Developing nozzle and spraying equipment
By setting multiple quick-release spray nozzles and spray holes in different directions on the developing nozzle, the problem of uneven spraying of existing developing nozzles is solved, thereby improving the uniformity of wafer developing reaction and the lithography effect.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- FOREHOPE SEMICONDUCTOR (NINGBO) CO LTD
- Filing Date
- 2025-06-17
- Publication Date
- 2026-04-28
AI Technical Summary
The existing developing nozzles have a large impact force near the spraying position and a small impact force far from the spraying position when spraying developing solution, which leads to uneven development reaction of the photoresist layer on the wafer and affects the photolithography effect.
The developing nozzle design includes a liquid supply body and multiple quick-release spray nozzles. The quick-release spray nozzles are equipped with spray holes in different directions, which disperse the impact force through buffering and ensure the consistency of the spray impact force.
It achieves uniformity in the degree of wafer development reaction, is suitable for different impact requirements, and improves the lithography effect and applicability.
Smart Images
Figure CN224176879U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of photolithography technology, and more specifically, to a developing nozzle and a spraying device. Background Technology
[0002] The photolithography process uses a photolithography machine to transfer a designed circuit pattern from a photomask to the wafer surface via photoresist. However, at this stage, the pattern only exists as exposed photoresist. The primary function of development is to clearly and accurately reveal this potential pattern, selectively removing or retaining the exposed photoresist according to the predetermined circuit pattern. This allows the photoresist layer on the wafer surface to form a three-dimensional pattern corresponding to the photomask, providing a precise template for subsequent processes such as etching and ion implantation.
[0003] During development, developing nozzles are typically used to spray developing solution. However, existing developing nozzles have a large impact force near the spraying position and a small impact force further away from the spraying position, making it difficult to ensure the consistency of the spraying impact force along the length direction. This results in uneven reaction of the wafer photoresist layer during development, affecting the photolithography effect. Utility Model Content
[0004] The purpose of this invention is to provide a developing nozzle and spraying equipment that can disperse the impact force during spraying, ensuring the consistency of the spraying impact force, thereby ensuring the uniformity of the reaction degree of wafer development.
[0005] The embodiments of this utility model are implemented as follows:
[0006] In one aspect, this utility model provides a developing nozzle, including a liquid supply body and a plurality of quick-release spray nozzles. A liquid supply channel is formed inside the liquid supply body, and a plurality of spray ports communicating with the liquid supply channel are provided on the bottom side of the liquid supply body. The plurality of quick-release spray nozzles are detachably and correspondingly assembled in the plurality of spray ports. Each quick-release spray nozzle is provided with a first spray hole, which communicates with the spray port, and the opening direction of the first spray hole is different from the opening direction of the spray port.
[0007] In some preferred embodiments, the quick-release spray nozzle is frustoconical in shape and has a large end and a small end, the large end being held in place by the spray nozzle and the small end extending downwards. A conical sidewall is also formed between the large end and the small end, and the first spray hole is disposed on the conical sidewall.
[0008] In some preferred embodiments, the large end is provided with a guide groove, the guide groove is connected to the liquid supply channel, and the plurality of first spray holes are all connected to the guide groove.
[0009] In some preferred embodiments, the large end is further provided with a retaining groove, and the spray nozzle is provided with a retaining protrusion, which is correspondingly retained in the retaining groove.
[0010] In some preferred embodiments, the retaining groove is annular and surrounds the guide groove.
[0011] In some preferred embodiments, the outer flare of each of the spray nozzles forms a receiving groove, and the retaining protrusion is disposed in the receiving groove, the receiving groove being used to receive the large end.
[0012] In some preferred embodiments, each of the spray nozzles is a rectangular opening, and the outer diameter of the larger end is smaller than the width of the longer side of the spray nozzle.
[0013] In some preferred embodiments, a plurality of second spray holes are further provided on the conical sidewall, the plurality of first spray holes are distributed along the first circumference, the plurality of second spray holes are distributed along the second circumference, and the diameter of the first circumference is smaller than the diameter of the second circumference.
[0014] In some preferred embodiments, the liquid supply body is in the shape of a cylindrical tube, and the plurality of spray nozzles are evenly spaced along the straight extension direction of the liquid supply body.
[0015] On the other hand, this utility model embodiment also provides a spraying device, including a machine base and the aforementioned developing nozzle, wherein a liquid supply pipe is provided on the machine base, the liquid supply body is disposed on the machine base, and the liquid supply pipe is connected to the liquid supply channel.
[0016] The beneficial effects of this utility model embodiment include:
[0017] The developing nozzle and spraying device provided in this embodiment of the utility model include a liquid supply body and a plurality of quick-release spray nozzles. A liquid supply channel is formed inside the liquid supply body, and a plurality of spray ports connected to the liquid supply channel are provided on the bottom side of the liquid supply body. The plurality of quick-release spray nozzles are detachably and correspondingly assembled in the plurality of spray ports. Each quick-release spray nozzle is provided with a first spray hole, which is connected to the spray port, and the opening direction of the first spray hole is different from the opening direction of the spray port.
[0018] Using the above solution, the spraying action can be performed using the first spray hole on the quick-release spray nozzle. Since the spraying direction of the first spray hole is different from that of the spray outlet, the quick-release spray nozzle can act as a buffer, dispersing the spray impact force and preventing uneven impact, thus ensuring the consistency of the sprayed impact force and guaranteeing the uniformity of the wafer development reaction. Simultaneously, the quick-release spray nozzle can be removed from the spray outlet, allowing direct spraying through the outlet. This is suitable for situations requiring high impact force to remove photoresist (such as using a high-impact developer to remove photoresist during wafer rework), offering greater versatility. Attached Figure Description
[0019] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.
[0020] Figure 1 This is a schematic diagram of the structure of the developing nozzle provided in an embodiment of the present invention;
[0021] Figure 2 for Figure 1 A magnified view of a section at point II;
[0022] Figure 3 for Figure 1 Schematic diagram of the quick-release spray nozzle;
[0023] Figure 4 This is a partial structural schematic diagram of the developing nozzle provided in an embodiment of the present invention.
[0024] icon:
[0025] 100-Developing nozzle; 110-Supply body; 111-Supply channel; 130-Quick-release spray nozzle; 131-Large end; 132-Small end; 133-Guide groove; 134-Clamping groove; 150-Spray port; 151-Clamping protrusion; 152-Receiving groove; 170-First spray hole; 190-Second spray hole. Detailed Implementation
[0026] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. The components of the embodiments of this utility model described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.
[0027] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.
[0028] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.
[0029] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this utility model is in use. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first," "second," and "third," etc., are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.
[0030] Furthermore, terms such as "horizontal" and "vertical" do not imply that components must be absolutely horizontal or suspended, but rather that they can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal than "vertical," not that the structure must be completely horizontal, but can be slightly tilted.
[0031] In the description of this utility model, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.
[0032] As disclosed in the background section, the developing nozzle 100 in the prior art typically sprays the developing solution directly through the spray nozzle 150. However, the existing developing nozzle 100 has a large impact force near the spray position of the developing solution and a small impact force far from the spray position, making it difficult to ensure the consistency of the spray impact force along the length direction. This results in uneven reaction degree of the wafer photoresist layer development and affects the photolithography effect.
[0033] Furthermore, if the existing developing nozzle 100 adopts the method of directly reducing the size of the spray nozzle 150 to prevent excessive impact force, it will result in the inability to remove photoresist when the wafer rework requires a large impact force, thus having poor applicability.
[0034] To address the aforementioned problems, this utility model provides a developing nozzle 100 and a spraying device. The partial structure and working principle of the developing nozzle 100 and the spraying device are described in detail below.
[0035] See Figures 1 to 4 This utility model provides a developing nozzle 100 that can disperse the impact force during spraying, ensuring the consistency of the sprayed impact force and thus ensuring the uniformity of the reaction degree of wafer development. It also has better applicability, meeting different impact force requirements.
[0036] The developing nozzle 100 provided in this embodiment of the present invention includes a liquid supply body 110 and a plurality of quick-release spray nozzles 130. A liquid supply channel 111 is formed in the liquid supply body 110, and a plurality of spray ports 150 communicating with the liquid supply channel 111 are provided on the bottom side of the liquid supply body 110. The plurality of quick-release spray nozzles 130 are detachably and correspondingly assembled in the plurality of spray ports 150. Each quick-release spray nozzle 130 is provided with a first spray hole 170, which is connected to the spray port 150, and the opening direction of the first spray hole 170 is different from the opening direction of the spray port 150.
[0037] In practical use, the spraying action can be performed using the first spray hole 170 on the quick-release spray nozzle 130. Since the spraying direction of the first spray hole 170 is different from that of the spray outlet 150, the quick-release spray nozzle 130 can act as a buffer, dispersing the spray impact force and preventing uneven impact, thus ensuring the consistency of the spray impact force and guaranteeing the uniformity of the wafer development reaction. Simultaneously, the quick-release spray nozzle 130 can be removed from the spray outlet 150, allowing direct spraying. This is suitable for situations requiring high impact force to remove photoresist (such as using a high-impact developer to remove photoresist during wafer rework), making it more versatile.
[0038] It is worth noting that the liquid supply body is set on the machine platform, and the machine platform is also equipped with a liquid supply pipe. The liquid supply pipe can be connected to four spray nozzles 150, and there are also four quick-release spray nozzles 130. The number of spray nozzles 150 and quick-release spray nozzles 130 here is just an example.
[0039] In some embodiments, the quick-release spray nozzle 130 is frustoconical in shape, having a large end 131 and a small end 132. The large end 131 is held in place by the spray nozzle 150, and the small end 132 extends downward. A conical sidewall is formed between the large end 131 and the small end 132, and a first spray hole 170 is disposed on the conical sidewall. Specifically, using a conical quick-release spray nozzle 130 can more effectively achieve the effect of dispersing impact force. Furthermore, the large end 131 and the small end 132 are the two end faces of the frustum, the large end 131 can be held in place by the spray nozzle 150, and the small end 132 can protrude downward, thereby enabling the first spray hole 170 to spray circumferentially, fully achieving the buffering effect. Of course, in other preferred embodiments of this utility model, the quick-release spray nozzle 130 can also be trapezoidal. The specific shape of the quick-release spray nozzle 130 is not specifically limited here.
[0040] In some embodiments, the large end 131 is provided with a guide groove 133, which is connected to the liquid supply channel 111, and the plurality of first spray holes 170 are all connected to the guide groove 133. Specifically, the guide groove 133 is recessed toward the small end 132, thereby forming a confluence cavity on the quick-release spray nozzle 130. This confluence cavity can gather the developer sprayed from the spray port 150 and spray it out through the plurality of first spray holes 170. Through the buffering effect of the guide groove 133, the impact force of the developer can be effectively reduced.
[0041] Furthermore, the larger end 131 is also provided with a retaining groove 134, and the spray nozzle 150 is provided with a retaining protrusion 151, which is correspondingly retained in the retaining groove 134. Specifically, the depth of the retaining groove 134 is slightly less than the depth of the guide groove 133, and the retaining protrusion 151 can be correspondingly interference-fitted in the retaining groove 134, thereby achieving the fixation of the quick-release spray nozzle 130. Preferably, the shape of the retaining protrusion 151 is adapted to the shape of the retaining groove 134, and there can be two retaining protrusions 151, which can more firmly fix the quick-release spray nozzle 130. When disassembly is required, the quick-release spray nozzle 130 can be directly removed by hand or tool under external force, which is very convenient.
[0042] In some embodiments, the retaining groove 134 is annular and surrounds the guide groove 133. Specifically, the retaining protrusion 151 is arc-shaped and matches the shape of the retaining annular groove, while the annular design of the retaining groove 134 reduces the installation accuracy of the quick-release spray nozzle 130, eliminating the need for circumferential alignment and improving installation efficiency.
[0043] In some embodiments, the outer flare of each spray nozzle 150 forms a receiving groove 152, and a retaining protrusion 151 is disposed in the receiving groove 152. The receiving groove 152 is used to receive the large end 131. Specifically, the outer flare of the spray nozzle 150 forms a circular receiving groove 152. The size of the receiving groove 152 is adapted to the size of the large end 131 of the quick-release spray nozzle 130, so that the large end 131 can be just inserted into the receiving groove 152, which facilitates the retaining protrusion 151 to be retained in the retaining groove 134. At the same time, it can also reduce the protrusion height of the small end 132 and prevent the small end 132 from protruding too high and affecting the spraying effect.
[0044] It should be noted that the receiving tank 152 does not extend into the internal liquid supply channel 111, and the receiving tank 152 does not serve to facilitate the flow of developer. Furthermore, the opening of the spray nozzle 150 is located in the middle of the receiving tank 152, allowing the developer to be sprayed out from the spray nozzle 150 and enter the guide channel 133.
[0045] In some embodiments, each spray nozzle 150 is a rectangular opening, and the outer diameter of the larger end 131 is smaller than the width of the long side of the spray nozzle 150. Specifically, the spray nozzle 150 has a long side and a short side, the width of the long side is greater than the outer diameter of the larger end 131, and the width of the short side is smaller than the outer diameter of the larger end 131. With this arrangement, the spraying area can be increased and the water pressure area of the spray nozzle 150 can be improved while ensuring that the developer sprayed from the spray nozzle 150 can be smoothly sprayed into the guide groove 133, thus avoiding the quick-release spray nozzle 130 from being washed away due to excessive water pressure in the spray nozzle 150.
[0046] In some embodiments, a plurality of second spray holes 190 are further provided on the conical sidewall, a plurality of first spray holes 170 are distributed along a first circumference, and a plurality of second spray holes 190 are distributed along a second circumference, wherein the diameter of the first circumference is smaller than the diameter of the second circumference. Specifically, the plurality of second spray holes 190 and the plurality of first spray holes 170 are respectively provided correspondingly. By increasing the number of second spray holes 190, the spraying area can be expanded and the spraying effect can be improved.
[0047] In some embodiments, the liquid supply body is cylindrical, and multiple spray nozzles 150 are evenly spaced along the straight extension direction of the liquid supply body. Specifically, a cylindrical liquid supply channel 111 is formed inside the liquid supply body, which is connected to an external liquid supply pipe to supply developing solution. Simultaneously, the liquid supply body can be connected to the rotating mechanism of the machine, thereby moving with the rotating mechanism to achieve spraying at different positions. The even distribution of multiple spray nozzles 150 along a straight direction further improves spray uniformity.
[0048] This utility model embodiment also provides a spraying device, including a machine base and the aforementioned developing nozzle 100. The developing nozzle 100 includes a liquid supply body 110 and a plurality of quick-release spray nozzles 130. A liquid supply channel 111 is formed inside the liquid supply body 110, and a plurality of spray ports 150 communicating with the liquid supply channel 111 are provided on the bottom side of the liquid supply body 110. The plurality of quick-release spray nozzles 130 are detachably and correspondingly assembled in the plurality of spray ports 150. Each quick-release spray nozzle 130 is provided with a first spray hole 170, which communicates with the spray port 150, and the opening direction of the first spray hole 170 is different from the opening direction of the spray port 150. A liquid supply pipe is provided on the machine base, the liquid supply body is placed on the machine base, and the liquid supply pipe is connected to the liquid supply channel 111.
[0049] In summary, the developing nozzle 100 and spraying device provided in this embodiment of the present invention have a liquid supply channel 111 formed in the liquid supply body 110, and a plurality of spray ports 150 connected to the liquid supply channel 111 are provided on the bottom side of the liquid supply body 110. A plurality of quick-release spray nozzles 130 are detachably and correspondingly assembled in the plurality of spray ports 150. Each quick-release spray nozzle 130 is provided with a first spray hole 170, which is connected to the spray port 150, and the opening direction of the first spray hole 170 is different from the opening direction of the spray port 150. Using the above scheme, the spraying action can be performed using the first spray hole 170 on the quick-release spray nozzle 130. Since the spraying direction of the first spray hole 170 is different from that of the spray outlet 150, the quick-release spray nozzle 130 can act as a buffer, dispersing the spray impact force and preventing uneven impact, thus ensuring the consistency of the spray impact force and guaranteeing the uniformity of the wafer development reaction. Simultaneously, the quick-release spray nozzle 130 can be removed from the spray outlet 150, allowing direct spraying through the outlet. This is suitable for situations requiring high impact force to remove photoresist (such as using a high-impact developer to remove photoresist during wafer rework), offering greater versatility.
[0050] The above are merely preferred embodiments of this utility model and are not intended to limit the scope of this utility model. Various modifications and variations can be made to this utility model by those skilled in the art. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of this utility model should be included within the protection scope of this utility model.
Claims
1. A developing nozzle, characterized in that, The device includes a liquid supply body and multiple quick-release spray nozzles. The liquid supply body has a liquid supply channel, and the bottom side of the liquid supply body is provided with multiple spray ports that communicate with the liquid supply channel. The multiple quick-release spray nozzles are detachably assembled into the multiple spray ports one by one. Each quick-release spray nozzle is provided with multiple first spray holes, and the multiple first spray holes are all connected to the spray ports. The opening direction of each first spray hole is different from the opening direction of the spray port.
2. The developing nozzle according to claim 1, characterized in that, The quick-release spray nozzle is frustoconical in shape and has a large end and a small end. The large end is held in place by the spray nozzle, and the small end extends downward. A conical sidewall is formed between the large end and the small end, and the first spray hole is disposed on the conical sidewall.
3. The developing nozzle according to claim 2, characterized in that, The large end is provided with a guide groove, which is connected to the liquid supply channel, and the plurality of first spray holes are all connected to the guide groove.
4. The developing nozzle according to claim 3, characterized in that, The large end is also provided with a retaining groove, and the spray nozzle is provided with a retaining protrusion, which is correspondingly retained in the retaining groove.
5. The developing nozzle according to claim 4, characterized in that, The retaining groove is annular and surrounds the guide groove.
6. The developing nozzle according to claim 4, characterized in that, Each of the spray nozzles has an outer flared opening forming a receiving groove, and the retaining protrusion is disposed in the receiving groove, which is used to receive the large end.
7. The developing nozzle according to claim 6, characterized in that, Each of the spray nozzles has a rectangular opening, and the outer diameter of the larger end is smaller than the width of the longer side of the spray nozzle.
8. The developing nozzle according to claim 3, characterized in that, The conical sidewall is also provided with a plurality of second spray holes, the plurality of first spray holes are distributed along the first circumference, and the plurality of second spray holes are distributed along the second circumference, wherein the diameter of the first circumference is smaller than the diameter of the second circumference.
9. The developing nozzle according to claim 6, characterized in that, The liquid supply body is in the shape of a cylindrical tube, and the multiple spray nozzles are evenly spaced along the straight extension direction of the liquid supply body.
10. A spraying device, characterized in that, It includes a machine base and a developing nozzle as described in any one of claims 1-9, wherein a liquid supply pipe is provided on the machine base, the liquid supply body is disposed on the machine base, and the liquid supply pipe is connected to the liquid supply channel.