Cathode baffle of magnetron sputtering equipment

Abstract

The utility model discloses a cathode baffle of magnetron sputtering equipment, which comprises a vacuum chamber, at least two magnetron sputtering cathodes and two first side baffles, the at least two first side baffles are respectively positioned on the outer sides of the two magnetron sputtering cathodes and are fixedly connected to the inner wall of the bottom end of the vacuum chamber, and the cathode baffle further comprises a shielding mechanism, a first baffle plate and a second baffle plate, the shielding plates are positioned on two sides of the two magnetron sputtering cathodes and in the middle of the two magnetron sputtering cathodes, are used for shielding the top ends of the magnetron sputtering cathodes and between the two magnetron sputtering cathodes, and have deformability; the loading mechanism is connected with the shielding mechanism; the cathode baffle plate of the magnetron sputtering equipment disclosed by the utility model has deformability, so that cross contamination of adjacent target materials is prevented, and the sputtering effect can be prevented from being influenced by an unstable state when sputtering is just started.

Description

Technical Field

[0001] This utility model relates to the field of magnetron sputtering equipment technology, and in particular to a cathode baffle for magnetron sputtering equipment. Background Technology

[0002] In magnetron sputtering equipment, multiple magnetron sputtering cathodes are usually installed. To avoid cross-contamination between adjacent targets during sputtering, a baffle is usually installed between two magnetron sputtering cathodes as a barrier.

[0003] During magnetron sputtering, the plasma is unstable in the initial stage, and the ion bombardment density distribution on the target surface is uneven. Directly exposing the substrate at this time will lead to film thickness fluctuations and lattice defects. However, ordinary baffles can only be used as a separator between two adjacent magnetron sputtering cathodes and cannot help solve the problem of instability at the beginning of sputtering, so the sputtering effect will still be affected. Utility Model Content

[0004] This utility model discloses a cathode baffle for a magnetron sputtering device, which aims to solve the technical problem that ordinary baffles can only be used as a partition between two adjacent magnetron sputtering cathodes and cannot help solve the problem of instability at the beginning of sputtering, thus affecting the sputtering effect.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A cathode baffle for a magnetron sputtering apparatus includes a vacuum chamber, at least two magnetron sputtering cathodes, and at least two first side baffles. The two first side baffles are respectively located outside the two magnetron sputtering cathodes and are fixedly connected to the bottom inner wall of the vacuum chamber. The apparatus further includes:

[0007] The shielding mechanism is located on both sides of the two magnetron sputtering cathodes and in the middle of the two magnetron sputtering cathodes. It is used to shield the top of the magnetron sputtering cathodes and the space between the two magnetron sputtering cathodes, and it is deformable.

[0008] The load-bearing mechanism, connected to the shielding mechanism, is used to assist the shielding mechanism in deformation;

[0009] The positioning mechanism, connected to the blocking mechanism, is used to limit the blocking mechanism during the deformation process;

[0010] The blocking mechanism includes:

[0011] Two U-shaped slide rails, each with a side support fixedly connected to both ends, and the two U-shaped slide rails are fixedly connected to the inner walls of opposite sides of the vacuum chamber through the side supports;

[0012] Two sets of crossbars, each with a sliding sleeve fixedly connected to both ends, and each set of crossbars is symmetrically and movably connected to two U-shaped slide rails via the sliding sleeves, with the sliding sleeves movably fitted onto the U-shaped slide rails;

[0013] The shielding mechanism also includes:

[0014] A flexible baffle is used to create a barrier. Multiple sleeves are symmetrically fixedly connected to the flexible baffle, and multiple sleeves are symmetrically perforated through each crossbar.

[0015] The flexible baffle is made of carbon fiber reinforced polymer material and has a ceramic coating on its surface;

[0016] The shielding mechanism also includes:

[0017] Two traction lines are fixedly connected to the outer periphery of the two horizontal bars at the highest point, and are used to pull the flexible baffle to unfold.

[0018] Two bearing housings are fixedly connected to the inner walls of opposite sides of the vacuum chamber, and the two bearing housings are arranged symmetrically.

[0019] The shielding mechanism also includes:

[0020] Two shafts are rotatably connected to two bearing seats, and two traction lines are respectively wound around the outer circumference of the two shafts;

[0021] Two motors are fixedly connected to the outer wall of one side of two bearing seats, and the output ends of the motors are fixedly connected to two rotating shafts respectively.

[0022] By incorporating a shielding mechanism, when sputtering is first started, the output of the motor rotates, causing the traction wire to be pulled around the axis and move the two sides of the flexible baffle outward until they cover the top of the magnetron sputtering cathode. This prevents the unstable state at the beginning of sputtering from affecting the sputtering effect. Subsequently, when the motor reverses, the flexible baffle can be moved back to its original position, thus serving as a barrier to prevent cross-contamination.

[0023] In a preferred embodiment, the load-bearing mechanism includes:

[0024] A rhomboid-shaped load-bearing block is movably connected to the center of the top surface of the flexible baffle;

[0025] Two second side baffles are symmetrically fixed to the top surface of the flexible baffle and movably fit against both ends of the rhomboid load-bearing block. They are made of the same material as the flexible baffle.

[0026] The load-bearing mechanism also includes:

[0027] Multiple vertical rods are simultaneously fixedly connected to the bottom outer wall of the rhomboid load-bearing block;

[0028] Multiple perforations are installed at the bottom of the flexible baffle, and multiple vertical rods are respectively inserted through the multiple perforations;

[0029] The load-bearing mechanism also includes:

[0030] Multiple spherical blocks are fixedly connected to the bottom outer wall of multiple vertical rods to lower the center of gravity and ensure the normal descent of the flexible baffle.

[0031] An arc-shaped groove is provided on the inner wall of the bottom end of the vacuum chamber, and the bottom ends of multiple spherical blocks are respectively movably attached to the inner wall of the arc-shaped groove.

[0032] By incorporating a load-bearing mechanism, when the traction line is released rapidly, the load-bearing mechanism can drive the flexible baffle to ensure that the center line falls vertically at a low position. Under the action of the spherical block, the swaying of the flexible baffle caused by the sudden release of external force can be reduced.

[0033] In a preferred embodiment, the positioning mechanism includes:

[0034] Two triangular pressure blocks are fixedly connected to the outer wall of the same side of the two sliding sleeves located at the top.

[0035] Two mounting slots are respectively installed through two side supports located on the same side;

[0036] The positioning mechanism also includes:

[0037] Two pressure sensors are fixedly installed in two mounting slots. When the triangular pressure block on one side presses down on the pressure sensor, the traction line on the same side stops pulling.

[0038] By incorporating a positioning mechanism, traction is stopped when the triangular pressure block presses against the pressure sensor, thereby ensuring the uniform distribution of the flexible baffles and facilitating their smooth return to their original position.

[0039] As described above, a cathode baffle for a magnetron sputtering device includes a vacuum chamber, two magnetron sputtering cathodes, and two side baffles. The two side baffles are located on the outer sides of the two magnetron sputtering cathodes and are fixedly connected to the bottom inner wall of the vacuum chamber. The device also includes: a shielding mechanism located on both sides and in the middle of the two magnetron sputtering cathodes, used to shield the top of the magnetron sputtering cathodes and the area between the two cathodes, and is deformable. This prevents cross-contamination between adjacent targets and also prevents instability at the start of sputtering from affecting the sputtering effect; a load-bearing mechanism connected to the shielding mechanism to assist in the deformation of the shielding mechanism; and a positioning mechanism connected to the shielding mechanism to limit the shielding mechanism during deformation. The cathode baffle for a magnetron sputtering device provided by this invention is deformable, preventing cross-contamination between adjacent targets and also preventing instability at the start of sputtering from affecting the sputtering effect. Attached Figure Description

[0040] Figure 1 This is a schematic diagram of the overall appearance structure of the cathode baffle of a magnetron sputtering device proposed in this utility model.

[0041] Figure 2 This is a schematic diagram showing the disassembled shielding mechanism of the cathode baffle in a magnetron sputtering device according to this utility model.

[0042] Figure 3 This is a schematic diagram showing the disassembled load-bearing mechanism of the cathode baffle in a magnetron sputtering device according to this utility model.

[0043] Figure 4 This is a cross-sectional view of the load-bearing mechanism of the cathode baffle in a magnetron sputtering device proposed in this utility model.

[0044] Figure 5 This is a schematic diagram showing the disassembled positioning mechanism of the cathode baffle in a magnetron sputtering device according to this utility model.

[0045] In the attached diagram: 1. Vacuum chamber; 2. Shielding mechanism; 3. Positioning mechanism; 4. First side baffle; 5. Magnetron sputtering cathode; 6. Load-bearing mechanism; 201. Bearing seat; 202. Motor; 203. Rotary shaft; 204. Traction line; 205. Crossbar; 206. Sliding sleeve; 207. Sleeve; 208. Flexible baffle; 209. U-shaped slide rail; 210. Side support; 301. Triangular pressure block; 302. Pressure sensor; 303. Mounting groove; 601. Perforation; 602. Spherical block; 603. Vertical rod; 604. Prism-shaped load-bearing block; 605. Second side baffle; 606. Arc-shaped groove. Detailed Implementation

[0046] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0047] The cathode baffle of the magnetron sputtering equipment disclosed in this utility model is mainly used in magnetron sputtering scenarios.

[0048] Reference Figure 1 and Figure 2 A cathode baffle for a magnetron sputtering apparatus includes a vacuum chamber 1, at least two magnetron sputtering cathodes 5, and at least two first side baffles 4. The two first side baffles 4 are respectively located outside the two magnetron sputtering cathodes 5 and are fixedly connected to the inner wall of the vacuum chamber 1. The apparatus also includes:

[0049] The shielding mechanism 2 is located on both sides of the two magnetron sputtering cathodes 5 and in the middle of the two magnetron sputtering cathodes 5. It is used to shield the top of the magnetron sputtering cathodes 5 and the space between the two magnetron sputtering cathodes 5. It is also deformable. It can prevent cross-contamination of adjacent target materials and prevent the unstable state at the beginning of sputtering from affecting the sputtering effect.

[0050] The load-bearing mechanism 6 is connected to the shielding mechanism 2 and is used to assist the deformation of the shielding mechanism 2;

[0051] The positioning mechanism 3 is connected to the blocking mechanism 2 and is used to limit the blocking mechanism 2 during the deformation process.

[0052] Reference Figure 2 In a preferred embodiment, the blocking mechanism 2 includes:

[0053] Two U-shaped slide rails 209, each U-shaped slide rail 209 having a side support 210 fixedly connected to both ends, and the two U-shaped slide rails 209 being fixedly connected to the inner walls of opposite sides of the vacuum chamber 1 via the side support 210.

[0054] Two sets of crossbars 205, each crossbar 205 has a sliding sleeve 206 fixedly connected to both ends, and each set of crossbars 205 is symmetrically and movably connected to two U-shaped slide rails 209 through the sliding sleeve 206, with the sliding sleeve 206 movably sleeved on the U-shaped slide rail 209.

[0055] Reference Figure 2 In a preferred embodiment, the blocking mechanism 2 further includes:

[0056] The flexible baffle 208 is used to create a shield. Multiple sleeves 207 are symmetrically fixedly connected to the flexible baffle 208, and multiple sleeves 207 are symmetrically perforated through each crossbar 205.

[0057] The flexible baffle 208 is made of carbon fiber reinforced polymer and has a ceramic coating on its surface.

[0058] Reference Figure 2 In a preferred embodiment, the blocking mechanism 2 further includes:

[0059] Two traction lines 204 are fixedly connected to the outer periphery of the two horizontal bars 205 located at the highest point, respectively, and are used to pull the flexible baffle 208 to unfold.

[0060] Two bearing seats 201 are fixedly connected to the inner walls of opposite sides of the vacuum chamber 1, and the two bearing seats 201 are arranged symmetrically.

[0061] Reference Figure 2 In a preferred embodiment, the blocking mechanism 2 further includes:

[0062] Two shafts 203 are rotatably connected to two bearing seats 201, and two traction lines 204 are respectively wound around the outer circumference of the two shafts 203;

[0063] Two motors 202 are fixedly connected to the outer wall of one side of two bearing seats 201, and the output ends of the motors 202 are fixedly connected to two rotating shafts 203. When the flexible baffle 208 is folded and vertically set between the two magnetron sputtering cathodes 5, it can be used to prevent cross-contamination of adjacent target materials. When sputtering is just started, the output ends of the motors 202 rotate to drive the two sides of the flexible baffle 208 to move outward until they cover the top of the magnetron sputtering cathode 5, thus blocking the substrate and the magnetron sputtering cathode 5. This prevents the unstable state at the beginning of sputtering from affecting the sputtering effect. Subsequently, when the motors 202 reverse and the traction wire 204 is quickly released, the load-bearing mechanism 6 can drive the flexible baffle 208 back to its original position, thus serving as a barrier to prevent cross-contamination again.

[0064] Reference Figure 3 In a preferred embodiment, the load-bearing mechanism 6 includes:

[0065] A rhomboid-shaped load-bearing block 604 is movably connected to the center of the top surface of the flexible baffle 208;

[0066] Two second side baffles 605 are symmetrically fixed to the top surface of the flexible baffle 208 and movably attached to both ends of the rhomboid load block 604, and are made of the same material as the flexible baffle 208.

[0067] Reference Figure 3 In a preferred embodiment, the load-bearing mechanism 6 further includes:

[0068] Multiple vertical rods 603 are simultaneously fixedly connected to the bottom outer wall of the prismatic load-bearing block 604;

[0069] Multiple perforations 601 are provided through the bottom end of the flexible baffle 208, and multiple vertical rods 603 are respectively passed through the multiple perforations 601.

[0070] Reference Figure 3 and Figure 4 In a preferred embodiment, the load-bearing mechanism 6 further includes:

[0071] Multiple spherical blocks 602 are fixedly connected to the bottom outer wall of multiple vertical rods 603 to lower the center of gravity and ensure the normal descent of the flexible baffle 208;

[0072] An arc-shaped groove 606 is provided on the inner wall of the bottom end of the vacuum chamber 1, and the bottom ends of multiple spherical blocks 602 are respectively movably attached to the inner wall of the arc-shaped groove 606. When the traction line 204 is released quickly, the load-bearing mechanism 6 can drive the flexible baffle 208 to ensure that the center line falls vertically at a low position. The second side baffle 605 can restrict the position of the prismatic load block 604, preventing the prismatic load block from moving to both ends until it detaches from the flexible baffle 208. The multiple edges of the prismatic load block 604 can increase the friction with the flexible baffle 208, preventing it from swaying to both sides. The vertical rod 603 can lower the center of gravity. When it falls to the bottom, the contact surface of the spherical block 602 dissipates the horizontal impact energy through rolling or slight deformation, which can reduce the shaking of the flexible baffle caused by the sudden release of external force.

[0073] Reference Figure 5 In a preferred embodiment, the positioning mechanism 3 includes:

[0074] Two triangular pressure blocks 301 are fixedly connected to the outer wall of the same side of the two sliding sleeves 206 located at the top and on the same side;

[0075] Two mounting slots 303 are respectively installed through two side supports 210 located on the same side.

[0076] Reference Figure 5 In a preferred embodiment, the positioning mechanism 3 further includes:

[0077] Two pressure sensors 302 are fixedly installed in two mounting slots 303 respectively. When the triangular pressure block 301 on one side presses on the pressure sensor 302, the traction line 204 on the same side stops traction. Since the position of the traction line 204 on the shaft 203 is not the same each time, simply setting the number of turns of the motor 202 cannot guarantee that the flexible baffle 208 is evenly distributed on the top of the two magnetron sputtering cathodes 5. However, based on the setting of the pressure sensor 302, when one side is tractioned into place, the triangular pressure block 301 on that side presses on the pressure sensor 302 and stops traction. Even if the traction speeds on both sides are different, the final traction distance on both sides can be guaranteed to be consistent. This ensures the even distribution of the flexible baffle 208 and also makes it easier for the flexible baffle 208 to return to its original position.

[0078] Working principle: When the flexible baffle 208 is folded and vertically positioned between the two magnetron sputtering cathodes 5, it can be used to prevent cross-contamination of adjacent targets. When sputtering is just started, the output end of the motor 202 rotates, causing the traction wire 204 to rotate around the shaft 203 and pull it. The sliding sleeve 206 moves on the U-shaped slide rail 209, which drives the two sides of the flexible baffle 208 to move outward until it covers the top of the magnetron sputtering cathode 5. This can block the substrate and the magnetron sputtering cathode 5, thus preventing the unstable state at the beginning of sputtering from affecting the sputtering effect. Subsequently, when the motor 202 reverses and the traction wire 204 is quickly released, the load-bearing mechanism 6 can drive the flexible baffle 208 back into position, thus acting as a barrier to prevent cross-contamination again.

[0079] The above description is merely a preferred embodiment of this utility model, but the protection scope of this utility model is not limited thereto. The substitutions may be replacements of some structures, devices, or method steps, or they may be complete technical solutions. Equivalent substitutions or modifications made based on the technical solution and inventive concept of this utility model should all be covered within the protection scope of this utility model.

Claims

1. A cathode baffle for a magnetron sputtering apparatus, comprising a vacuum chamber (1), at least two magnetron sputtering cathodes (5), and at least two first side baffles (4), wherein the two first side baffles (4) are respectively located outside the two magnetron sputtering cathodes (5) and are fixedly connected to the inner wall of the bottom end of the vacuum chamber (1), characterized in that, Also includes: The shielding mechanism (2) is located on both sides of the two magnetron sputtering cathodes (5) and in the middle of the two magnetron sputtering cathodes (5). It is used to shield the top of the magnetron sputtering cathodes (5) and the space between the two magnetron sputtering cathodes (5), and is deformable. The load-bearing mechanism (6) is connected to the shielding mechanism (2); The positioning mechanism (3) is connected to the blocking mechanism (2).

2. The cathode baffle of a magnetron sputtering device according to claim 1, characterized in that, The shielding mechanism (2) includes: Two U-shaped slide rails (209), each U-shaped slide rail (209) has a side support (210) fixedly connected to both ends, and the two U-shaped slide rails (209) are fixedly connected to the inner walls of opposite sides of the vacuum chamber (1) through the side support (210); Two sets of crossbars (205), each crossbar (205) has a sliding sleeve (206) fixedly connected to both ends, and each set of crossbars (205) is symmetrically and movably connected to two U-shaped slide rails (209) through the sliding sleeve (206), and the sliding sleeve (206) is movably sleeved on the U-shaped slide rail (209).

3. The cathode baffle of a magnetron sputtering device according to claim 2, characterized in that, The shielding mechanism (2) further includes: A flexible baffle (208) is symmetrically fixedly connected with multiple sleeves (207), and each crossbar (205) is symmetrically perforated with multiple sleeves (207); The flexible baffle (208) is made of carbon fiber reinforced polymer material and has a ceramic coating on its surface.

4. The cathode baffle of a magnetron sputtering device according to claim 3, characterized in that, The shielding mechanism (2) further includes: Two traction lines (204) are fixedly connected to the outer periphery of the two crossbars (205) located at the highest point; Two bearing seats (201) are fixedly connected to the inner walls of opposite sides of the vacuum chamber (1), and the two bearing seats (201) are arranged symmetrically.

5. A cathode baffle for a magnetron sputtering apparatus according to claim 4, characterized in that, The shielding mechanism (2) further includes: Two shafts (203) are rotatably connected to two bearing seats (201), and two traction lines (204) are wound around the outer circumference of the two shafts (203); Two motors (202) are fixedly connected to the outer wall of one side of two bearing seats (201), and the output end of the motors (202) is fixedly connected to two shafts (203).

6. A cathode baffle for a magnetron sputtering apparatus according to claim 3, characterized in that, The load-bearing mechanism (6) includes: A rhomboid-shaped load-bearing block (604) is movably connected to the center of the top surface of the flexible baffle (208); Two second side baffles (605) are symmetrically fixed to the top surface of the flexible baffle (208) and movably attached to both ends of the rhomboid load block (604), and are made of the same material as the flexible baffle (208).

7. A cathode baffle for a magnetron sputtering apparatus according to claim 6, characterized in that, The load-bearing mechanism (6) also includes: Multiple vertical rods (603) are simultaneously fixedly connected to the bottom outer wall of the prismatic load-bearing block (604); Multiple perforations (601) are provided through the bottom end of the flexible baffle (208), and multiple vertical rods (603) are respectively inserted through the multiple perforations (601).

8. A cathode baffle for a magnetron sputtering apparatus according to claim 7, characterized in that, The load-bearing mechanism (6) also includes: Multiple spherical blocks (602) are fixedly connected to the bottom ends of multiple vertical rods (603); An arc-shaped groove (606) is provided on the inner wall of the bottom end of the vacuum chamber (1), and the bottom ends of multiple spherical blocks (602) are respectively movably attached to the inner wall of the arc-shaped groove (606).

9. A cathode baffle for a magnetron sputtering apparatus according to claim 2, characterized in that, The positioning mechanism (3) includes: Two triangular pressure blocks (301) are respectively fixedly connected to the outer wall of the same side of the two sliding sleeves (206) located at the top and on the same side; Two mounting slots (303) are respectively installed through two side supports (210) located on the same side.

10. A cathode baffle for a magnetron sputtering apparatus according to claim 9, characterized in that, The positioning mechanism (3) also includes: Two pressure sensors (302) are fixedly installed in two mounting slots (303). When the triangular pressure block (301) on one side presses on the pressure sensor (302), the traction line (204) on the same side stops pulling.

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