Platform cleaning mechanism

Abstract

The utility model provides a platform cleaning mechanism which comprises a cleaning cover, an air inlet and an air outlet, an opening attached to a platform is formed in one side of the cleaning cover, and an air vent is formed in the side, away from the opening, of the cleaning cover; the conveying part is arranged in the cleaning cover in a striding mode in the first direction, at least one cleaning part is arranged on the side, close to the opening, of the conveying part, and the conveying part is used for driving the cleaning part to move in a reciprocating mode in the first direction; the air extractor is communicated with the vent hole through an air extraction pipe so as to extract foreign matter removed by the cleaning part in the cleaning cover, the cleaning part is an ultrasonic cleaning device, and the ultrasonic cleaning device is fixedly arranged on the side, close to the opening, of the conveying belt and used for cleaning the foreign matter in the cleaning cover. The ultrasonic cleaning device is used for vibrating the foreign matter on the platform away from the surface of the platform, so that the foreign matter on the surface of the platform is efficiently and safely cleaned, and the production and machining efficiency is effectively improved.

Description

Technical Field

[0001] This application belongs to the field of battery cell technology, specifically relating to a platform cleaning mechanism. Background Technology

[0002] Copper plating is an important process in semiconductor manufacturing and electronic component processing. Silicon wafers are the basic material for semiconductor devices, and by plating copper onto the surface of silicon wafers, functions such as circuit connections can be achieved. During this copper plating process, the silicon wafer is carefully placed on a smooth platform, and then the platform's vacuum system is activated. As the air pressure inside the platform gradually decreases, the air beneath the silicon wafer is extracted, and the external atmospheric pressure presses the silicon wafer tightly against the platform surface, thus bonding the wafer to the platform.

[0003] Because the silicon wafer needs to be tightly bonded to the platform, the cleanliness of the platform surface is required to be extremely high. The platform surface must be free of any particulate impurities or other dirt. Otherwise, during the copper electroplating process, these particulate impurities will be squeezed between the silicon wafer and the platform, causing the silicon wafer to break or develop microcracks.

[0004] In existing technologies, most platforms are wiped manually at regular intervals. However, manual wiping requires entering the copper electroplating machine, which poses certain safety risks. Furthermore, the generation of particulate impurities or other dirt on the platform is random. Manual wiping alone cannot remove foreign objects from the platform in a timely and effective manner, and it also affects production efficiency. Utility Model Content

[0005] This application provides a platform cleaning mechanism that can efficiently and safely clean foreign objects from the platform surface, effectively improving production and processing efficiency.

[0006] To address the aforementioned technical problems, this application provides a platform cleaning mechanism, comprising:

[0007] A cleaning cover, wherein one side of the cleaning cover has an opening that fits into the platform, and the side of the cleaning cover away from the opening has a vent hole;

[0008] A transmission component is provided inside the cleaning hood along a first direction. At least one cleaning component is provided on the side of the transmission component near the opening. The transmission component is used to drive the cleaning component to reciprocate in the first direction.

[0009] An air extraction device is provided, which is connected to the vent via an air extraction pipe to extract foreign objects removed by the cleaning component from inside the cleaning hood.

[0010] As a further improvement of this application, the transmission component includes a conveyor belt that spans the interior of the cleaning hood along a first direction, and a transmission roller shaft disposed at both ends of the conveyor belt and passing through the cleaning hood.

[0011] One of the conveyor rollers is driven by a drive unit, which drives the conveyor belt to reciprocate in a first direction.

[0012] As a further improvement of this application, the cleaning component is an ultrasonic cleaning device, which is fixedly installed on the side of the conveyor belt near the opening. The ultrasonic cleaning device is used to vibrate foreign objects off the platform surface.

[0013] As a further improvement of this application, the number of cleaning components is two, and the distance between the two cleaning components does not exceed 1 / 2 of the distance between the two conveying roller shafts.

[0014] As a further improvement of this application, the driving component is a drive motor, and the output shaft of the drive motor is connected to one of the conveying roller shafts.

[0015] As a further improvement of this application, the cleaning hood is provided with at least two vent holes on the side away from the opening, and the number of the air extraction pipes is equal to the number of the vent holes.

[0016] As a further improvement of this application, a sealing ring is provided on the side of the cleaning cover where the opening is provided, and the sealing ring abuts against the platform.

[0017] As a further improvement to this application, the sealing ring is made of rubber.

[0018] As a further improvement of this application, an air pipe interface is provided between the air extraction pipe and the air vent.

[0019] As a further improvement of this application, a fixing plate is provided through the side of the cleaning cover away from the opening.

[0020] This application provides a platform cleaning mechanism that sets up a cleaning hood to form a sealed cavity with the platform surface, preventing foreign objects generated during the cleaning process from spreading into the surrounding environment and achieving centralized cleaning of the platform surface. The cleaning component is driven by a transmission component to move back and forth in a first direction, so that the cleaning component fixed on the transmission component cleans the foreign objects on the platform surface. Compared with the unidirectional cleaning method, it can cover more areas of the platform surface and reduce cleaning blind spots. Then, the foreign objects in the cleaning hood are promptly extracted by an air extraction device to prevent the already cleaned area from being contaminated again by the foreign objects that have just been cleaned, thus achieving effective cleaning of the platform surface. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a schematic diagram of the platform cleaning mechanism provided in an embodiment of this application;

[0023] Figure 2 This is a schematic diagram of the transmission component in the platform cleaning mechanism provided in the embodiments of this application;

[0024] Figure 3 A top view of the platform cleaning mechanism provided in the embodiments of this application;

[0025] Explanation of reference numerals in the attached figures:

[0026] 1-Platform surface;

[0027] 10-Cleaning hood; 11-Opening; 12-Ventilation hole; 13-Sealing ring; 14-Fixing plate; 20-Transfer component; 21-Conveyor belt; 22-Transfer roller shaft; 30-Cleaning component; 40-Ejection pipe; 41-Air pipe interface. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are merely illustrative of this application and are not intended to limit this application.

[0029] In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified. All directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of this application are only used to explain the relative positional relationships and movement of the components in a specific posture (as shown in the figures). If the specific posture changes, the directional indication will also change accordingly. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion.

[0030] To make the description of this disclosure more detailed and complete, illustrative descriptions of the implementation methods and specific embodiments of this application are provided below; however, this is not the only form of implementing or utilizing the specific embodiments of this application. The implementation methods cover the features of multiple specific embodiments and the method steps and their order for constructing and operating these specific embodiments. However, other specific embodiments may also be used to achieve the same or equivalent functions and step sequences.

[0031] Copper plating is an important process in semiconductor manufacturing and electronic component processing. Silicon wafers are the basic material for semiconductor devices, and by plating copper onto the surface of silicon wafers, functions such as circuit connections can be achieved. During this copper plating process, the silicon wafer is carefully placed on a smooth platform, and then the platform's vacuum system is activated. As the air pressure inside the platform gradually decreases, the air beneath the silicon wafer is extracted, and the external atmospheric pressure presses the silicon wafer tightly against the platform surface, thus bonding the wafer to the platform.

[0032] Because the silicon wafer needs to be tightly bonded to the platform, the cleanliness of the platform surface is required to be extremely high. The platform surface must be free of any particulate impurities or other dirt. Otherwise, during the copper electroplating process, these particulate impurities will be squeezed between the silicon wafer and the platform, causing the silicon wafer to break or develop microcracks.

[0033] In existing technologies, most platforms are wiped manually at regular intervals. However, manual wiping requires entering the copper electroplating machine, which poses certain safety risks. Furthermore, the generation of particulate impurities or other dirt on the platform is random. Manual wiping alone cannot remove foreign objects from the platform in a timely and effective manner, and it also affects production efficiency.

[0034] For the reasons mentioned above, please refer to Figures 1-3 This application provides a platform cleaning mechanism that can efficiently and safely clean foreign objects on the platform, effectively improving production and processing efficiency.

[0035] Please refer to Figure 1 This is a schematic diagram of the platform cleaning mechanism provided in the embodiments of this application. The platform cleaning mechanism provided in this application includes a cleaning cover 10, a transmission component 20 and a cleaning component 30 disposed inside the cleaning cover 10, and an air extraction device disposed outside the cleaning cover 10 and communicating with the cleaning cover 10.

[0036] As an optional implementation, the cleaning cover 10 is provided with an opening 11 on one side that fits into the platform, and a vent 12 is provided on the side of the cleaning cover 10 away from the opening 11. That is, the side of the cleaning cover 10 with the opening 11 fits into the platform, thereby forming a sealed cavity with the platform surface 1, which facilitates the cleaning component 30 provided inside the cleaning cover 10 to clean the platform surface 1.

[0037] Further, please refer to Figure 2This is a schematic diagram of the structure of the transmission component in the platform cleaning mechanism provided in this application embodiment. The transmission component 20 is disposed inside the cleaning cover 10 along the first direction. At least one cleaning component 30 is provided on the side of the transmission component 20 near the opening 11. The cleaning component 30 is driven to reciprocate in the first direction by the transmission component 20. Since the cleaning component 30 is located on the side of the transmission component 20 near the opening, the cleaning component 30 will effectively clean the foreign objects on the platform surface 1 while the transmission component 20 drives the cleaning component 30 to reciprocate in the first direction.

[0038] At the same time, this application also provides an air extraction device, which is connected to the above-mentioned vent 12 through an air extraction pipe 40, so as to promptly remove foreign objects from the cleaning cover 10.

[0039] This application sets up a cleaning hood 10 to form a sealed cavity with the platform surface 1, preventing foreign objects generated during the cleaning process from spreading into the surrounding environment, and realizing centralized cleaning of the platform surface 1. The cleaning component 30 is driven by the transmission component 20 to move back and forth in the first direction, so that the cleaning component 30 fixedly set on the transmission component 20 cleans the foreign objects on the platform surface 1. Compared with the unidirectional cleaning method, it can cover more areas of the platform surface 1 and reduce cleaning blind spots. Then, the foreign objects in the cleaning hood 10 are promptly extracted by the air extraction device to prevent the already cleaned area from being contaminated again by the foreign objects that have just been cleaned, thus achieving effective cleaning of the platform surface 1.

[0040] In an optional embodiment, the aforementioned transmission member 20 includes a conveyor belt 21 extending across the interior of the cleaning cover 10 along a first direction, and conveyor rollers 22 disposed at both ends of the conveyor belt 21 and passing through the cleaning cover 10. It can be observed that the two conveyor rollers 22 pass through the cleaning cover 10, and the conveyor belt 21 is disposed between the two conveyor rollers 22.

[0041] Specifically, this application has a drive unit connected to one of the conveyor rollers 22. The drive unit drives the conveyor roller 22 to rotate, and further drives the conveyor belt 21 and the other conveyor roller 22 to move, thereby driving the cleaning component 30 to reciprocate in the first direction.

[0042] For example, the aforementioned driving component can be configured as a drive motor (not shown in the figure), such that the output shaft of the drive motor is connected to the corresponding conveyor roller shaft 22 for transmission.

[0043] Of course, if the cost allows, each conveyor roller 22 can also be equipped with a corresponding drive component. As for the specific configuration of the drive component and the specific structure of the drive component and the transmission connection between the drive component and the conveyor roller 22, this application will not go into too much detail.

[0044] Preferably, the cleaning component 30 can be configured as an ultrasonic cleaning device. The ultrasonic cleaning device generates ultrasonic waves, which cause the particulate impurities or other dirt on the platform surface 1 to vibrate. Then, the foreign matter that has been vibrated away from the platform surface 1 is promptly extracted by the air extraction device, thereby achieving timely cleaning of the platform surface 1.

[0045] In this embodiment, the number of cleaning components 30 can be set to at least two, but the distance between the two cleaning components 30 shall not exceed 1 / 2 of the distance between the two conveyor rollers 22. Taking the first direction as the left and right direction as an example, when the conveyor belt 21 moves to the left, if the cleaning component 30 that is relatively to the left of the two cleaning components 30 is close to the leftmost conveyor roller 22, the driving component should drive the conveyor belt 21 to move to the right until the cleaning component 30 that is relatively to the right of the two cleaning components 30 moves close to the rightmost conveyor roller 22, and then continues to move to the left. This process is repeated to realize the reciprocating movement of the two cleaning components 30 in the first direction.

[0046] In order to prevent the edge of the cleaning cover 10 from scratching the platform surface 1, this application also provides a sealing ring 13 on the side of the cleaning cover 10 with the opening 11, so that the sealing ring 13 abuts against the platform, thereby forming a sealed cavity between the cleaning cover 10 and the platform surface 1.

[0047] For example, the sealing ring 13 can be made of rubber. Of course, other flexible materials that can achieve sealing are also feasible, and this application does not limit them.

[0048] As an optional implementation method, please refer to Figure 3 This is a top view of the platform cleaning mechanism provided in the embodiment of this application. The application provides at least two vent holes 12 on the side of the cleaning cover 10 away from the opening 11, and provides an equal number of suction pipes 40 to the number of vent holes 12, so that the suction pipes 40 and the vent holes 12 are connected in a one-to-one correspondence. Of course, an air pipe interface 41 can also be provided between the suction pipes 40 and the vent holes 12 to avoid air leakage at the connection point between the suction pipes 40 and the vent holes 12, which would affect the suction effect.

[0049] Optionally, a fixing plate 14 can be provided on the side of the cleaning cover 10 away from the opening 11, and the cleaning cover 10 can be mounted on the platform surface 1 by the fixing plate 14. Of course, a telescopic structure can also be provided on the side of the cleaning cover 10 away from the opening 11, so as to adjust the overall height of the cleaning cover 10 to adapt it to platforms of different heights, as should be known by those skilled in the art.

[0050] It is understood that the technical features of the above embodiments can be combined arbitrarily. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0051] The above embodiments are merely exemplary implementations used to illustrate the principles of this application; however, this application is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and substance of this application, and these modifications and improvements are also considered to be within the scope of protection of this application.

Claims

1. A platform cleaning mechanism, characterized in that, include: A cleaning cover, wherein one side of the cleaning cover has an opening that fits into the platform, and the side of the cleaning cover away from the opening has a vent. A transmission component is provided inside the cleaning hood along a first direction. At least one cleaning component is provided on the side of the transmission component near the opening. The transmission component is used to drive the cleaning component to reciprocate in the first direction. An air extraction device is provided, which is connected to the vent via an air extraction pipe to extract foreign objects removed by the cleaning component from inside the cleaning hood.

2. The platform cleaning mechanism as described in claim 1, characterized in that, The transmission component includes a conveyor belt that spans the interior of the cleaning hood along a first direction, and a transmission roller shaft disposed at both ends of the conveyor belt and passing through the cleaning hood. One of the conveyor rollers is driven by a drive member, which drives the conveyor belt to reciprocate in a first direction.

3. The platform cleaning mechanism as described in claim 2, characterized in that, The cleaning component is an ultrasonic cleaning device, which is fixedly installed on the side of the conveyor belt near the opening. The ultrasonic cleaning device is used to vibrate foreign objects off the platform surface.

4. The platform cleaning mechanism as described in claim 2, characterized in that, The number of cleaning components is two, and the distance between the two cleaning components does not exceed 1 / 2 of the distance between the two conveying roller shafts.

5. The platform cleaning mechanism as described in claim 2, characterized in that, The driving component is a drive motor, and the output shaft of the drive motor is connected to one of the conveyor roller shafts.

6. The platform cleaning mechanism as described in claim 1, characterized in that, The cleaning hood has at least two vent holes on the side away from the opening, and the number of the suction pipes is equal to the number of vent holes.

7. The platform cleaning mechanism as described in claim 1, characterized in that, The cleaning hood is provided with a sealing ring on the side with the opening, and the sealing ring abuts against the platform.

8. The platform cleaning mechanism as described in claim 7, characterized in that, The sealing ring is made of rubber.

9. The platform cleaning mechanism as described in claim 1, characterized in that, An air pipe interface is provided between the air extraction pipe and the air vent.

10. The platform cleaning mechanism as described in any one of claims 1-9, characterized in that, A fixing plate is provided through the side of the cleaning cover away from the opening.

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