Leveling structure for photoetching plate of double-sided exposure machine

Abstract

The utility model relates to the technical field of exposure machines, in particular to a leveling structure for a photoetching plate of a double-sided exposure machine, which comprises a leveling mechanism and is used for leveling the photoetching plate. The fine adjustment assembly comprises a base arranged on the moving assembly, a bearing part is arranged on the base and used for fixing a photoetching plate jig, six lower universal joints are fixed to the outer edge of the top of the base, electric supporting legs are pivoted to the lower universal joints, and upper universal joints are pivoted to the output ends of the electric supporting legs; the bearing part comprises a bearing platform arranged above the base, the upper universal joint is fixed to the bottom of the bearing platform, a mounting cavity is formed in the bearing platform, and mounting lugs are arranged at the four corners in the mounting cavity; the nanoscale precise leveling of the photoetching plate is realized through the cooperative control of the six-degree-of-freedom electric supporting legs, and the movement flexibility is ensured through the connection of the universal joints; the design of the modular mounting cavity and the four-corner mounting lugs supports quick replacement of the jig.

Description

Technical Field

[0001] This utility model relates to the field of exposure machine technology, specifically to a leveling structure for a photomask in a double-sided exposure machine. Background Technology

[0002] In semiconductor manufacturing and PCB fabrication, the photolithography process using double-sided exposure machines demands extremely high parallelism between the substrate and the photomask. Traditional leveling methods suffer from limited adjustment freedom and insufficient precision, making it difficult to meet the sub-micron alignment accuracy requirements of modern micro-nano fabrication. Especially for double-sided exposure processes, ensuring the alignment accuracy of the patterns on both sides simultaneously places even higher demands on the leveling system.

[0003] According to CN220855445U, a manual double-sided concentric adjustment platform is disclosed. This technology discloses "a manual double-sided concentric adjustment platform, including a platform, a mounting base vertically mounted on the platform, a horizontally arranged support base and a vertically arranged linear guide rail on the mounting base, a lower adjustment mechanism and an upper adjustment mechanism slidably mounted on the linear guide rail, a lower alignment lens mounted on the lower adjustment mechanism, a Y-axis fine adjustment platform mounted on the upper adjustment mechanism, an X-axis fine adjustment platform mounted on the Y-axis fine adjustment platform, and an upper alignment lens mounted on the X-axis fine adjustment platform. The upper and lower alignment lenses are located on the upper and lower sides of the support base, respectively, and a calibration ruler is provided on the support base." This technology has the technical effect that "when in use, the calibration ruler is placed on the XY-axis stage, and the calibration ruler serves as a reference, which allows for convenient adjustment of the upper and lower alignment lenses to make them concentric."

[0004] Existing leveling structures mainly employ manual or simple mechanical adjustment methods, which suffer from insufficient adjustment precision and cumbersome operation. In particular, in double-sided exposure processes where precise alignment of the front and back patterns is required simultaneously, traditional leveling structures struggle to achieve multi-degree-of-freedom precision pose adjustment, resulting in the parallelism between the photomask and the substrate failing to meet sub-micron level requirements. This severely impacts the alignment accuracy of the exposed patterns and product quality. Utility Model Content

[0005] To address the shortcomings of existing technologies, this utility model provides a photomask leveling structure for a double-sided exposure machine. It achieves nanometer-level precision leveling of the photomask through coordinated control of six-degree-of-freedom electric support legs, and the universal joint connection ensures flexible movement. The modular mounting cavity and four-corner mounting ear design support quick fixture replacement.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a leveling structure for a photomask in a double-sided exposure machine, comprising a leveling mechanism for leveling the photomask, the leveling mechanism comprising:

[0007] The moving component is set on the exposure machine and used for coarse positioning;

[0008] The fine-tuning component includes a base mounted on the moving component, a support component on the base for fixing the photolithography fixture, six lower universal joints fixed to the outer edge of the top of the base, electric support legs pivotally connected to the lower universal joints, and upper universal joints pivotally connected to the output ends of the electric support legs.

[0009] Preferably, the supporting component includes a supporting platform disposed above the base, and an upper universal joint is fixed to the bottom of the supporting platform. The supporting platform has an installation cavity inside, and installation ears are provided at the four corners of the installation cavity.

[0010] Preferably, the moving component further includes an X-axis electric slide table disposed below the fine-tuning component, a Y-axis electric slide table fixed on the slider of the X-axis electric slide table, a slewing bearing disposed on the Y-axis electric slide table, the inner ring of the slewing bearing being fixed on the slider of the Y-axis electric slide table, and the base being fixed on the outer ring of the slewing bearing.

[0011] Preferably, the moving component further includes a mounting plate fixed to one end of the base, a servo motor is mounted on the mounting plate, a gear is fixed to the output end of the servo motor, and the gear meshes with the outer ring of the slewing bearing for transmission.

[0012] Preferably, the six electric outriggers are symmetrically distributed, with each pair of electric outriggers forming a group, and the three groups providing cross support.

[0013] Preferably, the electric outrigger has a built-in displacement sensor to monitor the extension and retraction of the electric outrigger in real time and feed it back to the control system. Beneficial effects

[0014] This invention provides a leveling structure for photomasks in a double-sided exposure machine. Compared with the prior art, it has the following advantages:

[0015] 1. Through the coordinated operation of six independently extendable electric outriggers, the translation and rotation control of the support component in three-dimensional space is realized. The upper and lower ends of each electric outrigger are connected to the support component and the base through upper and lower universal joints, respectively. When the length of the electric outrigger changes, the support component can obtain six degrees of freedom for precise positional adjustment, thereby achieving the leveling of the photolithography plate placed on the support component.

[0016] 2. By setting up mounting cavities inside the bearing platform and configuring mounting ears at the four corners, the photolithography fixture can be quickly disassembled and replaced using bolts. The symmetrically distributed mounting ears at the four corners ensure that the fixture is evenly stressed and avoids deformation due to uneven load. At the same time, it is easy to flexibly replace and adapt various fixtures according to different process requirements, which significantly improves the versatility and maintenance convenience of the equipment. Attached Figure Description

[0017] Figure 1 This is a three-dimensional structural diagram of the present invention;

[0018] Figure 2 This is a schematic diagram of the structure of the mobile component in this utility model;

[0019] Figure 3 This is a schematic diagram of the structure of the fine-tuning component in this utility model;

[0020] Figure 4 This is a schematic diagram of the structure of the support platform in this utility model.

[0021] In the diagram: 1. Leveling mechanism; 11. Moving component; 111. X-axis electric slide; 112. Y-axis electric slide; 113. Slewing bearing; 114. Mounting plate; 115. Servo motor; 116. Gear; 12. Fine-tuning component; 121. Base; 122. Bearing component; 1221. Bearing platform; 1222. Mounting cavity; 1223. Mounting ear; 123. Lower universal joint; 124. Electric support leg; 125. Upper universal joint. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] Please see Figure 1 - Figure 4 This utility model provides a technical solution: a leveling structure for a photomask in a double-sided exposure machine, including a leveling mechanism 1 for leveling the photomask, the leveling mechanism 1 including:

[0024] The movable component 11 is set on the exposure machine and used for coarse position adjustment;

[0025] The fine-tuning component 12 includes a base 121 disposed on the moving component 11. A bearing component 122 is disposed on the base 121 for fixing the photolithography fixture. Six lower universal joints 123 are fixed on the top outer edge of the base 121. Electric support legs 124 are pivotally connected to the lower universal joints 123. The output end of the electric support leg 124 is pivotally connected to the upper universal joint 125.

[0026] In this embodiment, six independently extendable electric support legs 124 work together to achieve translation and rotation control of the support component 122 in three-dimensional space. The upper and lower ends of each electric support leg 124 are connected to the support component 122 and the base 121 through upper universal joint 125 and lower universal joint 123, respectively. When the length of the electric support leg 124 changes, the support component 122 can obtain precise position and pose adjustment of six degrees of freedom, thereby achieving leveling of the photomask placed on the support component 122.

[0027] Specifically, the support component 122 includes a support platform 1221 disposed above the base 121, and an upper universal joint 125 is fixed to the bottom of the support platform 1221. The support platform 1221 has an installation cavity 1222 inside, and installation ears 1223 are provided at the four corners inside the installation cavity 1222.

[0028] In this embodiment, the fixture for placing the photomask can be fixed in the mounting cavity 1222 on the support platform 1221 by mounting ears 1223 and bolts, so that the fixture can be replaced.

[0029] Specifically, the moving component 11 also includes an X-axis electric slide 111 disposed below the fine-tuning component 12. A Y-axis electric slide 112 is fixed on the slider of the X-axis electric slide 111. A slewing bearing 113 is disposed on the Y-axis electric slide 112, and the inner ring of the slewing bearing 113 is fixed on the slider of the Y-axis electric slide 112. The base 121 is fixed on the outer ring of the slewing bearing 113.

[0030] In this embodiment, the X-axis electric slide 111 and the Y-axis electric slide 112 drive the photolithography plate placed on the fine-tuning component 12 to automatically coarsely adjust its planar position.

[0031] Specifically, the moving component 11 also includes a mounting plate 114 fixed to one end of the base 121. A servo motor 115 is mounted on the mounting plate 114. A gear 116 is fixed to the output end of the servo motor 115, and the gear 116 meshes with the outer ring of the slewing bearing 113 for transmission.

[0032] In this embodiment, the output end of the servo motor 115 drives the gear 116 to rotate the outer ring of the slewing bearing 113, and the outer ring of the slewing bearing 113 drives the photolithography plate placed on the fine-tuning component 12 to rotate and adjust.

[0033] Specifically, the six electric outriggers 124 are symmetrically distributed, with each pair of electric outriggers 124 forming a group, and the three groups providing cross support.

[0034] In this embodiment, the symmetrical distribution of the three sets of cross supports optimizes the load distribution, enhances the system's resistance to off-center loads, and ensures stability during movement.

[0035] Specifically, the electric outrigger 124 has a built-in displacement sensor that monitors the extension and retraction of the electric outrigger 124 in real time and feeds the feedback to the control system.

[0036] In this embodiment, a closed-loop adjustment mechanism is formed by a built-in displacement sensor to ensure the accuracy and stability of the leveling process, while also having an automatic compensation function to eliminate mechanical transmission errors.

[0037] The working principle and usage process of this utility model are as follows: First, the fixture for placing the photomask is fixed in the mounting cavity 1222 on the support platform 1221 by mounting ears 1223 and bolts; then, the photomask placed on the fine adjustment component 12 is automatically coarsely adjusted in planar position by the X-axis electric slide 111 and the Y-axis electric slide 112; then, the output end of the servo motor 115 drives the gear 116 to drive the outer ring of the slewing bearing 113 to rotate, and the outer ring of the slewing bearing 113 drives the photomask placed on the fine adjustment component 12 to rotate and adjust.

[0038] Finally, through the coordinated operation of six independently extendable electric support legs 124, the translation and rotation control of the support component 122 in three-dimensional space is realized. The upper and lower ends of each electric support leg 124 are connected to the support component 122 and the base 121 through the upper universal joint 125 and the lower universal joint 123, respectively. This allows the support component 122 to obtain precise pose adjustment with six degrees of freedom when the length of the electric support leg 124 changes, thereby achieving the leveling of the photomask placed on the support component 122.

[0039] The displacement sensor model is LWH-0130. It is a product using existing mature technology and will not be described in detail here. All electrical components mentioned in this article are connected to the external main controller and 220V AC mains power.

[0040] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0041] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A leveling structure for a photomask in a double-sided exposure machine, characterized in that: Includes a leveling mechanism (1) for leveling photomasks, the leveling mechanism (1) including: A movable component (11) is set on the exposure machine and used for coarse positioning; The fine-tuning component (12) includes a base (121) disposed on the moving component (11). A bearing component (122) is disposed on the base (121) and used to fix the photolithography fixture. Six lower universal joints (123) are fixed on the top outer edge of the base (121). An electric support leg (124) is pivotally connected to the lower universal joint (123). An upper universal joint (125) is pivotally connected to the output end of the electric support leg (124).

2. The leveling structure for a photomask in a double-sided exposure machine according to claim 1, characterized in that: The supporting component (122) includes a supporting platform (1221) disposed above the base (121), and an upper universal joint (125) is fixed to the bottom of the supporting platform (1221). The supporting platform (1221) has an installation cavity (1222) inside, and installation ears (1223) are provided at the four corners inside the installation cavity (1222).

3. The leveling structure for a photomask in a double-sided exposure machine according to claim 1, characterized in that: The moving component (11) also includes an X-axis electric slide (111) disposed below the fine-tuning component (12). A Y-axis electric slide (112) is fixed on the slider of the X-axis electric slide (111). A slewing bearing (113) is disposed on the Y-axis electric slide (112), and the inner ring of the slewing bearing (113) is fixed on the slider of the Y-axis electric slide (112). The base (121) is fixed on the outer ring of the slewing bearing (113).

4. The leveling structure for a photomask in a double-sided exposure machine according to claim 1, characterized in that: The moving component (11) also includes a mounting plate (114) fixed to one end of the base (121). A servo motor (115) is mounted on the mounting plate (114). A gear (116) is fixed to the output end of the servo motor (115), and the gear (116) meshes with the outer ring of the slewing bearing (113) for transmission.

5. A leveling structure for a photomask in a double-sided exposure machine according to claim 1, characterized in that: The six electric outriggers (124) are symmetrically distributed, with each pair of electric outriggers (124) forming a group, and the three groups are cross-supported.

6. The leveling structure for a photomask in a double-sided exposure machine according to claim 1, characterized in that: The electric outrigger (124) has a built-in displacement sensor that monitors the extension and retraction of the electric outrigger (124) in real time and feeds it back to the control system.

Images