Anti-blocking structure of oxidation tower

By installing a ground tank between the oxidation tower and the filter, and relocating the sulfur slurry pump to the outside of the ground tank, the blockage problem caused by sulfur deposition at the bottom of the oxidation tower was solved using an overflow plate and liquid level difference design, thereby improving production efficiency and equipment utilization.

CN224194765UActive Publication Date: 2026-05-05CHINA PETROLEUM & CHEMICAL CORP +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
CHINA PETROLEUM & CHEMICAL CORP
Filing Date
2025-05-08
Publication Date
2026-05-05

AI Technical Summary

Technical Problem

During the oxidation reaction process, sulfur deposits on the bottom wall of the oxidation tower can easily clog the outlet of the bottom cone and the sulfur slurry pump, preventing the sulfur slurry from being discharged smoothly and affecting production.

Method used

A ground tank is installed between the oxidation tower and the filter, and the location of the sulfur slurry pump is changed from the bottom of the tower to the outside of the ground tank. By utilizing the overflow plate and sulfur slurry pump design inside the ground tank, sulfur is prevented from directly contacting the pump body. The sulfur deposition is reduced by the liquid level difference and the circulating flow of the jet pump.

Benefits of technology

It effectively reduced the probability of clogging in the sulfur slurry pump, improved the vacuum utilization rate of the filter and the production efficiency of sulfur paste, reduced the frequency of manual cleaning, and achieved energy saving and consumption reduction.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to an anti-blocking structure of an oxidation tower, and relates to the technical field of desulfurization devices. The anti-blocking structure of the oxidation tower comprises a ground tank, the ground tank is used for receiving a solution discharged from the bottom of the oxidation tower, an overflow plate is arranged in the ground tank and divides the interior of the ground tank into a first cavity and a second cavity, and a first sulfur slurry pump and a second sulfur slurry pump are arranged outside the ground tank. Two ends of the first sulfur slurry pump are respectively communicated with the first chamber and the filter, and two ends of the second sulfur slurry pump are respectively communicated with the second chamber and the first chamber. The ground tank is arranged between the oxidation tower and the filter, and the arrangement position of the sulfur slurry pump is changed from the bottom of the oxidation tower to the outside of the ground tank, so that the sulfur slurry pump does not directly receive sulfur flowing out of the conical bottom of the oxidation tower, and the sulfur discharged from the bottom of the oxidation tower is pumped by the sulfur slurry pump after being input into the ground tank; and sulfur flowing out of the conical bottom of the oxidation tower cannot directly influence the sulfur slurry pump, so that the blockage probability of the sulfur slurry pump is reduced.
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Description

Technical Field

[0001] This utility model relates to the field of desulfurization equipment technology, and in particular to an anti-clogging structure for an oxidation tower. Background Technology

[0002] Oxidation towers are commonly used in the chemical preparation and processing field to prepare corresponding chemicals through oxidation reactions, such as the oxidation of sulfide products.

[0003] In related technologies, the bottom of the oxidation tower is set in a conical shape. During the oxidation of sulfides, sulfur deposits will form on the inner wall of the bottom of the tower. As the reaction preparation time increases, the amount of sulfur deposited on the inner wall of the bottom of the oxidation tower also increases. After the sulfur attached to the inner wall of the oxidation tower falls off, it is easy to block the outlet of the conical part of the tower bottom. The sulfur slurry pump set at the bottom of the tower is also prone to blockage, which will prevent the sulfur slurry from being discharged smoothly and affect production.

[0004] Chinese patent CN220738916U discloses a device for preventing sulfur deposition at the bottom of an oxidation tower. This device uses a cleaning nozzle to blow high-pressure air towards the bottom of the tower, thus removing sulfur deposits on the inner wall of the oxidation tower without requiring manual knocking or vibration. However, this patent only addresses sulfur deposits on the inner wall of the tower bottom and fails to solve the problem of easy blockage of the sulfur slurry pump after the discharge outlet. Utility Model Content

[0005] This invention provides an anti-clogging structure for an oxidation tower, which prevents the sulfur slurry pump from becoming clogged by setting up a ground tank.

[0006] This utility model provides an anti-clogging structure for an oxidation tower, including a ground tank for receiving the solution discharged from the bottom of the oxidation tower. The ground tank is equipped with an overflow plate that divides the interior of the ground tank into a first chamber and a second chamber. A first sulfur slurry pump and a second sulfur slurry pump are provided outside the ground tank. The two ends of the first sulfur slurry pump are respectively connected to the first chamber and the filter, and the two ends of the second sulfur slurry pump are respectively connected to the second chamber and the first chamber.

[0007] In one embodiment, the oxidation tower includes a primary tower and a secondary tower, with an overflow pipe provided between the primary tower and the secondary tower.

[0008] In one embodiment, a first connecting pipe is provided between the primary tower and the ground tank, and a first flow regulating valve is provided on the first connecting pipe; a second connecting pipe is provided between the secondary tower and the ground tank, and a second flow regulating valve is provided on the second connecting pipe.

[0009] In one embodiment, the ground tank is equipped with a level transmitter, and both the first flow regulating valve and the second flow regulating valve are connected to the level transmitter.

[0010] In one embodiment, a rich liquor inlet is provided on one side of the primary column, and a lean liquor pump is provided on one side of the secondary column.

[0011] In one embodiment, the first chamber is provided with multiple inlets, and the second sulfur slurry pump delivers the solution in the second chamber to the first chamber through the multiple inlets.

[0012] In one embodiment, an ejector pump is also provided outside the ground tank. The ejector pump is connected to the second chamber and can transport the solution in the second chamber back to the top of the first-stage tower and the top of the second-stage tower.

[0013] In one embodiment, the bottom of the first chamber is a slope.

[0014] In one embodiment, a filter screen is provided on the top of the overflow plate.

[0015] In one embodiment, the liquid level difference between the solution in the oxidation tower and the liquid level in the ground tank is greater than 2m.

[0016] Compared with existing technologies, the advantages of this invention are as follows: by setting up a ground tank between the oxidation tower and the filter, and changing the location of the sulfur slurry pump from the bottom of the oxidation tower to outside the ground tank, the sulfur slurry pump does not directly receive sulfur flowing out from the conical bottom of the oxidation tower. Sulfur discharged from the bottom of the oxidation tower is only drawn into the ground tank before being pumped by the sulfur slurry pump. This prevents the sulfur flowing out from the conical bottom of the oxidation tower from directly affecting the sulfur slurry pump, thereby reducing the probability of clogging. A portion of the solution overflowing from the first chamber into the second chamber over the overflow plate is pumped back into the first chamber by the second sulfur slurry pump, impacting and agitating the solution in the first chamber, reducing the probability of sulfur deposition dead zones in the first chamber. Attached Figure Description

[0017] The present invention will be described in more detail below based on embodiments and with reference to the accompanying drawings.

[0018] Figure 1 This is a schematic diagram of the anti-clogging structure of the oxidation tower in an embodiment of this utility model;

[0019] Figure 2 This is a schematic diagram of the structure of the ground tank in an embodiment of this utility model;

[0020] Figure 3 yes Figure 1 Enlarged view of point A in the middle.

[0021] Figure label:

[0022] 1. Ground tank; 11. Overflow plate; 12. First chamber; 121. Inlet; 122. Inclined surface; 13. Second chamber; 14. First sulfur slurry pump; 15. Second sulfur slurry pump; 16. Jet pump; 17. Filter screen; 2. Oxidation tower; 21. Primary tower; 211. Rich liquor inlet; 22. Secondary tower; 221. Lean liquor pump; 23. Overflow pipe; 24. First connecting pipe; 25. First flow regulating valve; 26. Second connecting pipe; 27. Second flow regulating valve; 3. Level transmitter. Detailed Implementation

[0023] The present invention will be further described below with reference to the accompanying drawings.

[0024] like Figure 1 and Figure 2 As shown, an embodiment of the oxidation tower anti-clogging structure of this utility model includes a ground tank 1, which is used to receive the solution discharged from the bottom of the oxidation tower 2. An overflow plate 11 is provided inside the ground tank 1, which divides the interior of the ground tank 1 into a first chamber 12 and a second chamber 13. A first sulfur slurry pump 14 and a second sulfur slurry pump 15 are provided outside the ground tank 1. The two ends of the first sulfur slurry pump 14 are respectively connected to the first chamber 12 and the filter (not shown in the figure), and the two ends of the second sulfur slurry pump 15 are respectively connected to the second chamber 13 and the first chamber 12.

[0025] By installing a ground tank 1 between the oxidation tower 2 and the filter, and changing the location of the sulfur slurry pump from the bottom of the oxidation tower 2 to outside the ground tank 1, the sulfur slurry pump does not directly receive sulfur flowing out from the conical bottom of the oxidation tower 2. Sulfur discharged from the bottom of the oxidation tower 2 is only pumped out by the sulfur slurry pump after entering the ground tank 1. The internal space of the first chamber 12 and the second chamber 13 of the ground tank 1 is relatively large and not conical like the bottom of the oxidation tower 2, allowing for more flexible installation of the sulfur slurry pump. It can be positioned to avoid sulfur deposition areas, ensuring that sulfur flowing out from the conical bottom of the oxidation tower 2 does not directly affect the sulfur slurry pump, thus reducing the probability of clogging. Part of the solution overflowing from the first chamber 12 into the second chamber 13 via the overflow plate 11 is pumped back into the first chamber 12 by the second sulfur slurry pump 15, impacting and agitating the solution in the first chamber 12, reducing the probability of sulfur deposition dead zones in the first chamber 12.

[0026] Most of the sulfur will settle at the bottom of the first chamber 12, while a small portion of sulfur particles are in suspension and will settle at the bottom of the second chamber 13 over time. Therefore, the second sulfur slurry pump 15 is needed to transport the sulfur overflowing into the second chamber 13 back to the first chamber 12, reducing the sulfur content in the second chamber 13 and purifying it. The sulfur slurry in the first chamber 12 is transported to the filter by the first sulfur slurry pump 14 and then flows back to the first chamber 12, reducing the solid content of the first chamber 12.

[0027] In this embodiment, the oxidation tower 2 includes a primary tower 21 and a secondary tower 22, with an overflow pipe 23 connecting the primary tower 21 and the secondary tower 22. A rich liquor inlet 211 is located on one side of the primary tower 21, and a lean liquor pump 221 is located on one side of the secondary tower 22. In the submerged complexed iron desulfurization process, the lean liquor pump 221 sends the lean liquor from the secondary tower 22 to the absorption tower (not shown in the figure), where the solution is countercurrently mixed with acid gas to form a rich liquor. The rich liquor is then sent to the primary tower 21, where ferrous ions are oxidized to ferric ions. Elemental sulfur settles in the conical section of the primary tower 21, and the solution in the primary tower 21 overflows to the secondary tower 22 through the overflow pipe 23, forming a cycle.

[0028] When there are a large number of oxidation towers 2, such as four sets of oxidation towers 2, conventional technical solutions require eight sulfur slurry pumps. However, in this embodiment, due to the change in the location of the sulfur slurry pumps, only two sulfur slurry pumps are needed, which has the effect of energy saving and consumption reduction.

[0029] like Figure 1 As shown, a first connecting pipe 24 is provided between the primary tower 21 and the ground tank 1, and a first flow regulating valve 25 is provided on the first connecting pipe 24. A second connecting pipe 26 is provided between the secondary tower 22 and the ground tank 1, and a second flow regulating valve 27 is provided on the second connecting pipe 26. The first flow regulating valve 25 and the second flow regulating valve 27 can control the flow rate of the solution entering the first chamber 12, thereby maintaining the liquid level in the ground tank 1 at a reasonable level. The connection points of the first connecting pipe 24 and the second connecting pipe 26 to the ground tank 1 are set low, so that the impact force of the solution can be used to flush the bottom of the first chamber 12, avoiding excessive sulfur deposition at the bottom of the first chamber 12, so that the slurry pumped by the first sulfur slurry pump 14 can have a higher sulfur content. After the solid content in the slurry is increased, the sulfur slurry can cover the filter cloth, improving the vacuum utilization rate of the filter and thus improving the efficiency of the filter in producing sulfur paste.

[0030] In order to generate sufficient impact force on the interior of the first chamber 12 by the solutions in the first connecting pipe 24 and the second connecting pipe 26, the liquid level difference between the solution in the oxidation tower 2 and the liquid level in the ground tank 1 is greater than 2m, so as to generate a large gravitational potential energy.

[0031] like Figure 1 and Figure 3 As shown, the bottom of the first chamber 12 is a slope 122. This design causes the sulfur in the first chamber 12 to mainly deposit near the outlet of the first connecting pipe 24 and the second connecting pipe 26, which can make fuller use of the impact force of the solution transported from the oxidation tower 2 to flush the bottom of the first chamber 12, achieving a self-cleaning effect and reducing the frequency of manual cleaning.

[0032] Furthermore, a level transmitter 3 is installed inside the ground tank 1, and both the first flow regulating valve 25 and the second flow regulating valve 27 are connected to the level transmitter 3. The level transmitter 3 is an extension and development of pressure transmitter technology. Based on the principle that the pressure generated by liquids of different specific gravities at different heights is linearly related, it realizes the accurate measurement and transmission of the volume, liquid level, and weight of water, oil, and paste. The level transmitter 3 can monitor the liquid level in the ground tank 1. In this embodiment, both the first flow regulating valve 25 and the second flow regulating valve 27 are automatic regulating valves, which can automatically adjust their opening degree according to the liquid level information collected by the level transmitter 3, thereby automatically regulating the flow rate of the solution input into the ground tank 1 without manual adjustment.

[0033] like Figure 2 As shown, the first chamber 12 is provided with multiple inlets 121. The second sulfur slurry pump 15 transports the solution in the second chamber 13 to the first chamber 12 through the multiple inlets 121. The multiple inlets 121 are distributed over a large area, so that the solution transported back from the second chamber 13 to the first chamber 12 can impact and disturb the solution inside the first chamber 12 over a large area, further reducing the amount of sulfur deposited in the first chamber 12.

[0034] Specifically, inlet 121 is located near the bottom of the first chamber 12 to reduce sulfur deposition at the bottom of the first chamber 12.

[0035] like Figure 1 As shown, an ejector pump 16 is also provided outside the ground tank 1. The ejector pump 16 is connected to the second chamber 13 and can transport the solution in the second chamber 13 back to the top of the primary tower 21 and the top of the secondary tower 22, thereby realizing the circulation of the solution. In this embodiment, the ejector pump 16 draws the solution in the middle of the second chamber 13, while the second sulfur slurry pump 15 draws the solution in the lower part of the second chamber 13. The solution drawn by the second sulfur slurry pump 15 has a higher solid content, and the ejector pump 16 and the second sulfur slurry pump 15 need to be separated by a certain distance.

[0036] The rated flow rate of the jet pump 16 is adjusted according to the number of oxidation towers 2 to ensure a larger solution flow rate, thereby reducing the probability of blockage at the conical bottom of the oxidation tower 2.

[0037] like Figure 2As shown, the top of the overflow plate 11 is provided with a filter screen 17, which can prevent larger floating objects from entering the second chamber 13, keeping the second chamber 13 in a relatively clean state.

[0038] Although the present invention has been described with reference to preferred embodiments, various modifications can be made thereto and components can be replaced with equivalents without departing from the scope of the invention. In particular, the technical features mentioned in the various embodiments can be combined in any manner, provided there is no structural conflict. The present invention is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. An anti-clogging structure for an oxidation tower, characterized in that, The device includes a ground tank for receiving the solution discharged from the bottom of the oxidation tower. The ground tank is equipped with an overflow plate that divides the interior of the ground tank into a first chamber and a second chamber. A first sulfur slurry pump and a second sulfur slurry pump are provided outside the ground tank. The two ends of the first sulfur slurry pump are respectively connected to the first chamber and the filter, and the two ends of the second sulfur slurry pump are respectively connected to the second chamber and the first chamber.

2. The anti-clogging structure for the oxidation tower according to claim 1, characterized in that, The oxidation tower includes a primary tower and a secondary tower, with an overflow pipe between the primary tower and the secondary tower.

3. The anti-clogging structure for the oxidation tower according to claim 2, characterized in that, A first connecting pipe is provided between the primary tower and the ground tank, and a first flow regulating valve is provided on the first connecting pipe. A second connecting pipe is provided between the secondary tower and the ground tank, and a second flow regulating valve is provided on the second connecting pipe.

4. The anti-clogging structure for the oxidation tower according to claim 3, characterized in that, The ground tank is equipped with a level transmitter, and both the first flow regulating valve and the second flow regulating valve are connected to the level transmitter.

5. The anti-clogging structure for the oxidation tower according to claim 2, characterized in that, The first-stage column is equipped with a rich liquid inlet on one side, and the second-stage column is equipped with a lean liquid pump on one side.

6. The anti-clogging structure for the oxidation tower according to claim 2, characterized in that, The first chamber is provided with multiple inlets, and the second sulfur slurry pump delivers the solution in the second chamber to the first chamber through the multiple inlets.

7. The anti-clogging structure for the oxidation tower according to claim 2, characterized in that, An ejector pump is also provided outside the ground tank. The ejector pump is connected to the second chamber and can transport the solution in the second chamber back to the top of the first-stage tower and the top of the second-stage tower.

8. The anti-clogging structure for the oxidation tower according to claim 2, characterized in that, The bottom of the first chamber is a slope.

9. The anti-clogging structure for the oxidation tower according to claim 1, characterized in that, A filter screen is provided on the top of the overflow plate.

10. The anti-clogging structure for the oxidation tower according to claim 1, characterized in that, The difference between the solution level inside the oxidation tower and the liquid level in the ground tank is greater than 2m.

Citation Information

Patent Citations

  • Anti-deposition device for cone bottom of oxidation tower

    CN220738916U