A wafer box / wafer basket cleaning equipment

Abstract

This utility model belongs to the technical field of cleaning equipment, specifically a wafer cassette and wafer basket cleaning device, including a base plate; its characteristic is that: a groove is formed on the top of the base plate, a base is fixedly connected in the groove, and fixed plates are fixedly connected to both sides of the base. Through the combination of a first lifting plate and a second lifting plate, and the sliding of a sliding block on a limiting shaft, the nozzle can be flexibly adjusted in the vertical and horizontal directions, which can adapt to the cleaning needs of wafer cassettes and wafer baskets of different sizes and shapes. It can meet diverse cleaning tasks without changing equipment parts, improving the versatility and efficiency of the equipment. The push plate can push the wafer cassette and wafer basket to move under the drive of the linkage mechanism. With the cleaning fluid sprayed by the nozzle, all parts of the wafer cassette and wafer basket can be thoroughly cleaned, effectively avoiding cleaning dead corners, improving the cleaning effect, and ensuring the cleanliness of the wafer cassette and wafer basket.

Description

Technical Field

[0001] This utility model belongs to the field of cleaning equipment technology, specifically a wafer box / wafer basket cleaning equipment. Background Technology

[0002] In the semiconductor manufacturing process, wafer cassettes and wafer baskets are key containers that carry wafers, and their cleanliness directly affects the quality of the wafers. As semiconductor technology develops towards higher precision, the cleaning requirements for wafer cassettes and wafer baskets are becoming increasingly stringent.

[0003] Publication No. CN116053188B, this application belongs to the technical field of wafer cleaning or drying production equipment, and relates to a wafer tilting and rotating support device. Power is transmitted from one end of a first support mounting plate to a third support mounting plate via a first rotating shaft, a second rotating shaft, and a third rotating shaft connected to each other, thereby realizing the rotation of the wafers in the wafer basket placed on the third support mounting plate within the wafer receiving box. Simultaneously, the universal coupling, lifting plate, and lifting block allow the wafer basket to be in a horizontal state when receiving wafers transported by a robotic arm, and in a tilted state when descending into the tank, eliminating the need for a robotic arm and improving work efficiency. This application also provides a wafer cleaning and drying method based on the above-mentioned wafer tilting and rotating support device, but the following problems still exist:

[0004] Most existing wafer cassette cleaning equipment uses a fixed structure design, which can only clean wafer cassettes or wafer baskets of specific sizes and shapes. When cleaning containers of different sizes is required, the entire cleaning unit often needs to be replaced or additional adapter parts need to be added. This not only increases equipment investment costs but also occupies a large amount of production space. Furthermore, frequent replacement of equipment parts may introduce new contaminants during the cleaning process, affecting wafer quality. Therefore, this paper proposes a wafer cassette and wafer basket cleaning equipment to address the above problems. Utility Model Content

[0005] In order to overcome the shortcomings of the prior art and solve at least one of the technical problems mentioned in the background art, this utility model proposes a wafer box and wafer basket cleaning device.

[0006] The technical solution adopted by this utility model to solve its technical problem is as follows: A wafer basket cleaning device according to this utility model includes a base plate; characterized in that: a groove is formed on the top of the base plate, a base is fixedly connected in the groove, fixed plates are fixedly connected to both sides of the base, a support plate is fixedly connected to the side of the fixed plate away from the base, a load-bearing plate is fixedly connected to the top of the support plate, a first fixed shaft is fixedly connected to the top of the load-bearing plate, a movable plate is movably connected to the surface of the first fixed shaft, a second fixed shaft is movably connected to the end of the movable plate away from the first fixed shaft, and a second fixed shaft is fixedly connected to one side of the second fixed shaft. A first protective plate is fixedly connected to a first protective plate. A protective block is fixedly connected to one side of the first protective plate. A second protective plate is fixedly connected to the side of the protective block away from the first protective plate. A support block is fixedly connected to the side of the second protective plate away from the protective block. A first lifting plate is fixedly connected to the top of the support block. A second lifting plate is sleeved on the top of the first lifting plate. A horizontal plate is fixedly connected to one side of the second lifting plate. A first lifting block and a second lifting block are fixedly connected to one side of the first lifting plate and the second lifting plate, respectively. A first lifting rod is fixedly connected to the top of the first lifting block. A second lifting rod is sleeved on the top of the first lifting rod.

[0007] Preferably, a connecting plate is fixedly connected to one side of the first lifting plate, and a connecting block is fixedly connected to the side of the connecting plate away from the first lifting plate. A sliding groove is provided on one side of the connecting block, and a limiting shaft is fixedly connected in the sliding groove. A sliding block is slidably connected to the surface of the limiting shaft, and a sliding plate is fixedly connected to the sliding block. A nozzle is fixedly connected to one side of the sliding plate, and a through hole is provided at the top of the nozzle. A water supply pipe is fixedly connected to the through hole, and a water tank is fixedly connected to the end of the water supply pipe away from the nozzle. The water tank is fixedly connected to the side of the sliding plate away from the nozzle.

[0008] Preferably, a first connecting shaft is fixedly connected to one side of the second lifting block, a first movable plate is movably connected to the surface of the first connecting shaft, a movable shaft is movably connected to the end of the first movable plate away from the connecting shaft, a second movable plate is movably connected to the surface of the movable shaft, a second connecting shaft is movably connected to the end of the second movable plate away from the movable shaft, and a push plate is fixedly connected to one side of the second connecting shaft.

[0009] Preferably, a pad is provided at the bottom of the push plate, a pad block is fixedly connected to the top of the pad, a groove is provided at the top of the pad block, a roller is fixedly connected in the groove, a movable block is sleeved on the surface of the roller, and the top of the movable block is fixedly connected to the second connecting shaft.

[0010] Preferably, a cleaning plate is fixedly connected to the bottom of the pad, a plurality of through holes are provided on the top of the cleaning plate, a support column is fixedly connected to the bottom of the cleaning plate, and a water collection tank is fixedly connected to the bottom of the support column.

[0011] Preferably, a stabilizing plate is fixedly connected to the bottom of the water collection tank, and the stabilizing plate is fixedly connected to the top of the base.

[0012] Preferably, the first movable plate and the second movable plate are symmetrically distributed through a first connecting axis.

[0013] The beneficial effects of this utility model are:

[0014] 1. This utility model provides a wafer box and wafer basket cleaning device. Through the combination of the first lifting plate and the second lifting plate, and the sliding of the sliding block on the limiting shaft, the nozzle can be flexibly adjusted in the vertical and horizontal directions, which can adapt to the cleaning needs of wafer boxes and wafer baskets of different sizes and shapes. It can meet diverse cleaning tasks without changing equipment parts, thus improving the versatility and efficiency of the equipment.

[0015] 2. This utility model provides a wafer box and wafer basket cleaning device. The push plate can move the wafer box and wafer basket under the drive of the linkage mechanism. With the cleaning fluid sprayed by the nozzle, it can thoroughly clean all parts of the wafer box and wafer basket, effectively avoid cleaning dead corners, improve the cleaning effect, and ensure the cleanliness of the wafer box and wafer basket. Attached Figure Description

[0016] The accompanying drawings, which are included to provide a further understanding of the present invention and form part of this application, illustrate exemplary embodiments of the present invention and, together with the description thereof, serve to explain the present invention and do not constitute an undue limitation thereof. In the drawings:

[0017] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0018] Figure 2 This is a schematic diagram of the top structure of this utility model;

[0019] Figure 3 This is a utility model Figure 2 Enlarged structural diagram at point A in the middle;

[0020] Figure 4 This is a utility model Figure 2 Enlarged structural diagram at point B;

[0021] Figure 5 This is a utility model Figure 1 Enlarged structural diagram at point C.

[0022] Legend:

[0023] 1. Base plate; 101. Base; 102. Fixing plate; 103. Load-bearing plate; 104. First fixed shaft; 105. Movable plate; 106. Second fixed shaft; 107. First protective plate; 108. Second protective plate; 109. Support block; 110. First lifting plate; 111. Second lifting plate; 112. Horizontal plate; 113. First lifting block; 114. Second lifting block; 115. First lifting rod; 116. Second lifting rod; 2. Connecting plate; 201 1. Connecting block; 202. Limiting shaft; 203. Sliding block; 204. Sliding plate; 205. Nozzle; 206. Water supply pipe; 207. Water tank; 3. First connecting shaft; 301. First movable plate; 302. Movable shaft; 303. Second movable plate; 304. Second connecting shaft; 305. Push plate; 4. Pad plate; 401. Pad block; 402. Roller; 403. Moving block; 5. Cleaning plate; 501. Support column; 502. Water collection tank; 503. Stabilizing plate. Detailed Implementation

[0024] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present utility model.

[0025] Specific implementation examples are given below.

[0026] Please see Figures 1-5This utility model provides a wafer basket cleaning device, including a base plate 1; characterized in that: a groove is formed on the top of the base plate 1, a base 101 is fixedly connected in the groove, a fixing plate 102 is fixedly connected to both sides of the base 101, a support plate is fixedly connected to the side of the fixing plate 102 away from the base 101, a load-bearing plate 103 is fixedly connected to the top of the support plate, a first fixing shaft 104 is fixedly connected to the top of the load-bearing plate 103, and a movable plate 105 is movably connected to the surface of the first fixing shaft 104. A second fixed shaft 106 is movably connected to the end of plate 105 away from the first fixed shaft 104. A first protective plate 107 is fixedly connected to one side of the second fixed shaft 106. A protective block is fixedly connected to one side of the first protective plate 107. A second protective plate 108 is fixedly connected to the side of the protective block away from the first protective plate 107. A support block 109 is fixedly connected to the side of the second protective plate 108 away from the protective block. A first lifting plate 110 is fixedly connected to the top of the support block 109. A sleeve is fitted on the top of the first lifting plate 110. The second lifting plate 111 has a horizontal plate 112 fixedly connected to one side. The first lifting plate 110 and the second lifting plate 111 have a first lifting block 113 and a second lifting block 114 fixedly connected to one side respectively. The top of the first lifting block 113 is fixedly connected to a first lifting rod 115, and the top of the first lifting rod 115 is fitted with a second lifting rod 116. During operation, the base plate 1 serves as the foundation of the equipment, and the base 101 in the groove provides stable support for the entire equipment. The fixed plates 102, support plates, and load-bearing plates 103 on both sides of the base 101 are connected in sequence to form a stable support frame. The linkage structure composed of the first fixed shaft 104, the movable plate 105, and the second fixed shaft 106 provides an installation base for the first protective plate 107, the protective block, and the second protective plate 108. These protective components can effectively prevent the cleaning fluid from splashing during the cleaning process, protecting the operators and the surrounding environment. The support block 109 supports the first lifting plate 110 and the second lifting plate 111, providing a stable platform for subsequent height adjustment and cleaning operations.

[0027] Furthermore, such as Figure 1 and Figure 2As shown, a connecting plate 2 is fixedly connected to one side of the first lifting plate 110. A connecting block 201 is fixedly connected to the side of the connecting plate 2 away from the first lifting plate 110. A sliding groove is provided on one side of the connecting block 201, and a limiting shaft 202 is fixedly connected in the sliding groove. A sliding block 203 is slidably connected to the surface of the limiting shaft 202. A sliding plate 204 is fixedly connected to the sliding block 203. A nozzle 205 is fixedly connected to one side of the sliding plate 204. A through hole is provided at the top of the nozzle 205, and a water supply pipe 206 is fixedly connected to the through hole. A water supply pipe is fixedly connected to the end of the water supply pipe 206 away from the nozzle 205. The water tank 207 is fixedly connected to the sliding plate 204 on the side away from the nozzle 205. During operation, the water tank 207 stores cleaning fluid. When it is necessary to clean the wafer cassette or wafer basket, the height of the horizontal plate 112 can be adjusted by controlling the relative positions of the first lifting plate 110 and the second lifting plate 111, thereby adjusting the height of the nozzle 205. At the same time, the sliding block 203 can slide on the surface of the limiting shaft 202, driving the sliding plate 204 and the nozzle 205 to move horizontally, realizing flexible adjustment of the nozzle 205 position to adapt to wafer cassettes and wafer baskets of different sizes and shapes. After the nozzle 205 position is adjusted, the cleaning fluid is sprayed from the water tank 207 through the water supply pipe 206 and through the through hole of the nozzle 205 to rinse the wafer cassette and wafer basket.

[0028] Furthermore, such as Figure 3 As shown, a first connecting shaft 3 is fixedly connected to one side of the second lifting block 114. A first movable plate 301105 is movably connected to the surface of the first connecting shaft 3. A movable shaft 302 is movably connected to the end of the first movable plate 301 away from the connecting shaft. A second movable plate 303 is movably connected to the surface of the movable shaft 302. A second connecting shaft 304 is movably connected to the end of the second movable plate 303 away from the movable shaft 302. A push plate 305 is fixedly connected to one side of the second connecting shaft 304. During operation, the lifting action of the second lifting block 114 is driven by the linkage mechanism composed of the first connecting shaft 3, the first movable plate 301, the movable shaft 302, the second movable plate 303, and the second connecting shaft 304, which drives the push plate 305 to move accordingly. The movable block 403 at the bottom of the push plate 305 can slide on the surface of the roller 402, making the movement of the push plate 305 smoother and more stable. During the cleaning process, the push plate 305 can push the wafer cassette and wafer basket to move, so that all parts of them can be rinsed by the cleaning fluid, avoiding cleaning dead corners.

[0029] Furthermore, such as Figure 4 As shown, a pad 4 is provided at the bottom of the push plate 305, and a pad block 401 is fixedly connected to the top of the pad 4. A groove is provided at the top of the pad block 401, and a roller 402 is fixedly connected in the groove. A moving block 403 is sleeved on the surface of the roller 402, and the top of the moving block 403 is fixedly connected to the second connecting shaft 304.

[0030] Furthermore, such as Figure 4 As shown, a cleaning plate 5 is fixedly connected to the bottom of the pad 4. The top of the cleaning plate 5 has multiple through holes. A support column 501 is fixedly connected to the bottom of the cleaning plate 5. A water collection tank 502 is fixedly connected to the bottom of the support column 501. During operation, the sewage generated during the cleaning process flows down through the multiple through holes on the top of the cleaning plate 5 and flows into the water collection tank 502 through the support column 501. The stabilizing plate 503 at the bottom of the water collection tank 502 is fixedly connected to the base 101 to ensure that the water collection tank 502 is placed stably. The collected sewage can be centrally treated to prevent sewage from flowing randomly and causing environmental pollution.

[0031] Furthermore, such as Figure 4 As shown, a stabilizing plate 503 is fixedly connected to the bottom of the water collection tank 502, and the stabilizing plate 503 is fixedly connected to the top of the base 101.

[0032] Furthermore, such as Figure 4 As shown, the first movable plate 301105 and the second movable plate 303105 are symmetrically distributed through the first connecting axis 3.

[0033] Working principle: During operation, the base plate 1 serves as the foundation of the equipment, and the base 101 within the groove provides stable support for the entire equipment. The fixed plates 102, support plates, and load-bearing plates 103 on both sides of the base 101 are connected in sequence to form a stable support frame. The linkage structure composed of the first fixed shaft 104, the movable plate 105, and the second fixed shaft 106 provides the installation foundation for the first protective plate 107, the protective block, and the second protective plate 108. These protective components can effectively prevent the cleaning fluid from splashing during the cleaning process, protecting the operators and the surrounding environment. The support block 109 supports the first lifting plate. The first lifting plate 110 and the second lifting plate 111 provide a stable platform for subsequent height adjustment and cleaning operations. The water tank 207 stores cleaning fluid. When it is necessary to clean the wafer cassette or wafer basket, the height of the horizontal plate 112 can be adjusted by controlling the relative position of the first lifting plate 110 and the second lifting plate 111, thereby adjusting the height of the nozzle 205. At the same time, the sliding block 203 can slide on the surface of the limiting shaft 202, driving the sliding plate 204 and the nozzle 205 to move horizontally, realizing flexible adjustment of the position of the nozzle 205 to adapt to wafer cassettes and wafer baskets of different sizes and shapes. After adjusting the position of the nozzle 205, the cleaning fluid is sprayed from the water tank 207 through the water pipe 206 and through the through hole of the nozzle 205 to rinse the wafer cassette and wafer basket. The lifting action of the second lifting block 114 is driven by a linkage mechanism composed of the first connecting shaft 3, the first movable plate 301105, the movable shaft 302, the second movable plate 303, and the second connecting shaft 304, which drives the push plate 305 to move accordingly. The movable block 403 at the bottom of the push plate 305 can slide on the surface of the roller 402, so that the push plate 305... The movement is smoother and more stable. During the cleaning process, the push plate 305 can push the wafer box and wafer basket to move, so that all parts of them can be rinsed by the cleaning fluid, avoiding cleaning dead corners. The wastewater generated during the cleaning process flows down through multiple through holes on the top of the cleaning plate 5 and flows into the water collection tank 502 through the support column 501. The stabilizing plate 503 at the bottom of the water collection tank 502 is fixedly connected to the base 101 to ensure that the water collection tank 502 is placed stably. The collected wastewater can be centrally treated to prevent wastewater from flowing randomly and causing environmental pollution.

[0034] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of this utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed utility model.

Claims

1. A wafer basket cleaning device, comprising a base plate (1); characterized in that: The top of the base plate (1) has a groove, and a base (101) is fixedly connected to the groove. Fixing plates (102) are fixedly connected to both sides of the base (101). A support plate is fixedly connected to the side of the fixing plate (102) away from the base (101). A load-bearing plate (103) is fixedly connected to the top of the support plate. A first fixing shaft (104) is fixedly connected to the top of the load-bearing plate (103). A movable plate (105) is movably connected to the surface of the first fixing shaft (104). A second fixing shaft (106) is movably connected to the end of the movable plate (105) away from the first fixing shaft (104). A first protective plate (107) is fixedly connected to one side of the second fixing shaft (106). A protective block is fixedly connected to one side of the first protective plate (107). A second protective plate (108) is fixedly connected to the side of the protective block away from the first protective plate (107). A support block (109) is fixedly connected to the side of the second protective plate (108) away from the protective block. A first lifting plate (110) is fixedly connected to the top of the support block (109). A second lifting plate (111) is sleeved on the top of the first lifting plate (110). A horizontal plate (112) is fixedly connected to one side of the second lifting plate (111). A first lifting block (113) and a second lifting block (114) are fixedly connected to one side of the first lifting plate (110) and the second lifting plate (111), respectively. A first lifting rod (115) is fixedly connected to the top of the first lifting block (113). A second lifting rod (116) is sleeved on the top of the first lifting rod (115).

2. The wafer cassette and wafer basket cleaning equipment according to claim 1, characterized in that: A connecting plate (2) is fixedly connected to one side of the first lifting plate (110). A connecting block (201) is fixedly connected to the side of the connecting plate (2) away from the first lifting plate (110). A sliding groove is provided on one side of the connecting block (201). A limiting shaft (202) is fixedly connected in the sliding groove. A sliding block (203) is slidably connected to the surface of the limiting shaft (202). A sliding plate (204) is fixedly connected to the sliding block (203). A nozzle (205) is fixedly connected to one side of the sliding plate (204). A through hole is provided at the top of the nozzle (205). A water supply pipe (206) is fixedly connected to the through hole. A water tank (207) is fixedly connected to the end of the water supply pipe (206) away from the nozzle (205). The water tank (207) is fixedly connected to the side of the sliding plate (204) away from the nozzle (205).

3. The wafer cassette and wafer basket cleaning equipment according to claim 2, characterized in that: A first connecting shaft (3) is fixedly connected to one side of the second lifting block (114). A first movable plate (301) (105) is movably connected to the surface of the first connecting shaft (3). A movable shaft (302) is movably connected to the end of the first movable plate (301) (105) away from the connecting shaft. A second movable plate (303) (105) is movably connected to the surface of the movable shaft (302). A second connecting shaft (304) is movably connected to the end of the second movable plate (303) (105) away from the movable shaft (302). A push plate (305) is fixedly connected to one side of the second connecting shaft (304).

4. The wafer cassette and wafer basket cleaning equipment according to claim 3, characterized in that: The bottom of the push plate (305) is provided with a pad plate (4), and the top of the pad plate (4) is fixedly connected with a pad block (401). The top of the pad block (401) is provided with a sliding groove, and a roller (402) is fixedly connected in the sliding groove. A moving block (403) is sleeved on the surface of the roller (402), and the top of the moving block (403) is fixedly connected to the second connecting shaft (304).

5. The wafer cassette and wafer basket cleaning equipment according to claim 4, characterized in that: The bottom of the pad (4) is fixedly connected to a cleaning plate (5), the top of the cleaning plate (5) is provided with multiple through holes, the bottom of the cleaning plate (5) is fixedly connected to a support column (501), and the bottom of the support column (501) is fixedly connected to a water collection tank (502).

6. The wafer cassette and wafer basket cleaning equipment according to claim 5, characterized in that: A stabilizing plate (503) is fixedly connected to the bottom of the water collection tank (502), and the stabilizing plate (503) is fixedly connected to the top of the base (101).

7. The wafer cassette and wafer basket cleaning equipment according to claim 6, characterized in that: The first movable plate (301) (105) and the second movable plate (303) (105) are symmetrically distributed through the first connecting axis (3).

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