Coating apparatus and coating equipment

By employing a spatial coating method and a coating device with real-time control of reactive gas spraying, the problems of low coating efficiency and high cost have been solved, achieving efficient and low-cost thin film deposition.

CN224280441UActive Publication Date: 2026-05-26拉普拉斯(西安)科技有限责任公司

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
拉普拉斯(西安)科技有限责任公司
Filing Date
2025-05-26
Publication Date
2026-05-26

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Abstract

This application relates to the fields of photovoltaic and semiconductor technology, and more particularly to a coating apparatus and equipment to solve the problems of low coating efficiency and high coating cost in coating devices. The coating apparatus includes a process chamber, a conveying component, multiple sets of reactive gas jetting components, and a detection component. The process chamber is configured to provide coating space, the conveying component is configured to continuously convey the product during the coating process, and the multiple sets of reactive gas jetting components are arranged in the process chamber sequentially along the conveying direction of the conveying component. The detection component is located in the process chamber and is configured to detect the position of the product conveyed by the conveying component. Some reactive gas jetting components are activated based on the product being in the corresponding position, while the remaining reactive gas jetting components are deactivated. This coating apparatus replaces the method of coating products using time-controlled reactive gas jetting components, thereby improving coating efficiency and reducing coating costs.
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Description

Technical Field

[0001] This application relates to the fields of photovoltaic and semiconductor technology, and in particular to a coating apparatus and coating equipment. Background Technology

[0002] With the development of the photovoltaic and semiconductor integrated circuit industries, electronic devices are becoming increasingly miniaturized and integrated. Silicon wafers, as the substrate for manufacturing photovoltaic and semiconductor components, typically undergo texturing, diffusion, laser scanning, etching, coating, printing, sintering, and testing processes. Because the micro- and nano-structures in photovoltaic and semiconductor components are extremely small, coating equipment must precisely control the coating thickness and uniformity when coating the substrate.

[0003] Currently, in coating equipment, the substrate remains stationary during coating. The equipment uses a time-controlled reactive gas jetting component to spray reactive gases onto the substrate. To ensure the required film thickness and uniformity on the substrate surface, coating equipment typically uses a long gas spraying time, resulting in long coating times, low coating efficiency, and high coating costs. Utility Model Content

[0004] In view of this, embodiments of this application provide a coating apparatus and a coating equipment to solve the problems of low coating efficiency and high coating cost of the coating apparatus.

[0005] In a first aspect, one embodiment of this application provides a coating apparatus, comprising: a process chamber configured to provide a coating space; a conveying assembly at least partially disposed in the process chamber, the conveying assembly being configured to convey a product; multiple sets of reactive gas jetting assemblies disposed in the process chamber and sequentially arranged along the conveying direction of the conveying assembly, the reactive gas jetting assemblies being configured to spray reactive gas onto the product conveyed by the conveying assembly; and a detection assembly disposed in the process chamber, the detection assembly being configured to detect the position of the product conveyed by the conveying assembly; wherein, some of the reactive gas jetting assemblies are activated based on the product being at a corresponding position, and the remaining reactive gas jetting assemblies are deactivated.

[0006] In conjunction with the first aspect, in some implementations of the first aspect, a plurality of detection positions are spaced apart within the process chamber along the conveying direction of the conveying assembly; wherein, the detection assembly includes: a plurality of detection elements, at least one of the detection elements being disposed at the detection position, and the detection element being configured to detect whether the product has reached the corresponding detection position.

[0007] In conjunction with the first aspect, in some implementations of the first aspect, the coating apparatus further includes: a plurality of isolation gas jetting assemblies disposed in the process chamber and between adjacent reaction gas jetting assemblies, wherein the isolation gas jetting assemblies are configured to isolate the reaction gas sprayed by the adjacent reaction gas jetting assemblies and to clean the product; wherein, when the detection assembly detects the position of the product conveyed by the conveying assembly, the isolation gas jetting assembly corresponding to the position of the product is activated, and the remaining isolation gas jetting assemblies are deactivated.

[0008] In conjunction with the first aspect, in some implementations of the first aspect, the reaction gas jet assembly includes a precursor gas jet structure and an oxygen source jet structure, which are arranged sequentially along the conveying direction of the conveying assembly; wherein, the isolation gas jet assembly is further disposed between the precursor gas jet structure and the oxygen source jet structure, and the isolation gas jet assembly is further configured to isolate the gases sprayed by the precursor gas jet structure and the oxygen source jet structure respectively.

[0009] In conjunction with the first aspect, in some implementations of the first aspect, the isolation gas jet assembly includes at least one isolation gas jet structure; the coating apparatus further includes: a plurality of suction assemblies disposed in the process chamber, and the suction assemblies are respectively disposed on both sides of the conveying direction of the conveying assembly by the precursor gas jet structure, the oxygen source jet structure and the isolation gas jet structure.

[0010] In conjunction with the first aspect, in some implementations of the first aspect, the coating apparatus further includes: a plurality of partitions disposed in the process chamber and disposed between the extraction component and the precursor gas jet structure, between the extraction component and the oxygen source jet structure, and between the extraction component and the isolation gas jet structure.

[0011] In conjunction with the first aspect, in some implementations of the first aspect, the coating apparatus further includes: a plurality of flow meters, respectively connected to the precursor gas jet structure, the oxygen source jet structure and the isolation gas jet structure.

[0012] In conjunction with the first aspect, in some implementations of the first aspect, multiple sets of the reaction gas jetting assemblies are arranged at equal intervals along the conveying direction of the conveying assembly.

[0013] Secondly, one embodiment of this application provides a coating apparatus, comprising: the coating device mentioned in the first aspect, configured to coat a product; a feeding device connected to the coating device, the feeding device being configured to convey the product to the coating device; and a discharging device connected to the coating device, the discharging device being configured to receive the coated product.

[0014] In conjunction with the second aspect, in some implementations of the second aspect, the feeding device is further configured to clean the product and convey the cleaned product to the coating apparatus; and / or, the discharging device is further configured to cool the coated product; and / or, the coating apparatus further includes: a preheating device disposed between the feeding device and the coating apparatus, wherein the feeding device conveys the product to the preheating device so that the preheating device preheats the product, and the preheating device conveys the preheated product to the coating apparatus.

[0015] The coating apparatus provided in this application uses a conveying component to continuously convey products, so that the products move continuously along the conveying direction of the conveying component. Multi-layer coating is achieved during the movement of the products. That is, this application uses a spatial coating method to replace the time-based coating method of related technologies, which improves coating efficiency and reduces coating cost.

[0016] In addition, this application uses a detection component to detect the position of the product being transported by the conveying component, and activates the reaction gas jetting component corresponding to the product's position in a timely manner, so that the reaction gas jetting component sprays reaction gas onto the product at the corresponding position, or shuts off the reaction gas jetting component corresponding to the position where the product is not, thereby saving reaction gas and further reducing coating costs. Attached Figure Description

[0017] The above and other objects, features, and advantages of this application will become more apparent from the more detailed description of the embodiments of this application in conjunction with the accompanying drawings. The drawings are provided to further illustrate the embodiments of this application and form part of the specification. They are used together with the embodiments of this application to explain this application and do not constitute a limitation thereof. In the drawings, the same reference numerals generally represent the same components or steps.

[0018] Figure 1 The diagram shown is a structural schematic of a coating apparatus and product provided in an embodiment of this application.

[0019] Figure 2 The diagram shown is a structural schematic of a coating apparatus and product provided in another embodiment of this application.

[0020] Figure 3 The diagram shown is a structural schematic of a coating apparatus and product provided in another embodiment of this application.

[0021] Figure 4 The diagram shown is a structural schematic of a coating apparatus and product provided in another embodiment of this application.

[0022] Figure 5 The diagram shown is a structural schematic of a coating apparatus provided in an embodiment of this application.

[0023] Figure 6 As shown Figure 5 The enlarged view of the coating apparatus shown in region A.

[0024] Figure 7 The diagram shown is a structural schematic of a coating apparatus provided in an embodiment of this application.

[0025] Figure 8 The diagram shown is a structural schematic of a feeding device, a carrier, and a product provided in an embodiment of this application.

[0026] Figure 9 The diagram shown is a structural schematic of the discharge device, carrier, and product provided in an embodiment of this application.

[0027] Figure 10 The diagram shown is a structural schematic of a preheating device, a carrier, and a product provided in an embodiment of this application.

[0028] Figure label:

[0029] 1. Coating equipment; 10. Coating apparatus; 100. Process chamber; 1001. Coating space; 101. Detection position; 200. Conveying assembly; 210. Roller structure; 300. Reaction gas jet assembly; 310. Precursor gas jet structure; 320. Oxygen source jet structure; 400. Detection assembly; 410. Detection piece; 500. Isolation gas jet assembly; 510. Isolation gas jet structure; 600. Evacuation assembly; 700. Partition plate; 800. Flow meter; 900. Supporting component; 901. First end of the supporting component; 902. Second end of the supporting component; 1000. First heating assembly; 1100. First heating element; 1200. First homogenizing element; 13 00. Electric valve; 1400. Check valve; 1500. Pneumatic valve; X1. First horizontal direction; 20. Feeding device; 201. Feeding conveying assembly; 202. Feeding exhaust assembly; 203. Cleaning assembly; 2031. Plasma power supply; 2032. Plasma generator; 30. Discharge device; 301. Discharge conveying assembly; 302. Cooling assembly; 3021. Cooling medium conveying pipeline; 3022. Cooling medium channel; 303. Discharge exhaust assembly; 40. Preheating device; 401. Preheating conveying assembly; 402. Second heating assembly; 4021. Second heating element; 4022. Second uniform heating element; 403. Preheating exhaust assembly; 2. Product. Detailed Implementation

[0030] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0031] Figure 1 The diagram shown is a structural schematic of a coating apparatus and product provided in an embodiment of this application. Figure 1 As shown, the coating apparatus 10 includes a process chamber 100, a conveying assembly 200, multiple sets of reactive gas jetting assemblies 300, and a detection assembly 400. The process chamber 100 is configured to provide a coating space 1001. At least a portion of the conveying assembly 200 is disposed in the process chamber 100, and the conveying assembly 200 is configured to convey the product 2. Multiple sets of reactive gas jetting assemblies 300 are disposed in the process chamber 100, arranged sequentially along the conveying direction of the conveying assembly 200, and the reactive gas jetting assemblies 300 are configured to spray reactive gases onto the product 2 conveyed by the conveying assembly 200. The detection assembly 400 is disposed in the process chamber 100, and the detection assembly 400 is configured to detect the position of the product 2 conveyed by the conveying assembly 200. Some of the reactive gas jetting assemblies 300 are activated based on the product 2 being in the corresponding position, and the remaining reactive gas jetting assemblies 300 are deactivated.

[0032] The coating apparatus 10 uses the conveying component 200 to continuously convey the product 2, so that the product 2 moves continuously along the conveying direction of the conveying component 200. During the movement of the product 2, multi-layer coating is achieved. That is, the coating apparatus 10 adopts a spatial coating method instead of the time-based coating method of related technologies, which improves the coating efficiency and reduces the coating cost.

[0033] In addition, the coating apparatus 10 uses the detection component 400 to detect the position of the product 2 conveyed by the conveying component 200, and then activates the reaction gas jetting component 300 corresponding to the position of the product 2 in a timely manner, so that the reaction gas jetting component 300 sprays reaction gas onto the product 2 at the corresponding position, or shuts off the reaction gas jetting component 300 corresponding to the position where the product 2 is not, thereby saving reaction gas and further reducing the coating cost.

[0034] For example, the coating apparatus 10 further includes a carrier 900, which is configured to carry the product 2. The conveying assembly 200 conveys the carrier 900 carrying the product 2 along the conveying direction to achieve the conveying of the product 2. As a carrier platform, the carrier 900 can stably carry the product 2, ensuring the conveying stability of the product 2 by the conveying assembly 200, and avoiding poor coating uniformity of the product 2 due to shaking or displacement of the product 2 during the coating process of the coating apparatus 10.

[0035] In addition, during the process of the conveying assembly 200 conveying the carrier 900 carrying the product 2 along the conveying direction, the detection assembly 400 can detect the position of the first end 901 of the carrier to turn on the reaction gas jet assembly 300 corresponding to the position of the first end 901 of the carrier, and turn off the remaining reaction gas jet assembly 300, thereby realizing the timely switching on and off of the reaction gas required for coating.

[0036] In addition, the carrier 900 can be used in conjunction with an automated conveying device to automatically and stably transfer the product 2 between different types of coating devices, thereby improving the coating efficiency and coating quality of the product 2 by each coating device.

[0037] For example, the cross-sectional shape of the support member 900 can be rectangular, parallelogram, trapezoidal, other polygonal, or irregular. The shape and size of the support member 900 can be set according to actual production needs to adapt to products 2 of different sizes and shapes.

[0038] For example, the carrier 900 may have functions such as clamping, snapping or adsorption to further ensure that the carrier 900 can stably carry the product 2, thereby further preventing the product 2 from shaking or shifting on the carrier 900 during the process of the conveying assembly 200 conveying the product 2.

[0039] For example, product 2 can be a silicon wafer, a solar cell, a crystal wafer, a glass substrate, etc. For example, the cross-sectional shape of product 2 can be rectangular, parallelogram, trapezoidal, other polygonal, or irregular.

[0040] For example, the conveying component 200 may be a structure such as a motor or conveyor belt, or a linear module structure, or a roller structure, etc.

[0041] For example, multiple sets of reactive gas jetting assemblies 300 are disposed at the top of the process chamber 100. The product 2 conveyed by the conveying assembly 200 passes under the reactive gas jetting assemblies 300, and the upper surface of the product 2 is the surface to be coated. This allows the reactive gas sprayed downward by the reactive gas jetting assemblies 300 to come into more direct contact with the surface to be coated of the product 2, thereby further improving the coating efficiency and coating uniformity of the coating apparatus 10 on the product 2.

[0042] In some embodiments, such as Figure 2 As shown, multiple detection positions 101 are spaced apart within the process chamber 100 along the conveying direction of the conveying assembly 200. The detection assembly 400 includes multiple detection elements 410, with at least one detection element 410 disposed at each detection position 101, i.e., at least one detection element 410 is disposed at each detection position 101. The detection element 410 is configured to detect whether the product 2 has reached the corresponding detection position 101.

[0043] By using multiple detectors 410 to detect whether the product 2 has reached the corresponding detection position 101 of each detector 410 and providing feedback, the reactive gas jet assembly 300 corresponding to each of the multiple detection positions 101 can be turned on or off more promptly, which further improves the accuracy of the position detection of the product 2 and reduces the coating cost.

[0044] For example, the detection element 410 is a sensor, which can be a slotted photoelectric sensor, a through-beam photoelectric sensor, an electromagnetic sensor, etc.

[0045] For example, multiple detectors 410 detect whether the first end 901 of the carrier has reached its respective detection position 101. When the first end 901 of the carrier sequentially reaches the detection position 101 of each detector 410 along the conveying direction of the conveying assembly 200, the reaction gas jetting assembly 300 corresponding to each detector 410 is sequentially activated, and the activated reaction gas jetting assembly 300 remains activated, so that during the process of the conveying assembly 200 conveying the carrier 900 carrying the product 2, each activated reaction gas jetting assembly 300 sequentially sprays reaction gas onto the product 2 at its respective detection position 101. At the same time, during the process of the conveying assembly 200 conveying the carrier 900, if each detector 410 detects that there is no carrier 900 at its respective detection position 101, the reaction gas jetting assembly 300 corresponding to each detector 410 is deactivated.

[0046] The number of detection pieces 410 and reaction gas jet assembly 300 can be set according to actual production needs. When all detection pieces 410 of the coating device 10 detect that there is no carrier 900 at their respective detection positions 101, the coating process is completed and the conveying assembly 200 stops operating.

[0047] For example, such as Figure 2 As shown, the first horizontal direction X1 is the conveying direction of the conveying assembly 200. Four detection positions 101 are spaced apart along the first horizontal direction X1 within the process chamber 100, and a first detection element 410, a second detection element 410, a third detection element 410, and a fourth detection element 410 are sequentially spaced apart along the first horizontal direction X1. Each detection element 410 corresponds to one detection position 101 and one set of reactive gas jetting assemblies 300. That is, the first detection element 410 corresponds to the first detection position 101 and the first set of reactive gas jetting assemblies 300, the second detection element 410 corresponds to the second detection position 101 and the second set of reactive gas jetting assemblies 300, the third detection element 410 corresponds to the third detection position 101 and the third set of reactive gas jetting assemblies 300, and the fourth detection element 410 corresponds to the fourth detection position 101 and the fourth set of reactive gas jetting assemblies 300.

[0048] During the continuous conveying of the carrier 900 by the conveying assembly 200 along the first horizontal direction X1, and when the first detection element 410 detects that the first end 901 of the carrier has reached the first detection position 101, the first set of reactive gas jetting assemblies 300 is activated. As the first end 901 of the carrier moves from the first detection position 101 to the second detection position 101, the first set of reactive gas jetting assemblies 300 continuously sprays reactive gas onto the product 2 located between the first and second detection positions 101. When the second detection element 410 detects that the first end 901 of the carrier has reached the second detection position 101, the second set of reactive gas jetting assemblies 300 is activated. As the first end 901 of the carrier moves from the second detection position 101 to the third detection position 101, the first set of reactive gas jetting assemblies 300 continuously sprays reactive gas onto the product 2 located between the first and second detection positions 101, and the second set of reactive gas jetting assemblies 300 continuously sprays reactive gas onto the product 2 located between the second and third detection positions 101. When the third detection element 410 detects that the first end 901 of the carrier has reached the third detection position 101, the third set of reaction gas jetting components 300 is activated. During the process of the first end 901 of the carrier moving from the third detection position 101 to the fourth detection position 101, the first set of reaction gas jetting components 300 continuously sprays reaction gas onto the product 2 between the first detection position 101 and the second detection position 101, the second set of reaction gas jetting components 300 continuously sprays reaction gas onto the product 2 between the second detection position 101 and the third detection position 101, and the third set of reaction gas jetting components 300 continuously sprays reaction gas onto the product 2 between the third detection position 101 and the fourth detection position 101. When the fourth detection element 410 detects that the first end 901 of the carrier has reached the fourth detection position 101, the fourth group of reactive gas jetting components 300 is activated. As the first end 901 of the carrier continues to move along the first horizontal direction X1 from the fourth detection position 101, the first group of reactive gas jetting components 300 continuously sprays reactive gas onto the product 2 between the first and second detection positions 101, the second group of reactive gas jetting components 300 continuously sprays reactive gas onto the product 2 between the second and third detection positions 101, the third group of reactive gas jetting components 300 continuously sprays reactive gas onto the product 2 between the third and fourth detection positions 101, and the fourth group of reactive gas jetting components 300 continuously sprays reactive gas onto the product 2 between the fourth detection position 101 and within the spraying range of the fourth group of reactive gas jetting components 300.

[0049] Simultaneously, during the continuous conveying of the carrier 900 by the conveying assembly 200 along the first horizontal direction X1, the first group of reactive gas jetting assemblies 300 shuts down when the first detection element 410 detects that there is no carrier 900 at the first detection position 101; the second group of reactive gas jetting assemblies 300 shuts down when the second detection element 410 detects that there is no carrier 900 at the second detection position 101; the third group of reactive gas jetting assemblies 300 shuts down when the third detection element 410 detects that there is no carrier 900 at the third detection position 101; and the fourth group of reactive gas jetting assemblies 300 shuts down when the fourth detection element 410 detects that there is no carrier 900 at the fourth detection position 101. When the second end 902 of the carrier moves between the first detection position 101 and the second detection position 101, the first group of reactive gas jetting assemblies 300 is turned off; when the second end 902 of the carrier moves between the second detection position 101 and the third detection position 101, the second group of reactive gas jetting assemblies 300 is turned off; when the second end 902 of the carrier moves between the third detection position 101 and the fourth detection position 101, the third group of reactive gas jetting assemblies 300 is turned off; when the second end 902 of the carrier moves to the fourth detection position 101 or later, the fourth group of reactive gas jetting assemblies 300 is turned off.

[0050] In some embodiments, such as Figure 3 As shown, the coating apparatus 10 also includes a plurality of isolation gas jetting assemblies 500. The plurality of isolation gas jetting assemblies 500 are disposed in the process chamber 100 and between adjacent reaction gas jetting assemblies 300. The isolation gas jetting assemblies 500 are configured to isolate the reaction gases sprayed by adjacent reaction gas jetting assemblies 300 and to clean the product 2. When the detection assembly 400 detects the position of the product 2 being conveyed by the conveying assembly 200, the isolation gas jetting assembly 500 corresponding to the position of the product 2 is activated, and the remaining isolation gas jetting assemblies 500 are deactivated.

[0051] The detection component 400 can work in conjunction with the isolation gas jetting component 500. The isolation gas sprayed by the isolation gas jetting component 500 isolates the reactive gas sprayed by the adjacent reactive gas jetting component 300, preventing different reactive gases from mixing and generating gas-phase reactions. This avoids impurity particles generated by gas-phase reactions adhering to the surface of product 2, thus reducing the coating quality of product 2. Furthermore, the isolation gas sprayed by the isolation gas jetting component 500 cleans product 2, ensuring the cleanliness of its surface and improving the coating quality of product 2 by the coating apparatus 10.

[0052] In addition, the isolation gas can dilute the reaction gas, allowing the reaction gas to be distributed more evenly within the process chamber 100, thereby improving the uniformity of the coating on product 2.

[0053] For example, the isolation gas is a chemically stable gas to ensure that it does not react chemically with the reactant gas or reaction products. For example, the isolation gas may be argon (Ar). r ), Helium (H) e Helium (N2) and other gases include nitrogen (N2). Helium has a smaller atomic mass and a faster diffusion rate, enabling rapid diffusion of reactive gases. Argon and nitrogen are less expensive and more widely used. The appropriate type of isolation gas can be selected based on actual production needs.

[0054] Currently, atomic layer deposition (ALD) technology is widely used in coating processes in the photovoltaic and semiconductor technology fields. As a precision thin film deposition technique, ALD technology can accurately control the film thickness and uniformity. ALD technology enables the deposition of thin films layer by layer on the surface of a substrate with single-atom-layer precision. The ALD coating process is as follows: First, a gaseous precursor is introduced into the process chamber and brought into contact with the substrate surface. Precursor molecules undergo chemisorption on the substrate surface until all active sites on the substrate surface are occupied by precursor molecules. Then, a purge gas, such as nitrogen, is used to purge excess unreacted gaseous precursor and reaction byproducts, ensuring that only a single layer of precursor molecules adheres to the substrate surface. Subsequently, another reactive gas is introduced into the process chamber, where it reacts chemically with the single-layer precursor adhering to the substrate surface to form the desired compound film. Finally, a purge gas is used again to purge excess unreacted other reactive gas and reaction byproducts. Each completion of the above cycle forms a thin film of a certain thickness on the surface of the substrate. Repeating the cycle yields a thin film of several atomic layers.

[0055] In related technologies, ALD (Alternating Current Deposition) devices maintain a static state within the substrate during coating. The ALD device uses a time-controlled reactive gas jetting assembly to spray reactive gases onto the substrate. To ensure sufficient adsorption of precursor molecules onto the substrate surface and adequate chemical reaction between the reactive gas and the adsorbed precursor, thereby achieving the required thickness and uniformity of the resulting compound film, ALD devices typically employ long gas introduction and purging times. This results in prolonged single-layer coating times, leading to an overall long coating time for the substrate, reducing coating efficiency, and increasing coating costs.

[0056] In addition, since the substrate remains stationary in the ALD device during coating, the concentration of reactant gas in the process chamber of the ALD device near the gas inlet is usually greater than that in the area far from the gas inlet. Therefore, the uniformity of reactant gas distribution in the process chamber of the ALD device is poor, resulting in poor coating uniformity.

[0057] In addition, the ALD device of the related technology adopts a tubular structure, which is complex and has high manufacturing cost.

[0058] The coating apparatus 10 provided in this application embodiment can replace the ALD device of the related technology, and adopts a spatial coating method instead of the ALD device of the related technology. The method of coating the product by spraying the reaction gas through the time-controlled reaction gas jet assembly improves the coating efficiency and reduces the coating cost.

[0059] Furthermore, multiple sets of reactive gas jetting assemblies 300 are installed within the process chamber 100 of the coating apparatus 10, and these assemblies 300 are arranged sequentially along the conveying direction of the conveying assembly 200. By spraying reactive gases into the process chamber 100 using these multiple reactive gas jetting assemblies 300, the uniformity of the reactive gas distribution within the process chamber 100 is further improved, thereby further enhancing the coating uniformity of the coating apparatus 10 on the product 2.

[0060] In addition, when an isolation gas jet assembly 500 is provided between adjacent reaction gas jet assemblies 300, the isolation gas sprayed by the isolation gas jet assembly 500 can dilute the reaction gas, so that the reaction gas can be more evenly distributed in the process chamber 100, thereby further improving the coating uniformity of the coating apparatus 10 on the product 2.

[0061] In addition, the coating apparatus 10 of this application adopts a plate structure, which is more compact, simple, easy to operate and maintain, and reduces the manufacturing cost and maintenance cost of the coating apparatus 10.

[0062] In some embodiments, such as Figures 4 to 6 As shown, the reaction gas jet assembly 300 includes a precursor gas jet structure 310 and an oxygen source jet structure 320. The precursor gas jet structure 310 and the oxygen source jet structure 320 are arranged sequentially along the conveying direction of the conveying assembly 200. An isolation gas jet assembly 500 is also disposed between the precursor gas jet structure 310 and the oxygen source jet structure 320, and the isolation gas jet assembly 500 is further configured to isolate the gases sprayed by the precursor gas jet structure 310 and the oxygen source jet structure 320 respectively.

[0063] The isolation gas sprayed by the isolation gas jet assembly 500 isolates the gases sprayed by the precursor gas jet structure 310 and the oxygen source jet structure 320, respectively, to prevent the precursor gas sprayed by the precursor gas jet structure 310 from mixing with the gas sprayed by the oxygen source jet structure 320 and generating a gas phase reaction. This is to prevent impurity particles generated by the gas phase reaction from adhering to the surface of the product 2 and reducing the coating quality of the product 2.

[0064] In addition, the isolation gas can dilute the precursor gas sprayed by the precursor gas jet structure 310 and the gas sprayed by the oxygen source jet structure 320, so that the reaction gas can be more evenly distributed in the process chamber 100, thereby improving the coating uniformity of the product 2.

[0065] For example, the precursor gas provided by the precursor gas jet structure 310 can be a gaseous metal compound. For example, titanium tetrachloride (T1) i Cl4), trimethylaluminum (Al(CH3)3), etc. Exemplarily, the gas sprayed by the oxygen source jet structure 320 can be oxygen (O2) or ozone (O3). Oxygen or ozone can provide oxygen atoms, which react with the metal compounds attached to the surface of product 2 to form a metal oxide film. Ozone has a stronger oxidizing ability than oxygen, and can achieve a more efficient oxidation reaction with the precursors attached to the surface of product 2 at a lower temperature.

[0066] Furthermore, when the precursor gas provided by the precursor gas jet structure 310 is a gaseous metal compound, the metal compound is relatively sensitive to air and water. It typically needs to be transported under the protection of a chemically stable gas to prevent hydrolysis or oxidation and loss of activity. Therefore, the isolation gas sprayed by the isolation gas jet assembly 500 also provides protection for the transport of the precursor gas.

[0067] For example, in some ALD processes, a reducing gas, such as hydrogen (H2), is introduced into the process chamber 100 along with a precursor gas. Hydrogen can react with some metal precursors, such as copper, to reduce metal ions to metal atoms, thereby forming a metal film on the surface of product 2.

[0068] For example, such as Figure 5 and Figure 6 As shown, at least one isolation gas jet assembly 500 is provided on the side of the first precursor gas jet structure 310 away from the adjacent oxygen source jet structure 320, so as to ensure that the product 2 is cleaned by at least one isolation gas jet assembly 500 before reaching the first detection position 101 corresponding to the first precursor gas jet structure 310, so as to ensure that the surface of the product 2 has a better cleanliness before being coated, thereby further improving the coating quality of the coating device 10 on the product 2.

[0069] For example, at least one isolation gas jet assembly 500 is provided on the side of the last oxygen source jet structure 320 away from the adjacent precursor gas jet structure 310, so as to ensure that after the product 2 is coated with the last thin film, it is cleaned by at least one isolation gas jet assembly 500, so as to ensure that the surface of the coated product 2 has a good cleanliness.

[0070] For example, such as Figure 5 and Figure 6 As shown, the conveying assembly 200 includes a plurality of roller structures 210, which are spaced apart along the conveying direction of the conveying assembly 200. Each roller structure 210 carries a carrier 900, and during rolling, the roller structure 210 conveys the carrier 900 along the conveying direction of the conveying assembly 200. For example, the roller structure 210 can roll at a preset rolling speed to stably convey the carrier 900 at the preset speed.

[0071] In some embodiments, such as Figure 5 and Figure 6 As shown, the isolation gas jet assembly 500 includes at least one isolation gas jet structure 510. The coating apparatus 10 also includes a plurality of suction assemblies 600, which are disposed in the process chamber 100, and each of the precursor gas jet structure 310, oxygen source jet structure 320 and isolation gas jet structure 510 has a suction assembly 600 disposed on both sides of the conveying direction of the conveying assembly 200.

[0072] For example, such as Figure 6 As shown, the isolation gas jet assembly 500 includes an isolation gas jet structure 510. An extraction assembly 600 is disposed between adjacent isolation gas jet assemblies 500 to remove excess isolation gas. An extraction assembly 600 is disposed between adjacent isolation gas jet assemblies 500 and the precursor gas jet structure 310 to remove excess isolation gas and excess precursor gas. An extraction assembly 600 is disposed between adjacent isolation gas jet assemblies 500 and the oxygen source jet structure 320 to remove excess isolation gas, excess oxygen or ozone, and reaction byproducts. The extraction assembly 600 removes excess reaction gases and reaction byproducts from the process chamber 100 to ensure the cleanliness of the process environment within the process chamber 100 and to facilitate the introduction of new reaction gases.

[0073] For example, the pumping assembly 600 may be a turbomolecular pump, a Roots pump, a diaphragm pump, etc. For example, multiple pumping assemblies 600 are connected to a vacuum system to maintain the pressure within the process chamber 100 within the pressure range required by the process while the pumping assemblies 600 extract excess gas from the process chamber 100.

[0074] In some embodiments, such as Figure 5 and Figure 6 As shown, the coating apparatus 10 also includes a plurality of partitions 700. The plurality of partitions 700 are disposed in the process chamber 100, and are disposed between the suction assembly 600 and the precursor gas jet structure 310, between the suction assembly 600 and the oxygen source jet structure 320, and between the suction assembly 600 and the isolation gas jet structure 510.

[0075] The baffle 700 isolates the gases sprayed by different jet structures, further preventing the precursor gas from mixing with the oxygen source gas and causing a gas-phase reaction. This also prevents impurity particles generated by the gas-phase reaction from adhering to the surface of product 2, thus reducing the coating quality of product 2. Furthermore, the baffles 700 on both sides of each jet structure guide the gas sprayed by each jet structure, allowing the gas to flow along a specific path to the surface of product 2. This further improves the uniformity of the distribution of precursor gas and oxygen source gas near the surface of product 2, and further enhances the coating uniformity of product 2 by the coating apparatus 10.

[0076] For example, the partition 700 is vertically arranged, and the partition 700 is provided with a guide groove or guide hole to guide the gas sprayed by the corresponding jet structure to form a uniform airflow, so as to further improve the uniformity of the distribution of the precursor gas and oxygen source gas near the surface of the product 2, thereby further improving the coating uniformity of the coating device 10 on the product 2.

[0077] In some embodiments, such as Figure 5 and Figure 6 As shown, the coating apparatus 10 also includes multiple flow meters 800. The multiple flow meters 800 are respectively connected to the precursor gas jet structure 310, the oxygen source jet structure 320, and the isolation gas jet structure 510.

[0078] Depending on the different process requirements and stages, the flow rate of the gas sprayed by the corresponding jet structure is adjusted using a flow meter 800.

[0079] For example, before product 2 enters the first detection position 101 corresponding to the first precursor gas jet structure 310, the flow meters 800 corresponding to the two isolation gas jet structures 510 preceding the first precursor gas jet structure 310 control their respective isolation gas jet structures 510 to spray a larger flow rate of isolation gas, so that the isolation gas can quickly and effectively clean the surface of product 2. For example, the flow meter 800 corresponding to the isolation gas jet structure 510 located between the precursor gas jet structure 310 and the oxygen source jet structure 320 controls the corresponding isolation gas jet structure 510 to spray a smaller flow rate of isolation gas, so that the smaller flow rate of isolation gas purges excess precursor gas or oxygen source gas, thus preventing the larger flow rate of isolation gas from purging away a large amount of precursor gas or oxygen source gas and affecting the coating quality of product 2. For example, during the cleaning stage, the isolation gas jet structure 510 responsible for cleaning product 2 continuously sprays a large flow rate of isolation gas to clean product 2. During the coating stage, the isolation gas jet structure 510, located between the precursor gas jet structure 310 and the oxygen source jet structure 320, periodically sprays a small flow rate of isolation gas to isolate and dilute the precursor gas or oxygen source gas, and to purge excess precursor gas, oxygen source gas or reaction byproducts.

[0080] For example, the flow meter 800 may be a differential pressure flow meter, a volumetric flow meter, etc. For example, the flow meter 800 has sealing and corrosion resistance to meet the sealed delivery requirements of different types of gases. For example, the material of the internal structure of the flow meter 800 that comes into contact with the gas may be stainless steel, polytetrafluoroethylene, etc.

[0081] The gas path connection methods between multiple precursor gas jet structures 310, multiple oxygen source jet structures 320, and multiple isolation gas jet structures 510 can be set according to actual needs.

[0082] For example, the coating apparatus 10 includes a main precursor gas path, a main oxygen source gas path, and a main isolation gas path. The main precursor gas path connects to multiple sub-precursor gas paths, the main oxygen source gas path connects to multiple sub-oxygen source gas paths, and the main isolation gas path connects to multiple sub-isolation gas paths. The multiple main precursor gas paths are respectively connected to multiple precursor gas jet structures 310, the multiple sub-oxygen source gas paths are respectively connected to multiple oxygen source jet structures 320, and the multiple sub-isolation gas paths are respectively connected to multiple isolation gas jet structures 510. A flow meter 800 is installed on each sub-precursor gas path, each sub-oxygen source gas path, and each sub-isolation gas path. A gas path valve 1500 is installed on each sub-precursor gas path, each sub-oxygen source gas path, and each sub-isolation gas path. The gas path valve 1500 can open or close according to feedback from the corresponding detection element 410, so that each sub-gas path can be opened or closed individually.

[0083] For example, an electric valve 1300 is installed at the end of the main precursor gas path near the precursor gas inlet, the end of the main oxygen source gas path near the oxygen source inlet, and the end of the main isolation gas path near the isolation gas inlet. The electric valve 1300 can automatically open or close the corresponding main gas path. A one-way valve 1400 is installed on the side of the electric valve 1300 near the inlet. The one-way valve 1400 can prevent gas from flowing back to the gas supply device connected to the inlet, thus avoiding contamination of the gas in the gas supply device.

[0084] In some embodiments, such as Figures 1 to 6 As shown, multiple sets of reactive gas jetting assemblies 300 are arranged at equal intervals along the conveying direction of the conveying assembly 200.

[0085] Each reactive gas jet assembly 300 sprays reactive gas that can form a thin film on the surface of product 2. Multiple reactive gas jet assemblies 300 are arranged at equal intervals along the conveying direction of conveying assembly 200, so as to achieve the uniform spraying of reactive gas by multiple reactive gas jet assemblies 300 in sequence, thereby improving the coating uniformity of coating device 10 on product 2.

[0086] For example, such as Figure 5 and Figure 6As shown, the coating apparatus 10 further includes a first heating component 1000, which is disposed in the process chamber 100 and extends along the conveying direction of the conveying component 200. The first heating component 1000 can heat the product 2 to the temperature required for the coating process, ensuring the smooth operation of the coating process. Exemplarily, the first heating component 1000 includes a first heating element 1100 and a first heat equalizing element 1200 connected to each other. Both the first heating element 1100 and the first heat equalizing element 1200 extend along the conveying direction of the conveying component 200. The first heating element 1100 is configured to provide heat, and the first heat equalizing element 1200 is disposed on the side of the first heating element 1100 near the conveying component 200 and is configured to transfer the heat provided by the first heating element 1100 to the product 2 conveyed by the conveying component 200.

[0087] The first heat-uniforming element 1200 can uniformly transfer the heat provided by the first heating element 1100 to the product 2 conveyed by the conveying assembly 200 through heat conduction and radiation, thereby improving the heating uniformity of the product 2 by the first heating assembly 1000. It also prevents the heat provided by the first heating assembly 1000 from being directly and rapidly transferred to the product 2, which could cause excessive temperature changes and generate thermal stress, leading to deformation or damage to the product 2. Furthermore, the first heat-uniforming element 1200 can reflect some of the heat provided by the first heating element 1100 to prevent excessive heat transfer to the product 2 and other structures near the first heating assembly 1000, thus avoiding damage to the product 2 and other structures. Additionally, the first heat-uniforming element 1200 can also reflect some of the heat located between the first heat-uniforming element 1200 and the conveying assembly 200, allowing the reflected heat to be redistributed to the product 2 conveyed by the conveying assembly 200, thereby reducing heat loss and improving heat utilization.

[0088] For example, the first heating component 1000 is disposed at the bottom of the process chamber 100. For example, the first heating element 1100 may be a heating wire, a heating plate, a heating rod, etc.

[0089] For example, the coating apparatus 10 also includes a chamber switching valve. When the chamber switching valve is closed, it isolates the process chamber 100 from the outside of the coating apparatus 10, keeping the process chamber 100 in a sealed state to ensure that the coating process of the coating apparatus 10 is not affected by external factors. Additionally, when the chamber switching valve is closed, it also prevents leakage of reactive gases from the process chamber 100, thus preventing harm to operators. Furthermore, after the coating process is completed, the chamber switching valve can automatically open to allow the coated product 2 to be transported out of the coating apparatus 10.

[0090] Figure 7 The diagram shown is a structural schematic of a coating apparatus provided in an embodiment of this application. Figure 8The diagram shown is a structural schematic of a feeding device, a carrier, and a product provided in an embodiment of this application. Figure 9 The diagram shown is a structural schematic of the discharge device, carrier, and product provided in an embodiment of this application. Figures 7 to 9 As shown, the coating equipment 1 includes the coating apparatus 10, feeding device 20, and discharging device 30 mentioned in the above embodiments. The coating apparatus 10 is configured to coat the product 2. The feeding device 20 is connected to the coating apparatus 10 and is configured to convey the product 2 to the coating apparatus 10. The discharging device 30 is connected to the coating apparatus 10 and is configured to receive the coated product 2.

[0091] For example, such as Figure 8 As shown, the feeding device 20 includes a feeding conveying assembly 201 and a feeding degassing assembly 202. The feeding conveying assembly 201 is configured to convey a carrier 900 carrying an uncoated product 2, thereby conveying the uncoated product 2. The feeding degassing assembly 202 is configured to extract gas from within the feeding device 20. Exemplarily, the feeding degassing assembly 202 is connected to a vacuum system to maintain the pressure within the feeding device 20 within a desired pressure range while extracting excess gas. Exemplarily, Figure 8 The feed conveying assembly 201 shown includes a plurality of roller structures spaced apart along the conveying direction of the feed conveying assembly 201.

[0092] For example, such as Figure 9 As shown, the discharge device 30 includes a discharge conveying assembly 301. The discharge conveying assembly 301 is configured to receive a carrier 900 carrying the coated product 2, for conveying the coated product 2. Exemplarily, Figure 9 The discharge conveying assembly 301 shown includes a plurality of roller structures spaced apart along the conveying direction of the discharge conveying assembly 301.

[0093] In some embodiments, such as Figure 8 As shown, the feeding device 20 is further configured to clean the product 2 and convey the cleaned product 2 to the coating device 10.

[0094] For example, such as Figure 8 As shown, the feeding device 20 also includes a cleaning component 203, which is configured to clean the uncoated product 2 conveyed by the feeding conveying component 201.

[0095] For example, the cleaning assembly 203 uses plasma cleaning to clean the uncoated product 2 conveyed by the feeding and conveying assembly 201. For example, the cleaning assembly 203 includes a plasma power supply 2031 and multiple plasma generators 2032. The plasma power supply 2031 is located outside the feeding device 20. The plasma power supply 2031 can control the energy and density of the plasma by adjusting parameters such as output power and frequency to meet different cleaning requirements. Multiple plasma generators 2032 are arranged at intervals along the conveying direction of the feeding and conveying assembly 201 and are all electrically connected to the plasma power supply 2031. The plasma generators 2032 are configured to ionize the plasma gas source to generate plasma, which chemically reacts with impurities on the product 2 to achieve cleaning of the product 2. A suitable type of plasma gas source can be selected according to the actual cleaning needs.

[0096] In some embodiments, such as Figure 9 As shown, the discharge device 30 is further configured to cool the coated product 2.

[0097] During the coating process, the temperature of product 2 will rise. After coating, the unloading device 30 is used to cool the coated product 2, so that the temperature of the coated product 2 can be reduced more quickly. This avoids thermal stress caused by excessively high temperature of the coated product 2, which could lead to defects such as cracks. In addition, the unloading device 30 is used to cool the coated product 2 so that its temperature can be quickly reduced to the temperature of the next process, facilitating the next processing of product 2.

[0098] For example, such as Figure 9 As shown, the discharge device 30 also includes a cooling assembly 302 and a discharge degassing assembly 303. Exemplarily, the cooling assembly 302 includes a cooling medium delivery pipe 3021 and a cooling medium channel 3022 that are interconnected. The cooling medium channel 3022 is connected to a cooling medium supply device and is configured to deliver cooling medium to the cooling medium delivery pipe 3021. The cooling medium delivery pipe 3021 is disposed within the discharge device 30 and extends along the delivery direction of the discharge conveying assembly 301, and is configured to introduce cooling medium into the interior of the discharge device 30 to cool the coated product 2 conveyed by the discharge conveying assembly 301. The discharge degassing assembly 303 is configured to extract gas from within the discharge device 30. Exemplarily, the discharge degassing assembly 303 is connected to a vacuum system to maintain the pressure within the discharge device 30 within a required pressure range while extracting excess gas from the discharge device 30.

[0099] For example, such as Figure 9As shown, the two cooling components 302 are respectively positioned above and below the discharge conveying component 301, which improves the cooling efficiency of the coated product 2.

[0100] For example, the cooling medium can be air, nitrogen, etc.

[0101] In some embodiments, such as Figure 7 and Figure 10 As shown, the coating equipment 1 also includes a preheating device 40. The preheating device 40 is located between the feeding device 20 and the coating equipment 10. The feeding device 20 conveys the product 2 to the preheating device 40 so that the preheating device 40 preheats the product 2. The preheating device 40 then conveys the preheated product 2 to the coating equipment 10.

[0102] The uncoated product 2 is preheated by the preheating device 40, which raises the temperature of the uncoated product 2. After the preheated uncoated product 2 is transported to the coating device 10, the first heating component 1000 of the coating device 10 can quickly heat the uncoated product 2 to the temperature required for the coating process, shortening the heating time of the uncoated product 2 by the coating device 10 and improving the heating efficiency, thereby further improving the coating efficiency of the coating device 10.

[0103] For example, such as Figure 10 As shown, the preheating device 40 includes a preheating conveying assembly 401, a second heating assembly 402, and a preheating extraction assembly 403. The preheating conveying assembly 401 is configured to receive a carrier 900 carrying a cleaned, uncoated product 2, for conveying the cleaned, uncoated product 2. Exemplarily, Figure 10 The preheating conveying assembly 401 shown includes a plurality of roller structures spaced apart along the conveying direction of the preheating conveying assembly 401. The second heating assembly 402 includes a second heating element 4021 and a second heat equalizing element 4022 interconnected. Both the second heating element 4021 and the second heat equalizing element 4022 extend along the conveying direction of the preheating conveying assembly 401. The second heating element 4021 is configured to provide heat, and the second heat equalizing element 4022 is disposed on the side of the second heating element 4021 near the preheating conveying assembly 401 and configured to transfer the heat provided by the second heating element 4021 to the product 2 conveyed by the preheating conveying assembly 401. The preheating vacuum assembly 403 is configured to extract excess gas from the preheating device 40. Exemplarily, the preheating vacuum assembly 403 is connected to a vacuum system to maintain the pressure within the preheating device 40 within a desired pressure range while the preheating vacuum assembly 403 extracts excess gas from the preheating device 400.

[0104] For example, two second heating components 402 are respectively disposed above and below the preheating conveying component 401, jointly heating the product 2 conveyed by the preheating conveying component 401, thereby improving the preheating efficiency of the preheating device 40 for the product 2. The beneficial effects of the second heat equalizer 4022 are the same as those of the first heat equalizer 1200, and will not be described again here. For example, the second heating component 4021 can be a heating wire, a heating plate, or a heating rod, etc.

[0105] Exemplarily, the coating equipment 1 also includes a quality inspection device, which is arranged adjacent to the discharge device 30 and configured to inspect the quality of the cooled coated product 2 to determine whether the coated product 2 is qualified or unqualified. Exemplarily, the quality inspection device can inspect the thickness, uniformity, adhesion, optical properties, etc., of the thin film on the surface of the product 2. Exemplarily, the quality inspection device includes a polarimeter, which is used to measure the thickness and refractive index of the thin film and to assist in analyzing the results of scratch tests to evaluate the adhesion of the thin film.

[0106] In the embodiments of this disclosure, unless otherwise specified, the connection can be a detachable connection using bolts, nuts, screws, clips, magnets, etc. In some connections where there is no particular requirement for a detachable fit, a non-detachable connection can be achieved through welding, bonding, etc.

[0107] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.

[0108] The block diagrams of devices, apparatuses, devices, and systems involved in this application are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.

[0109] It should also be noted that in the apparatus, equipment, and methods of this application, the components or steps can be disassembled and / or recombined. These disassemblies and / or recombinations should be considered as equivalent solutions of this application.

[0110] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use this application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein can be applied to other aspects without departing from the scope of this application. Therefore, this application is not intended to be limited to the aspects shown herein, but rather to be accorded the widest scope consistent with the principles and novel features disclosed herein.

[0111] The above description has been given for purposes of illustration and description. Furthermore, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations thereof.

Claims

1. A coating apparatus, characterized in that, include: The process chamber is configured to provide a coating space; A conveying assembly, at least partially disposed in the process chamber, is configured to convey products; Multiple sets of reactive gas jetting assemblies are disposed in the process chamber and arranged sequentially along the conveying direction of the conveying assembly. The reactive gas jetting assemblies are configured to spray reactive gas onto the product conveyed by the conveying assembly. A detection component is disposed in the process chamber, and the detection component is configured to detect the position of the product conveyed by the conveying component; Some of the reactive gas jetting components are activated based on the product being in the corresponding position, while the remaining reactive gas jetting components are deactivated.

2. The coating apparatus according to claim 1, characterized in that, Multiple detection positions are spaced apart along the conveying direction of the conveying assembly within the process chamber; The detection component includes: Multiple detection elements, at least one of the detection elements is disposed at the detection position, and the detection element is configured to detect whether the product has reached the corresponding detection position.

3. The coating apparatus according to claim 1, characterized in that, Also includes: Multiple isolation gas jetting assemblies are disposed in the process chamber and between adjacent reaction gas jetting assemblies. The isolation gas jetting assemblies are configured to isolate the reaction gases sprayed by the adjacent reaction gas jetting assemblies and to clean the product. Specifically, when the detection component detects the position of the product being transported by the conveying component, the isolation gas jetting component corresponding to the position of the product is activated, and the remaining isolation gas jetting components are deactivated.

4. The coating apparatus according to claim 3, characterized in that, The reactive gas jetting assembly includes a precursor gas jetting structure and an oxygen source jetting structure, which are arranged sequentially along the conveying direction of the conveying assembly. The isolation gas jet assembly is further disposed between the precursor gas jet structure and the oxygen source jet structure, and is further configured to isolate the gases sprayed by the precursor gas jet structure and the oxygen source jet structure respectively.

5. The coating apparatus according to claim 4, characterized in that, The isolation gas jet assembly includes at least one isolation gas jet structure; The coating apparatus further includes: Multiple extraction components are disposed in the process chamber, and the extraction components are respectively disposed on both sides of the conveying direction of the conveying component by the precursor gas jet structure, the oxygen source jet structure and the isolation gas jet structure.

6. The coating apparatus according to claim 5, characterized in that, Also includes: Multiple baffles are disposed in the process chamber, and are disposed between the extraction assembly and the precursor gas jet structure, between the extraction assembly and the oxygen source jet structure, and between the extraction assembly and the isolation gas jet structure.

7. The coating apparatus according to claim 5 or 6, characterized in that, Also includes: Multiple flow meters are respectively connected to the precursor gas jet structure, the oxygen source jet structure, and the isolation gas jet structure.

8. The coating apparatus according to any one of claims 1 to 6, characterized in that, Multiple sets of the reaction gas jetting assemblies are arranged at equal intervals along the conveying direction of the conveying assembly.

9. A coating equipment, characterized in that, include: The coating apparatus according to any one of claims 1 to 8 is configured to coat a product; A feeding device, connected to the coating device, is configured to convey the product to the coating device; A discharge device is connected to the coating device, and the discharge device is configured to receive the coated product.

10. The coating equipment according to claim 9, characterized in that, The feeding device is further configured to clean the product and convey the cleaned product to the coating device; And / or, The discharge device is further configured to cool the coated product; And / or, The coating equipment also includes: A preheating device is disposed between the feeding device and the coating device. The feeding device conveys the product to the preheating device so that the preheating device preheats the product. The preheating device then conveys the preheated product to the coating device.