipment requires operation in a vacuum environment during the coating process. Before product transport, the chamber must be ruptured to open the valves. Therefore, the rupture time directly affects coating efficiency, and the uniformity of the ruptured air directly impacts the yield of silicon wafers. Existing rupture methods involve placing multiple air inlets above or below the chamber, or using a single air inlet in conjunction with a gas distribution plate to increase the air intake, reduce the flow rate of the ruptured air, and improve its uniformity, thereby achieving rapid rupture.

[0003] As the market develops, to meet the demands of high-capacity PECVD or PVD, PECVD or PVD chambers on the market are gradually becoming larger, even employing double-layer coating methods. This significantly impacts the equipment's cavitation cycle time and yield. Existing cavitation structures and methods cannot meet the cavitation cycle time requirements of large chambers, or require increasing atmospheric pressure and gas volume to increase gas flow rate to match the production time cycle. Increasing gas flow rate can cause gas to concentrate at the inlet, potentially blowing silicon wafers off the carrier, reducing production yield, and ultimately affecting production capacity.

[0004] Therefore, a cavitation structure suitable for large chambers and double-layer coating equipment is needed to meet market demand. Utility Model Content

[0005] The purpose of this invention is to address the shortcomings of existing technologies by providing a large vacuum chamber with a double-layer gas uniform flow structure. This not only improves the vacuum breaking efficiency but also achieves uniform gas flow within the chamber, thereby improving the gas distribution uniformity of the large vacuum chamber equipment, reducing silicon wafer drop rate, and increasing yield.

[0006] To achieve the above objectives, the present invention adopts the following technical solution:

[0007] This utility model discloses a large vacuum chamber with a double-layer gas uniform flow structure, which includes a chamber and a double-layer gas uniform flow structure disposed in the chamber. The double-layer gas uniform flow structure includes a pipe box, an upper uniform flow component, and a lower uniform flow component. The pipe box includes a box body, an inlet pipe, and an outlet. The box body is rectangular and located in the middle of the chamber. The volume of the box body can fill the internal space of the chamber, thereby reducing the required evacuation volume and evacuation time of the chamber.

[0008] The air inlet pipe and air outlet are located inside the housing, with the air inlet located outside the chamber. The air inlet pipe includes an upper air inlet pipe and a lower air inlet pipe for independent air intake control. The air outlet includes an upper air outlet connected to the upper air inlet pipe and a lower air outlet connected to the lower air inlet pipe. The upper flow equalization component is located on the upper surface of the housing and connected to the upper air outlet; the lower flow equalization component is located on the lower surface of the housing and connected to the lower air outlet. The dual inlet pipes independently control the air intake of the double-layer gas flow equalization structure, allowing for flow rate control at each intake point according to production needs, thus improving air breaking efficiency.

[0009] The upper flow equalization assembly, from bottom to top, includes a first sealing ring, a diffusion flow equalization plate, a second sealing ring, and a mesh flow equalization plate. The diffusion flow equalization plate and the mesh flow equalization plate are respectively fixed to the upper surface of the box body. The upper surface of the box body, the first sealing ring, and the bottom surface of the diffusion flow equalization plate form a first flow equalization cavity, and the upper surface of the diffusion flow equalization plate, the second sealing ring, and the mesh flow equalization plate form a second flow equalization cavity. After the gas enters from the inlet pipe, it enters the first flow equalization cavity through the outlet, diffuses, then enters the second flow equalization cavity and flows out evenly, finally entering the chamber.

[0010] The diffusion and flow equalization plate is provided with diffusion and flow equalization holes, which radiate outwards from the central hole in a "wavy" pattern. The farther away from the central hole, the denser the distribution of the diffusion and flow equalization holes. The center of the diffusion and flow equalization plate is located above the upper air inlet, so that the airflow is stronger closer to the air inlet. By changing the density of the diffusion and flow equalization holes in conjunction with the airflow magnitude, the gas velocity in the central area is high, the sparse holes reduce resistance, the flow velocity in the edge area is low, and the dense holes increase the flow rate. This achieves the effect of diffusing the gas at the air outlet to the entire second flow equalization chamber. The mesh flow equalization plate is provided with uniformly distributed mesh flow equalization holes, which are used to further uniformly disperse the gas in the second flow equalization chamber into the chamber.

[0011] Furthermore, the structure of the lower flow equalization component is the same as that of the upper flow equalization component, reducing the types of accessories and facilitating production.

[0012] Furthermore, both the upper and lower air outlets are provided with two outlets each, and the diffusion uniform plate is provided with two diffusion center holes. The upper air outlets are all located directly below the diffusion center holes, and the lower air outlets are all located directly above the diffusion center holes. The upper air outlets all face upwards, and the lower air outlets all face downwards.

[0013] Furthermore, both the diffusion flow equalizer and the mesh flow equalizer are provided with isolation columns on their back sides to isolate the spacing between adjacent plates.

[0014] Furthermore, the air inlet pipe includes clamps, a corrugated pipe, and a vacuum tube. The vacuum tube is housed within the casing and connected to the air outlet. Clamps are located at both ends of the corrugated pipe. One end of the corrugated pipe is connected to the vacuum tube via a clamp, and the other end is connected to an external inflation device via a clamp. The clamp connection provides a quick-release function for easy maintenance, while the use of a corrugated pipe allows for dimensional error compensation and facilitates installation.

[0015] Furthermore, the box body is a hollow rectangular box formed by fixing several fixing plates, and the interior is provided with several crisscrossing stiffening plates to increase stability and fix the vacuum tube, which can reduce the weight of the entire box body and reduce the amount of manufacturing materials.

[0016] The advantages of this utility model are:

[0017] 1. The utility model has a box-shaped pipe box, which hides the air inlet pipe inside the box to fill the internal space of the cavity, thereby reducing the required evacuation volume and evacuation time of the cavity.

[0018] 2. This utility model adopts dual-inlet pipes for air intake and independently controls the intake of the double-layer gas uniform flow structure, so that the flow rate of each air intake point can be controlled according to production needs, which facilitates the improvement of air breaking efficiency.

[0019] 3. The flow equalization component of this utility model forms two flow equalization cavities by setting a diffusion flow equalization plate and a mesh flow equalization plate. The flow equalization is achieved by first diffusion and then flow equalization, thereby realizing the uniformity of gas distribution in the cavity, improving the uniformity of gas distribution in the large vacuum chamber equipment, reducing the silicon wafer drop rate, and improving the yield. Attached Figure Description

[0020] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of the structure of this embodiment.

[0022] Figure 2 This is a schematic diagram of a double-layer gas uniform flow structure.

[0023] Figure 3 It is an exploded diagram of a two-layer gas uniform flow structure.

[0024] Figure 4 This is a structural diagram of the pipe box.

[0025] Figure 5 This is a front view of a double-layer gas uniform flow structure.

[0026] Figure 6 yes Figure 5 A schematic diagram of the cross-sectional structure along AA.

[0027] Figure 7 This is a front view of the diffusion uniform plate.

[0028] Figure 8 This is a schematic diagram of the back of the diffusion uniform plate.

[0029] Figure 9 This is a front view of the mesh flow equalizer.

[0030] Figure 10 This is a schematic diagram of the back of the mesh flow equalizer.

[0031] Figure 11 This is a top view of a double-layer gas uniform flow structure.

[0032] Figure 12 yes Figure 11 A schematic diagram of the cross-section along B_B.

[0033] Figure 13 yes Figure 12 A magnified view of a section at point F.

[0034] Explanation of key component symbols:

[0035] 1. Pipe box; 11. Box body; 12. Inlet pipe; 13. Outlet; 14. Clamp; 15. Corrugated pipe; 16. Vacuum tube.

[0036] 2. Upper flow equalization component;

[0037] 3. Lower flow equalization component;

[0038] 41. First sealing ring; 42. Diffusion equalization plate; 43. Second sealing ring; 44. Mesh equalization plate; 45. First equalization cavity; 46. Second equalization cavity; 47. Diffusion equalization hole; 48. Diffusion center hole; 49. Mesh equalization hole.

[0039] 5. Isolation column;

[0040] 100. Chamber; 200. Double-layer gas uniform flow structure. Detailed Implementation

[0041] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0042] In this utility model, unless otherwise stated, directional terms such as "up," "down," "left," and "right" are generally understood in conjunction with the accompanying drawings and the directions shown in actual applications.

[0043] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0044] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0045] The endpoints and any values ​​of the ranges disclosed herein are not limited to the precise ranges or values, and should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of the various ranges, the endpoint values ​​of the various ranges and individual point values, and individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be considered as specifically disclosed herein. The terms "optional" and "discretionary" mean that they may or may not be included (or may or may not be present).

[0046] like Figures 1 to 3 As shown, this utility model discloses a large vacuum chamber with a double-layer gas uniform flow structure, which includes a chamber 100 and a double-layer gas uniform flow structure 200 disposed in the chamber 100.

[0047] The double-layer gas flow equalization structure 200 includes a pipe box 1, an upper flow equalization component 2, and a lower flow equalization component 3.

[0048] Among them, such as Figures 4 to 6 As shown, the tubing box 1 includes a box body 11, an inlet pipe 12, and an outlet pipe 13. Specifically, the box body 11 is rectangular and located in the center of the chamber. The volume of the box body 11 can fill the internal space of the chamber, thereby reducing the required evacuation volume and evacuation time of the chamber. Specifically, the box body 11 is a hollow rectangular box formed by fixing several plates, and the interior is provided with several crisscrossing ribs to increase stability and fix the vacuum tube 16. This design also reduces the weight of the entire box body 11 and the amount of manufacturing materials required.

[0049] Specifically, the air inlet pipe 12 includes a clamp 14, a corrugated pipe 15, and a vacuum pipe 16. The vacuum pipe 16 is located inside the housing 11 and connected to the air outlet 13. The clamp 14 is located at both ends of the corrugated pipe 15. One end of the corrugated pipe 15 is connected to the vacuum pipe 16 via the clamp 14, and the other end is connected to an external inflation device via the clamp 14. The clamp 14 provides a quick-release function for easy maintenance, while the corrugated pipe 15 allows for dimensional error compensation and facilitates installation.

[0050] The vacuum tube 16 and the air outlet 13 are located inside the housing 11, while the bellows 15 is located outside the chamber. The air inlet pipe 12 includes an upper air inlet pipe 12 and a lower air inlet pipe 12 for independent air intake control. The air outlet 13 includes two upper air outlets 13 and two lower air outlets 13. Both upper air outlets 13 face upwards and are connected to the upper air inlet pipe 12, while both lower air outlets 13 face downwards and are connected to the lower air inlet pipe 12.

[0051] The upper flow equalization component 2 is disposed on the upper surface of the housing 11 and is connected to the upper air outlet 13. The lower flow equalization component 3 is disposed on the lower surface of the housing 11 and is connected to the lower air outlet 13. The dual inlet pipes independently control the air intake of the double-layer gas equalization structure, so that the flow rate at each air intake point can be controlled according to production needs, which facilitates the improvement of air breaking efficiency.

[0052] Among them, such as Figure 3 As shown, the upper flow equalization assembly 2, from bottom to top, includes a first sealing ring 41, a diffusion flow equalization plate 42, a second sealing ring 43, and a mesh flow equalization plate 44. Figures 11 to 13 As shown, the diffusion uniform plate 42 and the mesh uniform plate 44 are respectively fixed to the upper surface of the box body 11. The upper surface of the box body 11, the first sealing ring 41, and the bottom surface of the diffusion uniform plate 42 form a first uniform flow cavity 45. The upper surface of the diffusion uniform plate 42, the second sealing ring 43, and the mesh uniform plate 44 form a second uniform flow cavity 46. After the gas enters from the inlet pipe 12, it enters the first uniform flow cavity 45 through the outlet 13, diffuses, then enters the second uniform flow cavity 46 and flows out evenly, finally entering the chamber. Figure 8 , Figure 10As shown, in order to enhance the stability of the cavity space, both the diffusion uniform plate 42 and the mesh uniform plate 44 are provided with isolation columns 5 on their back sides to isolate the spacing between adjacent plates.

[0053] Specifically, such as Figure 7 , Figure 9 As shown, the diffusion equalization plate 42 is provided with diffusion equalization holes 47, which radiate outwards from the central hole in a "wavy" pattern. The farther away from the central hole, the denser the distribution of the diffusion equalization holes 47. In this embodiment, the diffusion equalization plate 42 is provided with two diffusion central holes 48, which are located directly above the upper air inlet. This results in a larger airflow closer to the diffusion central hole 48. By changing the density of the diffusion equalization holes 47 to match the airflow, the gas velocity in the central region is high, and the sparse holes reduce resistance; the velocity in the edge region is low, and the dense holes increase the flow rate. This achieves the effect of diffusing the gas at the outlet 13 to the entire second equalization cavity 46. The mesh equalization plate 44 is provided with uniformly distributed mesh equalization holes 49, which are used to further uniformly disperse the gas in the second equalization cavity 46 into the cavity.

[0054] The structure of the lower flow equalization component 3 is the same as that of the upper flow equalization component 2, which reduces the types of accessories and facilitates production.

[0055] In summary, this utility model designs the main body of the structure into a box shape to fill the internal space of the cavity, reducing the evacuation volume. It adopts multi-point air intake with controllable flow rate at each air intake point. The upper and lower sides of the box are equipped with flow equalization components to achieve uniform gas flow in the cavity, improve the uniformity of gas distribution in the large vacuum chamber equipment, reduce silicon wafer drop rate, and improve yield.

[0056] The preferred embodiments of this utility model have been described in detail above; however, this utility model is not limited thereto. Within the scope of the technical concept of this utility model, various simple modifications can be made to the technical solution of this utility model, including combining the various technical features in any other suitable manner. These simple modifications and combinations should also be considered as the content disclosed by this utility model and are all within the protection scope of this utility model.

Claims

1. A large vacuum chamber provided with a double-layer gas uniform flow structure, characterized in that: The system includes a chamber and a double-layer gas equalization structure disposed within the chamber. The double-layer gas equalization structure includes a pipe box, an upper equalization component, and a lower equalization component. The pipe box includes a box body, an inlet pipe, and an outlet. The box body is rectangular and located in the middle of the chamber. The inlet pipe and outlet are disposed inside the box body, and the outlet is located outside the chamber. The inlet pipe includes an upper inlet pipe and a lower inlet pipe for independently controlled air intake. The outlet includes an upper outlet connected to the upper inlet pipe and a lower outlet connected to the lower inlet pipe. The upper equalization component is disposed on the upper surface of the box body and connected to the upper outlet. The lower equalization component is disposed on the lower surface of the box body and connected to the lower outlet. The upper flow equalization assembly includes, from bottom to top, a first sealing ring, a diffusion flow equalization plate, a second sealing ring, and a mesh flow equalization plate. The diffusion flow equalization plate and the mesh flow equalization plate are respectively fixed on the upper surface of the box body. The upper surface of the box body, the first sealing ring, and the bottom surface of the diffusion flow equalization plate form a first flow equalization cavity, and the upper surface of the diffusion flow equalization plate, the second sealing ring, and the mesh flow equalization plate form a second flow equalization cavity. After the gas enters through the inlet pipe, it enters the first uniform flow chamber through the outlet, then the second uniform flow chamber, and finally enters the chamber chamber. The diffusion equalization plate is provided with diffusion equalization holes, which radiate outwards from the central hole in a "wavy" pattern. The farther away from the central hole, the denser the distribution of the diffusion equalization holes. The center of the diffusion equalization plate is located above the upper air inlet. The mesh equalization plate is provided with uniformly distributed mesh equalization holes.

2. The large vacuum chamber provided with the double-layer gas uniform flow structure according to claim 1, characterized in that: The structure of the lower flow equalization component is the same as that of the upper flow equalization component.

3. The large vacuum chamber provided with the double-layer gas uniform flow structure according to claim 2, characterized in that: Both the upper and lower air outlets are provided with two outlets each, and the diffusion uniform plate is provided with two diffusion center holes. The upper air outlets are all located directly below the diffusion center holes, and the lower air outlets are all located directly above the diffusion center holes. The upper air outlets are all facing upwards, and the lower air outlets are all facing downwards.

4. The large vacuum chamber provided with the double-layer gas uniform flow structure according to claim 1, characterized in that: Both the diffusion flow equalizer and the mesh flow equalizer have isolation columns on their back sides to isolate the spacing between adjacent plates.

5. The large vacuum chamber provided with the double-layer gas uniform flow structure according to claim 1, characterized in that: The air inlet pipe includes a clamp, a corrugated pipe, and a vacuum pipe. The vacuum pipe is located inside the box and connected to the air outlet. The clamp is located at both ends of the corrugated pipe. One end of the corrugated pipe is connected to the vacuum pipe through the clamp, and the other end is connected to an external inflation device through the clamp.

6. The large vacuum chamber provided with a double-layer gas uniform flow structure according to claim 1, characterized in that: The box is a hollow rectangular box made of several fixing plates, and inside there are several crisscrossing stiffening plates to increase stability and fix the vacuum tube.

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