A transverse etching apparatus for ultrathin glass

By designing a lateral etching device for ultra-thin glass, and employing an etching limiting structure and rack and pinion clamping technology, the problem of low efficiency in existing glass etching tooling has been solved, achieving high-efficiency etching and high-yield glass production.

CN224280094UActive Publication Date: 2026-05-26WUHU DONGXIN PHOTOELECTRIC TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
WUHU DONGXIN PHOTOELECTRIC TECH CO LTD
Filing Date
2025-05-30
Publication Date
2026-05-26

AI Technical Summary

Technical Problem

Existing glass etching fixtures are inefficient and prone to producing defective products.

Method used

Design a transverse etching device for ultrathin glass, employing an etching limiting structure including a first limiting bracket, a second limiting bracket, and a third limiting bracket. The device uses a rack and a locking interface to engage the glass edge, preventing glass displacement and supporting the bottom of the glass during etching to avoid the pattern area from being suspended and breaking.

Benefits of technology

It improved glass production efficiency and yield, optimized etching effect, reduced defect rate, and increased production efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

This utility model belongs to the field of ultra-thin glass etching technology. Specifically, it relates to a transverse etching device for ultra-thin glass. The transverse etching device includes a fixed base with an etching limiting structure. A locking interface on a first rack is used to engage one edge of the glass, a locking interface on a third rack is used to engage the other edge of the glass, and a locking interface on a second rack is used to engage the bottom edge of the glass, preventing displacement of the glass during etching. The arranged locking interfaces allow for the interleaved arrangement of ultra-thin glass pieces, enabling simultaneous etching of multiple pieces, improving production efficiency, optimizing the etching effect, and reducing the defect rate.
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Description

Technical Field

[0001] This utility model belongs to the field of ultra-thin glass etching technology. Specifically, this utility model relates to a transverse etching device for ultra-thin glass. Background Technology

[0002] In modern high-tech fields such as electronic information and optoelectronic displays, ultra-thin glass, with its lightweight, thinness, high light transmittance, and strong flexibility, is widely used in the manufacture of products such as smartphone screens, flat panel displays, and flexible electronic devices. Among these, etching, as a key technology for imparting specific patterns and functional structures to ultra-thin glass, directly affects the performance and quality of the final product due to its processing precision and efficiency. Existing glass etching fixtures are inefficient, and defective products are prone to occur.

[0003] Chinese Patent (Publication No.: 220502924U) discloses a glass-etched basket structure. The upper component of the basket has multiple upper slots (1) on its inner side, and the lower component has multiple lower slots (2) on its inner side. Side limiting members (3) are provided on the sides of both the upper and lower components. Multiple limiting slots (4) are provided inside the side limiting members (3). Each limiting slot (4) is connected to an upper slot (1) at its upper part and to a lower slot (2) at its lower part. However, the glass-etched basket has low production efficiency, and defective products are prone to occur. Utility Model Content

[0004] This utility model is designed to solve the above-mentioned problems and aims to provide a transverse etching device for ultra-thin glass, which can improve glass production efficiency and glass yield. To achieve the above objective, the technical solution adopted by this utility model is as follows: a transverse etching device for ultra-thin glass, including a fixed base, wherein an etching limiting structure is provided on the fixed base.

[0005] The etching limiting structure includes a first limiting bracket, a second limiting bracket, and a third limiting bracket. The fixing base has a first cavity. The first limiting bracket and the third limiting bracket are arranged horizontally and parallel to each other in the first cavity, and the second limiting bracket is arranged vertically in the first cavity.

[0006] The first limiting bracket includes a first limiting plate with a first rack; the second limiting bracket includes a second limiting plate with a second rack; and the third limiting bracket includes a third limiting plate with a third rack.

[0007] The fixed base includes a base plate, on which a first fixed plate and a second fixed plate are provided, and a first limiting bracket, a second limiting bracket and a third limiting bracket are disposed between the first fixed plate and the second fixed plate.

[0008] A reinforcing rod is provided between the first fixing plate and the second fixing plate.

[0009] Both the first fixing plate and the second fixing plate have sliding grooves, and both ends of the first limiting plate are located in the sliding grooves.

[0010] Both the first fixing plate and the second fixing plate have weight reduction holes.

[0011] The first limiting bracket, the second limiting bracket, and the third limiting bracket are symmetrically arranged around the central axis of the base plate.

[0012] The technical advantages of this invention are as follows: The locking interface on the first rack is used to lock one edge of the glass, the locking interface on the third rack is used to lock the other edge of the glass, and the locking interface on the second rack is used to lock the bottom edge of the glass, preventing displacement of the glass during etching. Simultaneously, the arranged locking interfaces ensure that the ultra-thin glass pieces are spaced apart, preventing adhesion. During etching, because there is a pattern in the middle of the product, the second limiting plate and the second rack support the bottom of the glass, preventing the patterned area from being suspended during spraying, thus reducing the risk of breakage. This device can etch multiple glasses simultaneously, improving production efficiency, optimizing the etching effect, reducing the defect rate, and enhancing overall production efficiency. Attached Figure Description

[0013] This manual includes the following figures, which illustrate the following:

[0014] Figure 1 This is an overall structural diagram of a transverse etching device for ultra-thin glass according to the present invention.

[0015] The markings in the diagram are as follows: 1. Fixing base; 101. First cavity; 102. Base plate; 103. First fixing plate; 104. Second fixing plate; 2. Etched limiting structure; 21. First limiting bracket; 211. First limiting plate; 212. First rack; 22. Second limiting bracket; 221. Second limiting plate; 222. Second rack; 23. Third limiting bracket; 231. Third limiting plate; 232. Third rack; 3. Slide groove; 4. Weight reduction hole; 5. Reinforcing rod. Detailed Implementation

[0016] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings, in order to help those skilled in the art to have a more complete, accurate and in-depth understanding of the inventive concept and technical solution of the present invention, and to facilitate its implementation.

[0017] like Figure 1As shown, a lateral etching apparatus for ultra-thin glass includes a mounting base 1 with an etching limiting structure 2. The mounting base 1 serves as the basic support structure for the entire etching apparatus, and the first cavity 101 inside the mounting base 1 provides installation space for the etching limiting structure 2. Ultra-thin glass is placed on the etching limiting structure 2, which separates multiple pieces of glass during etching, preventing them from sticking together. By changing the placement of the glass, the etching effect is optimized, the defect rate is reduced, and production efficiency is improved. The reduced size of the mounting base 1 addresses the problem of insufficient cleaning capacity and severe contamination after etching due to tooling size limitations. This solves the problem of using small-piece processing technology in the production of ultra-thin flexible glass, improving production efficiency.

[0018] The etching limiting structure 2 includes a first limiting bracket 21, a second limiting bracket 22 and a third limiting bracket 23. The fixing base 1 is provided with a first cavity 101. The first limiting bracket 21 and the third limiting bracket 23 are arranged horizontally and parallel to each other in the first cavity 101, and the second limiting bracket 22 is arranged vertically in the first cavity 101. The first limiting bracket 21 and the third limiting bracket 23 are arranged laterally within the first cavity 101 and are parallel to each other. The first limiting bracket 21 and the third limiting bracket 23 are arranged in pairs, and multiple sets are arranged in parallel within the first cavity 101. This allows for the simultaneous etching of multiple pieces of glass, improving production efficiency and product processing efficiency. The third limiting bracket 23 is located at the bottom of the first cavity 101. During the etching of flexible glass, the flexible glass is located between the first limiting bracket 21 and the third limiting bracket 23. One side of the flexible glass abuts against the first limiting bracket 21, and the other side of the flexible glass abuts against the third limiting bracket 23. The third limiting bracket 23 supports and limits the bottom of the flexible glass, ensuring that the glass does not shift during the etching process and guaranteeing the accuracy of the etching position.

[0019] The first limiting bracket 21 includes a first limiting plate 211, on which a first rack 212 is provided. The first limiting plate 211 is the main body of the first limiting bracket 21 and is used to connect the first rack 212. The second limiting bracket 22 includes a second limiting plate 221, on which a second rack 222 is provided. The second limiting plate 221 is the main body of the second limiting bracket 22 and is used to connect the second rack 222. The third limiting bracket 23 includes a third limiting plate 231, on which a third rack 232 is provided. The third limiting plate 231 is the main body of the third limiting bracket 23. The third limiting plate 231 is used to connect the third rack 232. The first rack 212, second rack 222, and third rack 232 all have arranged locking interfaces. These interfaces can engage the edges of the ultra-thin glass. The locking interface on the first rack 212 engages one edge of the glass, the locking interface on the third rack 232 engages the other edge of the glass, and the locking interface on the second rack 222 engages the bottom edge of the glass, preventing displacement during etching. The arranged locking interfaces also allow the ultra-thin glass pieces to be spaced apart, preventing adhesion. During etching, because the product has a pattern in the middle, the patterned area is very prone to cracking when sprayed with etching solution. The second limiting plate 221 and the second rack 222 support the bottom of the glass, preventing the patterned area from being suspended during spraying and increasing the risk of cracking.

[0020] The mounting base 1 includes a base plate 102, on which a first fixing plate 103 and a second fixing plate 104 are disposed. A first limiting bracket 21 and a second limiting bracket 22 are disposed between the first fixing plate 103 and the second fixing plate 104. The first fixing plate 103 and the second fixing plate 104 are vertically bolted to the base plate 102. The first fixing plate 103 and the second fixing plate 104 are arranged in parallel and there is a certain distance between them. The space formed between the first fixing plate 103 and the second fixing plate 104 is the first cavity 101. The first fixing plate 103 and the second fixing plate 104 provide installation positions for the first limiting bracket 21 and the second limiting bracket 22. A third limiting bracket 23 is bolted to the base plate 102.

[0021] A reinforcing rod 5 is provided between the first fixing plate 103 and the second fixing plate 104. One end of the reinforcing rod 5 is bolted to the first fixing plate 103, and the other end of the reinforcing rod 5 is bolted to the second fixing plate 104. The reinforcing rod 5 can fix the first fixing plate 103 and the second fixing plate 104, prevent the first fixing plate 103 and the second fixing plate 104 from tilting, and at the same time ensure the parallelism of the first fixing plate 103 and the second fixing plate 104.

[0022] Both the first fixing plate 103 and the second fixing plate 104 have sliding grooves 3, and both ends of the first limiting plate 211 are located within the sliding grooves 3. The sliding grooves 3 are provided on the first fixing plate 103 and the second fixing plate 104, and the sliding grooves 3 cooperate with the first limiting plate 211. The first limiting plate 211 can move within the sliding grooves 3. By adjusting the distance of the first limiting plate 211, the distance between the first rack 212 and the third rack 232 can be changed to accommodate glass of different sizes.

[0023] Both the first fixing plate 103 and the second fixing plate 104 are provided with weight-reducing holes 4. The weight-reducing holes 4 can reduce the weight of the first fixing plate 103 and the second fixing plate 104, thus saving materials.

[0024] The first limiting bracket 21, the second limiting bracket 22, and the third limiting bracket 23 are symmetrically arranged around the central axis of the base plate 102. By symmetrically arranging the first limiting bracket 21, the second limiting bracket 22, and the third limiting bracket 23, the space utilization rate can be maximized.

[0025] The role and effect of the embodiments

[0026] The locking interface on the first rack 212 is used to lock the glass to one edge, the locking interface on the third rack 232 is used to lock the glass to the other edge, and the locking interface on the second rack 222 is used to lock the bottom edge of the glass, preventing displacement of the glass during etching. The arranged locking interfaces also ensure spacing between the ultra-thin glass pieces, preventing adhesion. During etching, because the product has a pattern in the middle, the patterned area is very prone to cracking when sprayed with etching solution. The second limiting plate 221 and the second rack 222 support the bottom of the glass, preventing the patterned area from being suspended during spraying, thus reducing the risk of cracking. This device can etch multiple glasses simultaneously, improving production efficiency, optimizing the etching effect, reducing defect rates, and enhancing overall production efficiency.

[0027] The present invention has been described above by way of example with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvements made using the inventive concept and technical solution of the present invention; or the direct application of the inventive concept and technical solution to other situations without modification, are all within the protection scope of the present invention.

Claims

1. A transverse etching apparatus for ultrathin glass, characterized in that, It includes a fixing base (1), on which an etching limiting structure (2) is provided.

2. The transverse etching apparatus for ultrathin glass according to claim 1, characterized in that: The etching limiting structure (2) includes a first limiting bracket (21), a second limiting bracket (22) and a third limiting bracket (23). The fixing base (1) is provided with a first cavity (101). The first limiting bracket (21) and the third limiting bracket (23) are arranged horizontally parallel in the first cavity (101), and the second limiting bracket (22) is arranged vertically in the first cavity (101).

3. The transverse etching apparatus for ultrathin glass according to claim 2, characterized in that: The first limiting bracket (21) includes a first limiting plate (211) and a first rack (212) is provided on the first limiting plate (211). The second limiting bracket (22) includes a second limiting plate (221) and a second rack (222) is provided on the second limiting plate (221). The third limiting bracket (23) includes a third limiting plate (231) and a third rack (232) is provided on the third limiting plate (231).

4. The transverse etching apparatus for ultrathin glass according to claim 3, characterized in that: The fixed base (1) includes a base plate (102), on which a first fixed plate (103) and a second fixed plate (104) are provided. The first limiting bracket (21), the second limiting bracket (22) and the third limiting bracket (23) are disposed between the first fixed plate (103) and the second fixed plate (104).

5. The transverse etching apparatus for ultrathin glass according to claim 4, characterized in that: A reinforcing rod (5) is provided between the first fixing plate (103) and the second fixing plate (104).

6. The transverse etching apparatus for ultrathin glass according to claim 4, characterized in that: Both the first fixing plate (103) and the second fixing plate (104) have grooves (3), and both ends of the first limiting plate (211) are located in the grooves (3).

7. The transverse etching apparatus for ultrathin glass according to claim 4, characterized in that: The first fixing plate (103) and the second fixing plate (104) are both provided with weight reduction holes (4).

8. The transverse etching apparatus for ultrathin glass according to claim 2, characterized in that: The first limiting bracket (21), the second limiting bracket (22) and the third limiting bracket (23) are symmetrically arranged about the central axis of the base plate (102).