Gas inlet and tail gas universal device for CVD (Chemical Vapor Deposition) furnace

Abstract

The utility model provides a gas inlet and tail gas universal device for a CVD (Chemical Vapor Deposition) furnace. The CVD furnace gas inlet and tail gas universal device comprises a gas distribution mechanism, the gas distribution mechanism comprises a fixing plate, a first gas distribution plate and a second gas distribution plate which are arranged at intervals, the fixing plate is detachably connected with the furnace wall of a reaction furnace, a first gas distribution cavity is formed in the interval between the fixing plate and the first gas distribution plate, and a second gas distribution cavity is formed in the interval between the first gas distribution plate and the second gas distribution plate. A gap between the first gas distribution plate and the second gas distribution plate forms a second gas distribution cavity; the fixing plate is provided with an air pipe communicated with the first air distribution cavity, the first air distribution plate is provided with a first air hole communicated with the first air distribution cavity and the second air distribution cavity, and the second air distribution plate is provided with a second air hole communicated with the second air distribution cavity and the deposition chamber; the number of the gas distribution mechanisms is two, one gas pipe forms a gas inlet pipe, and the other gas pipe forms a gas outlet pipe. The two gas distribution cavities are arranged in the gas distribution mechanism, so that gas can be distributed more uniformly.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor material preparation technology, and in particular to a universal device for CVD furnace inlet and outlet gas. Background Technology

[0002] CVD (Chemical Vapor Deposition) refers to a technology that involves the reaction between mixed gases or the interaction between mixed gases and the surface of a substrate to form a thin film coating of metallic or non-metallic compounds on the substrate surface, thereby modifying the material surface to achieve certain special performance requirements.

[0003] CVD technology has become increasingly important in the production and research of high-performance new materials, especially in the field of semiconductor materials. In CVD growth technology, the condensation state of the material precursor is divided into gaseous, liquid, and solid states. For gaseous precursors, a gas flow meter can generally be used for precise control; for liquid precursors, a bubbling method is generally used, where a carrier gas is bubbled to carry the liquid into the high-temperature reaction zone; for solid precursors, such as the solid-source evaporation vacuum distributor disclosed in patent publication number CN221117605U, and the gas source output device for gas-based growth using solid raw material evaporation disclosed in patent publication number CN220099174U, these devices have the following problems:

[0004] (i) Uneven airflow distribution makes the flow field difficult to control;

[0005] (ii) The structure is complex and difficult to replace;

[0006] (iii) The exhaust structure and the intake structure are different and cannot be used interchangeably, resulting in high spare parts costs.

[0007] (iv) The nozzle of the air intake device extends directly into the reaction chamber inside the furnace. Once the nozzle is blocked, the replacement and maintenance costs are high.

[0008] Therefore, there is currently no good technology to achieve a stable supply with accurate metering, which makes it difficult to accurately control the temperature and flow rate of solid-state sources. Utility Model Content

[0009] The purpose of this invention is to provide a universal device for both the inlet and outlet gas of a CVD furnace that can achieve uniform gas supply to solid precursors and save costs.

[0010] The technical solution of this utility model is: a universal device for CVD furnace inlet and outlet gas, installed on the furnace wall of a reaction furnace with a deposition chamber. The universal device for CVD furnace inlet and outlet gas includes a gas distribution mechanism. The gas distribution mechanism includes a fixed plate, a first gas distribution plate and a second gas distribution plate arranged at intervals. The fixed plate is detachably connected to the furnace wall of the reaction furnace. The interval between the fixed plate and the first gas distribution plate forms a first gas distribution chamber, and the interval between the first gas distribution plate and the second gas distribution plate forms a second gas distribution chamber.

[0011] The fixed plate is provided with an air pipe that communicates with the first air distribution chamber. The first air distribution plate is provided with a first air hole that communicates with the first air distribution chamber and the second air distribution chamber. The second air distribution plate is provided with a second air hole that communicates with the second air distribution chamber and the sedimentation chamber. There are two air distribution mechanisms, one of which forms an air inlet pipe and the other forms an air outlet pipe.

[0012] In the above scheme, the two gas distribution mechanisms set on the furnace wall of the reactor can achieve the same structure for the gas inlet and outlet, and the two can be used interchangeably to reduce the cost of spare parts; the gas distribution mechanism is set with two gas distribution chambers, which can make the gas distribution more uniform.

[0013] Preferably, the first gas distribution plate and the second gas distribution plate are located in the deposition chamber.

[0014] Preferably, the periphery of the first air distribution chamber is sealed with a first end plate, and the periphery of the second air distribution chamber is sealed with a second end plate.

[0015] Preferably, the first end plate and the first air distribution plate are integral parts, and the second end plate and the second air distribution plate are integral parts.

[0016] Preferably, the two gas distribution mechanisms on the reactor are arranged symmetrically.

[0017] Preferably, the fixing plate, the first air distribution plate, and the second air distribution plate are detachably connected by a connector.

[0018] Preferably, the trachea, the first air hole, and the second air hole are each provided with multiple parts.

[0019] Preferably, the multiple tracheas and multiple second air holes are arranged in a rectangular array, and the multiple first air holes are distributed in a circular or rhomboid shape with the center of the cross-sectional circle of each trachea as a reference.

[0020] Preferably, the diameter of the first pore is larger than the diameter of the second pore.

[0021] Compared with related technologies, the beneficial effects of this utility model are as follows:

[0022] I. The present invention provides two gas distribution mechanisms on the furnace wall of the reactor, which enable the gas inlet and gas outlet to have identical structures and can be used interchangeably, thereby reducing the cost of spare parts.

[0023] Second, the gas distribution mechanism is equipped with two gas distribution chambers, which can make the gas distribution more uniform.

[0024] 3. The fixing plate is detachably connected to the furnace wall, which facilitates the replacement of the gas distribution mechanism;

[0025] Fourth, multiple tracheas and multiple second vents are arranged in a rectangular array, and multiple first vents are distributed in a circular or rhomboid shape with the center of the cross-sectional circle of each trachea as the reference, which can make the reaction gas mix more evenly after entering the gas distribution chamber. Attached Figure Description

[0026] Figure 1 A three-dimensional perspective view of the universal device for CVD furnace air inlet and exhaust gas provided by this utility model, with the furnace cover removed.

[0027] Figure 2 A radial cross-sectional schematic diagram of the universal device for CVD furnace inlet and outlet gas provided by this utility model;

[0028] Figure 3 This is a schematic diagram of the structure of the first air distribution plate;

[0029] Figure 4 This is a schematic diagram of the second air distribution plate.

[0030] In the attached diagram: 1. Reactor; 11. Deposition chamber; 12. Furnace body; 2. Gas distribution mechanism; 21. Fixing plate; 22. First gas distribution plate; 23. Second gas distribution plate; 24. First gas distribution chamber; 25. Second gas distribution chamber; 26. Gas pipe; 27. First gas hole; 28. Second gas hole; 29. ​​Connector; 210. First end plate; 211. Second end plate. Detailed Implementation

[0031] The present invention will be described in detail below with reference to the accompanying drawings and embodiments. It should be noted that, unless otherwise specified, the embodiments and features described in the embodiments of the present invention can be combined with each other. For ease of description, the terms "upper," "lower," "left," and "right" appearing below only indicate that they correspond to the upper, lower, left, and right directions of the drawings themselves, and do not limit the structure.

[0032] like Figure 1 , Figure 2As shown, this embodiment provides a universal device for both CVD furnace inlet and outlet gas, installed on the furnace wall of a reactor 1 having a deposition chamber 11. The universal device includes a gas distribution mechanism 2. The reactor 1 includes a cylindrical furnace body 12 and furnace covers (not shown) sealing both ends of the furnace body 12. The furnace covers and the furnace body 12 enclose the deposition chamber 11.

[0033] Two gas distribution mechanisms 2 are provided on the furnace wall of the reactor 1. The two gas distribution mechanisms 2 are arranged symmetrically. In the two gas distribution mechanisms 2, one gas pipe 26 forms an inlet pipe and the other gas pipe 26 forms an outlet pipe.

[0034] The gas distribution mechanism 2 includes a fixed plate 21, a first gas distribution plate 22, and a second gas distribution plate 23 arranged at intervals. The interval between the fixed plate 21 and the first gas distribution plate 22 forms a first gas distribution chamber 24, and the interval between the first gas distribution plate 22 and the second gas distribution plate 23 forms a second gas distribution chamber 25.

[0035] The periphery of the first air distribution chamber 24 is sealed with a first end plate 210, and the periphery of the second air distribution chamber 25 is sealed with a second end plate 211. For example... Figure 3 , Figure 4 As shown, the first end plate 210 and the first gas distribution plate 22 are integral parts, and the second end plate 211 and the second gas distribution plate 23 are integral parts. During installation, the first end plate 210 is attached to the lower surface of the fixing plate 21, and the second end plate 211 is attached to the lower surface of the first gas distribution plate 22. Then, the fixing plate 21, the first gas distribution plate 22, the second gas distribution plate 23, and the furnace wall of the furnace body 12 are connected by multiple connectors 29 (bolts). This places the first gas distribution plate 22 and the second gas distribution plate 23 in the deposition chamber 11.

[0036] The fixed plate 21 is provided with an air pipe 26 that communicates with the first air distribution chamber 24, the first air distribution plate 22 is provided with a first air hole 27 that communicates with the first air distribution chamber 24 and the second air distribution chamber 25, and the second air distribution plate 23 is provided with a second air hole 28 that communicates with the second air distribution chamber 25 and the deposition chamber 11.

[0037] The trachea 26, the first air hole 27, and the second air hole 28 are each provided with multiple parts. For example... Figure 1 As shown, the multiple tracheae 26 and multiple second vents 28 are arranged in a rectangular array. Figure 1 , Figure 2 As shown, the plurality of first air holes 27 are distributed in a circular or rhomboid shape with reference to the center of the cross-sectional circle of each air tube 26. The diameter of the first air hole 27 is larger than the diameter of the second air hole 28.

[0038] In use, the nozzle of the air intake device is installed on the air pipe 26 of one of the gas distribution mechanisms 2. The reaction gas enters the first gas distribution chamber 24 through the air pipe 26 and mixes; then it enters the second gas distribution chamber 25 evenly through the first air hole 27 and mixes again; then it enters the deposition chamber 11 through the second air hole 28 with a more uniform airflow to carry out the reaction. After the reaction is completed, the exhaust gas enters the second gas distribution chamber 25 through the second air hole 28, then enters the first gas distribution chamber 24 through the first air hole 27, and finally exits from the air pipe 26.

[0039] The first air distribution plate 22 and the second air distribution plate 23 in the two air distribution mechanisms 2 are arranged in parallel. In addition, the size and position of the first air hole 27 and the second air hole 28 can be adjusted according to actual needs to meet the usage requirements of different processes and products.

[0040] The above description is merely an embodiment of this utility model and does not limit the patent scope of this utility model. Any equivalent structural or procedural transformations made based on the description and drawings of this utility model, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this utility model.

Claims

1. A universal device for both inlet and outlet gas of a CVD furnace, installed on the furnace wall of a reactor (1) having a deposition chamber (11), characterized in that, The gas distribution mechanism (2) includes a fixed plate (21), a first gas distribution plate (22), and a second gas distribution plate (23) spaced apart. The fixed plate (21) is detachably connected to the furnace wall of the reactor (1). The gap between the fixed plate (21) and the first gas distribution plate (22) forms a first gas distribution chamber (24), and the gap between the first gas distribution plate (22) and the second gas distribution plate (23) forms a second gas distribution chamber (25). The fixed plate (21) is provided with an air pipe (26) communicating with the first air distribution chamber (24), the first air distribution plate (22) is provided with a first air hole (27) communicating with the first air distribution chamber (24) and the second air distribution chamber (25), and the second air distribution plate (23) is provided with a second air hole (28) communicating with the second air distribution chamber (25) and the sedimentation chamber (11); there are two air distribution mechanisms (2), one of which is an air pipe (26) forming an air inlet pipe and the other is an air pipe (26) forming an air outlet pipe.

2. The universal device for CVD furnace inlet and outlet gas as described in claim 1, characterized in that, The first gas distribution plate (22) and the second gas distribution plate (23) are located in the sedimentation chamber (11).

3. The universal device for CVD furnace inlet and outlet gas as described in claim 1, characterized in that, The periphery of the first air distribution chamber (24) is sealed with a first end plate (210), and the periphery of the second air distribution chamber (25) is sealed with a second end plate (211).

4. The universal device for CVD furnace inlet and outlet gas as described in claim 3, characterized in that, The first end plate (210) and the first air distribution plate (22) are integral parts, and the second end plate (211) and the second air distribution plate (23) are integral parts.

5. The universal device for CVD furnace inlet and outlet gas as described in claim 1, characterized in that, The two gas distribution mechanisms (2) on the reactor (1) are symmetrically arranged.

6. The universal device for CVD furnace inlet and outlet gas as described in claim 1, characterized in that, The fixed plate (21), the first air distribution plate (22), and the second air distribution plate (23) are detachably connected by a connector (29).

7. The universal device for CVD furnace inlet and outlet gas as described in claim 1, characterized in that, The trachea (26), the first vent (27), and the second vent (28) are each provided with multiple vents.

8. The universal device for CVD furnace inlet and outlet gas as described in claim 7, characterized in that, Multiple tracheae (26) and multiple second vents (28) are arranged in a rectangular array, and multiple first vents (27) are arranged in a circular or rhomboid shape with the center of the cross-sectional circle of each tracheae (26) as the reference.

9. The universal device for CVD furnace inlet and outlet gas as described in claim 1, characterized in that, The diameter of the first pore (27) is larger than the diameter of the second pore (28).

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