Vacuum coating device

Abstract

The utility model relates to a vacuum coating device. The vacuum coating device comprises a base, a vacuum cavity, a magnetron sputtering module, a planetary workpiece bearing mechanism, a shielding component, a moving mechanism and a driving mechanism, the magnetron sputtering module is arranged on the side wall of the vacuum cavity; the planetary workpiece bearing mechanism is arranged on the base and is used for bearing a workpiece and driving the workpiece to revolve and rotate; the shielding component is rotationally arranged on the base and located on the periphery of the planetary workpiece bearing mechanism. The moving mechanism is connected with the base and used for driving the planetary workpiece bearing mechanism and the shielding component to move between the interior and the exterior of the vacuum cavity. The driving mechanism is used for driving the shielding component to rotate in the circumferential direction of the vacuum cavity so that the shielding component can be located in front of the emergent area of the magnetron sputtering module or leave the emergent area. Through position switching of the shielding component, control over starting and stopping of the coating process is achieved under the condition that the magnetron sputtering module continuously operates, and sputtering particles in the unstable stage are prevented from being deposited on the surface of a workpiece.

Description

Technical Field

[0001] This utility model relates to the field of vacuum coating technology, and in particular to a magnetron sputtering vacuum coating device. Background Technology

[0002] Magnetron sputtering is a commonly used physical vapor deposition technique. It involves creating a plasma in a vacuum environment, causing gas ions to bombard the target surface, sputtering target atoms, and depositing them onto the workpiece surface to form a thin film. This process is widely used in various surface treatment fields due to its advantages such as dense film formation, good adhesion, and strong controllability.

[0003] In actual production processes, magnetron sputtering equipment typically needs to operate continuously for a certain period to improve production efficiency. However, at the initial stage of the sputtering process, the target surface often has an oxide layer, adsorbed gases, or impurities, and the sputtering state is not yet stable. At this time, the composition and energy distribution of the sputtered particles fluctuate. If the workpiece is directly coated at this stage, it can easily lead to unstable film quality, affecting product performance.

[0004] Furthermore, there is the problem of difficulty in controlling the timing of sputtering particle action during the coating process. For example, if sputtering has already started but the workpiece has not yet entered the appropriate coating position, or if sputtering has not stopped after the coating process is completed, unnecessary deposition may occur, affecting the surface quality of the workpiece.

[0005] Therefore, in the magnetron sputtering coating process, how to ensure that sputtered particles act on the workpiece only during the stage where coating is required while sputtering is continuously operating, and avoid deposition during unstable stages or stages where coating is not required, has become a technical problem that needs to be solved in this field. Utility Model Content

[0006] Therefore, the technical problem to be solved by this utility model is to overcome the problem that the timing of sputtering particles is difficult to control in the prior art, so that sputtering particles act on the workpiece only when coating is required, while the sputtering process is running continuously.

[0007] To solve the above-mentioned technical problems, this utility model provides a vacuum coating apparatus, comprising:

[0008] Base;

[0009] A vacuum chamber is located on one side of the base;

[0010] A magnetron sputtering module is disposed on the side wall of the vacuum chamber;

[0011] A planetary workpiece bearing mechanism is mounted on the base. The planetary workpiece bearing mechanism is used to bear the workpiece and drive the workpiece to perform revolution and rotation.

[0012] A shielding component is fixedly mounted on a rotating bracket. The shielding component is rotatably connected to the base through the rotating bracket. The rotating bracket extends axially along the vacuum cavity and is located on the circumferential periphery of the planetary workpiece bearing mechanism.

[0013] The rotating bracket includes a support plate and a support ring at both ends thereon, and the shielding member also serves as a connecting component of the rotating bracket, connecting the support plate and the support ring;

[0014] The base is fixedly connected to the mounting plate via a connecting column. The mounting plate is arranged opposite to the base. The support plate is rotatably connected to the mounting plate so that one end of the rotating bracket rotates around the mounting plate. The support ring is rotatably fitted into a rotating groove formed on the base so that the other end of the rotating bracket rotates around the base.

[0015] A moving mechanism, connected to the base, is used to drive the planetary workpiece carrying mechanism and the shielding member to move between the inside and outside of the vacuum chamber along the in-and-out direction; and...

[0016] A drive mechanism, connected to the rotating bracket, is used to drive the shielding member to rotate circumferentially along the vacuum cavity, so that when the shielding member rotates to a set position, it can be located in front of or away from the ejection area of ​​the magnetron sputtering module.

[0017] In one embodiment of the present invention, the planetary workpiece bearing mechanism includes a first motor mounted on the base, a central rotating shaft connected to the first motor, two rotating disks respectively fixed at both ends of the central rotating shaft, and a plurality of workpiece mounting shafts arranged circumferentially along the central rotating shaft and respectively mounted between the two rotating disks;

[0018] The axes of the central rotating shaft and the workpiece mounting shaft both extend along the axial direction of the vacuum cavity;

[0019] The first motor is used to drive the central rotating shaft to rotate, thereby driving the rotating disk and the workpiece mounting shaft to revolve; each of the workpiece mounting shafts is connected to a second motor mounted on the base, and rotates under the drive of the second motor.

[0020] In one embodiment of the present invention, the second motor is connected to the plurality of workpiece mounting shafts via a transmission assembly, the transmission assembly including a central gear disk, a plurality of first gears, second gears and third gears;

[0021] The central gear disk includes a gear disk body and a gear disk bushing extending from the gear disk body. The central gear disk is sleeved on the end of the central rotating shaft near the first motor.

[0022] A plurality of first gears are arranged along the outer periphery of the central gear disk and respectively mesh with the central gear disk, and each first gear is respectively connected to the corresponding workpiece mounting shaft;

[0023] The second motor is connected to the second gear, the second gear meshes with the third gear, and the third gear is fixedly mounted on the gear disc bushing.

[0024] In one embodiment of the present invention, the gear disc bushing is disposed inside the guide bushing, and the guide bushing is fixedly installed on the base.

[0025] In one embodiment of the present invention, the shielding member is an arc-shaped shielding plate extending along the axial direction of the vacuum cavity.

[0026] In one embodiment of the present invention, the driving mechanism includes a third motor mounted on the base and a fourth gear connected to the third motor, and a rack is provided on the support ring, with the fourth gear meshing with the rack.

[0027] In one embodiment of the present invention, the projected area of ​​the shielding member on a plane perpendicular to the emission direction of the magnetron sputtering module is greater than the projected area of ​​the emission region of the magnetron sputtering module on the same plane.

[0028] In one embodiment of this utility model, the moving mechanism includes a base plate, a guide rail, a lead screw, and a fourth motor. The guide rail and the lead screw are both mounted on the base plate, and the base is slidably connected to the guide rail via a slider. The fourth motor is mounted on the base plate and is driven by the lead screw. The lead screw is driven by the base via a nut seat, so that the base moves along the extension direction of the guide rail under the drive of the fourth motor.

[0029] The above-mentioned technical solution of this utility model has the following advantages compared with the prior art:

[0030] This invention integrates the shielding component and the planetary workpiece bearing mechanism onto the same base, with a moving mechanism driving the entire assembly in and out of the vacuum chamber. Through this integrated design, the relative positional relationship between the shielding component and the planetary workpiece bearing mechanism is ensured by the base, maintaining consistency after each entry and exit from the vacuum chamber without requiring recalibration. Furthermore, a single moving mechanism can simultaneously drive both components in and out, simplifying the control logic and ensuring more stable and reliable motion, thus improving the reliability and consistency of equipment operation.

[0031] In this invention, the shielding component is fixedly mounted on the rotating bracket, and also serves as a connecting part of the rotating bracket, connecting the support plate and the support ring. Through this structural arrangement, the shielding component not only achieves its shielding function but also acts as a structural connector, linking the support plate and the support ring to form an integral structure. This reduces the use of independent connecting parts, making the structure more compact and improving overall rigidity.

[0032] In this invention, a support plate and a support ring are respectively provided at both ends of the rotating bracket. A mounting plate is fixedly connected to the base, and the support plate is rotatably connected to the mounting plate, allowing one end of the rotating bracket to rotate around the mounting plate. A rotation groove is formed on the base, and the support ring is embedded in the rotation groove and rotatably engages with the rotation groove, allowing the other end of the rotating bracket to rotate around the base. Through the above structure, one side of the rotating bracket is defined by the rotatable connection between the support plate and the mounting plate, while the other side is provided with circumferential guidance and radial support by the engagement of the support ring and the rotation groove. Thus, both ends of the rotating bracket are stably supported, and the movement trajectory remains stable during rotation.

[0033] In this invention, the support ring extends circumferentially and forms continuous contact with the rotating groove. Compared to single-point or partial support structures, this continuous contact can distribute the load generated during rotation onto a larger contact surface, reducing localized stress concentration and eccentric loading, and lowering structural vibration. Thus, the rotating bracket experiences more uniform force during rotation, making it less prone to swaying or jamming.

[0034] This invention controls the timing of sputtering particle action by rotating a shielding component while the magnetron sputtering module is continuously running: In the initial stage of sputtering, the shielding component blocks the ejection area, preventing sputtering particles from reaching the workpiece surface and thus avoiding particle deposition on the unstable target surface; after the sputtering state stabilizes, the shielding component is driven away from the ejection area by a drive mechanism, allowing sputtering particles to act on the workpiece surface for coating; after the predetermined coating time is reached, the shielding component blocks the sputtering particles again, thereby terminating the effect of sputtering particles on the workpiece and achieving controllable switching of the coating process.

[0035] Meanwhile, the planetary workpiece carrier mechanism drives the workpiece to revolve and rotate during rotation, so that each area of ​​the workpiece surface is exposed to the action range of sputtering particles in turn, thereby achieving uniform deposition of the coating. Furthermore, the moving mechanism drives the planetary workpiece carrier mechanism and the shielding component to enter and exit the vacuum chamber as a whole, so that the loading and coating processes are separated, improving operating efficiency and operational stability.

[0036] Therefore, by combining the shielding component with the driving mechanism, this invention achieves effective control over the start and end of the coating process without relying on the start and stop control of the magnetron sputtering module, avoiding sputtering deposition in unstable and non-target stages, improving coating quality, and enhancing the reliability and consistency of equipment operation. Attached Figure Description

[0037] To make the content of this utility model easier to understand, the present utility model will be further described in detail below with reference to specific embodiments and accompanying drawings.

[0038] Figure 1 This is a front view of the vacuum coating apparatus provided by this utility model;

[0039] Figure 2 This is a side view of the vacuum coating apparatus provided by this utility model;

[0040] Figure 3 yes Figure 2 Sectional view along AA;

[0041] Figure 4 This is a structural schematic diagram of the rotating bracket, shielding component, and base provided by this utility model;

[0042] Figure 5 This is a structural schematic diagram of the rotating bracket and shielding component provided by this utility model.

[0043] Explanation of reference numerals in the accompanying drawings: 10, base; 20, vacuum chamber; 30, magnetron sputtering module; 40, planetary workpiece bearing mechanism; 41, first motor; 42, central rotating shaft; 43, rotating disk; 44, workpiece mounting shaft; 45, second motor; 46, transmission assembly; 461, central gear disk; 4611, gear disk body; 4612, gear disk bushing; 464, first gear; 462, second gear; 463, third gear; 47, guide bushing; 50, shielding component; 60, moving mechanism; 61, guide rail; 62, fourth motor; 70, drive mechanism; 71, third motor; 72, fourth gear; 73, rack; 80, rotating bracket; 81, support plate; 82, support ring; 90, mounting plate; 91, connecting column; 100, base plate. Detailed Implementation

[0044] The present invention will be further described below with reference to the accompanying drawings and specific embodiments, so that those skilled in the art can better understand and implement the present invention. However, the embodiments are not intended to limit the present invention.

[0045] See Figures 1 to 5As shown, this utility model embodiment provides a vacuum coating device, including a base 10, a vacuum chamber 20, a magnetron sputtering module 30, a planetary workpiece bearing mechanism 40, a shielding component 50, a moving mechanism 60, and a driving mechanism 70.

[0046] A vacuum chamber 20 is disposed on one side of the base 10 to provide the vacuum environment required for coating. A magnetron sputtering module 30 is disposed on the side wall of the vacuum chamber 20. The magnetron sputtering module 30 can be a single module or two modules. The two magnetron sputtering modules 30 can be arranged circumferentially or symmetrically along the vacuum chamber 20 to bombard the target material after the working gas is ionized to form plasma, so that the target atoms are sputtered from the target surface and move along the ejection direction.

[0047] The planetary workpiece carrier mechanism 40 is set on the base 10. The planetary workpiece carrier mechanism 40 can be set as a single one or two. When set as two, each planetary workpiece carrier mechanism 40 is respectively set within the emission area of ​​different magnetron sputtering modules 30. It is used to carry the workpiece and drive the workpiece to revolve and rotate, so that the workpiece continuously changes its spatial position and orientation during the coating process, thereby realizing the effect of each area of ​​the workpiece surface receiving sputtered particles in sequence.

[0048] The shielding member 50 is rotatably mounted on the base 10 and located around the corresponding planetary workpiece bearing mechanism 40. The shielding member 50 can be a single member or two members. When two members are used, each shielding member 50 is respectively configured to correspond one-to-one with the corresponding magnetron sputtering module 30 and corresponds to the ejection area of ​​each magnetron sputtering module 30 in spatial position, so as to shield or open the corresponding ejection area during its rotation.

[0049] The moving mechanism 60 is connected to the base 10 and is used to drive the planetary workpiece carrying mechanism 40 and the shielding component 50 to move between the inside and outside of the vacuum chamber 20 along the inlet and outlet directions, so as to realize the switching process of loading the workpiece outside the chamber and coating it inside the chamber. The end of the vacuum chamber 20 closest to the base 10 is the inlet and outlet. The inlet and outlet of the vacuum chamber 20 are sealed when the planetary workpiece carrying mechanism 40 and the shielding component 50 are fully inserted into the vacuum chamber 20.

[0050] The drive mechanism 70 is connected to the shielding member 50 and is used to drive the shielding member 50 to rotate circumferentially along the vacuum cavity 20, so that each shielding member 50 can rotate to a set position, thereby shielding or opening the ejection area of ​​the corresponding magnetron sputtering module 30 respectively.

[0051] In this embodiment, see Figures 1 to 4 As shown, there are two magnetron sputtering modules 30, which are respectively located on opposite sides of the vacuum chamber 20.

[0052] Accordingly, two planetary workpiece carrier mechanisms 40 are configured, each corresponding to a magnetron sputtering module 30, so that the workpieces on each planetary workpiece carrier mechanism 40 are located within the ejection area of ​​the corresponding magnetron sputtering module 30.

[0053] Two shielding components 50 are provided, located in the outer areas of the two planetary workpiece bearing mechanisms 40 respectively, and are respectively set to correspond one-to-one with the corresponding magnetron sputtering modules 30.

[0054] Two shielding components 50 rotate synchronously around the vacuum cavity 20 under the action of the drive mechanism 70. When the shielding component 50 rotates to the first position, the two shielding components 50 are respectively located in front of the emission area of ​​the corresponding magnetron sputtering module 30, thereby shielding the sputtered particles of their respective positions. When the shielding component 50 rotates to the second position, the two shielding components 50 leave the corresponding emission area at the same time, so that the sputtered particles can act on the corresponding workpieces respectively, thereby performing coating.

[0055] In actual use, the planetary workpiece bearing mechanism 40, driven by the moving mechanism 60, moves from outside the vacuum chamber 20 into the vacuum chamber 20, and brings the shielding component 50 into the chamber along with it.

[0056] When the equipment is evacuated and the working gas is introduced, the magnetron sputtering module 30 starts up and generates plasma to bombard the target material, thereby continuously generating sputtered particles.

[0057] In the initial stage of sputtering, the target surface usually has an oxide layer or impurities, and the sputtering state is not yet stable. At this time, the two shielding components 50 are driven to rotate synchronously by the drive mechanism 70, so that they are respectively located in front of the ejection area of ​​the corresponding magnetron sputtering module 30, thereby shielding the sputtering particles and preventing them from reaching the workpiece surface.

[0058] As the sputtering process continues, the target surface is gradually cleaned, and the sputtering state stabilizes. At this point, the shielding component 50 is driven to rotate synchronously by the drive mechanism 70, causing it to leave the corresponding ejection area. The sputtered particles can then act on the corresponding workpiece surfaces, thus initiating the formal coating process.

[0059] During the coating process, the planetary workpiece support mechanism 40 drives the workpiece to revolve and rotate, so that each area of ​​the workpiece surface is exposed to the action range of sputtered particles in turn, thus completing the coating deposition.

[0060] Once the predetermined coating time is reached, the shielding member 50 is driven to rotate synchronously again by the drive mechanism 70, so that it is positioned again in front of the ejection area of ​​the corresponding magnetron sputtering module 30, thereby blocking the sputtered particles from continuing to act on the workpiece surface and terminating the coating process.

[0061] Then, the magnetron sputtering module 30 is turned off as needed.

[0062] With the above structural configuration, the shielding component 50 is correspondingly set with the magnetron sputtering module 30 and can rotate synchronously with the drive mechanism 70, thereby shielding or opening the emission area of ​​each magnetron sputtering module 30 at different stages, so that the sputtered particles are in a blocked or passable state at different stages.

[0063] Therefore, without relying on the start and stop control of the magnetron sputtering module 30, the start and end of the coating process can be controlled by the rotation of the shielding member 50, avoiding the deposition of particles generated in the unstable stage of sputtering onto the workpiece surface, while reducing the impact of non-target deposition on the workpiece and equipment structure.

[0064] Furthermore, by setting the shielding component 50 and the planetary workpiece bearing mechanism 40 together on the base 10, and having the moving mechanism 60 drive the whole structure to enter and exit the vacuum chamber 20, the structure is more integrated and the motion relationship is more stable, which is conducive to improving the reliability and consistency of equipment operation.

[0065] See Figures 1 to 3 As shown, the planetary workpiece carrying mechanism 40 includes a first motor 41 mounted on the base 10, a central rotating shaft 42 connected to the first motor 41, two rotating disks 43 respectively fixed at both ends of the central rotating shaft 42, and a plurality of workpiece mounting shafts 44 arranged circumferentially along the central rotating shaft 42 and respectively mounted between the two rotating disks 43. The axes of the central rotating shaft 42 and the workpiece mounting shafts 44 both extend along the axial direction of the vacuum chamber 20.

[0066] The first motor 41 drives the central rotating shaft 42 to rotate, thereby driving the two rotating disks 43 to rotate synchronously, and further driving multiple workpiece mounting shafts 44 to revolve around the central rotating shaft 42; each workpiece mounting shaft 44 is connected to the second motor 45 mounted on the base 10, and rotates under the drive of the second motor 45.

[0067] In this embodiment, each workpiece mounting shaft 44 has a mounting portion for mounting the workpiece at one end away from the rotating disk 43. The mounting portion is used to realize a detachable connection or a fixed connection between the workpiece and the workpiece mounting shaft 44. It can be any one or a combination of a clamping structure, a plug-in structure or a threaded connection structure. Through the above structure, the workpiece can rotate synchronously with the workpiece mounting shaft 44 and maintain a stable connection state during the revolution.

[0068] In actual operation, the workpiece is mounted on each workpiece mounting shaft 44. Under the combined action of revolution and rotation, the workpiece surface continuously changes its posture in space, so that different areas alternately face the emission direction of the magnetron sputtering module 30, thereby achieving uniform deposition of sputtered particles on the workpiece surface.

[0069] The above structural design allows the workpiece to simultaneously rotate and revolve during the coating process, which can effectively improve the uniformity of the coating and reduce the problem of excessively thick or thin local deposits, thereby improving the coating quality.

[0070] See Figure 3 As shown, the second motor 45 is connected to multiple workpiece mounting shafts 44 via a transmission assembly 46, which includes a central gear disk 461, multiple first gears 464, second gears 462, and third gears 463.

[0071] The central gear disk 461 includes a gear disk body 4611 and a gear disk bushing 4612 extending from the gear disk body 4611. The central gear disk 461 is sleeved on one end of the central rotating shaft 42 near the first motor 41. A plurality of first gears 464 are arranged along the outer periphery of the central gear disk 461 and mesh with the central gear disk 461 respectively. Each first gear 464 is connected to the corresponding workpiece mounting shaft 44. The second motor 45 is drivenly connected to the second gear 462. The second gear 462 meshes with the third gear 463. The third gear 463 is fixedly installed on the gear disk bushing 4612.

[0072] During operation, the second motor 45 outputs power, which is transmitted to the central gear disk 461 through the meshing of the second gear 462 and the third gear 463. Then, through the meshing of the central gear disk 461 and multiple first gears 464, the power is synchronously distributed to each workpiece mounting shaft 44, thereby realizing the synchronous rotation of multiple workpiece mounting shafts 44.

[0073] The aforementioned transmission structure enables multiple workpiece mounting shafts 44 to achieve synchronous and stable rotational motion, avoiding the structural complexity caused by individual drives and improving transmission consistency and reliability.

[0074] See Figure 3 As shown, the gear disc bushing 4612 is disposed within the guide bushing 47, which is fixedly mounted on the base 10. During operation, the guide bushing 47 provides radial support and guidance for the gear disc bushing 4612, ensuring a stable axial position of the central gear disc 461 during rotation and reducing sway or vibration. This design improves the operational stability of the transmission components, reduces wear, and extends the service life of the equipment.

[0075] See Figures 4 to 5As shown, the shielding member 50 is rotatably connected to the base 10 via the rotating bracket 80. The shielding member 50 is an arc-shaped shielding plate extending along the axial direction of the vacuum cavity 20. The rotating bracket 80 also extends along the axial direction of the vacuum cavity 20. The shielding member 50 is fixedly mounted on the rotating bracket 80.

[0076] The arc-shaped shield corresponds spatially to the ejection area of ​​the magnetron sputtering module 30, and its axial extension along the vacuum cavity 20 can cover the ejection area within a certain range.

[0077] Under the action of the drive mechanism 70, the rotating bracket 80 drives the shielding component 50 to rotate around the axis of the vacuum cavity 20, thereby realizing the switching of the shielding component 50 between being in front of the emission area and leaving the emission area.

[0078] By adopting an arc-shaped structure, the shielding range is matched with the splashing area, resulting in a more stable and reliable shielding effect.

[0079] See Figures 3 to 5 As shown, the rotating bracket 80 includes a support plate 81 and a support ring 82 located at both ends thereon. The shielding member 50 also serves as a connecting component of the rotating bracket 80, connecting the support plate 81 and the support ring 82.

[0080] The shielding component 50 not only performs the shielding function, but also serves as a structural connector, connecting the support plate 81 and the support ring 82 to form an integral structure.

[0081] Driven by the drive mechanism 70, the rotating bracket 80 rotates around the axis of the vacuum chamber 20, thereby driving the shielding component 50 to rotate synchronously.

[0082] By adopting the above structural design, the use of independent connecting parts is reduced, making the structure more compact and improving the overall rigidity.

[0083] See Figures 4 to 5 As shown, the base 10 is fixedly connected to the mounting plate 90 by the connecting column 91, and the mounting plate 90 is arranged opposite to the base 10; the support plate 81 is disposed at one end of the rotating bracket 80 and is rotatably connected to the mounting plate 90; the support ring 82 is disposed at the other end of the rotating bracket 80 and is rotatably engaged with the rotating groove formed on the base 10, and the support ring 82 is embedded in the rotating groove and can slide circumferentially along the rotating groove.

[0084] With the above structure, the rotating bracket 80 forms rotational support and guiding constraint on its two sides respectively. On one side, the rotation axis position is defined by the rotational connection between the support plate 81 and the mounting plate 90, and on the other side, circumferential guidance and radial support are provided by the cooperation between the support ring 82 and the rotation groove, thereby forming stable support for the rotating bracket 80 at two relative positions.

[0085] In actual operation, when the drive mechanism 70 drives the rotating bracket 80 to rotate, the rotation connection structure at the support plate 81 is used to determine the position of the rotation center. The support ring 82 slides circumferentially in the rotation groove, thereby providing continuous guiding constraints to the rotating bracket 80 and enabling the rotating bracket 80 to maintain a stable motion trajectory during rotation.

[0086] Meanwhile, since the support ring 82 extends circumferentially and forms continuous contact with the rotating groove, it can effectively disperse the load generated during rotation compared to single-point or local support structures, reducing local force concentration and off-center loading, and reducing structural vibration. This makes the rotating bracket 80 more evenly stressed during rotation, avoiding swaying or jamming, and improving the stability and positional consistency of the shielding component 50 during movement.

[0087] See Figure 5 As shown, the drive mechanism 70 includes a third motor 71 mounted on the base 10 and a fourth gear 72 connected to the third motor 71. A rack 73 is provided on the support ring 82, and the fourth gear 72 meshes with the rack 73.

[0088] During operation, the third motor 71 drives the fourth gear 72 to rotate. The fourth gear 72 meshes with the rack 73, thereby driving the support ring 82 and the rotating bracket 80 to rotate circumferentially, which in turn drives the shielding component 50 to rotate.

[0089] The use of gear and rack transmission makes the rotation control of the blocking component 50 more precise and the response speed faster.

[0090] The projected area of ​​the shielding member 50 on the plane perpendicular to the emission direction of the magnetron sputtering module 30 is greater than the projected area of ​​the emission area of ​​the magnetron sputtering module 30 on the same plane.

[0091] The aforementioned dimensional relationships ensure that the shielding member 50, when in the shielding position, completely covers the emission area of ​​the magnetron sputtering module 30, thereby preventing sputtered particles from leaking from the edges. This ensures reliable shielding and avoids non-target deposition.

[0092] See Figure 1 As shown, the moving mechanism 60 includes a base plate 100, a guide rail 61, a lead screw (not shown in the figure), and a fourth motor 62. The guide rail 61 and the lead screw are both mounted on the base plate 100. The base 10 is slidably connected to the guide rail 61 via a slider. The fourth motor 62 is mounted on the base plate 100 and is driven by the lead screw. The lead screw is driven by the base 10 via a nut seat.

[0093] During operation, the fourth motor 62 drives the lead screw to rotate. Through the transmission between the lead screw and the base 10, the base 10 moves along the extension direction of the guide rail 61, thereby driving the planetary workpiece bearing mechanism 40 and the shielding component 50 to enter and exit the vacuum chamber 20 as a whole.

[0094] The above structure enables the planetary workpiece bearing mechanism 40 and the shielding component 50 to be loaded outside the cavity and coated inside the cavity, thereby achieving separation of the loading area and the coating area, improving operational convenience, and increasing production cycle time.

[0095] Obviously, the above embodiments are merely illustrative examples for clear explanation and are not intended to limit the implementation. Those skilled in the art will recognize that other variations or modifications can be made based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. However, obvious variations or modifications derived therefrom are still within the protection scope of this invention.

Claims

1. A vacuum coating apparatus, characterized in that: include: Base; A vacuum chamber is located on one side of the base; A magnetron sputtering module is disposed on the side wall of the vacuum chamber; A planetary workpiece bearing mechanism is mounted on the base. The planetary workpiece bearing mechanism is used to bear the workpiece and drive the workpiece to perform revolution and rotation. A shielding component is fixedly mounted on a rotating bracket. The shielding component is rotatably connected to the base through the rotating bracket. The rotating bracket extends axially along the vacuum cavity and is located on the circumferential periphery of the planetary workpiece bearing mechanism. The rotating bracket includes a support plate and a support ring at both ends thereon, and the shielding member also serves as a connecting component of the rotating bracket, connecting the support plate and the support ring; The base is fixedly connected to the mounting plate via a connecting column. The mounting plate is arranged opposite to the base. The support plate is rotatably connected to the mounting plate so that one end of the rotating bracket rotates around the mounting plate. The support ring is rotatably fitted into a rotating groove formed on the base so that the other end of the rotating bracket rotates around the base. A moving mechanism, connected to the base, is used to drive the planetary workpiece bearing mechanism and the shielding component to move between the inside and outside of the vacuum chamber along the in-and-out direction; as well as, A drive mechanism, connected to the rotating bracket, is used to drive the shielding member to rotate circumferentially along the vacuum cavity, so that when the shielding member rotates to a set position, it can be located in front of or away from the ejection area of ​​the magnetron sputtering module.

2. The vacuum coating apparatus according to claim 1, characterized in that: The planetary workpiece bearing mechanism includes a first motor mounted on the base, a central rotating shaft connected to the first motor, two rotating disks respectively fixed at both ends of the central rotating shaft, and a plurality of workpiece mounting shafts arranged circumferentially along the central rotating shaft and respectively mounted between the two rotating disks; The axes of the central rotating shaft and the workpiece mounting shaft both extend along the axial direction of the vacuum cavity; The first motor is used to drive the central rotating shaft to rotate, thereby driving the rotating disk and the workpiece mounting shaft to revolve; each of the workpiece mounting shafts is connected to a second motor mounted on the base, and rotates under the drive of the second motor.

3. The vacuum coating apparatus according to claim 2, characterized in that: The second motor is connected to the plurality of workpiece mounting shafts via a transmission assembly, which includes a central gear disk, a plurality of first gears, second gears, and third gears; The central gear disk includes a gear disk body and a gear disk bushing extending from the gear disk body. The central gear disk is sleeved on the end of the central rotating shaft near the first motor. A plurality of first gears are arranged along the outer periphery of the central gear disk and respectively mesh with the central gear disk, and each first gear is respectively connected to the corresponding workpiece mounting shaft; The second motor is connected to the second gear, the second gear meshes with the third gear, and the third gear is fixedly mounted on the gear disc bushing.

4. The vacuum coating apparatus according to claim 3, characterized in that: The gear disc bushing is disposed inside the guide bushing, and the guide bushing is fixedly installed on the base.

5. The vacuum coating apparatus according to claim 1, characterized in that: The shielding component is an arc-shaped shielding plate that extends along the axial direction of the vacuum cavity.

6. The vacuum coating apparatus according to claim 1, characterized in that: The drive mechanism includes a third motor mounted on the base and a fourth gear connected to the third motor. A rack is provided on the support ring, and the fourth gear meshes with the rack.

7. The vacuum coating apparatus according to claim 1, characterized in that: The projected area of ​​the shielding member on a plane perpendicular to the emission direction of the magnetron sputtering module is greater than the projected area of ​​the emission region of the magnetron sputtering module on the same plane.

8. The vacuum coating apparatus according to claim 1, characterized in that: The moving mechanism includes a base plate, a guide rail, a lead screw, and a fourth motor. The guide rail and the lead screw are both mounted on the base plate. The base is slidably connected to the guide rail via a slider. The fourth motor is mounted on the base plate and is driven by the lead screw. The lead screw is driven by the base via a nut seat, so that the base moves along the extension direction of the guide rail under the drive of the fourth motor.

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