High vacuum ion sputtering apparatus

By incorporating a light indicator unit and a cover adjustment mechanism into the high-vacuum ion sputtering instrument, the problems of difficulty in noticing when sputtering stops and blurred observation windows are solved, achieving clear reminders and observation, and improving operational efficiency and equipment performance.

CN224378185UActive Publication Date: 2026-06-19SHENZHEN KUOWEI ATOMIC TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
SHENZHEN KUOWEI ATOMIC TECH CO LTD
Filing Date
2025-08-04
Publication Date
2026-06-19

AI Technical Summary

Technical Problem

Existing high-vacuum ion sputtering instruments lack a clear alert mechanism after sputtering stops, making it difficult for operators to quickly detect the end of sputtering and affecting work efficiency; the surface of the observation window is easily blurred due to thin film deposition, increasing the difficulty and uncertainty of operation.

Method used

A light indicator unit and a cover adjustment mechanism are installed in the high vacuum ion sputtering instrument. The light indicator unit provides a conspicuous reminder through LED light, and the cover adjustment mechanism adjusts the obstruction state of the observation window manually or electrically to ensure the clarity of the observation window.

Benefits of technology

A clear and conspicuous reminder mechanism has been implemented, which improves operational efficiency. The clearness of the observation window is maintained by the cover adjustment component to avoid the influence of thin film deposition and ensure that the vacuum level is not affected.

✦ Generated by Eureka AI based on patent content.

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Abstract

This utility model relates to the technical field of ion sputtering coating equipment, and particularly to a high-vacuum ion sputtering instrument, which includes a machine frame, a vacuum component mounted on the machine frame, a vacuum chamber, a magnetron cathode mounted in the vacuum chamber, and a control system. The high-vacuum ion sputtering instrument also includes a light-indicating unit mounted on the machine frame and electrically connected to the control system, and an observation window mounted on the wall of the vacuum chamber. The observation window includes a window opening and a transparent cover covering the outside of the window. A baffle and a baffle adjustment mechanism are provided at the window opening. The baffle can be adjusted by the baffle adjustment mechanism to either block or reveal the inside of the transparent cover. Based on this, the light-indicating unit provided by the high-vacuum ion sputtering instrument of this utility model can realize a light-indicating function, and the baffle and baffle adjustment mechanism can achieve the blocking or revealing of the observation window, thus satisfying the observation function of the observation window while reducing the probability of the transparent cover being blocked by thin film deposition.
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