Resistivity detection mechanism and processing equipment

Abstract

The utility model relates to a resistivity detection mechanism and a processing device. The resistivity detection mechanism comprises a carrying table used for carrying a workpiece; the resistivity detection assembly is located on one side of the carrying table; the motion platform can adjust the relative position of the carrying platform and the resistivity detection assembly in at least one of the horizontal direction of the resistivity detection mechanism and the height direction perpendicular to the horizontal direction. Therefore, the carrying platform and the resistivity detection assembly are relatively close to or far away from each other along at least one of the horizontal direction and the height direction of the resistivity detection mechanism. According to the resistivity detection mechanism, the problem that the work efficiency is not high due to the fact that the workpieces need to be manually moved for multiple times in the detection process is effectively solved, the stability of the workpiece moving process is improved, meanwhile, the accuracy and the moving efficiency of the workpiece moving process are guaranteed, and therefore the detection requirement for a large number of workpieces in the workpiece machining process is met; and higher requirements in the workpiece machining process are further met.

Description

Technical Field

[0001] This application relates to the field of laser processing technology, and in particular to a resistivity detection mechanism and processing equipment. Background Technology

[0002] With the continuous advancement of laser processing technology and the diversification of laser processing product applications, the requirements for laser processing are becoming increasingly stringent. During laser refining of workpieces, due to the inconsistencies in the internal characteristics of each workpiece, the resistivity values ​​of different surfaces will also vary. If resistivity testing is not performed before processing the workpiece, and a high-power laser is used directly for internal refining, the processing marks on the separated workpiece surfaces will be heavy, requiring a deeper thinning depth and affecting the workpiece thickness. Conversely, using a lower-power laser for internal refining risks incomplete workpiece processing, making separation and fragmentation impossible. Therefore, it is essential to perform workpiece resistivity testing before laser refining.

[0003] In related technologies, it is usually necessary to detect the resistance value of multiple points on the workpiece. During the detection process, the workpiece needs to be moved manually multiple times. The manual movement process results in low work efficiency and makes it difficult to meet the needs of large-scale workpiece detection. Utility Model Content

[0004] Therefore, it is necessary to provide a resistivity detection mechanism and processing equipment to address the aforementioned technical problems.

[0005] A resistivity detection mechanism, comprising:

[0006] A platform for supporting workpieces;

[0007] A resistivity detection component is located on one side of the stage;

[0008] The motion platform can adjust the relative position of the stage and the resistivity detection component in at least one of the horizontal and vertical directions of the resistivity detection mechanism, so that the stage and the resistivity detection component move closer or further apart relative to each other in at least one of the horizontal and vertical directions of the resistivity detection mechanism;

[0009] The height direction is perpendicular to the horizontal direction.

[0010] In one embodiment, the resistivity detection mechanism further includes:

[0011] A rotating unit is connected to the platform to drive the platform to rotate.

[0012] In one embodiment, the motion platform can adjust the relative position of the stage and the resistivity detection component in the horizontal direction.

[0013] In one embodiment, the motion platform includes a horizontal axis motion platform, a vertical axis motion platform, and a vertical axis motion platform;

[0014] The horizontal direction includes the length direction and the width direction;

[0015] The horizontal axis motion platform can adjust the relative position of the stage and the resistivity detection component in the length direction;

[0016] The longitudinal axis motion platform can adjust the relative position of the stage and the resistivity detection component in the width direction;

[0017] The vertical axis motion platform can adjust the relative position of the platform and the resistivity detection component in the height direction.

[0018] In one embodiment, the resistivity detection assembly includes a resistivity detection element and a first connector, the resistivity detection element being connected to the motion platform via the first connector.

[0019] In one embodiment, the resistivity detection assembly further includes a first mounting component, the resistivity detection element is disposed on the first mounting component, the end face of the first mounting component near the motion platform is provided with a first through hole, and the first connector passes through the first through hole and is connected to the motion platform.

[0020] In one embodiment, the motion platform includes a horizontal axis motion platform, a vertical axis motion platform, and a horizontal axis motion platform. The horizontal axis motion platform includes a horizontal axis driver, a horizontal axis movable component, and a horizontal axis slide rail. The output end of the horizontal axis driver is connected to the horizontal axis movable component. The horizontal axis movable component is connected to the vertical axis motion platform or the vertical axis motion platform. The bottom of the horizontal axis movable component is slidably connected to the horizontal axis slide rail.

[0021] In one embodiment, the longitudinal axis motion platform includes a longitudinal axis driver, a longitudinal axis movable component, and a longitudinal axis slide rail. The output end of the longitudinal axis driver is connected to the longitudinal axis movable component, the longitudinal axis movable component is connected to the transverse axis motion platform or the vertical axis motion platform, and the bottom of the longitudinal axis movable component is slidably connected to the longitudinal axis slide rail.

[0022] In one embodiment, the vertical axis motion platform includes a vertical axis driver, a vertical axis movable component, and a vertical axis slide rail. The output end of the vertical axis driver is connected to the vertical axis movable component, the vertical axis movable component is connected to the horizontal axis motion platform or the vertical axis motion platform, and the bottom of the vertical axis movable component is slidably connected to the vertical axis slide rail.

[0023] A processing device, comprising:

[0024] Such as the resistivity testing mechanism mentioned above.

[0025] The technical effects of the embodiments provided in this application are as follows:

[0026] The aforementioned resistivity detection mechanism, during laser modification of a workpiece (such as a crystal ingot), adjusts the relative positions of the platform carrying the workpiece (such as a crystal ingot) and the resistivity detection component located on one side of the platform in at least one of the horizontal and vertical directions of the resistivity detection mechanism. This ensures that the platform and the resistivity detection component move closer or further apart in at least one of the horizontal and vertical directions of the resistivity detection mechanism until their relative positions are adjusted to a preset position. After the position adjustment, the resistivity of the workpiece is detected in conjunction with the resistivity detection component, thus enabling the detection of different positions on the workpiece (such as detecting the resistance values ​​at multiple points on the workpiece). Compared to manually moving the workpiece, this effectively improves the problem of low work efficiency caused by repeatedly moving the workpiece manually during the detection process. While improving the stability of the workpiece movement process, it also ensures the accuracy and efficiency of the workpiece movement process, thereby meeting the detection needs of large batches of workpieces during the workpiece processing process and thus satisfying the higher requirements of the workpiece processing process. Attached Figure Description

[0027] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0028] Figure 1 This is a schematic diagram of the resistivity detection mechanism in one embodiment;

[0029] Figure 2 This is a schematic diagram of the resistivity detection mechanism in one embodiment;

[0030] Figure 3 This is a partial structural schematic diagram of the resistivity detection mechanism in one embodiment. Detailed Implementation

[0031] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0032] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0033] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0034] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0035] Figure 1 and Figure 2 This is a schematic diagram of the resistivity detection mechanism in one embodiment.

[0036] In this embodiment, as Figure 1 and Figure 2 As shown, the resistivity detection mechanism includes a stage 10, a motion platform 20, a resistivity detection component 30, a rotation unit 40, and a bottom support component 50. The resistivity detection mechanism is used to adjust the position of the workpiece 60 and detect the resistance values ​​at multiple points on the workpiece 60 after the position adjustment. Optionally, the workpiece 60 can be a structure such as a crystal ingot that requires resistivity detection, and the bottom support component 50 can be a support base or support structure such as a support plate or support base.

[0037] The stage 10 is used to support the workpiece 60. The resistivity detection component 30 is located on one side of the stage 10. The motion platform 20 can adjust the relative position of the stage 10 and the resistivity detection component 30 in at least one of the horizontal and vertical directions of the resistivity detection mechanism, so that the stage 10 and the resistivity detection component 30 are relatively closer or farther apart in at least one of the horizontal and vertical directions of the resistivity detection mechanism, with the vertical direction being perpendicular to the horizontal direction.

[0038] The stage 10 can be a support structure for carrying the workpiece 60, connected to the motion platform 20 and the rotating unit 40, and capable of moving closer to or further away from the resistivity detection component 30 in the horizontal and / or vertical directions under the driving action of the motion platform 20, and rotating under the action of the rotating unit 40. The motion platform 20 can be a drive structure connected to the stage 10, capable of driving the stage 10 carrying the workpiece 60 to adjust its position along at least one of the horizontal and vertical directions of the resistivity detection mechanism; the motion platform 20 can also be a drive structure connected to the resistivity detection component 30, capable of driving the resistivity detection component 30 to adjust its position along at least one of the horizontal and vertical directions of the resistivity detection mechanism. Optionally, the stage 10 can be a circular stage 10.

[0039] Position adjustments along the horizontal direction of the resistivity measuring mechanism include adjustments along one or more of the length, width, and radial directions of the resistivity measuring mechanism.

[0040] The motion platform 20 includes a horizontal axis motion platform 210, a vertical axis motion platform 220, and a vertical axis motion platform 230. The horizontal axis motion platform 210 can adjust the relative position of the stage 10 and the resistivity detection component 30 in the length direction; the vertical axis motion platform 220 can adjust the relative position of the stage 10 and the resistivity detection component 30 in the width direction; and the vertical axis motion platform 230 can adjust the relative position of the stage 10 and the resistivity detection component 30 in the height direction.

[0041] Optionally, the horizontal axis motion platform 210 can drive the stage 10 to move relative to the bottom support member 50 along the length direction of the bottom support member 50, the vertical axis motion platform 220 can drive the stage 10 to move relative to the bottom support member 50 along the width direction of the bottom support member 50, and the vertical axis motion platform 230 can drive the stage 10 to move relative to the bottom support member 50 along the thickness direction of the bottom support member 50, so that the stage 10 moves relative to the resistivity detection component 30 in at least one of the horizontal and vertical directions of the resistivity detection mechanism.

[0042] The horizontal axis motion platform 210 can also drive the resistivity detection component 30 to move relative to the bottom support component 50 along the length direction of the bottom support component 50, the vertical axis motion platform 220 can also drive the resistivity detection component 30 to move relative to the bottom support component 50 along the width direction of the bottom support component 50, and the vertical axis motion platform 230 can also drive the resistivity detection component 30 to move relative to the bottom support component 50 along the thickness direction of the bottom support component 50, so that the resistivity detection component 30 moves relative to the stage 10 in at least one of the horizontal and vertical directions of the resistivity detection mechanism.

[0043] The horizontal axis motion platform 210 can be a drive structure that drives the stage 10 and / or the resistivity detection component 30 to move along the length direction of the bottom support member 50, thereby adjusting the relative position of the stage 10 and the resistivity detection component 30 along the length direction of the bottom support member 50. The vertical axis motion platform 220 can be a drive structure that drives the stage 10 and / or the resistivity detection component 30 to move along the width direction of the bottom support member 50, thereby adjusting the relative position of the stage 10 and the resistivity detection component 30 along the width direction of the bottom support member 50. The vertical axis motion platform 230 can be a drive structure that drives the stage 10 and / or the resistivity detection component 30 to move along the thickness direction of the bottom support member 50, thereby adjusting the relative position of the stage 10 and the resistivity detection component 30 along the thickness direction of the bottom support member 50.

[0044] The connection methods of the horizontal axis motion platform 210, the vertical axis motion platform 220 and the vertical axis motion platform 230 include: the horizontal axis motion platform 210 is connected to the vertical axis motion platform 220 and the vertical axis motion platform 220 is connected to the vertical axis motion platform 230; or the horizontal axis motion platform 210 is connected to the vertical axis motion platform 230 and the vertical axis motion platform 230 is connected to the vertical axis motion platform 220.

[0045] The horizontal axis motion platform 210 includes a horizontal axis driver, a horizontal axis movable component, and a horizontal axis slide rail. The output end of the horizontal axis driver is connected to the horizontal axis movable component, which is connected to the vertical axis motion platform 220 or the vertical axis motion platform 230. The bottom of the horizontal axis movable component is slidably connected to the horizontal axis slide rail. The vertical axis motion platform 220 includes a vertical axis driver, a vertical axis movable component, and a vertical axis slide rail. The output end of the vertical axis driver is connected to the vertical axis movable component, which is connected to the horizontal axis motion platform 210 or the vertical axis motion platform 230. The bottom of the vertical axis movable component is slidably connected to the vertical axis slide rail. The vertical axis motion platform 230 includes a vertical axis driver, a vertical axis movable component, and a vertical axis slide rail. The output end of the vertical axis driver is connected to the vertical axis movable component, which is connected to the horizontal axis motion platform 210 or the vertical axis motion platform 220. The bottom of the vertical axis movable component is slidably connected to the vertical axis slide rail.

[0046] It should be noted that, depending on the usage requirements and application scenarios, the connection relationship between the platform 10, the motion platform 20, and the bottom support component 50 can be as follows: the longitudinal axis motion platform 220 is set on the bottom support component 50 and connected to the bottom of the platform 10 through the horizontal axis motion platform 210 or the vertical axis motion platform 230; the horizontal axis motion platform 210 is set on the bottom support component 50 and connected to the bottom of the platform 10 through the longitudinal axis motion platform 220 or the vertical axis motion platform 230; or the vertical axis motion platform 230 is set on the bottom support component 50 and connected to the bottom of the platform 10 through the horizontal axis motion platform 210 or the longitudinal axis motion platform 220. All three connection relationships can achieve the position adjustment of the workpiece 60.

[0047] Similarly, the connection between the resistivity detection component 30 and the motion platform 20 can be such that the resistivity detection component 30 is first connected to the vertical axis motion platform 230 and then connected to the horizontal axis motion platform 210 or the vertical axis motion platform 220; or the resistivity detection component 30 is first connected to the horizontal axis motion platform 210 and then connected to the vertical axis motion platform 230 or the vertical axis motion platform 220; or the resistivity detection component 30 is first connected to the vertical axis motion platform 220 and then connected to the horizontal axis motion platform 210 or the vertical axis motion platform 230.

[0048] Optionally, the horizontal axis motion platform 210 can be a driver whose output end is arranged horizontally, the vertical axis motion platform 220 can be a driver whose output end is arranged vertically, and the vertical axis motion platform 230 can be a driver whose output end is arranged vertically.

[0049] The resistivity detection component 30 is located on one side of the stage 10.

[0050] The resistivity detection component 30 can be a detection structure located vertically above the stage 10 carrying the workpiece 60 and connected to the motion platform 20, capable of moving closer to or further away from the stage 10 carrying the workpiece 60 in the horizontal and / or vertical directions under the drive of the motion platform 20. Optionally, the resistivity detection component 30 can be a resistance value detector.

[0051] It should be noted that the adjustment process of the relative position between the stage 10 and the resistivity detection component 30 (i.e., the relative position of the two along the width, length, and thickness directions of the bottom support component 50) can be as follows: the motion platform 20 drives the stage 10 to move toward the resistivity detection component 30 to complete the relative position adjustment process in multiple directions; the motion platform 20 drives the resistivity detection component 30 to move toward the stage 10 to complete the relative position adjustment process in multiple directions; or the motion platform 20 first drives the stage 10 toward the resistivity detection component 30 to complete the relative position adjustment process in some directions, and then the motion platform 20 drives the resistivity detection component 30 toward the stage 10 to complete the relative position adjustment process in the remaining directions. Different motion driving methods can be matched according to different application scenarios. This application mainly describes the motion platform 20 driving the stage 10 toward the resistivity detection component 30. The same principle applies to the motion platform 20 driving the resistivity detection component 30 toward the stage 10, and will not be repeated here.

[0052] like Figure 3 As shown, the resistivity detection assembly 30 includes a first mounting component 310, a resistivity detection element 320, and a first connecting element (not shown in the figure). The resistivity detection element 320 is disposed on the first mounting component 310. A first through hole is provided on the end face of the first mounting component 310, and the first connecting element passes through the first through hole and is connected to the motion platform 20. Optionally, the first mounting component 310 may be a mounting plate, mounting block, or mounting base, etc., and the first connecting element may be a screw or other fixing connection structure.

[0053] The rotating unit 40 is connected to the stage 10 to drive the stage 10 to rotate; at this time, the motion platform 20 can adjust the relative position of the stage 10 and the resistivity detection component 30 in the horizontal direction.

[0054] The rotating unit 40 may be a functional unit connected to the bottom of the stage 10, capable of driving the stage 10 to rotate angularly along an axis or non-axis. Optionally, the rotating unit 40 may be a rotating disk.

[0055] By coordinating the components of the resistivity detection assembly 30, a tight connection is achieved between the resistivity detection assembly 30, the first mounting component 310, and the motion platform 20. This effectively ensures the synchronization of movement between the resistivity detection assembly 30 and the motion platform 20. Furthermore, the horizontal axis motion platform 210, the vertical axis motion platform 220, and the vertical axis motion platform 230 in the motion platform 20 enable more precise positional adjustment of the resistivity detection assembly 30. In addition, the rotation of the stage 10 by the rotating unit 40 ensures the accuracy of the loading angle of the workpiece 60 on the stage 10. Moreover, it also meets the requirement of rotating the workpiece 60 at a certain processing angle in some processes, thereby ensuring the accuracy of the workpiece 60 detection process and improving the detection efficiency of a large batch of workpieces 60.

[0056] It should be noted that the motion platform 20 can also be adjusted in the radial direction of the resistivity detection mechanism (i.e., the radial direction of the workpiece 60 on the stage 10), and in conjunction with the rotation of the rotating unit 40 on the stage 10, ensure the accuracy of the loading angle of the workpiece 60 on the stage 10. In addition, it also meets the requirement of rotating the workpiece 60 to process angle in some processes, thereby ensuring the accuracy of the workpiece 60 detection process and improving the detection efficiency of a large number of workpieces 60.

[0057] When the workpiece 60 (such as a crystal ingot) is subjected to laser modification processing, the motion platform 20 adjusts the relative position of the stage 10 carrying the workpiece 60 (such as a crystal ingot) and the resistivity detection component 30 located on one side of the stage 10 in at least one of the horizontal and vertical directions of the resistivity detection mechanism, so that the stage 10 and the resistivity detection component 30 move closer or further away from each other in at least one of the horizontal and vertical directions of the resistivity detection mechanism, until the relative position of the stage 10 and the resistivity detection component 30 is adjusted to a preset position. After the position is adjusted, the resistivity of the workpiece 60 is detected in conjunction with the resistivity detection component 30, that is, the detection of different positions of the workpiece 60 is realized (such as detecting the resistance value of multiple points of the workpiece 60).

[0058] This application also provides a processing device, which includes the resistivity detection mechanism in the above embodiments.

[0059] The division of the various modules in the resistivity detection mechanism described above is only for illustrative purposes. In other embodiments, the resistivity detection mechanism can be divided into different modules as needed to complete all or part of the functions of the resistivity detection mechanism described above.

[0060] The resistivity detection mechanism and processing equipment provided in the above embodiments, when laser-modified processing is performed on a workpiece (such as a crystal ingot), adjusts the relative position of the stage carrying the workpiece (such as a crystal ingot) and the resistivity detection component located on one side of the stage in at least one of the horizontal and vertical directions of the resistivity detection mechanism. This is done so that the stage and the resistivity detection component move closer or further apart in at least one of the horizontal and vertical directions of the resistivity detection mechanism until the relative position of the stage and the resistivity detection component is adjusted to a preset position. After the position is adjusted, the resistivity of the workpiece is detected in conjunction with the resistivity detection component, thus realizing the detection of different positions of the workpiece (such as detecting the resistance values ​​of multiple points on the workpiece). Compared with the method of manually moving the workpiece, this effectively improves the problem of low work efficiency caused by the need to manually move the workpiece multiple times during the detection process. While improving the stability of the workpiece movement process, it also ensures the accuracy and efficiency of the workpiece movement process, thereby meeting the detection needs of a large number of workpieces during the workpiece processing process, and further meeting the higher requirements of the workpiece processing process. It has important economic value and practical application value.

[0061] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0062] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A resistivity detection mechanism, characterized in that, include: A platform for supporting workpieces; A resistivity detection component is located on one side of the stage; The motion platform can adjust the relative position of the stage and the resistivity detection component in at least one of the horizontal and vertical directions of the resistivity detection mechanism, so that the stage and the resistivity detection component move closer or further apart relative to each other in at least one of the horizontal and vertical directions of the resistivity detection mechanism; The height direction is perpendicular to the horizontal direction.

2. The resistivity detection mechanism according to claim 1, characterized in that, The resistivity detection mechanism also includes: A rotating unit is connected to the platform to drive the platform to rotate.

3. The resistivity detection mechanism according to claim 2, characterized in that, The motion platform can adjust the relative position of the stage and the resistivity detection component in the horizontal direction.

4. The resistivity detection mechanism according to claim 1, characterized in that, The motion platform includes a horizontal axis motion platform, a vertical axis motion platform, and a vertical axis motion platform; The horizontal direction includes the length direction and the width direction; The transverse axis motion platform can adjust the relative position of the stage and the resistivity detection component in the length direction; The longitudinal axis motion platform can adjust the relative position of the stage and the resistivity detection component in the width direction; The vertical axis motion platform can adjust the relative position of the platform and the resistivity detection component in the height direction.

5. The resistivity detection mechanism according to claim 1, characterized in that, The resistivity detection assembly includes a resistivity detection element and a first connector, wherein the resistivity detection element is connected to the motion platform via the first connector.

6. The resistivity detection mechanism according to claim 5, characterized in that, The resistivity detection assembly further includes a first mounting component, the resistivity detection element is disposed on the first mounting component, the end face of the first mounting component near the motion platform is provided with a first through hole, and the first connector passes through the first through hole and is connected to the motion platform.

7. The resistivity detection mechanism according to claim 1, characterized in that, The motion platform includes a horizontal axis motion platform, a vertical axis motion platform, and a vertical axis motion platform. The horizontal axis motion platform includes a horizontal axis driver, a horizontal axis movable component, and a horizontal axis slide rail. The output end of the horizontal axis driver is connected to the horizontal axis movable component. The horizontal axis movable component is connected to the vertical axis motion platform or the vertical axis motion platform. The bottom of the horizontal axis movable component is slidably connected to the horizontal axis slide rail.

8. The resistivity detection mechanism according to claim 7, characterized in that, The longitudinal axis motion platform includes a longitudinal axis driver, a longitudinal axis movable component, and a longitudinal axis slide rail. The output end of the longitudinal axis driver is connected to the longitudinal axis movable component. The longitudinal axis movable component is connected to the horizontal axis motion platform or the vertical axis motion platform. The bottom of the longitudinal axis movable component is slidably connected to the longitudinal axis slide rail.

9. The resistivity detection mechanism according to claim 7, characterized in that, The vertical axis motion platform includes a vertical axis driver, a vertical axis movable component, and a vertical axis slide rail. The output end of the vertical axis driver is connected to the vertical axis movable component, the vertical axis movable component is connected to the horizontal axis motion platform or the vertical axis motion platform, and the bottom of the vertical axis movable component is slidably connected to the vertical axis slide rail.

10. A processing device, characterized in that, include: The resistivity detection mechanism as described in any one of claims 1 to 9.

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