A reticle structure for a photolithography machine

Abstract

This utility model discloses a photomask structure for a lithography machine, relating to the field of lithography machine technology. The photomask structure includes a base, with lifting structures on both the front and rear sides of the upper end of the base. A placement frame is provided on the upper end of the two lifting structures. An expansion module is provided on both the front and rear sides of the placement frame. Connectors are provided at both ends of the two sets of expansion modules. Protective structures are symmetrically arranged on the outer sides of the two sets of connectors. An angle adjustment device is provided at the lower end of the placement frame. Support seats are provided at both the front and rear ends of the angle adjustment device. This solution addresses the problems of existing photomask structures, which are inconvenient to adjust when fixed to the lithography machine, and are not suitable for fixing wafers of different sizes, thus reducing the practicality of the photomask structure.

Description

Technical Field

[0001] This utility model relates to the field of lithography machine technology, specifically to a photomask structure for a lithography machine. Background Technology

[0002] Photomasks are an indispensable key component in semiconductor manufacturing, playing a crucial role, especially in photolithography. They are plates made of high-precision transparent material coated with an opaque metal layer, used to precisely project circuit patterns onto a silicon wafer. The photomask is used in a photolithography machine to transfer the pattern onto a photoresist layer, thus forming the circuit structure on the chip. With advancements in semiconductor technology, the precision of the photomask directly impacts chip performance and manufacturing efficiency. Photomasks ensure circuit precision in semiconductor manufacturing, improve production efficiency, and support advanced processes. They ensure the accurate transfer of circuit designs to the wafer surface, affecting chip functionality and performance. Photomasks enable the transfer of a large number of circuit patterns in a single photolithography process, reducing production time and costs. Photomask technology is fundamental to the production of advanced chips, supporting the manufacturing of high-performance chips such as those for smartphones, computers, data centers, and artificial intelligence chips.

[0003] A photomask assembly for wafer lithography, as disclosed in publication number CN221551065U, includes a mounting base and a mounting shell. The mounting shell is movably connected to the top of the mounting base. A slot extends through the front and rear sides of the mounting shell, and a photomask body is movably connected inside the slot. A light-transmitting plate is provided on the top of the mounting shell, and baffles are movably connected to both the front and rear sides of the slot. By placing the photomask body into the slot and connecting the baffles to the mounting shell, the photomask body is prevented from falling out of the mounting shell during use. The photomask body can be pushed out of the slot by removing the baffles. This facilitates disassembly of the photomask after it enters the mounting frame and provides convenience for subsequent use. By moving the connecting rods around the mounting base within the connecting cylinder, the mounting base is brought into contact with the inner wall of the lithography machine. The position of the connecting rods is fixed by pressing the limiting block, thus facilitating the fixation of the photomask assembly within the lithography machine.

[0004] The existing photomask structure, which is fixed to the lithography machine, is inconvenient to adjust during use, and it is also not convenient to fix wafers of different sizes, thus reducing the practicality of the photomask structure. Therefore, we propose a photomask structure for lithography machines to solve the problems mentioned above. Utility Model Content

[0005] The purpose of this invention is to provide a photomask structure for a lithography machine, in order to solve the problems mentioned in the background art, such as the inconvenience of adjusting existing photomask structures by fixing them on the lithography machine, and the inconvenience of fixing wafers of different sizes, which reduces the practicality of the photomask structure.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a photomask structure for a lithography machine, comprising a base, wherein lifting structures are provided on both the front and rear sides of the upper end of the base, and a placement frame is provided on the upper end of the two sets of lifting structures, wherein an expansion module is provided on both the front and rear sides of the placement frame, and a connector is provided at both ends of the two sets of expansion modules, and protective structures are symmetrically provided on the outer sides of the two sets of connectors on the left and right, and an angle adjustment device is provided at the lower end of the placement frame, wherein a support base is provided at both the front and rear ends of the angle adjustment device.

[0007] Preferably, the lifting structure includes a lifting column, a hydraulic cylinder, a fixing block, and guide columns. The hydraulic cylinder is located on the upper end of the base, and a fixing block is located on the upper end of the hydraulic cylinder. Two sets of guide columns are symmetrically arranged on the left and right sides of the hydraulic cylinder. The upper ends of the two sets of guide columns extend through and to the upper end of the fixing block. Two sets of lifting columns are symmetrically arranged on both sides of the two sets of guide columns. The upper end of the lifting column is bolted to the lower end of the fixing block.

[0008] Preferably, the expansion module includes a double-headed telescopic rod, adjustment buttons, and snap-fit ​​plates. Adjustment buttons are provided on the upper ends of both sides of the double-headed telescopic rod, and snap-fit ​​plates are provided at both ends of the double-headed telescopic rod. Both sets of snap-fit ​​plates are snap-fitted to two sets of connectors.

[0009] Preferably, the protective structure includes a buffer plate, a handle, and a buffer module. There are two sets of buffer modules, both of which are located inside the connector. A buffer plate is provided on the outside of each set of buffer modules, and a handle is provided on the outside of each set of buffer plates.

[0010] Preferably, the two sets of support seats include an upper cover, a support block, and bolts. The upper cover is disposed on the upper end of the support block and is bolted to the support block. The support blocks are all disposed on the upper end of the fixed block.

[0011] Preferably, the angle adjustment device includes a motor, a connecting rod, and a connecting block. The connecting block is located at the middle of the lower end of the placement frame. The connecting rod is installed inside the connecting block and is fixedly connected to the connecting block. Both ends of the connecting rod are located between the upper cover and the support block. The motor is installed at the front end of the connecting rod.

[0012] Preferably, two sets of snap-fit ​​modules are symmetrically arranged on the upper end of the placement rack and the upper end of the buffer plate, and a photomask is provided on the upper end of the snap-fit ​​module.

[0013] Compared with the prior art, the beneficial effects of this utility model are:

[0014] (1) This utility model has two sets of lifting structures symmetrically arranged on the front and rear sides of the base. By operating the two sets of hydraulic cylinders simultaneously, the height of the placement frame can be adjusted. With the angle adjustment device set at the lower end of the placement frame, the angle adjustment device is fixed to the upper end of the fixed block with two sets of support seats. The connecting rod is rotated by the motor, so the angle of the placement frame can be adjusted. This solves the problem that the existing photomask structure is inconvenient to adjust by fixing it on the photolithography machine.

[0015] (2) By symmetrically setting expansion modules on the front and rear sides of the placement rack, the size of the photomask can be adjusted by pressing the adjustment button and pulling the handle, so that photolithography can be performed on photomasks of different sizes at the same time. The buffer module and buffer plate in the protective structure play a buffering and protection role for the photomask, and also facilitate the placement and removal of the photomask. This solves the problem that the existing photomask structure is not convenient for fixing wafers of different sizes, which reduces the practicality of the photomask structure. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0017] Figure 2 This is a cross-sectional view of the extended module of this utility model;

[0018] Figure 3 This is a top view of the present invention;

[0019] Figure 4 This is a disassembled view of one side of the placement rack of this utility model;

[0020] In the diagram: 1. Base; 2. Lifting structure; 21. Lifting column; 22. Hydraulic cylinder; 23. Guide column; 3. Angle adjustment device; 31. Motor; 32. Connecting rod; 33. Connecting block; 4. Protective structure; 41. Buffer plate; 42. Handle; 43. Buffer module; 5. Placement rack; 6. Connector; 7. Expansion module; 71. Double-headed telescopic rod; 72. Adjustment button; 73. Clip plate; 8. Support base. Detailed Implementation

[0021] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0022] Please see Figure 1-4This utility model provides an embodiment of a photomask structure for a lithography machine, comprising a base 1. Lifting structures 2 are provided on both the front and rear sides of the upper end of the base 1. A placement frame 5 is provided on the upper end of each of the two lifting structures 2. An expansion module 7 is provided on both the front and rear sides of the placement frame 5. Connectors 6 are provided at both ends of each of the two sets of expansion modules 7. Protective structures 4 are symmetrically arranged on the outer sides of the two sets of connectors 6. An angle adjustment device 3 is provided at the lower end of the placement frame 5. Support seats 8 are provided at both the front and rear ends of the angle adjustment device 3. By symmetrically arranging two sets of lifting structures 2 on the front and rear sides of the base 1, and by simultaneously operating two sets of hydraulic cylinders 22, the height of the placement frame 5 can be adjusted. This, combined with the angle adjustment device 3 at the lower end of the placement frame 5, allows for height adjustment. Angle adjustment device 3, together with two sets of support seats 8, is fixed to the upper end of the fixed block. The connecting rod 32 is rotated by motor 31, thereby enabling the placement frame 5 to be angled. This solves the problem that existing photomask structures, which are fixed to the lithography machine, are inconvenient to adjust. By symmetrically setting expansion modules 7 on the front and rear sides of the placement frame 5, the size of the photomask can be adjusted by pressing the adjustment button 72 and pulling the handle 42. This allows for the simultaneous lithography process on photomasks of different sizes. The buffer module 43 and buffer plate 41 in the protective structure 4 provide buffer protection for the photomask and facilitate the placement and removal of the photomask. This solves the problem that existing photomask structures are not convenient for fixing wafers of different sizes, which reduces the practicality of the photomask structure.

[0023] Please see Figure 1 The lifting structure 2 includes a lifting column 21, a hydraulic cylinder 22, a fixing block, and guide columns 23. The hydraulic cylinder 22 is located on the upper end of the base 1, and a fixing block is located on the upper end of the hydraulic cylinder 22. Two sets of guide columns 23 are symmetrically arranged on the left and right sides of the hydraulic cylinder 22. The upper ends of the two sets of guide columns 23 extend through and to the upper end of the fixing block. Two sets of lifting columns 21 are symmetrically arranged on both sides of the two sets of guide columns 23. The upper end of the lifting column 21 is bolted to the lower end of the fixing block to adjust the height of the photomask.

[0024] Please see Figure 2 The expansion module 7 includes a double-headed telescopic rod 71, an adjustment button 72, and a snap-fit ​​plate 73. The upper ends of both sides of the double-headed telescopic rod 71 are provided with adjustment buttons 72, and the ends of both ends of the double-headed telescopic rod 71 are provided with snap-fit ​​plates 73. Both sets of snap-fit ​​plates 73 are snap-fitted to two sets of connectors 6, so that the placement rack 5 can place photomasks of different sizes.

[0025] Please see Figure 4The protective structure 4 includes a buffer plate 41, a handle 42, and a buffer module 43. There are two sets of buffer modules 43, both of which are located inside the connector 6. Buffer plates 41 are provided on the outside of both sets of buffer modules 43, and handles 42 are provided on the outside of both sets of buffer plates 41, which serve to protect the light cover.

[0026] Please see Figure 1 The two sets of support seats 8 include an upper cover, a support block and bolts. The upper cover is set on the upper end of the support block and is bolted to the support block. The support blocks are all set on the upper end of the fixed block and serve as the fixed angle adjustment device 3.

[0027] Please see Figure 1 The angle adjustment device 3 includes a motor 31, a connecting rod 32, and a connecting block 33. The connecting block 33 is located in the middle of the lower end of the placement frame 5. The connecting rod 32 is installed inside the connecting block 33 and is fixedly connected to the connecting block 33. The front and rear ends of the connecting rod 32 are located between the upper cover and the support block. The motor 31 is installed at the front end of the connecting rod 32, which enables the placement frame 5 to be angled.

[0028] Please see Figure 3 Two sets of snap-fit ​​modules are symmetrically arranged on the upper end of the placement frame 5 and the upper end of the buffer plate 41. A photomask is provided on the upper end of the snap-fit ​​module, which serves to fix the photomask.

[0029] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A photomask structure for a lithography machine, comprising a base (1), characterized in that: The base (1) is provided with lifting structures (2) on both the front and rear sides of the upper end. The two sets of lifting structures (2) are provided with a placement frame (5) on the upper end. The placement frame (5) is provided with an expansion module (7) on both the front and rear sides. The two sets of expansion modules (7) are provided with connectors (6) at both ends. The two sets of connectors (6) are symmetrically provided with protective structures (4) on the outer sides. The placement frame (5) is provided with an angle adjustment device (3) at the lower end. The angle adjustment device (3) is provided with a support base (8) at both the front and rear ends.

2. The photomask structure for a lithography machine according to claim 1, characterized in that: The lifting structure (2) includes a lifting column (21), a hydraulic cylinder (22), a fixing block, and a guide column (23). The hydraulic cylinder (22) is located on the upper end of the base (1). A fixing block is located on the upper end of the hydraulic cylinder (22). Two sets of guide columns (23) are symmetrically arranged on the left and right sides of the hydraulic cylinder (22). The upper ends of the two sets of guide columns (23) extend through and to the upper end of the fixing block. Two sets of lifting columns (21) are symmetrically arranged on both sides of the two sets of guide columns (23). The upper end of the lifting column (21) is bolted to the lower end of the fixing block.

3. The photomask structure for a lithography machine according to claim 2, characterized in that: The expansion module (7) includes a double-headed telescopic rod (71), an adjustment button (72), and a snap-fit ​​plate (73). The upper ends of both sides of the double-headed telescopic rod (71) are provided with adjustment buttons (72), and the ends of both ends of the double-headed telescopic rod (71) are provided with snap-fit ​​plates (73). Both sets of snap-fit ​​plates (73) are snap-fitted to two sets of connectors (6).

4. The photomask structure for a lithography machine according to claim 3, characterized in that: The protective structure (4) includes a buffer plate (41), a handle (42) and a buffer module (43). There are two sets of buffer modules (43), both of which are located inside the connector (6). A buffer plate (41) is provided on the outside of both sets of buffer modules (43), and a handle (42) is provided on the outside of both sets of buffer plates (41).

5. A photomask structure for a lithography machine according to claim 4, characterized in that: The two sets of support bases (8) include an upper cover, a support block and bolts. The upper cover is set on the upper end of the support block and is bolted to the support block. The support blocks are all set on the upper end of the fixed block.

6. A photomask structure for a lithography machine according to claim 5, characterized in that: The angle adjustment device (3) includes a motor (31), a connecting rod (32) and a connecting block (33). The connecting block (33) is located in the middle of the lower end of the placement frame (5). The connecting rod (32) is located inside the connecting block (33) and is fixedly connected to the connecting block (33). The front and rear ends of the connecting rod (32) are located between the upper cover and the support block. The motor (31) is located at the front end of the connecting rod (32).

7. A photomask structure for a lithography machine according to claim 6, characterized in that: Two sets of snap-fit ​​modules are symmetrically arranged on the upper end of the placement rack (5) and the upper end of the buffer plate (41), and a light cover is provided on the upper end of the snap-fit ​​module.

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