A cleaning device for film processing

Abstract

The utility model discloses a cleaning device of plate processing, this cleaning device includes the cleaning pool, and its inside is provided with a plurality of cleaning area and has placed different cleaning liquid or liquid medicine in each cleaning area, support the card board, place in the above of each cleaning area of cleaning pool, support the frame, place in support the card board and have the plate vertically placed in the inside of support frame. This cleaning device can be used to the immersion cleaning of plate, so as to guarantee the developing effect of subsequent with the full immersion of liquid medicine, and the liquid medicine and plate are guaranteed to be at preset temperature when soaking through constant temperature control component, thereby improving the developing quality of subsequent.

Description

Technical Field

[0001] This utility model relates to the field of non-destructive testing technology, specifically a film cleaning device. Background Technology

[0002] In the field of machining, non-destructive testing is often required to ensure that there are no slag inclusions or cracks in the weld during welding. Currently, non-destructive testing usually includes radiographic testing and ultrasonic testing. In the process of radiographic testing, film is taken by X-ray, and then the film is immersed in developing and fixing solutions to ensure the quality of subsequent development.

[0003] However, when performing non-destructive testing on large equipment, radiographic testing is required on various parts of the surface. As a result, there are a large number of film negatives after the images are taken. It is not convenient to separate them and put them into the cleaning solution for soaking and cleaning. This can easily cause the film negatives to pile up together, which seriously affects the cleaning quality. Furthermore, during the soaking and cleaning process, the temperature of the cleaning solution may drop due to external environmental factors or the film entering the cleaning solution. This may result in the development effect after soaking. Utility Model Content

[0004] Therefore, in order to overcome the above-mentioned shortcomings, this utility model provides a film cleaning device that can separate the film and immerse it in a cleaning solution, avoiding the film from being stacked together and affecting the contact between the solution and the film, thereby effectively ensuring the subsequent development effect of the film.

[0005] Specifically, a film processing cleaning apparatus includes a cleaning tank, which has multiple cleaning zones inside and different cleaning solutions or chemicals placed in each cleaning zone.

[0006] Support plates are placed above each cleaning zone of the cleaning tank;

[0007] A support frame is placed on a support plate, and a substrate is placed vertically inside the support frame.

[0008] Preferably, the support plate is constructed by welding together connecting strips distributed laterally and longitudinally to form multiple placement areas, and the support frame passes through the placement areas of the support plate and is supported by a frame extending outward from the top of the support frame.

[0009] Preferably, the substrate is held vertically within the support frame by a placement frame. The placement frame specifically includes a frame formed by two support members, a fixing member, and a connector. The opposing surfaces of the two support members have receiving grooves. The substrate is inserted into the receiving groove of the support member from one end of the connector and is fixed by the fixing member. A support rod is provided on the connector. The connector is inserted vertically downward into the support frame and is fixed by the support rod on the edge of the support frame.

[0010] Preferably, the support member is a plate, and a receiving groove is formed on the opposite surface of the plate and another support member. Multiple liquid inlet holes are formed through the adjacent surface of the receiving groove on the plate, and a guide plate corresponding to the receiving groove is provided on the end of the plate for guiding.

[0011] Preferably, the outer end of the connector is provided with a sleeve, the support rod passes through the sleeve to maintain linear sliding and is limited by a support handle movably connected to the end of the support rod.

[0012] Compared with the prior art, the present invention has the following advantages:

[0013] By using a partitioned immersion design in the cleaning device, the chemical solution can fully contact the film surface. Compared with stacking processing, this not only shortens the development time but also avoids problems such as over- or under-development caused by poor chemical flow. Attached Figure Description

[0014] The accompanying drawings are provided to further illustrate the present invention and form part of the specification. They are used together with the specific embodiments of the present invention to explain the present invention, but do not constitute any limitation on the present invention. In the drawings:

[0015] Figure 1 This is a schematic diagram of the structure of this utility model;

[0016] Figure 2 This is a top view of the structure of this utility model;

[0017] Figure 3 This is a schematic diagram of the constant temperature control component of this utility model installed in the cleaning tank;

[0018] Figure 4 This is a structural diagram of the support plate and support frame of this utility model when they are placed;

[0019] Figure 5 This is a schematic diagram of the structure of the placement frame of this utility model;

[0020] Figure 6 This is a schematic diagram of the structure of the support component of this utility model;

[0021] In the diagram: 1. Cleaning tank; 101. Cleaning area; 102. Heating device; 103. Temperature sensor; 2. Support plate; 3. Support frame; 4. Support component; 401. Plate; 402. Receiving tank; 403. Liquid inlet; 404. Guide plate; 5. Connector; 6. Fixing component; 7. Support rod; 8. Support handle. Detailed Implementation

[0022] The technical solution of this utility model will be further described in detail below through specific embodiments and in conjunction with the accompanying drawings. It should be understood that the specific embodiments described herein are only for illustration and explanation of this utility model and are not intended to limit this utility model in any way. The accompanying drawings in this utility model are only for illustrative purposes and to facilitate understanding of the embodiments and are not intended to limit this utility model in any way.

[0023] It should be noted that the structures, proportions, sizes, etc. shown in the accompanying drawings are only for the purpose of assisting those skilled in the art in understanding and reading the content disclosed in the specification, and are not intended to limit the conditions under which the present invention can be implemented. Any modifications to the structure, changes in the proportions, or adjustments to the size, without affecting the effects and purposes that the present invention can produce, should still fall within the scope of the technical content disclosed in the present invention.

[0024] As described in the background section, when processing films for X-ray inspection, if there are a large number of films, directly placing them into the developing or fixing solution can cause them to pile up, affecting the contact between the solution and the films. Furthermore, due to external environmental factors and the number of films, the temperature of the solution may drop when the films are immersed in it, thus failing to guarantee the film development effect.

[0025] For the reasons stated above, this embodiment provides a film processing cleaning apparatus. Please refer to the attached document. Figure 1 ~Appendix Figure 3 It includes a cleaning tank 1, which has multiple cleaning zones 101 inside and different cleaning solutions or chemical solutions are placed in each cleaning zone 101.

[0026] Support plate 2 is placed above each cleaning zone 101 of cleaning tank 1;

[0027] The support frame 3 is placed on the support plate 2, and the base plate is placed vertically inside the support frame 3.

[0028] A constant temperature control assembly is arranged at the bottom of the cleaning zone 101 of the cleaning tank 1, including a temperature sensor 103 and a heating device 102 installed inside the cleaning tank 1. The temperature sensor 103 monitors the liquid temperature inside the cleaning tank 1 in real time and controls the operation or shutdown of the heating device 102 through an external control system. The heating device 102 maintains adjustable power. The external control system can be configured as a PLC control system, and the heating device can be configured as an electric heating tube or steam, ensuring that the heating device is laid flat inside the cleaning tank to achieve uniform heating of the internal liquid.

[0029] The above-mentioned technical features solve the problem that multiple rolls of film tend to stick together and stack when immersed in the treatment solution at the same time, resulting in uneven contact of the solution; and overcome the temperature drop of the solution caused by ambient temperature fluctuations and the heat absorption effect of a large batch of film, ensuring constant temperature and controllable effect during the development process.

[0030] In this embodiment, please refer to the appendix. Figure 4 The support plate 2 is formed by welding together connecting strips distributed horizontally and vertically to form multiple placement areas. The support frame 3 passes through the placement areas of the support plate 2 and is supported by the frame extending outward from the top of the support frame 3.

[0031] As described above, setting the shape of the support plate and the support frame makes it easy to place multiple support frames in each cleaning area, which facilitates the placement of multiple films for soaking and cleaning.

[0032] In this embodiment, please refer to the appendix. Figure 5 The substrate is held vertically within the support frame 3 by a placement frame. The placement frame specifically includes a frame formed by two support members 4, a fixing member 6, and a connector 5. The opposing surfaces of the two support members 4 are provided with receiving grooves. The substrate is inserted into the receiving groove of the support member 4 from one end of the connector 5 and is fixed by the fixing member 6. A support rod 7 is provided on the connector 5. The connector 5 is inserted vertically downward into the support frame 3 and is fixed by the support rod 7 on the edge of the support frame 3.

[0033] In this embodiment, please refer to the appendix. Figure 6 The support member 4 is a plate 401. A receiving groove 402 is provided on the opposite surface of the plate 401 and another support member 4. Multiple liquid inlet holes 403 are provided through the adjacent surface of the receiving groove 402 on the plate 401. A guide plate 404 corresponding to the receiving groove 402 is provided on the end of the plate 401 for guiding.

[0034] As described above, by opening receiving grooves on the opposite surfaces of the plates, it is convenient to insert the film into the receiving grooves of the two plates and keep it fixed. At the same time, opening multiple liquid inlet holes on the adjacent surfaces of the receiving grooves facilitates the entry of the liquid into the receiving grooves and contact with the edge of the film, so that the liquid can fully contact the film and ensure the subsequent development effect. Furthermore, by setting a guide plate, it is convenient for the staff to quickly insert the film into the receiving groove of the plate, so as to quickly fix the film and immerse it in the liquid for soaking and cleaning.

[0035] In this embodiment, the outer end of the connector 5 is provided with a sleeve, the support rod 7 passes through the sleeve to maintain linear sliding and is limited by the support handle 8 movably connected to the end of the support rod 7.

[0036] As mentioned above, the connection method of the support rod and connector is designed to facilitate linear movement, thus making it easy to place on the edge of the support frame for support.

[0037] The above description is a detailed description of the preferred embodiments of the present utility model. However, the embodiments are not intended to limit the scope of the patent application of the present utility model. All equivalent changes or modifications made under the technical spirit of the present utility model should fall within the patent scope covered by the present utility model.

Claims

1. A film cleaning apparatus: characterized in that: include, The cleaning tank (1) has multiple cleaning zones (101) inside and different cleaning solutions or chemicals are placed in each cleaning zone (101); Support plates (2) are placed above each cleaning zone (101) of the cleaning tank (1); The support frame (3) is placed on the support plate (2) and the bottom plate is placed vertically inside the support frame (3).

2. The film processing cleaning apparatus according to claim 1, characterized in that: The support plate (2) is formed by welding connecting strips distributed horizontally and vertically to form multiple placement areas. The support frame (3) passes through the placement areas of the support plate (2) and is supported by the frame extending outward from the top of the support frame (3).

3. The film processing cleaning apparatus according to claim 2, characterized in that: The substrate is held vertically within the support frame (3) by a placement frame. The placement frame specifically includes a frame formed by two support members (4), a fixing member (6), and a connecting member (5). The opposing surfaces of the two support members (4) are provided with receiving grooves. The substrate is inserted into the receiving groove of the support member (4) from one end of the connecting member (5) and held in place by the fixing member (6). A support rod (7) is provided on the connecting member (5). The connecting member (5) is inserted vertically downward into the support frame (3) and held in place by the support rod (7) on the edge of the support frame (3).

4. The film processing cleaning apparatus according to claim 3, characterized in that: The support member (4) is a plate (401). A receiving groove (402) is provided on the opposite surface of the plate (401) and another support member (4). Multiple liquid inlet holes (403) are provided through the adjacent surface of the receiving groove (402) on the plate (401). A guide plate (404) corresponding to the receiving groove (402) is provided on the end of the plate (401) for guiding.

5. The film processing cleaning apparatus according to claim 3, characterized in that: The outer end of the connector (5) is provided with a sleeve, and the support rod (7) slides through the sleeve in a straight line and is limited by the support handle (8) movably connected to the end of the support rod (7).

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