Leak-proof automatic production equipment for silicon-based copper / titanium selective etching solution

Abstract

The utility model discloses a kind of automatic production equipment of anti-leakage silicon-based copper / titanium selective etching solution, including kettle body and upper cover, the upper cover is equipped with feed pipe and stirring unit, the kettle body bottom is equipped with discharge pipe, kettle body middle part outside is equipped with mounting plate, the mounting plate below is equipped with bottom cover, the bottom cover wraps kettle body bottom, the bottom cover and mounting plate cooperation form containing cavity, the containing cavity is used to contain etching solution, the bottom cover bottom is equipped with drain, the bottom cover is integrally-formed structure;The utility model uses front bottom column and rear bottom plate cooperation, kettle body bottom is set to set bottom cover, so that the connecting place of discharge pipe and kettle body is also corroded, silicon-based copper / titanium selective etching solution can be collected, and etching solution is guided to discharge from drain, and etching solution cannot leak to equipment outside.

Description

Technical Field

[0001] This utility model relates to etching solution technology, specifically an automated production equipment for a leak-proof silicon-based copper / titanium selective etching solution. Background Technology

[0002] Selective etching solutions are chemical solutions used to preferentially etch a certain phase / component in a specific material or structure. They are widely used in metallographic analysis, semiconductor processing, materials research, and other fields. Among them, silicon-based copper / titanium selective etching solutions are mainly used to selectively remove copper (Cu) / titanium (Ti) from silicon (Si) substrates without corroding silicon. They are commonly used in semiconductor manufacturing or microelectronics processing.

[0003] The discharge pipe of existing reactors is often fixed to the reactor surface by welding. However, silicon-based copper / titanium selective etching solution is corrosive and can easily cause corrosion and leakage at the connection between the discharge pipe and the reactor body, resulting in poor sealing of the reactor and leakage of silicon-based copper / titanium selective etching solution. Utility Model Content

[0004] To address the shortcomings of the existing technology, this utility model provides an automatic production equipment for leak-proof silicon-based copper / titanium selective etching liquid. The bottom is equipped with an integrally molded bottom cover, which ensures that even if the connection between the discharge pipe and the reactor body is corroded, the silicon-based copper / titanium selective etching liquid can still be collected by the bottom cover and guided out.

[0005] To achieve the above technical objectives, this utility model adopts the following technical solution: an automatic production equipment for leak-proof silicon-based copper / titanium selective etching liquid, comprising a vessel body and a top cover, wherein the top cover is provided with a feed pipe and a stirring unit, the bottom of the vessel body is provided with a discharge pipe, an installation plate is provided on the outer side of the middle part of the vessel body, a bottom cover is provided below the installation plate, the bottom cover covers the bottom of the vessel body, the bottom cover and the installation plate cooperate to form a receiving cavity, the receiving cavity is used to contain the etching liquid, the bottom of the bottom cover is provided with a drain port, and the bottom cover is an integrally formed structure.

[0006] Preferably, the stirring unit includes a motor and a stirring shaft. The motor is fixed to the upper cover, the stirring shaft is located inside the vessel, the stirring shaft is connected to the output shaft of the motor, and the bottom end of the stirring shaft is provided with several stirring blades.

[0007] Preferably, the top of the vessel body and the outer periphery of the top cover are provided with fixed flanges, and the two fixed flanges are fixed by fixing bolts.

[0008] Preferably, the mounting plate is provided with mounting flanges on its outer periphery and the top of the bottom cover, and the two mounting flanges are fixed by mounting bolts.

[0009] Preferably, the bottom of the outer periphery of the mounting plate is chamfered.

[0010] Preferably, the top of the vessel is provided with a guide plate, which is located below the feed pipe and is inclined downward on the side of the vessel near the side wall.

[0011] Preferably, the upper cover is equipped with a negative pressure pump, and the air inlet of the negative pressure pump passes through the upper cover and the mounting plate respectively.

[0012] In summary, this utility model achieves the following technical effects:

[0013] This utility model relates to an automatic production equipment for leak-proof silicon-based copper / titanium selective etching liquid. The bottom of the vessel is equipped with a bottom cover, which allows the silicon-based copper / titanium selective etching liquid to be collected even if the connection between the discharge pipe and the vessel is corroded, and the etching liquid is guided to be discharged from the drain port, preventing the etching liquid from leaking outside the equipment. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the structure of the automatic production equipment for leak-proof silicon-based copper / titanium selective corrosion liquid of this utility model;

[0015] Figure 2 This is a schematic diagram of the internal structure of the automatic production equipment for leak-proof silicon-based copper / titanium selective corrosion liquid of this utility model;

[0016] Explanation of the markings on the attached drawings: 1. Kettle body; 2. Top cover; 3. Feed pipe; 4. Bottom cover; 5. Mounting plate; 6. Support leg; 7. Motor; 8. Negative pressure pump; 9. Stirring blade; 10. Mounting flange; 11. Drain port; 12. Discharge pipe; 13. Guide plate. Detailed Implementation

[0017] The present invention will be further described in detail below with reference to the accompanying drawings.

[0018] This specific embodiment is merely an explanation of the present utility model and is not intended to limit the present utility model. After reading this specification, those skilled in the art can make modifications to this embodiment without contributing any inventive step, but as long as they are within the scope of the claims of the present utility model, they are protected by patent law.

[0019] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0020] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0021] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0022] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0023] Example 1:

[0024] like Figure 1As shown in Figure 2, an automatic production equipment for leak-proof silicon-based copper / titanium selective etching solution includes a vessel body 1 and a top cover 2. The top cover 2 is provided with a feed pipe 3 and a stirring unit. The bottom of the vessel body 1 is provided with a discharge pipe. An installation plate 5 is provided on the outer side of the middle part of the vessel body 1. A bottom cover 4 is provided below the installation plate 5. The bottom cover 4 covers the bottom of the vessel body 1. The bottom cover 4 and the installation plate 5 cooperate to form a receiving cavity. The receiving cavity is used to contain the etching solution. A drain port 11 is provided at the bottom of the bottom cover 4. The bottom cover 4 is an integrally formed structure.

[0025] The bottom of the bottom cover 4 is conical, with the lowest point at the drain outlet 11. This allows the corrosive liquid to be quickly discharged from the bottom cover 4. The bottom cover 4 is a one-piece molded structure with greater strength. Support feet 6 are provided on all four sides of the bottom cover 4. The mounting plate 5 is located in the middle of the vessel body 1 to minimize contact between the mounting plate 5 and the two mounting flanges and the corrosive liquid, thus preventing corrosion and leakage.

[0026] The automatic production equipment for leak-proof silicon-based copper / titanium selective corrosion liquid of this utility model has a bottom cover 4 installed at the bottom of the vessel body 1. This allows the silicon-based copper / titanium selective corrosion liquid to be collected even if the connection between the discharge pipe and the vessel body 1 is corroded, and the corrosion liquid to be guided out from the drain port 11, so that the corrosion liquid will not leak outside the equipment.

[0027] The stirring unit includes a motor 7 and a stirring shaft. The motor 7 is fixed to the upper cover 2, and the stirring shaft is located inside the vessel body 1. The stirring shaft is connected to the output shaft of the motor 7. The bottom end of the stirring shaft is provided with several stirring blades 9. The motor 7 drives the stirring shaft to rotate, which in turn drives the stirring blades 9 to stir the liquid inside the vessel body 1, so that the various components of the corrosion solution are fully mixed to form the finished corrosion solution.

[0028] The top of the vessel body 1 and the outer periphery of the upper cover 2 are both provided with fixed flanges, and the two fixed flanges are fixed by fixed bolts; the outer periphery of the mounting plate 5 and the top of the bottom cover 4 are both provided with mounting flanges 10, and the two mounting flanges 10 are fixed by mounting bolts; the setting of fixed flanges and mounting flanges 10 can make the upper cover 2 and the vessel body 1, and the mounting plate 5 and the bottom cover 4 sealed together.

[0029] The bottom of the mounting plate 5 is chamfered; the chamfer allows the bottom cover 4 to be installed quickly and the two mounting flanges 10 to be precisely aligned.

[0030] The top of the vessel body 1 is provided with a guide plate 13, which is located below the feed pipe 3. The guide plate 13 is inclined downward on the side near the side wall of the vessel body 1. The guide plate 13 can guide the liquid flowing in from the feed pipe 3 to flow down along the inner wall of the vessel body 1, avoiding the liquid from falling directly into the vessel body 1 and causing splashing.

[0031] The upper cover 2 is equipped with a negative pressure pump 8, and the air inlet of the negative pressure pump 8 passes through the upper cover 2 and the mounting plate 5 respectively. The negative pressure pump 8 can provide a certain negative pressure to the vessel body 1 and the containment cavity, discharge the gas generated when the components of the corrosive liquid are mixed, and prevent the gas pressure inside the vessel body 1 from being too high.

[0032] The above description is merely a preferred embodiment of the present utility model and is not intended to limit the present utility model in any way. Any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present utility model shall fall within the scope of the technical solution of the present utility model.

Claims

1. An automated production line for a leak-proof silicon-based copper / titanium selective etching solution, characterized in that, The device includes a vessel body and a top cover. The top cover is equipped with a feed pipe and a stirring unit. The bottom of the vessel body is equipped with a discharge pipe. An installation plate is provided on the outer side of the middle part of the vessel body. A bottom cover is provided below the installation plate. The bottom cover covers the bottom of the vessel body. The bottom cover and the installation plate cooperate to form a receiving cavity. The receiving cavity is used to contain corrosive liquid. A drain port is provided at the bottom of the bottom cover. The bottom cover is an integrally formed structure.

2. The automatic production equipment for leak-proof silicon-based copper / titanium selective etching solution according to claim 1, characterized in that, The stirring unit includes a motor and a stirring shaft. The motor is fixed to the upper cover, and the stirring shaft is located inside the vessel. The stirring shaft is connected to the output shaft of the motor, and the bottom end of the stirring shaft is provided with several stirring blades.

3. The automatic production equipment for leak-proof silicon-based copper / titanium selective etching solution according to claim 1, characterized in that, The top of the vessel body and the outer periphery of the top cover are both equipped with fixed flanges, and the two fixed flanges are fixed by fixing bolts.

4. The automatic production equipment for leak-proof silicon-based copper / titanium selective etching solution according to claim 1, characterized in that, The mounting plate is provided with mounting flanges on its outer periphery and the top of the bottom cover. The two mounting flanges are fixed by mounting bolts.

5. The automatic production equipment for leak-proof silicon-based copper / titanium selective etching solution according to claim 1, characterized in that, The mounting plate has a chamfered bottom on its outer periphery.

6. The automatic production equipment for leak-proof silicon-based copper / titanium selective etching solution according to claim 1, characterized in that, The top of the vessel is provided with a guide plate, which is located below the feed pipe and is inclined downward on the side of the vessel near the side wall.

7. The automatic production equipment for leak-proof silicon-based copper / titanium selective etching solution according to claim 1, characterized in that, The upper cover is equipped with a negative pressure pump, and the air inlet of the negative pressure pump passes through the upper cover and the mounting plate respectively.

Images