Device for testing air leakage rate of electrostatic chuck

Abstract

The utility model discloses an air leakage rate testing device for an electrostatic chuck. The air leakage rate testing device comprises a base, a supporting table, a guide frame and a vacuum cavity. The supporting table is arranged on the upper surface of the base and used for supporting the electrostatic chuck, and a first sealing ring is arranged on the upper surface of the supporting table and used for forming sealing with the electrostatic chuck; the guide frame is arranged on the upper surface of the base and located on the outer side of the supporting table. The air cylinder is arranged at the top end of the guide frame. The telescopic end of the air cylinder faces the supporting table. The vacuum cavity is arranged between the air cylinder and the supporting table, and the telescopic end of the air cylinder is fixedly connected to the upper end of the vacuum cavity so as to drive the vacuum cavity to move up and down. A second sealing ring is arranged at the lower end of the vacuum cavity and used for forming sealing with the electrostatic chuck when the telescopic end of the air cylinder drives the vacuum cavity to move downwards. The air cylinder drives the cavity and the chuck to be rapidly closed, a bolt fixing mode is replaced, the complicated connecting and installing process is avoided, it is guaranteed that the sealing ring is evenly stressed, efficiency is improved, and the leakage risk is reduced.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor testing equipment technology, and in particular to an electrostatic chuck leakage rate testing device. Background Technology

[0002] An electrostatic chuck is a precision fixture that uses electrostatic attraction to fix workpieces, primarily used in semiconductor manufacturing, optical processing, and high-vacuum processes. Unlike traditional vacuum chucks or mechanical clamping, it achieves non-contact fixing through the action of an electric field, making it particularly suitable for high-cleanliness environments and high-precision machining scenarios. Detecting the gas leakage rate of an electrostatic chuck is a crucial step in ensuring stable equipment operation and product processing quality. By accurately detecting the gas leakage rate of the electrostatic chuck, sealing defects can be detected promptly, preventing instability in the process environment caused by gas leakage, which could subsequently affect the processing accuracy and yield of wafers and other products.

[0003] Currently, the most common method for detecting gas leakage rates in electrostatic chucks is to use bolts to connect the test device cavity to the chuck. However, this traditional connection method has several serious drawbacks. First, the bolt tightening process requires multiple manual steps, with operators needing to tighten multiple bolts sequentially. This process is extremely time-consuming, significantly reducing the efficiency of the testing work. In the context of modern manufacturing, which pursues high-efficiency production, it is difficult to meet the demand for rapid testing. Second, the multiple manual steps make it difficult to ensure that the force and sequence of bolt tightening are completely consistent each time, resulting in uneven bolt preload. This uneven preload can easily cause local deformation of the sealing ring. Once the sealing ring is locally deformed, the originally tight sealing structure will be damaged, thus triggering a leakage risk. This seriously affects the accuracy of the gas leakage rate test results and may even lead to misjudgment of the actual leakage situation of the electrostatic chuck, misleading subsequent equipment maintenance and production decisions. Utility Model Content

[0004] The purpose of this invention is to provide an electrostatic chuck leakage rate testing device to address the shortcomings of existing testing methods, such as the need for multi-step manual operation for bolt tightening, uneven bolt preload, resulting in long testing times, poor repeatability, and leakage risks caused by local deformation of the sealing ring. By using a cylinder to drive the vacuum chamber to quickly close with the chuck, the traditional bolt fixing method is replaced, avoiding the complicated bolt connection and installation process, while ensuring uniform stress on the sealing ring, thus improving efficiency and reducing leakage risks.

[0005] To achieve the above objectives, this utility model is implemented through the following technical solution:

[0006] This utility model provides an electrostatic chuck leakage rate testing device, comprising:

[0007] Base;

[0008] A support platform is disposed on the upper surface of the base for supporting the electrostatic chuck. A first sealing ring is provided on the upper surface of the support platform for forming a seal with the electrostatic chuck.

[0009] A guide frame is disposed on the upper surface of the base, located on the outside of the support platform;

[0010] A cylinder is disposed at the top of the guide frame, with its telescopic end facing the support platform; and

[0011] A vacuum chamber is disposed between the cylinder and the support platform. The telescopic end of the cylinder is fixedly connected to the upper end of the vacuum chamber to drive the vacuum chamber to move up and down.

[0012] A second sealing ring is provided at the lower end of the vacuum chamber, which is used to form a seal between the vacuum chamber and the electrostatic chuck when the cylinder's extension end drives the vacuum chamber to move downward.

[0013] Optionally, a guide structure is fixedly provided on the outside of the vacuum cavity, and the guide structure is slidably disposed to the guide frame along the height direction.

[0014] Optionally, the guide frame includes a column extending upward along the upper surface of the base and a top plate disposed at the top of the column, the top plate being used to support the cylinder;

[0015] The guide structure is constructed as a sleeve that can be slidably disposed around the periphery of the column.

[0016] Optionally, a silicon wafer is disposed inside the vacuum chamber, the silicon wafer is electrically connected to the inner wall of the vacuum chamber, and a glass observation window for observing the silicon wafer is installed on the side of the vacuum chamber.

[0017] Optionally, a limiting pin is provided on the inner side of the bottom wall of the vacuum chamber, and a limiting groove matching the limiting pin is opened on the side of the silicon wafer, with the limiting pin located in the limiting groove to limit the silicon wafer.

[0018] Optionally, a vacuum generator, a gas flow meter, and a pressure gauge are provided on the side of the vacuum chamber. The air inlet of the vacuum generator is used to connect to a compressed air source, and the air outlet of the vacuum generator is connected to the interior of the vacuum chamber.

[0019] The exhaust port of the vacuum generator is connected to the gas flow meter, and a pneumatic silencer is also provided between the exhaust port of the vacuum generator and the gas flow meter;

[0020] The pressure gauge is connected to the air extraction port of the vacuum generator and / or the interior of the vacuum chamber, and is used to monitor the internal pressure of the vacuum chamber.

[0021] Optionally, the upper end of the support platform is provided with a positioning pin, and the edge of the electrostatic chuck is provided with a plurality of flange holes that are adapted to the positioning pin.

[0022] Optionally, the lower surface of the support platform is provided with a through hole for connecting the gas cylinder;

[0023] The lower surface of the electrostatic chuck is provided with an air inlet and multiple PIN holes, and each of the multiple PIN holes is fitted with a silicone plug to achieve a seal.

[0024] Optionally, the support platform is provided with two electrode contact pins, which are electrically connected to a high-voltage electrostatic generator;

[0025] The lower surface of the electrostatic chuck is provided with two electrode holes that are adapted to the electrode pins, and the electrostatic chuck is electrically connected to the electrode pins through the electrode holes.

[0026] Optionally, the lower end of the base is provided with a plurality of adjusting feet, which are threadedly connected to the base for adjusting the levelness of the base.

[0027] This utility model has at least one of the following technical effects:

[0028] By using a cylinder to drive the vacuum chamber and chuck to close quickly, replacing the traditional bolt fixing method, the complicated bolt connection and installation process is avoided, realizing one-button automated operation. At the same time, it ensures that the sealing ring is subjected to uniform force, which helps to improve efficiency and reduce the risk of leakage.

[0029] By adopting an integrated design for the sealing interface between the vacuum chamber, the stage, and the electrostatic chuck, the number of connecting parts is reduced, the structure is simplified, and the probability of leakage is reduced. Attached Figure Description

[0030] Figure 1 A three-dimensional schematic diagram of an electrostatic chuck leakage rate testing device provided in an embodiment of this utility model;

[0031] Figure 2 Another perspective view of the electrostatic chuck leakage rate testing device provided in an embodiment of this utility model;

[0032] Figure 3 Provided for an embodiment of this utility model Figure 2 Enlarged schematic diagram of the structure at point A;

[0033] Figure 4 A perspective view of a support provided in an embodiment of the present utility model;

[0034] Figure 5 This is a three-dimensional schematic diagram of an electrostatic chuck provided in an embodiment of the present invention.

[0035] Explanation of reference numerals in the attached figures:

[0036] 100: Electrostatic Chuck Leakage Rate Testing Device

[0037] 10: Base

[0038] 11: Adjust the feet

[0039] 12: Button box

[0040] 13: Display screen

[0041] 20: Supporting platform

[0042] 21: First sealing ring

[0043] 22: Positioning pin

[0044] 23: Through hole

[0045] 24: Electrode stylus

[0046] 30: Electrostatic Chuck

[0047] 31: Flange hole

[0048] 32: Air intake

[0049] 33: PIN hole

[0050] 34: Silicone plug

[0051] 35: Electrode hole

[0052] 40: Guide frame

[0053] 41: Column

[0054] 42: Top plate

[0055] 50: Cylinder

[0056] 51: Telescopic end

[0057] 60: Vacuum cavity

[0058] 61: Second sealing ring

[0059] 62: Guide Structure

[0060] 63: Silicon Wafer

[0061] 64: Glass observation window

[0062] 65: Limit pin

[0063] 66: Limiting groove

[0064] 67: Groove

[0065] 70: Vacuum generator

[0066] 71: Gas Flow Meter

[0067] 72: Barometer

[0068] 73: Air inlet of the vacuum generator

[0069] 74: Exhaust port of vacuum generator

[0070] 75: Pneumatic silencer Detailed Implementation

[0071] The following detailed description, in conjunction with the accompanying drawings and specific embodiments, provides a further detailed explanation of the electrostatic chuck leakage rate testing device proposed in this utility model. The advantages and features of this utility model will become clearer from the following description. It should be noted that the drawings are in a very simplified form and use non-precise proportions, used only to facilitate and clearly illustrate the purpose of the embodiments of this utility model. Please refer to the drawings to make the purpose, features, and advantages of this utility model more apparent and understandable. It should be understood that the structures, proportions, sizes, etc., depicted in the accompanying drawings are only for illustrative purposes to aid those skilled in the art and are not intended to limit the implementation conditions of this utility model. Therefore, they have no substantial technical significance. Any modifications to the structure, changes in proportions, or adjustments to the size, without affecting the effects and objectives achieved by this utility model, should still fall within the scope of the technical content disclosed in this utility model.

[0072] like Figures 1-5 As shown, this embodiment provides an electrostatic chuck leakage rate testing device 100, including a base, a support platform 20, a guide frame 40, and a vacuum chamber 60. The support platform 20 is disposed on the upper surface of the base to support the electrostatic chuck 30. A first sealing ring 21 is provided on the upper surface of the support platform 20 to form a seal between the support platform 20 and the electrostatic chuck 30. The guide frame 40 is disposed on the upper surface of the base, located outside the support platform 20. A cylinder 50 is disposed at the top of the guide frame 40, with its telescopic end 51 facing the support platform 20. The vacuum chamber 60 is disposed between the cylinder 50 and the support platform 20. The telescopic end 51 of the cylinder 50 is fixedly connected to the upper end of the vacuum chamber 60 to drive the vacuum chamber 60 to move up and down. A second sealing ring 61 is provided at the lower end of the vacuum chamber 60 to form a seal between the vacuum chamber 60 and the electrostatic chuck 30 when the telescopic end 51 of the cylinder 50 drives the vacuum chamber 60 to move downwards.

[0073] refer to Figure 1 and Figure 2 A guide structure 62 is fixedly disposed on the outer side of the vacuum chamber 60, and the guide structure 62 is slidably disposed to the guide frame 40 along the height direction. Specifically, the guide frame 40 includes a column 41 extending upward along the upper surface of the base and a top plate 42 disposed at the top of the column 41, the top plate 42 being used to support the cylinder 50. The guide structure 62 is constructed as a sleeve slidably disposed to the periphery of the column 41. In an embodiment not shown in the figure, the guide structure 62 can be constructed as a slider, and the guide frame 40 can be constructed with a guide rail matching the slider, so that the guide structure 62 is slidably connected to the guide frame 40. By providing a guide mechanism, the stability of the vacuum chamber 60 during lifting and lowering movements can be ensured.

[0074] In this embodiment, the lower end of the base can be provided with multiple adjusting feet 11, which are threadedly connected to the base. By adjusting the threaded feet, the levelness of the equipment during installation can be adjusted, reducing the impact of angle on the stability of equipment operation and the accuracy of test results. In this embodiment, two button boxes 12 can be installed on the base simultaneously. During testing, the operator needs to press the start button in both button boxes 12 simultaneously with both hands for the electrostatic chuck leakage rate testing device 100 to start, thereby fully ensuring the safety of the operator and reducing the probability of mechanical injury to the operator.

[0075] refer to Figure 3 The second sealing ring 61 is bonded to the lower end of the vacuum chamber 60. It ensures a tight seal between the lower end of the vacuum chamber 60 and the upper surface of the electrostatic chuck 30 when the telescopic end 51 of the cylinder 50 moves the vacuum chamber 60 downwards. In this embodiment, the vacuum chamber 60 is a one-piece design. The uniform downward pressure applied by the top cylinder 50 ensures consistent pressure across the entire circumference of the second sealing ring 61, thereby eliminating the risk of localized deformation in the surrounding area and improving the stability of leakage rate detection.

[0076] Continue to refer to Figure 3 A silicon wafer 63 is disposed inside the vacuum chamber 60. The outer diameter of the silicon wafer 63 is slightly larger than the outer diameter of the upper surface of the electrostatic chuck 30. The silicon wafer 63 is electrically connected to the inner wall of the vacuum chamber 60. Specifically, the upper surface of the silicon wafer 63 can be bonded to a wire using conductive adhesive, which is a conductive adhesive whose main component is graphite powder. The other end of the wire can be bolted to the inner wall of the vacuum chamber 60, thereby achieving an electrical connection between the silicon wafer 63 and the inner wall of the vacuum chamber 60.

[0077] A limiting pin 65 is provided on the inner side of the bottom wall of the vacuum chamber 60, and a limiting groove 66 matching the limiting pin 65 is provided on the side of the silicon wafer 63. The limiting groove 66 is constructed as an arc notch relative to the outer periphery of the silicon wafer 63, which can be used to mark or confirm the direction or angle of the silicon wafer 63 during operation. The limiting pin 65 is located in the limiting groove 66 to limit the silicon wafer 63. Through the cooperation of the limiting pin 65 and the limiting groove 66, it can be ensured that the silicon wafer 63 is always in a fixed horizontal direction and will not rotate, avoiding the conductive adhesive from falling off and causing poor connection, or even electrostatic sparking. The lower surface of the inner cavity of the vacuum chamber 60 is constructed with a groove 67 with an inner diameter slightly larger than the outer diameter of the silicon wafer 63, which is used to further limit the silicon wafer 63 in the radial direction, so as to ensure that the center of the silicon wafer 63 always coincides with the axis of the electrostatic chuck 30 during operation, avoiding edge leakage and resulting in incorrect measurement results.

[0078] refer to Figure 1 and Figure 2 A glass observation window 64 is installed on the side of the vacuum chamber 60, allowing observation of the operation of the internal silicon wafer 63. The glass observation window 64 is grounded to ensure that the silicon wafer 63 is always at electrical zero. In this embodiment, by placing the silicon wafer 63 on the inner wall of the vacuum chamber 60 and electrically connecting it to the inner wall of the vacuum chamber 60 via a wire, a potential difference is formed between the electrostatic chuck 30 and the silicon wafer 63 after energization, thereby causing the silicon wafer 63 to approach the electrostatic chuck 30 under the influence of the electrostatic field. If leakage occurs in the electrostatic chuck 30, the movement of the silicon wafer 63 can be observed through the glass observation window 64, thus determining whether the electrostatic chuck 30 is leaking.

[0079] refer to Figure 1 A vacuum generator 70, a gas flow meter 71, and a pressure gauge 72 are installed on the side of the vacuum chamber 60. The vacuum generator's inlet 73 is used to connect to a compressed air source, and the vacuum generator's exhaust port is connected to the interior of the vacuum chamber 60. By connecting high-pressure air to the vacuum generator's inlet 73, a pressure difference is created using Bernoulli's principle, allowing the gas in the chamber to be discharged through the vacuum generator's exhaust port 74, thus creating a negative pressure and vacuum environment.

[0080] The exhaust port 74 of the vacuum generator is connected to a gas flow meter 71, which monitors the gas flow rate and converts it into an electrical signal, which is then displayed in real time on the display screen 13 via a program interface. A pneumatic silencer 75 can also be installed between the exhaust port 74 and the gas flow meter 71 to reduce the noise of the vacuum generator 70 during operation and minimize its impact on the surrounding environment. A pressure gauge 72 is connected to the suction port of the vacuum generator 70 and / or the interior of the vacuum chamber 60, and can be used to monitor the internal pressure of the vacuum chamber 60 in real time.

[0081] refer to Figure 4 and Figure 5 The first sealing ring 21 is bonded to the upper surface of the support 20 to form a seal between the upper surface of the support 20 and the lower surface of the electrostatic chuck 30. A positioning pin 22 is provided at the upper end of the support 20, and multiple flange holes 31 that are adapted to the positioning pin 22 are opened on the edge of the electrostatic chuck 30. The electrostatic chuck 30 can be positioned relative to the support 20 by the cooperation of the positioning pin 22 and the flange holes 31.

[0082] The stage 20 contains two electrode pins 24, and the lower surface of the electrostatic chuck 30 has two electrode holes 35 that mate with the electrode pins 24. The electrostatic chuck 30 is electrically connected to the electrode pins 24 through the electrode holes 35. The back of the electrode pins 24 can be connected to a high-voltage electrostatic generator via wires. The top of the electrode pins 24 is a nickel alloy silver-plated pin, which is connected to the motor hole on the back of the electrostatic chuck 30, thereby providing an electrostatic potential of 0V to ±2000V to the chuck electrodes.

[0083] The lower surface of the support platform 20 has a through hole 23, which is located at the center of the support platform 20 and is used to connect to an external gas cylinder to provide the required gas source for the device. The gas source is usually helium. The lower surface of the electrostatic chuck 30 has an air inlet 32 ​​and multiple pin holes 33. Each of the multiple pin holes 33 is fitted with a silicone plug 34 to achieve a seal. By strictly sealing the pin holes 33 with conical silicone plugs 34 during the gas leak test, gas can be prevented from directly entering the electrostatic chuck 30 from the pin holes 33, thus avoiding any impact on the accuracy of the results.

[0084] In this embodiment, the electrostatic chuck leakage rate testing device 100 requires the operator to simultaneously press the start buttons in both button boxes 12 to activate the device. The telescopic end 51 of the cylinder 50 mounted on the upper end of the guide frame 40 moves the vacuum chamber 60 downwards, causing the electrostatic chuck 30 to be clamped between the support platform 20 and the vacuum chamber 60. The lower surface of the electrostatic chuck 30 is sealed to the support platform 20 by the second sealing ring 61, while the upper surface of the electrostatic chuck 30 is sealed to the vacuum chamber 60 by the first sealing ring 21, thus forming a sealed cavity between the vacuum chamber 60 and the electrostatic chuck 30. A negative pressure device is connected through the air inlet 73 of the vacuum generator, creating a negative pressure environment within the vacuum chamber 60, facilitating airtightness monitoring of the upper surface of the electrostatic chuck 30 under negative pressure conditions. The gas flow meter 71 is connected to the display screen 13 and converts the gas flow rate into an electrical signal, which is then sent to the display screen 13. The user can determine whether a leak has occurred based on the electrical signal displayed on the display screen 13. In addition, observing the movement of the silicon wafer 63 through the glass observation window 64 can also help determine whether the electrostatic chuck 30 is leaking air.

[0085] This invention utilizes a cylinder-driven vacuum chamber and chuck for rapid closure, replacing the traditional bolt-fixing method. This avoids the cumbersome bolt connection and installation process, achieving one-button automated operation while ensuring uniform stress on the sealing ring, thus improving efficiency and reducing the risk of leakage. The integrated design of the sealing interface between the vacuum chamber, support platform, and electrostatic chuck reduces the number of connecting parts, simplifies the structure, and further reduces the probability of leakage. This represents a significant advancement compared to existing technologies.

[0086] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. The terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0087] In the description of this utility model, it should be understood that the terms "center," "height," "thickness," "upper," "lower," "vertical," "horizontal," "top," "bottom," "inner," "outer," "axial," "radial," and "circumferential," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0088] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0089] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0090] Although the present invention has been described in detail through the above preferred embodiments, it should be understood that the above description should not be considered as a limitation of the present invention. Various modifications and substitutions to the present invention will be apparent to those skilled in the art after reading the above content. Therefore, the scope of protection of the present invention should be defined by the appended claims.

Claims

1. An electrostatic chuck leakage rate testing device, characterized in that, include: Base; A support platform is disposed on the upper surface of the base for supporting the electrostatic chuck. A first sealing ring is provided on the upper surface of the support platform for forming a seal with the electrostatic chuck. A guide frame is disposed on the upper surface of the base, located on the outside of the support platform; A cylinder is disposed at the top of the guide frame, with its telescopic end facing the support platform; and A vacuum chamber is disposed between the cylinder and the support platform. The telescopic end of the cylinder is fixedly connected to the upper end of the vacuum chamber to drive the vacuum chamber to move up and down. A second sealing ring is provided at the lower end of the vacuum chamber, which is used to form a seal between the vacuum chamber and the electrostatic chuck when the cylinder's extension end drives the vacuum chamber to move downward.

2. The electrostatic chuck leakage rate testing device according to claim 1, characterized in that, A guide structure is fixedly provided on the outside of the vacuum cavity, and the guide structure is slidably provided to the guide frame along the height direction.

3. The electrostatic chuck leakage rate testing device according to claim 2, characterized in that, The guide frame includes a column extending upward along the upper surface of the base and a top plate disposed at the top of the column, the top plate being used to support the cylinder; The guide structure is constructed as a sleeve that can be slidably disposed around the periphery of the column.

4. The electrostatic chuck leakage rate testing device according to claim 1, characterized in that, A silicon wafer is disposed inside the vacuum chamber, and the silicon wafer is electrically connected to the inner wall of the vacuum chamber. A glass observation window for observing the silicon wafer is installed on the side of the vacuum chamber.

5. The electrostatic chuck leakage rate testing device according to claim 4, characterized in that, A limiting pin is provided on the inner side of the bottom wall of the vacuum cavity, and a limiting groove matching the limiting pin is opened on the side of the silicon wafer. The limiting pin is located in the limiting groove to limit the silicon wafer.

6. The electrostatic chuck leakage rate testing device according to claim 1, characterized in that, A vacuum generator, a gas flow meter, and a pressure gauge are provided on the side of the vacuum chamber. The air inlet of the vacuum generator is used to connect to a compressed air source, and the air outlet of the vacuum generator is connected to the inside of the vacuum chamber. The exhaust port of the vacuum generator is connected to the gas flow meter, and a pneumatic silencer is also provided between the exhaust port of the vacuum generator and the gas flow meter; The pressure gauge is connected to the air extraction port of the vacuum generator and / or the interior of the vacuum chamber, and is used to monitor the internal pressure of the vacuum chamber.

7. The electrostatic chuck leakage rate testing device according to claim 1, characterized in that, The upper end of the support platform is provided with a positioning pin, and the edge of the electrostatic chuck is provided with a plurality of flange holes that are adapted to the positioning pin.

8. The electrostatic chuck leakage rate testing device according to claim 1, characterized in that, The lower surface of the support platform is provided with a through hole for connecting the gas cylinder; The lower surface of the electrostatic chuck is provided with an air inlet and multiple PIN holes, and each of the multiple PIN holes is fitted with a silicone plug to achieve a seal.

9. The electrostatic chuck leakage rate testing device according to claim 1, characterized in that, Two electrode pins are provided inside the support platform, and the electrode pins are electrically connected to a high-voltage electrostatic generator. The lower surface of the electrostatic chuck is provided with two electrode holes that are adapted to the electrode pins, and the electrostatic chuck is electrically connected to the electrode pins through the electrode holes.

10. The electrostatic chuck leakage rate testing device according to claim 1, characterized in that, The lower end of the base is provided with multiple adjusting feet, which are threaded to the base and used to adjust the levelness of the base.

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