Epitaxial machine table rotating mechanism and epitaxial machine table provided with same

Abstract

The utility model provides an extension machine table rotating mechanism and an extension machine table with the rotating mechanism, the rotating mechanism comprises a supporting rod and a tripod, the tripod is provided with a mounting hole, the top end of the supporting rod is inserted into the mounting hole and is clamped with the mounting hole in the axial direction, the inner side of the top of the mounting hole is provided with a protrusion, and the protrusion is clamped with the mounting hole in the axial direction. A clamping groove is formed in the upper portion of the top end of the supporting rod, and the protrusion is matched with the clamping groove in the circumferential direction, so that the top end of the supporting rod is clamped with the mounting hole in the circumferential direction. The rotating mechanism has the advantages that the protrusions are arranged in the mounting holes, the clamping grooves are formed in the tops of the supporting rods, and the protrusions and the clamping grooves are matched and clamped in the circumferential direction, so that the circumferential clamping area of the mounting holes and the supporting rods is increased, the service life is prolonged, the stability of the rotating mechanism is improved, and the quality of the epitaxial technology is guaranteed; and the problem of uniformity of film thickness and resistance is avoided.

Description

Technical Field

[0001] This utility model belongs to the field of epitaxial machine technology, and in particular relates to an epitaxial machine rotation mechanism and an epitaxial machine equipped with the rotation mechanism. Background Technology

[0002] On a 12-inch epitaxial wafer fabrication machine, the rotation mechanism consists of a support rod and a tripod. The tripod is mounted on top of the support rod, and the support rod drives the tripod to rotate. A base for placing the wafer rests on the tripod. In existing technology, a positioning bump is provided on one side of the top of the support rod, and a positioning groove is formed on the inner wall of the tripod mounting hole. The positioning bump and the positioning groove are fitted together for circumferential positioning. However, the positioning bump is prone to wear over long-term operation, affecting the stability of rotation and compromising the quality of the epitaxial process, leading to problems with film thickness and resistivity uniformity. Utility Model Content

[0003] To solve the above-mentioned technical problems, this utility model provides an epitaxial machine table rotation mechanism and an epitaxial machine table equipped with the rotation mechanism, which effectively solves the technical problem of poor stability of the epitaxial machine table rotation mechanism and overcomes the shortcomings of the prior art.

[0004] The technical solution adopted by this utility model is: an extension machine table rotation mechanism, including a support rod and a tripod. The tripod is provided with a mounting hole. The top end of the support rod is inserted into the mounting hole and axially engaged with the mounting hole. A protrusion is provided on the inner side of the top of the mounting hole. A slot is provided above the top end of the support rod. The protrusion and the slot are circumferentially adapted to each other, so that the top end of the support rod is circumferentially engaged with the mounting hole.

[0005] Furthermore, the protrusion is arranged circumferentially along the mounting hole, occupying 1 / 3 to 2 / 3 of the circumferential area of ​​the mounting hole.

[0006] Furthermore, the protrusion is arranged circumferentially along the mounting hole, occupying 1 / 2 of the circumferential area of ​​the mounting hole.

[0007] Furthermore, the mounting hole includes an integrally formed upper section and a lower section. The upper section is vertically arranged and has the protrusion inside one side. The lower section is inclined and the diameter of the end of the lower section away from the upper section is larger than the diameter of the upper section.

[0008] Furthermore, the inclination angle between the lower section and the central axis of the mounting hole is set to 7-9°.

[0009] Furthermore, the inclination angle between the lower section and the central axis of the mounting hole is set to 8°.

[0010] Furthermore, the top outer wall of the support rod is inclined and adapted to the lower section, so that the top outer wall of the support rod engages with the lower section.

[0011] Furthermore, the tripod is provided with a connecting rod at the top for connecting to the base on which the wafer is placed, and the connecting rod is evenly distributed along the circumference of the tripod.

[0012] Furthermore, the connecting rod is vertically arranged, and two grooves are formed on the outer side of the connecting rod, with the grooves facing away from each other.

[0013] This utility model also provides an epitaxial machine, including the epitaxial machine rotation mechanism described above.

[0014] The advantages and positive effects of this utility model are as follows: by setting a protrusion in the mounting hole and a slot on the top of the support rod, the protrusion and the slot are circumferentially matched and engaged, which increases the circumferential engagement area of ​​the mounting hole and the support rod, extends the service life, improves the stability of the rotating mechanism, ensures the quality of the epitaxial process, and avoids problems such as uneven film thickness and resistance. Attached Figure Description

[0015] Figure 1 This is a perspective view of a tripod for an extension machine table rotation mechanism according to Embodiment 1 of this utility model.

[0016] Figure 2 This is a top view of the tripod of an extension machine table rotation mechanism according to Embodiment 1 of this utility model.

[0017] Figure 3 This is a sectional view AA of the tripod of an extension machine table rotation mechanism according to Embodiment 1 of this utility model.

[0018] Figure 4 This is a top sectional view of the support rod of an extension machine table rotation mechanism according to Embodiment 1 of this utility model.

[0019] Figure 5 This is a top view of the tripod of an extension machine table rotation mechanism according to Embodiment 2 of this utility model.

[0020] Figure 6 A top view of a tripod for an extension machine table rotation mechanism according to Embodiment 3 of this utility model.

[0021] In the picture:

[0022] 1. Support rod 2. Tripod 3. Mounting holes

[0023] 4. Protrusion 5. Slot 6. Upper section

[0024] 7. Lower section 8. Connecting rod 9. Groove Detailed Implementation

[0025] This utility model provides an epitaxial machine rotation mechanism and an epitaxial machine equipped with the rotation mechanism. The embodiments of this utility model will be described below with reference to the accompanying drawings.

[0026] In the description of the embodiments of this utility model, it should be understood that the terms "top," "bottom," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. In the description of this utility model, it should be noted that unless otherwise expressly specified and limited, the terms "set" and "connected" should be interpreted broadly. For example, it can refer to a fixed connection, a detachable connection, or an integral connection; it can refer to a direct connection or an indirect connection through an intermediate medium; it can refer to the internal communication of two elements. Those skilled in the art can understand the specific meaning of the above terms in this utility model through specific circumstances.

[0027] like Figures 1-4 As shown in the figure, an embodiment of the present invention provides a rotating mechanism for an extension machine, including a support rod 1 and a tripod 2. A mounting hole 3 is provided at the center of the tripod 2 for housing the top of the support rod 1. The top of the support rod 1 is inserted into the mounting hole 3 and axially engaged with it for axial positioning. A protrusion 4 is provided on the inner side of the top of the mounting hole 3, and a groove 5 is provided above the top of the support rod 1. The groove 5 is stepped, and the protrusion 4 and the groove 5 are circumferentially adapted to each other, so that the top of the support rod 1 is circumferentially engaged with the mounting hole 3 for circumferential positioning. The height of the groove 5 is slightly greater than the height of the protrusion 4, meaning there is a gap between the bottom of the protrusion 4 and the bottom of the groove 5, and they do not contact each other. This ensures that the axial engagement is between the top of the support rod 1 and the bottom of the mounting hole 3. If no gap is provided, the bottom of the protrusion 4 and the bottom of the groove 5 will directly contact each other, resulting in axial engagement, which would affect the tightness of the engagement between the top of the support rod 1 and the bottom of the mounting hole 3. Furthermore, wear is likely to occur during rotation, thus affecting the stability of the axial engagement.

[0028] Specifically, such as Figure 2 , Figure 5 and Figure 6 As shown, in order to increase the circumferential contact area between the mounting hole 3 and the top of the support rod 1 and ensure rotational stability, the protrusion 4 is arranged along the circumference of the mounting hole 3, occupying 1 / 3 to 2 / 3 of the circumference of the mounting hole 3. Preferably, for ease of processing, the protrusion 4 is arranged along the circumference of the mounting hole 3, occupying 1 / 2 of the circumferential area of ​​the mounting hole 3.

[0029] Specifically, such as Figure 3As shown, the mounting hole 3 includes an integrally formed upper section 6 and lower section 7. The upper section 6 is vertically arranged, and a protrusion 4 is provided inside one side. The height of the protrusion 4 is the same as the height of the upper section 6. The lower section 7 is inclined, and the diameter of the end of the lower section 7 away from the upper section 6 is larger than the diameter of the upper section 6.

[0030] Specifically, the tilt angle between the lower section 7 and the central axis is set to 7 to 9°. Preferably, the tilt angle between the lower section 7 and the central axis is set to 8°.

[0031] Specifically, the top outer wall of the support rod 1 is inclined and adapted to the lower section 7, forming a tapered structure, so that the top of the support rod 1 can be inserted into the lower section 7 of the mounting hole 3 and axially engaged with the lower section 7.

[0032] Specifically, such as Figure 1 As shown, the top of the tripod 2 is provided with a connecting rod 8 for connecting to the base on which the wafer is placed. The connecting rod 8 is evenly arranged along the circumference of the tripod 2.

[0033] Specifically, the connecting rods 8 are set vertically and at the same height.

[0034] Specifically, to facilitate the installation of the base, two grooves 9 are provided on the top outer side of the connecting rod 8, and the grooves 9 are arranged opposite each other.

[0035] An epitaxial machine is provided with a rotating mechanism as described above, and a base for placing wafers is mounted on the rotating mechanism.

[0036] Example 1: As Figure 2As shown, an epitaxial growth plate rotation mechanism includes a support rod 1 and a tripod 2. A mounting hole 3 is provided at the center of the tripod 2 for housing the top of the support rod 1. The top of the support rod 1 is inserted into the mounting hole 3 and axially engaged with it. A protrusion 4 is provided on the inner side of the top of the mounting hole 3, and a stepped groove 5 is provided above the top of the support rod 1. The protrusion 4 and the groove 5 are circumferentially adapted to each other, so that the top of the support rod 1 is circumferentially engaged with the mounting hole 3. The height of the groove 5 is slightly greater than the height of the protrusion 4. The protrusion 4 is arranged circumferentially along the mounting hole 3, occupying half of the circumferential area of ​​the mounting hole 3. The mounting hole 3 includes an integrally formed upper section 6 and a lower section 7. The upper section 6 is vertically arranged, with a protrusion 4 on one side, the height of which is the same as the height of the upper section 6. The lower section 7 is inclined, and the diameter of the end of the lower section 7 away from the upper section 6 is larger than the diameter of the upper section 6. The inclination angle between the lower section 7 and the central axis is set to 8°. The top outer wall of the support rod 1 is inclined and adapted to the lower section 7, forming a tapered structure, so that the top of the support rod 1 can be inserted into the lower section 7 of the mounting hole 3 and axially engaged with the lower section 7. A connecting rod 8 is fixed to the top of the tripod 2 for connecting to the base on which the wafer is placed. The connecting rods 8 are evenly distributed along the circumference of the tripod 2. The connecting rods 8 are vertically arranged and of uniform height. Two grooves 9 are formed on the outer side of the connecting rod 8, and the grooves 9 are arranged opposite each other.

[0037] Example 2: Figure 5 As shown, an epitaxial growth plate rotation mechanism includes a support rod 1 and a tripod 2. A mounting hole 3 is provided at the center of the tripod 2 for housing the top of the support rod 1. The top of the support rod 1 is inserted into the mounting hole 3 and axially engaged with it. A protrusion 4 is provided on the inner side of the top of the mounting hole 3, and a stepped groove 5 is provided above the top of the support rod 1. The protrusion 4 and the groove 5 are circumferentially adapted to each other, so that the top of the support rod 1 is circumferentially engaged with the mounting hole 3. The height of the groove 5 is slightly greater than the height of the protrusion 4. The protrusion 4 is arranged circumferentially along the mounting hole 3, occupying 1 / 3 of the circumferential area of ​​the mounting hole 3. The mounting hole 3 includes an integrally formed upper section 6 and a lower section 7. The upper section 6 is vertically arranged, with a protrusion 4 inside one side. The height of the protrusion 4 is the same as the height of the upper section 6. The lower section 7 is inclined, and the diameter of the end of the lower section 7 away from the upper section 6 is larger than the diameter of the upper section 6. The inclination angle of the lower section 7 with respect to the central axis is set to 7°. The top outer wall of the support rod 1 is inclined and adapted to the lower section 7, forming a tapered structure, so that the top of the support rod 1 can be inserted into the lower section 7 of the mounting hole 3 and axially engaged with the lower section 7. A connecting rod 8 is fixed to the top of the tripod 2 for connecting to the base on which the wafer is placed. The connecting rods 8 are evenly distributed along the circumference of the tripod 2. The connecting rods 8 are vertically arranged and of uniform height. Two grooves 9 are formed on the outer side of the connecting rod 8, and the grooves 9 are arranged opposite each other.

[0038] Example 3: Figure 6As shown, an epitaxial growth plate rotation mechanism includes a support rod 1 and a tripod 2. A mounting hole 3 is provided at the center of the tripod 2 for housing the top of the support rod 1. The top of the support rod 1 is inserted into the mounting hole 3 and axially engaged with it. A protrusion 4 is provided on the inner side of the top of the mounting hole 3, and a stepped groove 5 is provided above the top of the support rod 1. The protrusion 4 and the groove 5 are circumferentially adapted to each other, so that the top of the support rod 1 is circumferentially engaged with the mounting hole 3. The height of the groove 5 is slightly greater than the height of the protrusion 4. The protrusion 4 is arranged circumferentially along the mounting hole 3, occupying 2 / 3 of the circumference of the mounting hole 3. The mounting hole 3 includes an integrally formed upper section 6 and a lower section 7. The upper section 6 is vertically arranged, with a protrusion 4 inside one side. The height of the protrusion 4 is the same as the height of the upper section 6. The lower section 7 is inclined, and the diameter of the end of the lower section 7 away from the upper section 6 is larger than the diameter of the upper section 6. The inclination angle of the lower section 7 with respect to the central axis is set to 9°. The top outer wall of the support rod 1 is inclined and adapted to the lower section 7, forming a tapered structure, so that the top of the support rod 1 can be inserted into the lower section 7 of the mounting hole 3 and axially engaged with the lower section 7. A connecting rod 8 is fixed to the top of the tripod 2 for connecting to the base on which the wafer is placed. The connecting rods 8 are evenly distributed along the circumference of the tripod 2. The connecting rods 8 are vertically arranged and of uniform height. Two grooves 9 are formed on the outer side of the connecting rod 8, and the grooves 9 are arranged opposite each other.

[0039] The advantages and positive effects of this utility model are:

[0040] By setting a protrusion in the mounting hole and a slot on the top of the support rod, the protrusion and the slot are circumferentially matched and engaged, which increases the circumferential engagement area of ​​the mounting hole and the support rod, extends the service life, improves the stability of the rotating mechanism, ensures the quality of the epitaxial process, and avoids problems such as uneven film thickness and resistance.

[0041] The embodiments of this utility model have been described in detail above, but the content described is only a preferred embodiment of this utility model and should not be considered as limiting the scope of implementation of this utility model. All equivalent changes and improvements made in accordance with the claims of this utility model should still fall within the patent coverage of this utility model.

Claims

1. An epitaxial machine rotation mechanism comprising a support rod and a tripod, characterized in that: The tripod is provided with mounting holes. The top end of the support rod is inserted into the mounting hole and axially engaged with the mounting hole. The top inner side of the mounting hole is provided with a protrusion, and the top end of the support rod is provided with a slot. The protrusion and the slot are circumferentially adapted to each other, so that the top end of the support rod is circumferentially engaged with the mounting hole.

2. The rotating mechanism of an epitaxial machine according to claim 1, wherein: The protrusion is arranged circumferentially along the mounting hole, occupying 1 / 3 to 2 / 3 of the circumferential area of ​​the mounting hole.

3. The rotating mechanism of an epitaxial machine according to claim 2, wherein: The protrusion is arranged circumferentially along the mounting hole and occupies 1 / 2 of the circumferential area of ​​the mounting hole.

4. The rotation mechanism of an epitaxial machine according to any one of claims 1-3, wherein: The mounting hole includes an integrally formed upper section and a lower section. The upper section is vertically arranged and has a protrusion inside one side. The lower section is inclined and the diameter of the end of the lower section away from the upper section is larger than the diameter of the upper section.

5. The rotating mechanism of an epitaxial machine according to claim 4, wherein: The inclination angle between the lower section and the central axis of the mounting hole is set to 7-9°.

6. The rotating mechanism of an epitaxial machine according to claim 5, wherein: The inclination angle between the lower section and the central axis of the mounting hole is set to 8°.

7. The rotating mechanism of an epitaxial machine according to claim 5 or 6, wherein: The top outer wall of the support rod is inclined and adapted to the lower section, so that the top outer wall of the support rod engages with the lower section.

8. The rotation mechanism for epitaxial machine according to any one of claims 1-3 and 5-6, wherein: The tripod is equipped with a connecting rod at the top for connecting to the base on which the wafer is placed. The connecting rod is evenly distributed along the circumference of the tripod.

9. The rotating mechanism of an epitaxial machine according to claim 8, wherein: The connecting rod is vertically arranged, and two grooves are formed on the outer side of the connecting rod, with the grooves facing away from each other.

10. An epitaxial machine, characterized by: Includes the epitaxial machine rotation mechanism as described in any one of claims 1-9.

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