Bidirectional deposition tool for CVD (chemical vapor deposition) silicon carbide ring

Abstract

The utility model belongs to the technical field of chemical vapor deposition, and particularly relates to a CVD (chemical vapor deposition) silicon carbide ring two-way deposition tool, which aims at improving the efficiency and quality of silicon carbide material deposition, and comprises a deposition base, a positioning piece, a connecting disc, a deposition base body and a deposition cover. Therefore, the production efficiency is improved; through reasonable structural design, uniform distribution of airflow is ensured, the problem that the thickness of a film of traditional one-way deposition equipment is not uniform is solved, and external impurities are effectively prevented from entering; through the combined design of the positioning column, the blocking cap, the blocking ring and the spring, the stability and operation convenience of the tool in the deposition process are guaranteed, the maintenance time and cost are reduced, the service life of equipment is further prolonged, the safety of the equipment is further improved, and reliable guarantee can be provided for efficient production of silicon carbide materials.

Description

CVD silicon carbide ring bidirectional deposition fixture Technical Field

[0001] This invention belongs to the field of chemical vapor deposition technology, specifically relating to a CVD silicon carbide ring bidirectional deposition fixture. Background Technology

[0002] Silicon carbide (SiC) materials are widely used in the manufacture of high-performance electronic devices and high-temperature structural materials due to their excellent mechanical strength, high-temperature stability, and chemical stability. With the continuous improvement of integrated circuit manufacturing processes, some components require the use of CVD silicon carbide materials for fabrication. Chemical vapor deposition (CVD) is a process that generates solid deposits by chemical and transport reactions of gaseous substances on the surface of a solid substrate. Therefore, during the deposition process, it is necessary to ensure that the deposition area is not obstructed to guarantee the deposition effect. This places higher demands on some products without support points, requiring consideration of how to improve production efficiency while ensuring deposition.

[0003] However, existing deposition fixtures are typically designed with single-sided support and single-sided deposition. This design allows only one finished product to be deposited at a time, resulting in low deposition efficiency and failing to meet the growing production demands. Furthermore, traditional unidirectional deposition equipment, due to its complex structure and inconvenient operation, also struggles to achieve efficient deposition processes. Existing equipment is prone to deposit accumulation or falling during deposition, leading to unsatisfactory deposition results and increasing cleaning and maintenance costs. Summary of the Invention

[0004] In view of the problems existing in the prior art, the purpose of this utility model is to provide a CVD silicon carbide ring bidirectional deposition fixture, which can flexibly assemble multiple deposition substrates and connecting disks together to form a bidirectional deposition fixture structure.

[0005] To achieve the above objectives, this utility model provides the following technical solution:

[0006] A CVD silicon carbide ring bidirectional deposition fixture includes a deposition base, the bottom of which is fitted with a positioning element for defining its position.

[0007] The deposition base includes a base plate connected to a positioning component. A connecting seat is fixedly connected to the top of the base plate. A plurality of connecting discs and a deposition substrate are provided on the top of the connecting seat. The connecting discs are distributed on both sides of the deposition substrate.

[0008] The topmost connecting plate is connected to a deposition cover.

[0009] Furthermore, a through groove is provided through the base plate, and the through groove is distributed at equal intervals around the central axis of the base plate;

[0010] The through groove is waist-shaped, and an insertion hole is provided at one end of the through groove.

[0011] Furthermore, the positioning element includes a positioning post disposed through the through groove, and a stop cap is fixedly connected to the top of the positioning post;

[0012] The diameter of the stop cap is the same as the inner diameter of the insertion hole, and the diameter of the stop cap is larger than the inner diameter of the through groove.

[0013] Furthermore, a retaining ring and a spring are fitted on the positioning post, and a fixing plate is connected to the bottom of the positioning post;

[0014] The bottom outer side of the positioning post is provided with a connecting thread, and the top of the fixing plate is provided with a second threaded groove that mates with the connecting thread.

[0015] The top of the fixing plate has symmetrical through-holes for fixing.

[0016] Furthermore, a connecting seat is fixedly connected to the top center of the base plate, and a first threaded groove is provided on the top of the connecting seat;

[0017] Both sides of the connecting plate are fixedly connected with threaded posts, and the threaded posts are connected to the first threaded groove.

[0018] Furthermore, the deposition substrate is shaped like a wheel, and a threaded hole for connection with a threaded post is provided at the center of the top of the deposition substrate.

[0019] Furthermore, the bottom of the deposition cover is fixedly connected to a connector, and the bottom of the connector has a third threaded groove that connects to the threaded post.

[0020] Compared with the prior art, the beneficial effects of this utility model are:

[0021] First, the bidirectional deposition structure design of this invention significantly improves deposition efficiency. Traditional CVD deposition fixtures typically employ a single-sided support structure, allowing only one finished product to be deposited at a time, resulting in low efficiency. This invention, by incorporating connecting discs and a deposition substrate on both sides of the deposition base, achieves simultaneous double-sided deposition, enabling the deposition of two finished products within a single fixture, effectively doubling the deposition efficiency. This design not only improves production efficiency but also reduces equipment occupancy time and resource consumption, resulting in significant economic benefits.

[0022] Secondly, this invention improves the uniformity and quality of the deposited layer through a reasonable structural design. The multi-layered design of the deposition base and connecting plate ensures uniform airflow distribution during deposition, avoiding the uneven film thickness problem commonly found in traditional unidirectional deposition fixtures. Furthermore, the deposition mask effectively prevents the entry of external impurities, ensuring the stability of the deposition process and improving deposition quality. The tight fit between the deposition mask, connecting plate, and deposition substrate further guarantees the uniformity of the deposited film and the quality of the finished product.

[0023] Furthermore, the positioning component and base plate structure designed in this utility model significantly simplify the operation steps of the tooling. The combined design of the positioning post, stop cap, stop ring, and spring ensures the stability and safety of the tooling; the separation and connection of the base plate and positioning component can be achieved through a simple rotation operation, making operation convenient and facilitating quick assembly and disassembly. This design reduces equipment maintenance time and costs, while also lowering the risk of damage due to improper operation.

[0024] Finally, the structural design of this invention makes the tooling more stable and reliable during the deposition process. The through slot and insertion hole design on the base plate ensures accurate positioning of the positioning components during installation, reducing structural loosening or displacement caused by equipment vibration or external forces. The threaded connection between the connecting seat and the connecting plate makes the fit between the various components tighter, avoiding the common problem of loose assembly in traditional tooling, and further improving the overall stability of the equipment. Attached Figure Description

[0025] Figure 1 is a schematic diagram of the structure of this utility model;

[0026] Figure 2 is a schematic diagram of the deposition base of this utility model;

[0027] Figure 3 is a structural schematic diagram of the positioning component of this utility model;

[0028] Figure 4 is a schematic diagram of the structure of the connecting plate of this utility model;

[0029] Figure 5 is a schematic diagram of the deposition and covering structure of this utility model.

[0030] The attached diagram lists the components represented by each number as follows:

[0031] 1. Deposition base;

[0032] 11. Base plate; 12. Through groove; 121. Insertion hole;

[0033] 13. Connecting seat; 131. First threaded groove;

[0034] 2. Positioning components;

[0035] 21. Fixing plate; 211. Fixing hole; 212. Second threaded groove;

[0036] 22. Positioning pin; 221. Stop cap; 222. Connecting thread;

[0037] 23. Retaining ring; 24. Spring;

[0038] 3. Connecting disc; 31. Threaded post;

[0039] 4. Deposition substrate; 41. Threaded hole;

[0040] 5. Deposition and covering;

[0041] 51. Connector; 511. Third threaded groove. Detailed Implementation

[0042] To make the objectives and advantages of this utility model clearer, the following detailed description is provided in conjunction with embodiments. It should be understood that the following text is merely used to describe one or more specific embodiments of this utility model and does not strictly limit the scope of protection specifically claimed by this utility model.

[0043] Referring to Figures 1-5, the CVD silicon carbide ring bidirectional deposition fixture includes a deposition base 1, with a positioning element 2 inserted into the bottom of the deposition base 1 to define its position. The deposition base 1 achieves bidirectional deposition functionality through a rational structural design. The main components of the deposition base 1 include a base plate 11, a connecting seat 13, multiple connecting discs 3, a deposition substrate 4, and a deposition cover 5. The base plate 11 provides support for the entire fixture and is fixed to the internal support of the deposition chamber by the positioning element 2, thereby ensuring the stability of the equipment during deposition. The top of the base plate 11 is fixedly connected to the connecting seat 13, which has multiple connecting discs 3 and a deposition substrate 4 on its top. The multiple connecting discs 3 are evenly distributed on both sides of the deposition substrate 4, realizing the structural characteristics of bidirectional deposition. The topmost connecting disc 3 is connected to a deposition cover 5, which covers and protects the deposition area, preventing impurities from entering the deposition area and ensuring deposition quality.

[0044] Referring to Figure 2, a through groove 12 is provided through the base plate 11, and the through grooves 12 are evenly distributed around the central axis of the base plate 11. This evenly spaced arrangement allows the base plate 11 to be evenly stressed during the deposition process, reducing structural deformation caused by uneven stress. The through groove 12 is designed in a waist shape, which enhances the strength of the through groove 12 and prevents deformation or damage due to airflow impact during the deposition process. An insertion hole 121 is provided at one end of the through groove 12. The insertion hole 121 is used to guide the insertion of the baffle 221 during the assembly or disassembly of the fixture, ensuring that the positioning component 2 can be accurately connected to the base plate 11, thereby ensuring the stability of the deposition fixture.

[0045] Referring to Figures 2-3, the positioning component 2 includes a positioning post 22 that passes through the through groove 12, and a stop cap 221 is fixedly connected to the top of the positioning post 22. The stop cap 221 is designed to cooperate with the insertion hole 121. The diameter of the stop cap 221 is the same as the inner diameter of the insertion hole 121, ensuring that the stop cap 221 can pass smoothly through the insertion hole 121 and enter the through groove 12 when the bottom plate 11 is rotated counterclockwise. In addition, the diameter of the stop cap 221 is larger than the inner diameter of the through groove 12, so that when the bottom plate 11 is rotated to the designated position, the stop cap 221 cannot slide out of the through groove 12, thereby fixing the bottom plate 11 on the positioning component 2 and preventing the bottom plate 11 from loosening or falling off due to vibration or other external forces during the deposition process.

[0046] Referring to Figure 3, a retaining ring 23 and a spring 24 are fitted on the positioning post 22. This design provides an adjustable buffer force between the positioning post 22 and the base plate 11, further enhancing the stability and safety of the tooling during the deposition process. A fixing plate 21 is connected to the bottom of the positioning post 22, which is used to fix the entire tooling structure inside the deposition chamber. A connecting thread 222 is opened on the outer side of the bottom of the positioning post 22, which cooperates with the second threaded groove 212 opened on the top of the fixing plate 21. By rotating the positioning post 22, a tight connection with the fixing plate 21 is achieved. A fixing hole 211 is symmetrically opened through the top of the fixing plate 21. The fixing hole 211 is used to fix the fixing plate 21 to the support of the deposition chamber, thereby ensuring the stability and positioning accuracy of the tooling during the deposition process.

[0047] Referring to Figures 2-5, a connecting seat 13 is fixedly connected to the top center of the base plate 11. The top of the connecting seat 13 has a first threaded groove 131. The first threaded groove 131 is used to connect with the threaded posts 31 of multiple connecting discs 3, so that the connecting discs 3 can be firmly fixed on the connecting seat 13. Threaded posts 31 are fixedly connected to both sides of the connecting discs 3. The threaded posts 31 are connected to the first threaded groove 131 of the connecting seat 13 to ensure that the connecting discs 3 do not shift during the deposition process, providing a support structure for bidirectional deposition.

[0048] Referring to Figures 4-5, the shape of the deposition substrate 4 is set as a wheel shape, which helps to distribute the airflow evenly, thereby improving the uniformity and quality of deposition. A threaded hole 41 is opened through the center of the top of the deposition substrate 4 to connect with the threaded post 31. The threaded hole 41 is used to fix the deposition substrate 4 on the connecting plate 3. The threaded connection ensures the stability and accurate positioning of the deposition substrate 4 during the deposition process.

[0049] Referring to Figures 4-5, the bottom of the deposition cover 5 is fixedly connected to a connector 51, and the bottom of the connector 51 has a third threaded groove 511 that connects to the threaded post 31. This design allows the deposition cover 5 to be stably covered on the topmost connecting plate 3, effectively preventing the entry of external impurities during the deposition process, while ensuring the sealing of the deposition area, improving the deposition effect and product quality.

[0050] The working principle of this utility model is as follows:

[0051] When in use, fix the fixing plate 21 on the internal support of the deposition chamber, then connect the threaded column 31 in the first threaded groove 131, connect the deposition substrate 4 to be deposited to the connecting plate 3, and flexibly assemble multiple connecting plates 3 and deposition substrate 4 together according to the deposition requirements.

[0052] Finally, install the deposition cover 5 onto the topmost connecting plate 3;

[0053] After the deposition base 1, connecting plate 3, deposition substrate 4 and deposition cover 5 are assembled, hold the base plate 11 with your hand and let the stop cap 221 pass through the insertion hole 121. After the stop cap 221 passes through, rotate the base plate 11 counterclockwise so that the positioning post 22 moves to the end of the through groove 12 away from the insertion hole 121.

[0054] Since the diameter of the stop cap 221 is larger than the inner diameter of the through groove 12, and since the positioning post 22 is fitted with a retaining ring 23 and a spring 24, under the elastic compression of the spring 24, the retaining ring 23 will fit tightly against the bottom of the base plate 11, thereby fixing the base plate 11 between the stop cap 221 and the retaining ring 23.

[0055] Once deposition is complete, simply rotate the base plate 11 clockwise to align the stop cap 221 with the insertion hole 121, and the base plate 11 and the positioning piece 2 will separate.

[0056] The above description is merely a preferred embodiment of this utility model. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principle of this utility model, and these improvements and modifications should also be considered within the scope of protection of this utility model. Structures, devices, and operating methods not specifically described or explained in this utility model, unless otherwise specified or limited, shall be implemented using conventional methods in the field.

Claims

1. A CVD silicon carbide ring bidirectional deposition fixture, characterized in that: The system includes a deposition base (1), the bottom of which is fitted with a positioning element (2) for defining its position; the deposition base (1) includes a base plate (11) connected to the positioning element (2), the top of which is fixedly connected with a connecting seat (13), the top of which is provided with multiple connecting discs (3) and a deposition substrate (4), the connecting discs (3) being distributed on both sides of the deposition substrate (4); a deposition cover (5) is connected to the topmost connecting disc (3).

2. The CVD silicon carbide ring bidirectional deposition fixture according to claim 1, characterized in that: A through groove (12) is provided on the base plate (11), and the through groove (12) is distributed at equal intervals around the central axis of the base plate (11); the through groove (12) is waist-shaped, and an insertion hole (121) is provided at one end of the through groove (12).

3. The CVD silicon carbide ring bidirectional deposition fixture according to claim 2, characterized in that: The positioning component (2) includes a positioning post (22) provided through the through groove (12), and a stop cap (221) is fixedly connected to the top of the positioning post (22); the diameter of the stop cap (221) is the same as the inner diameter of the insertion hole (121), and the diameter of the stop cap (221) is larger than the inner diameter of the through groove (12).

4. The CVD silicon carbide ring bidirectional deposition fixture according to claim 3, characterized in that: The positioning post (22) is fitted with a retaining ring (23) and a spring (24), and the bottom of the positioning post (22) is connected to a fixing plate (21); the bottom outer side of the positioning post (22) is provided with a connecting thread (222), and the top of the fixing plate (21) is provided with a second threaded groove (212) that matches the connecting thread (222); the top of the fixing plate (21) is symmetrically provided with fixing holes (211).

5. The CVD silicon carbide ring bidirectional deposition fixture according to claim 1, characterized in that: A connecting seat (13) is fixedly connected to the top center of the base plate (11), and a first threaded groove (131) is opened on the top of the connecting seat (13); threaded posts (31) are fixedly connected to both sides of the connecting plate (3), and the threaded posts (31) are connected to the first threaded groove (131).

6. The CVD silicon carbide ring bidirectional deposition fixture according to claim 5, characterized in that: The deposition substrate (4) is shaped like a wheel, and a threaded hole (41) for connecting to the threaded post (31) is provided at the center of the top of the deposition substrate (4).

7. The CVD silicon carbide ring bidirectional deposition fixture according to claim 6, characterized in that: The bottom of the deposition cover (5) is fixedly connected to a connector (51), and the bottom of the connector (51) is provided with a third threaded groove (511) that connects to the threaded post (31).

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