Helium sampling device
By designing a helium sampling device and using a pressure gauge, flow restrictor, and flow controller to precisely control the helium flow rate, the problem of helium sampling failure was solved, achieving efficient detection of gaseous molecular contaminants and improving the product qualification rate in semiconductor production.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- NEXCHIP SEMICON CO LTD
- Filing Date
- 2025-04-15
- Publication Date
- 2026-04-21
AI Technical Summary
Existing helium sampling devices suffer from problems such as helium accumulating above the sampling box, making it difficult to collect, and inaccurate flow control of the sampling pump, leading to helium sampling failure and making it impossible to effectively detect gaseous molecular pollutants.
A helium sampling device was designed, including a sampling port, a flow control unit, and a sampling container unit. The helium flow rate is precisely controlled by a pressure gauge, a flow restrictor, and a flow controller, and a filter is provided to filter out particles, ensuring that helium enters the sampling container for detection.
It achieves precise control and effective sampling of helium gas, improves sampling efficiency and detection accuracy, and ensures the device yield of semiconductor manufacturing processes.
Smart Images
Figure CN224152127U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of gas detection technology, and in particular to a helium sampling device. Background Technology
[0002] With the rapid development of integrated circuit and semiconductor technologies, the requirements for equipment in the production process are becoming increasingly precise and reliable, and the requirements for the manufacturing environment are also becoming increasingly stringent. For the microelectronics semiconductor manufacturing industry, airborne molecular contaminants (AMCs) can cause oxidation and erosion on the surface of semiconductor crystals, leading to a decrease in product yield and making them a critical aspect of the production process.
[0003] To prevent high-purity helium used in semiconductor etching and thin-film fabrication from becoming an AMC (Anaerobic Mechanism Contamination) source in cleanrooms, leading to defects and reduced device yield during semiconductor production, helium sampling and testing are typically required before use. However, current helium sampling methods using gas sampling boxes and pumps suffer from problems such as helium accumulation at the top of the sampling box, making it difficult to collect, and inaccurate flow control by the sampling pump, thus hindering effective AMC sampling of helium. Utility Model Content
[0004] Therefore, it is necessary to provide a helium sampling device to address the problems mentioned in the background technology, which can at least avoid sampling failure and improve sampling accuracy and efficiency.
[0005] To achieve the above and other related objectives, this application provides a helium sampling device for detecting gaseous molecular pollutants, the helium sampling device comprising:
[0006] Sampling port, used for helium sampling;
[0007] A flow control unit is connected to the sampling port, and the flow control unit includes a flow controller for controlling the sampling flow rate of helium.
[0008] A sampling container unit, connected to the flow control unit, the sampling container unit including a sampling container for detecting gaseous molecular pollutants.
[0009] In one embodiment, the flow controller includes a quality flow controller.
[0010] In one embodiment, the flow control unit further includes a flow limiting orifice disposed between the sampling port and the flow controller, for controlling the flow rate of helium gas flowing to the flow controller.
[0011] In one embodiment, the sampling container for detecting gaseous molecular pollutants includes at least one of a first sampling container for detecting total volatile organic compounds, a second sampling container for detecting ions, and a third sampling container for detecting metals.
[0012] In one embodiment, the sampling container unit further includes a heating device for heating the second sampling container and / or the third sampling container.
[0013] In one embodiment, the heating device is used to heat the solution in the second sampling container and / or the solution in the third sampling container until the solution temperature is in the range of 30°C to 50°C.
[0014] In one embodiment, the first sampling container is connected to the flow controller, the second sampling container is connected to the flow controller, and the third sampling container is connected to the second sampling container.
[0015] In one embodiment, the helium sampling device further includes a filter disposed between the sampling port and the flow control unit for filtering particles in the helium gas.
[0016] In one embodiment, the filter includes a filter screen for filtering particles larger than 2 micrometers in helium gas.
[0017] In one embodiment, a pressure gauge is provided at the sampling port to control the flow rate of helium gas flowing to the flow control unit.
[0018] According to the helium sampling device provided by this utility model, the helium flowing out of the sampling port first passes through the flow control unit to control the sampling flow rate of the helium, and then enters the sampling container unit to sample the helium for the detection of gaseous molecular pollutants. This achieves effective sampling of helium, while improving the control accuracy and detection accuracy of the helium sampling flow rate, thus providing more assurance for semiconductor manufacturing processes and improving device yield. Attached Figure Description
[0019] To better describe and illustrate embodiments and / or examples of the applications disclosed herein, reference may be made to one or more accompanying drawings. Additional details or examples used to describe the drawings should not be considered as limiting the scope of any of the disclosed applications, the embodiments and / or examples currently described, or the best mode of conduct of these applications as currently understood.
[0020] Figure 1 This is a schematic diagram of the structure of a helium sampling device provided in one embodiment.
[0021] Explanation of reference numerals in the attached figures:
[0022] 10. Sampling port; 20. Flow control unit; 21. Filter; 22. Flow limiting orifice; 23. Flow controller; 30. Sampling container unit; 31. First sampling container; 32. Second sampling container; 33. Third sampling container; 34. Heating device. Detailed Implementation
[0023] To facilitate understanding of this application, a more complete description will be provided below with reference to the accompanying drawings, which illustrate preferred embodiments of the application. However, this application can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to make the disclosure of this application more thorough and complete.
[0024] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the specification of this application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.
[0025] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the scope of this application. When used herein, the singular forms “a,” “an,” and “the” are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the terms “comprising” and / or “including,” when used in this specification, identify the presence of the stated features, integers, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups. When used herein, the term “and / or” includes any and all combinations of the associated listed items.
[0026] It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of this application. Although the illustrations only show the components related to this application and are not drawn according to the actual number, shape and size of the components in the actual implementation, the form, quantity and proportion of each component in the actual implementation can be arbitrarily changed, and the layout of the components may also be more complex.
[0027] When using a gas sampling chamber and sampling pump to sample helium for the detection of gaseous molecular contaminants (AMC), the inlet of the gas sampling chamber is connected to the helium sampling port, and the outlet of the gas sampling chamber is connected to the inlet of the AMC detection sampling unit. The sampling pump is typically connected to the outlet of the AMC detection sampling unit, and helium sampling is performed by controlling the pump's flow rate. However, because helium (He) is less dense than air, it tends to accumulate at the top of the gas sampling chamber. This causes the pump to frequently alarm due to insufficient gas extraction, making it impossible to effectively sample helium for AMC detection and analysis.
[0028] To address the above problems, this utility model provides a helium sampling device, such as... Figure 1 As shown, it includes:
[0029] Sampling port 10 is used for helium sampling;
[0030] A flow control unit 20 is connected to the sampling port 10. The flow control unit 20 includes a flow controller 23 for controlling the sampling flow rate of helium.
[0031] A sampling container unit 30 is connected to the flow control unit 20, and the sampling container unit 30 includes a sampling container for detecting gaseous molecular pollutants.
[0032] In one embodiment, sampling port 10 is located on a helium cylinder or helium supply pipeline used to store high-purity helium. When gaseous molecular contaminant (AMC) detection is required for the helium to be received, the helium in the helium cylinder is typically sampled. Specifically, the valve of the helium cylinder is opened as a sampling port, and the helium flow rate is controlled by adjusting the valve opening. Since the high-purity helium used in the semiconductor manufacturing process has already entered the helium supply pipeline, when gaseous molecular contaminant (AMC) detection is required before trial production, the helium in the helium supply pipeline is typically sampled. The helium supply pipeline has one or more sampling ports for helium sampling.
[0033] In one embodiment, a pressure gauge is installed at the sampling port to control the flow rate of helium gas to the flow control unit 20. The gas pressure gauge measures gas pressure, and therefore the measured value is proportional to the valve opening. Specifically, when the valve opening increases, the measured value of the gas pressure gauge increases; when the valve opening decreases, the measured value decreases. Therefore, the valve opening can be adjusted based on the pressure gauge reading to initially control the helium sampling flow rate. When the gas pressure gauge reading is higher than a preset range, the valve opening is decreased; when the gas pressure gauge reading is lower than the preset range, the valve opening is increased; when the gas pressure gauge reading is within the preset range, the valve is not adjusted, maintaining constant flow sampling.
[0034] In one embodiment, the helium sampling device further includes a filter 21 disposed between the sampling port 10 and the flow control unit 20 for filtering particles in the helium gas. The filter material is preferably one or more of the following: high-temperature resistant material, high-pressure resistant material, and corrosion-resistant material. Specifically, the filter 21 uses stainless steel as the filter material. Stainless steel has high strength and excellent high-temperature resistance, and can effectively resist various chemical corrosions. Even in harsh production environments such as high temperature, high pressure, acidic gases, and alkaline gases, it can maintain stable performance and ensure the durability of the filtration effect.
[0035] In one embodiment, the filter 21 includes a filter screen for filtering particles larger than 2 micrometers in helium gas. Since the filter 21 filters high-purity helium gas used in semiconductor manufacturing processes, it employs a high-precision filter to filter micron-sized particles. Specifically, by using a stainless steel filter material, filtration of particles larger than 2 μm can be achieved.
[0036] In one embodiment, the flow control unit 20 further includes a flow-limiting orifice 22, which is disposed between the sampling port 10 and the flow controller 23 to control the flow rate of helium gas flowing to the flow controller 23. Further, the flow-limiting orifice 22 can be a single-hole structure or a multi-hole structure, and can include only one level of flow-limiting orifice or a combination of multiple levels of flow-limiting orifices; this application does not impose any limitations on this. After the flow rate of helium gas sampling is initially controlled by the pressure gauge at the sampling port, the flow rate of helium gas sampling can be further controlled by the flow-limiting orifice 22. Specifically, when the structure of the flow-limiting orifice is determined, such as the number of orifices, the size of the orifices, and the number of orifice levels, the gas flow rate through the flow-limiting orifice always remains less than or equal to the maximum flow rate value. Based on this, the flow-limiting orifice can be used as a flow measurement element to measure flow rate, and also as a flow-limiting element to limit flow rate and reduce pressure. For example, when the valve at the sampling port is opened wider, the pressure difference before and after the flow-limiting orifice increases, and the flow rate through the flow-limiting orifice increases. However, when the pressure difference exceeds a certain value (called the critical pressure difference), the flow rate of the fluid through the flow-limiting orifice reaches the maximum flow rate. At this point, no matter how much the pressure difference increases, the flow rate through the flow-limiting orifice will remain at a certain value and will no longer increase.
[0037] In one embodiment, the flow control unit 20 further includes a flow controller 23. The flow controller (FC) includes, but is not limited to, at least one of a mass flow controller (MFC), a flow control valve (FPC), and a gas flow meter (BPC), preferably a mass flow controller (MFC). The mass flow controller (MFC) not only functions as a mass flow meter but also automatically controls the gas flow rate. When the user sets the flow rate as needed, the mass flow controller (MFC) automatically maintains the flow rate at the set value, ensuring that it does not deviate from the set value even if the system pressure fluctuates or the ambient temperature changes, thereby achieving constant flow sampling of helium.
[0038] After initial flow control of the helium sampling flow rate via a pressure gauge at the sampling port and secondary flow control via a flow-limiting orifice, the flow rate is further precisely controlled by a flow controller to achieve constant flow sampling of helium. The two-stage flow control by the pressure gauge and flow-limiting orifice confines the helium flow rate within a certain range, providing a favorable flow control environment for the flow controller and ensuring its accuracy. Furthermore, when the helium sampling device includes a flow controller, there is no need to install a separate sampling pump for evacuation.
[0039] Exemplarily, the sampling container unit 30 includes at least one of a first sampling container 31 for total volatile organic compound (TVOC) detection, a second sampling container 32 for ion detection, and a third sampling container 33 for metal detection. Further, the first sampling container 31 is connected to the flow controller 23, the second sampling container 32 is connected to the flow controller 23, and the third sampling container 33 is connected to the second sampling container 32.
[0040] In one embodiment, the sampling container unit 30 includes a first sampling container 31 for detecting total volatile organic compounds (TOCs). Since volatile organic compounds in helium can affect its purity, excessive TOC levels in helium used in semiconductor production can lead to particulate matter generation, affecting device yield. TOC detection involves oxidizing and burning a water sample to measure the increase in CO2 in the gas, thereby determining the total carbon content in the water sample. This provides a comprehensive indicator of the total amount of volatile organic compounds in the water sample. Because TOC measurement uses high-temperature combustion, all organic matter can be oxidized, providing a more direct representation of the total amount of organic matter. Therefore, it is often used to evaluate the degree of organic pollution. Specifically, the first sampling container 31 used for total volatile organic compound (TOC) detection includes a sampling tube or a sampling bottle. High-purity helium can be sampled using the sampling tube, for example, by setting an adsorption packing material in the sampling tube to enrich the volatile organic compounds in the helium. Subsequently, the sampling tube is placed in a gas chromatography-mass spectrometry (GC-MS) instrument for heating and desorption to analyze the concentration of volatile organic compounds in the helium. Alternatively, high-purity helium can be sampled using a sampling bottle, in which case the sampled high-purity helium is dissolved in water during the sampling stage, and the total amount of organic pollutants in the high-purity helium is subsequently determined by TOC detection.
[0041] In one embodiment, the sampling container unit 30 includes a second sampling container 32 for ion detection. Ion detection is used to detect one or more of acidic contaminants, basic contaminants, and dopant contaminants. Acidic contaminants include, but are not limited to, acidic gases such as HF, H2SO4, HCl, HNO3, H2S, and Cl2; basic contaminants include, but are not limited to, basic gases such as ammonia; and dopant contaminants include, but are not limited to, boron, phosphorus, and arsenic. The second sampling container 32 for ion detection includes a sampling bottle containing water. By dissolving acidic or basic gases in the high-purity helium gas in the water, ion detection sampling of the high-purity helium gas is achieved for subsequent ion detection.
[0042] In one embodiment, the sampling container unit 30 includes a third sampling container 33 for metal detection. Metal detection is used to detect metal ions. To improve metal dissolution efficiency, the third sampling container 33 for metal detection includes an acidification solution that facilitates metal dissolution. Specifically, the acidification solution includes nitric acid, and the volume fraction of the nitric acid is in the range of 1% to 3%, for example, 1%, 2%, or 3%, preferably 2%.
[0043] In one embodiment, the sampling container unit 30 further includes a heating device 34 for heating the second sampling container 32 for ion detection and / or the third sampling container 33 for metal detection, to accelerate the dissolution of gaseous molecules in high-purity helium in water and improve solution efficiency. The heating device 34 includes, but is not limited to, a constant-temperature water bath, a constant-temperature heating platform, or other constant-temperature heating devices, to maintain a constant temperature in the second sampling container 32 and / or the third sampling container 33, with the constant temperature range including 30°C to 50°C, for example 30°C, 40°C, and 50°C, preferably 40°C.
[0044] According to the helium sampling device provided by this utility model, high-purity helium enters the device through sampling port 10, and the flow rate of helium sampling is initially controlled by a pressure gauge set at the sampling port; then the helium enters filter 21 through helium pipeline to filter out particles larger than 2 micrometers in size; then the helium flows through flow restrictor 22 for secondary control of helium sampling flow rate; then the helium passes through flow controller 23 to achieve precise control of helium sampling flow rate; then the helium enters the first sampling container 31 for total volatile organic compound (TOC) detection through helium pipeline, and the other part passes sequentially through the solution in the second sampling container 32 for ion detection (heated by heating device 34) and the solution in the third sampling container 33 for metal detection, respectively for ion detection and metal detection.
[0045] According to the helium sampling device provided by this utility model, the helium flowing out of the sampling port first passes through the flow control unit to control the sampling flow rate of the helium, and then enters the sampling container unit to sample the helium for the detection of gaseous molecular pollutants. This achieves effective sampling of helium, while improving the control accuracy and detection accuracy of the helium sampling flow rate, thus providing more assurance for semiconductor manufacturing processes and improving device yield.
[0046] Please note that the above embodiments are for illustrative purposes only and do not imply any limitation on this application.
[0047] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.
[0048] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0049] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.
Claims
1. A helium sampling device, characterized by, For the detection of gaseous molecular pollutants, the helium sampling device includes: Sampling port, used for helium sampling; A flow control unit is connected to the sampling port, and the flow control unit includes a flow controller for controlling the sampling flow rate of helium. A sampling container unit, connected to the flow control unit, the sampling container unit including a sampling container for detecting gaseous molecular pollutants.
2. The helium gas sampling device of claim 1, wherein, The flow controller includes a mass flow controller.
3. The helium gas sampling device of claim 1, wherein, The flow control unit further includes a flow limiting orifice, which is disposed between the sampling port and the flow controller to control the flow rate of helium gas flowing to the flow controller.
4. The helium gas sampling device of claim 1, wherein, The sampling container for detecting gaseous molecular pollutants includes at least one of a first sampling container for detecting total volatile organic compounds, a second sampling container for detecting ions, and a third sampling container for detecting metals.
5. The helium gas sampling device of claim 4, wherein, The sampling container unit further includes a heating device for heating the second sampling container and / or the third sampling container.
6. The helium gas sampling device of claim 5, wherein, The heating device is used to heat the solution in the second sampling container and / or the solution in the third sampling container until the solution temperature is in the range of 30°C to 50°C.
7. The helium gas sampling device of claim 4 or 6, wherein, The first sampling container is connected to the flow controller, the second sampling container is connected to the flow controller, and the third sampling container is connected to the second sampling container.
8. The helium gas sampling device of claim 1, wherein, It also includes a filter disposed between the sampling port and the flow control unit for filtering particles in the helium gas.
9. The helium gas sampling device of claim 8, wherein, The filter includes: A filter screen is used to filter particles larger than 2 micrometers in helium gas.
10. The helium sampling device according to claim 1, characterized in that, A pressure gauge is installed at the sampling port to control the flow rate of helium gas flowing to the flow control unit.