A cleaning device for a sub-chamber of a single crystal furnace

Abstract

The utility model relates to photovoltaic manufacturing technical field discloses a cleaning device of single crystal furnace vice chamber, and the cleaning device includes first cleaning subassembly and second cleaning subassembly. First cleaning subassembly includes air bag and wiping member, and the wiping member is wrapped in air bag outside, and air bag can make wiping member contact with the inner wall of single crystal furnace vice chamber when swelling. Second cleaning subassembly is arranged in the direction of the interval with first cleaning subassembly in the single crystal furnace vice chamber, and second cleaning subassembly includes cleaning brush, and cleaning brush can contact with the inner wall of single crystal furnace vice chamber. By driving first cleaning subassembly and second cleaning subassembly synchronous reciprocating movement in the vice chamber, can effectively clean the attachment of the inner wall of vice chamber. Air bag is in the state of relaxation before entering the vice chamber, so that the cleaning device in the process of stretching into the vice chamber, wiping member will not wipe the inner wall of vice chamber, thereby avoiding pushing the attachment to the top of vice chamber, reducing the cleaning difficulty, guaranteeing the cleaning effect in the vice chamber, improve the crystal pulling quality of single crystal silicon rod.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic manufacturing technology, and in particular to a cleaning device for a single crystal furnace auxiliary chamber. Background Technology

[0002] A single crystal furnace is a precision thermal field device used to grow single crystal silicon rods in a highly controlled environment using the Czochralski Method (CZ method). The single crystal furnace mainly consists of a main chamber and a secondary chamber. The main chamber is the core reaction chamber, while the secondary chamber is used to store seed crystals, isolate the external atmosphere, and lift the crystal rod to this area for cooling after crystal growth is completed, so as not to affect the main chamber in preparation for the next production.

[0003] To ensure the quality of monocrystalline silicon rods, the sub-chamber needs to be cleaned regularly to prevent powder and dust adhering to the inner wall of the sub-chamber from affecting the quality of the monocrystalline silicon rods. In the existing technology, the cleaning device for the sub-chamber is usually a fixed structure, that is, the size is fixed. It is difficult for the cleaning device to extend into the sub-chamber, and it is easy to push the powder on the inner wall of the sub-chamber to the top of the sub-chamber, resulting in incomplete cleaning of the sub-chamber and affecting the quality and yield of monocrystalline silicon rod products.

[0004] Therefore, there is an urgent need for a cleaning device for the sub-chamber of a single crystal furnace to solve the above problems. Utility Model Content

[0005] Based on the above problems, the purpose of this utility model is to provide a cleaning device for the sub-chamber of a single crystal furnace, which can reduce the difficulty of cleaning the sub-chamber, improve the cleaning effect of the sub-chamber, and ensure the quality and yield of single crystal silicon rod products.

[0006] To achieve the above objectives, the present invention adopts the following technical solution:

[0007] A cleaning device for a single crystal furnace auxiliary chamber is provided, comprising:

[0008] The first cleaning component includes an airbag and a wiping element, the wiping element being wrapped around the airbag, and the airbag being able to make the wiping element contact the inner wall of the single crystal furnace sub-chamber when inflated;

[0009] A second cleaning component is provided at a distance from the first cleaning component in the direction of extending into the sub-chamber of the single crystal furnace. The second cleaning component includes a cleaning brush that is capable of contacting the inner wall of the sub-chamber of the single crystal furnace.

[0010] As an optional solution for the cleaning device of the single crystal furnace sub-chamber of this utility model, the cleaning device of the single crystal furnace sub-chamber further includes a third cleaning component, the third cleaning component including a spray structure, the spray structure being used to spray cleaning liquid onto the inner wall of the single crystal furnace sub-chamber.

[0011] As an optional solution for the cleaning device of the single crystal furnace sub-chamber of this utility model, the cleaning device of the single crystal furnace sub-chamber further includes a support, the third cleaning component includes a control component disposed on the support, the spray structure is provided with a triggering mechanism, the control component is connected to the triggering mechanism, and is used to trigger the triggering mechanism so that the spray structure sprays cleaning liquid.

[0012] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the spraying structure includes a liquid storage container and a nozzle disposed in the liquid storage container. The liquid storage container stores cleaning liquid, and the triggering mechanism is disposed in the nozzle. The triggering mechanism can cause the nozzle to spray cleaning liquid under the driving action of the control component.

[0013] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the third cleaning component further includes a mounting bracket disposed on the support, and the liquid storage container is disposed on the mounting bracket.

[0014] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the control component includes an operating rod movably disposed on the bracket. The first end of the operating rod is connected to the triggering mechanism, and the second end of the operating rod is provided with an operating part. The operating part is configured to drive the operating rod to move under the action of external force to trigger the triggering mechanism.

[0015] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the third cleaning component further includes an elastic element, one end of which is connected to the operating rod and the other end of which is connected to the bracket. The operating rod can be reset under the elastic force of the elastic element.

[0016] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the support includes a lifting rod, the lifting rod has a receiving cavity, and the operating rod is movably disposed in the receiving cavity along the extension direction of the lifting rod.

[0017] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the first end of the operating rod is provided with a connecting part, the lifting rod is provided with a first strip hole communicating with the receiving cavity, the first strip hole extends along the moving direction of the operating rod, the connecting part is movably inserted through the first strip hole and connected to the triggering mechanism;

[0018] The lifting rod is provided with a second strip-shaped hole that communicates with the receiving cavity. The second strip-shaped hole extends along the moving direction of the operating rod, and the operating part is movably inserted through the second strip-shaped hole.

[0019] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the bracket is provided with a support part, and the support part is spaced apart below the operating part.

[0020] As an optional solution for the cleaning device of the single crystal furnace sub-chamber of this utility model, the cleaning device of the single crystal furnace sub-chamber further includes a support frame, the first cleaning component includes a first fixed frame, the airbag is disposed on the first fixed frame, the second cleaning component includes a second fixed frame, the cleaning brush is disposed on the second fixed frame, the first fixed frame and the second fixed frame are both disposed on the support frame, and the second fixed frame is arranged at intervals below the first fixed frame.

[0021] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the first fixing frame includes a first fixing ring and a first supporting rib arranged crosswise in the first fixing ring, the airbag ring is disposed on the first fixing ring, and the first supporting rib is connected to the bracket.

[0022] As an optional solution for the cleaning device of the single crystal furnace sub-chamber of this utility model, the outer diameter of the airbag is smaller than the inner diameter of the single crystal furnace sub-chamber.

[0023] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the second fixing frame includes a second fixing ring and a second supporting rib arranged crosswise in the second fixing ring, the cleaning brush includes a plurality of brush groups arranged circumferentially at intervals in the second fixing ring, and the second supporting rib is connected to the bracket.

[0024] As an optional solution for the cleaning device of the single crystal furnace auxiliary chamber of this utility model, the first cleaning component includes a gas source and a gas supply pipeline. One end of the gas supply pipeline is connected to the gas source, and the other end is connected to the air bag. The gas source can supply air to the air bag through the gas supply pipeline.

[0025] The beneficial effects of this utility model are as follows:

[0026] The cleaning device for the sub-chamber of a single crystal furnace provided by this utility model allows the airbag to be in a relaxed state before cleaning, meaning that the airbag contains no gas or only a small amount of gas. Then, the first and second cleaning components are inserted into the sub-chamber from below until the first cleaning component reaches the top of the sub-chamber. Next, air is introduced into the airbag, causing it to inflate, and the wiping element wrapped around the airbag comes into contact with the inner wall of the sub-chamber. By driving the first and second cleaning components to move up and down synchronously within the sub-chamber, the wiping element wipes the top and side walls of the sub-chamber, while the cleaning brush simultaneously brushes the inner wall of the sub-chamber. The wiping element removes deposits, especially fine deposits (such as powder), from the inner wall of the sub-chamber, while the cleaning brush removes stubborn dirt. The cooperation of the first and second cleaning components effectively cleans the deposits from the inner wall of the sub-chamber, improving the cleaning effect.

[0027] Because the first and second cleaning components enter the sub-chamber from bottom to top, and the airbag is in a relaxed state before entering the sub-chamber, the wiping element does not wipe the inner wall of the sub-chamber during the cleaning device's insertion. This makes it easier for the cleaning device to enter the sub-chamber, thus reducing the difficulty of cleaning. Simultaneously, the wiping element does not contact the inner wall of the sub-chamber during insertion, preventing the pushing of deposits from the inner wall to the top of the sub-chamber, resulting in a more thorough cleaning and ensuring a better cleaning effect. This, in turn, improves the crystal pulling quality of the monocrystalline silicon rod and enhances the conversion efficiency of the solar cell product. Attached Figure Description

[0028] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments of this utility model will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the content of the embodiments of this utility model and these drawings without creative effort.

[0029] Figure 1 This is a schematic diagram of the cleaning device provided in a specific embodiment of the present invention;

[0030] Figure 2 This is a cross-sectional schematic diagram of the cleaning device provided in a specific embodiment of this utility model;

[0031] Figure 3 yes Figure 2 First partial view;

[0032] Figure 4 yes Figure 2 The second partial view;

[0033] Figure 5 This is a top view of the first cleaning component provided in a specific embodiment of this utility model.

[0034] In the picture:

[0035] 1. First cleaning component; 2. Second cleaning component; 3. Third cleaning component; 4. Support frame;

[0036] 11. Airbag; 12. Wiping component; 13. First fixing frame;

[0037] 131. First fixing ring; 132. First supporting rib;

[0038] 21. Cleaning brush; 22. Second mounting bracket;

[0039] 31. Spraying structure; 32. Control components; 33. Elastic components; 34. Mounting bracket;

[0040] 311. Triggering mechanism; 312. Liquid storage container; 313. Nozzle;

[0041] 321. Operating lever; 3211. Guide rod; 322. Operating part; 323. Connecting part;

[0042] 41. Lifting rod; 42. Support unit;

[0043] 411. Receiving cavity; 412. First strip hole; 413. Second strip hole; 414. Guide groove. Detailed Implementation

[0044] To make the technical problems solved by this utility model, the technical solutions adopted, and the technical effects achieved clearer, the technical solutions of the embodiments of this utility model will be further described in detail below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0045] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. Specifically, the terms "first position" and "second position" refer to two different positions.

[0046] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to fixed connections or detachable connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal connections between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0047] like Figures 1 to 5 As shown, this embodiment provides a cleaning device for the sub-chamber of a single crystal furnace, which can reduce the difficulty of cleaning the sub-chamber, improve the cleaning effect of the sub-chamber, and ensure the quality and yield of single crystal silicon rod products. The cleaning device for the sub-chamber of the single crystal furnace includes a first cleaning component 1 and a second cleaning component 2.

[0048] The first cleaning component 1 includes an airbag 11 and a wiping member 12. The wiping member 12 is wrapped around the airbag 11, and when the airbag 11 expands, the wiping member 12 can contact the inner wall of the single crystal furnace sub-chamber. The second cleaning component 2 is spaced apart from the first cleaning component 1 in the direction of extending into the single crystal furnace sub-chamber. The second cleaning component 2 includes a cleaning brush 21, which can contact the inner wall of the single crystal furnace sub-chamber.

[0049] The cleaning device for the sub-chamber of the single crystal furnace provided in this embodiment, before cleaning, allows the airbag 11 to be in a relaxed state, that is, the airbag 11 contains no gas or only a small amount of gas. Then, the first cleaning component 1 and the second cleaning component 2 are inserted into the sub-chamber from below until the first cleaning component 1 reaches the top of the sub-chamber. Then, air is introduced into the airbag 11, causing it to inflate, and the wiping element 12 wrapped around the airbag 11 comes into contact with the inner wall of the sub-chamber. By driving the first cleaning component 1 and the second cleaning component 2 to move up and down synchronously within the sub-chamber, the wiping element 12 wipes the top and side walls of the sub-chamber, while the cleaning brush 21 brushes the inner wall of the sub-chamber. The wiping element 12 can remove deposits, especially fine deposits (such as powder and dust), from the inner wall of the sub-chamber, while the cleaning brush 21 can remove stubborn dirt. The cooperation of the first cleaning component 1 and the second cleaning component 2 effectively cleans the deposits from the inner wall of the sub-chamber, improving the cleaning effect within the sub-chamber.

[0050] Because the first cleaning component 1 and the second cleaning component 2 enter the sub-chamber from bottom to top, and the airbag 11 is in a relaxed state before entering the sub-chamber, the wiping element 12 will not wipe the inner wall of the sub-chamber during the cleaning device's insertion into the sub-chamber. This makes it easier for the cleaning device to enter the sub-chamber, thereby reducing the difficulty of cleaning the sub-chamber. At the same time, the wiping element 12 does not contact the inner wall of the sub-chamber during insertion, which can prevent the adhering substances on the inner wall of the sub-chamber from being pushed to the top of the sub-chamber, making the cleaning of the sub-chamber more thorough and ensuring the cleaning effect of the sub-chamber. This, in turn, can improve the crystal pulling quality of the monocrystalline silicon rod and improve the conversion efficiency of the solar cell product.

[0051] Optionally, see Figure 1 and Figure 2 The cleaning device for the sub-chamber of the single crystal furnace also includes a third cleaning component 3, which includes a spray structure 31 for spraying cleaning fluid onto the inner wall of the sub-chamber. When the cleaning device extends into the sub-chamber of the single crystal furnace, the third cleaning component 3 also enters the sub-chamber. Before the cleaning device moves up and down, cleaning fluid can be sprayed onto the inner wall of the sub-chamber through the spray structure 31 to dissolve stains. This allows the wiping element 12 and the cleaning brush 21 to wipe the inner wall of the sub-chamber more quickly and thoroughly, improving the cleaning effect of the sub-chamber.

[0052] For example, the cleaning solution can be alcohol. Alcohol is chemically stable, does not corrode materials, and effectively dissolves stains. Furthermore, alcohol evaporates very quickly, leaving no moisture residue on the inner wall of the sub-chamber, resulting in excellent cleaning performance. In other embodiments, the cleaning solution can also be other liquid cleaning agents that meet the cleaning requirements.

[0053] Optionally, see Figure 2 , Figure 3 and Figure 4 The cleaning device for the sub-chamber of the single crystal furnace also includes a support 4. The third cleaning component 3 includes a control element 32 mounted on the support 4. The spray structure 31 is equipped with a triggering mechanism 311. The control element 32 is connected to the triggering mechanism 311 and is used to trigger the triggering mechanism 311 to spray cleaning liquid onto the inner wall of the sub-chamber. When it is necessary to spray cleaning liquid, the control element 32 drives the triggering mechanism 311 to operate, causing the spray structure 31 to spray cleaning liquid onto the inner wall of the sub-chamber. When it is not necessary to spray cleaning liquid, the triggering mechanism 311 can be deactivated. That is, by controlling the operation of the triggering mechanism 311 through the control element 32, the spray structure 31 can be selectively sprayed with cleaning liquid, which can be controlled according to cleaning needs.

[0054] Optionally, see Figure 3The spray structure 31 includes a liquid storage container 312 and a nozzle 313 disposed in the liquid storage container 312. The liquid storage container 312 stores cleaning liquid, and a triggering mechanism 311 is disposed in the nozzle 313. The triggering mechanism 311 can cause the nozzle 313 to spray cleaning liquid under the driving action of the control element 32. When the triggering mechanism 311 is triggered, the cleaning liquid in the liquid storage container 312 is sprayed out through the nozzle 313 under the action of driving force, thereby spraying cleaning liquid onto the inner wall of the auxiliary chamber of the single crystal furnace.

[0055] In this embodiment, the triggering mechanism 311 is a press-type structure, which includes a pressing head and a piston chamber. A piston is disposed in the piston chamber, and the pressing head is connected to the piston via a piston rod. The bottom of the piston chamber is connected to the interior of the liquid storage container 312 via a suction tube. The nozzle orifice of the spray head 313 is connected to the piston channel of the piston. When the pressing head of the triggering mechanism is driven downward by the control component 32, the piston moves downward in the piston chamber, increasing the pressure in the piston chamber. Under the pressure, the cleaning fluid stored in the piston chamber is sprayed out through the piston channel and the nozzle orifice of the spray head 313. When the triggering mechanism 311 resets, the pressure in the piston chamber decreases, and the cleaning fluid in the liquid storage container 312 enters the piston chamber through the suction tube for temporary storage, preparing for the next spraying of cleaning fluid.

[0056] Optionally, see Figure 2 and Figure 3 The third cleaning component 3 also includes a mounting bracket 34 disposed on the support 4, and a liquid storage container 312 disposed on the mounting bracket 34. By setting the mounting bracket 34, the liquid storage container 312 can be fixed on the support 4, so that the liquid storage container 312 can stably provide a liquid source for the nozzle 313.

[0057] For example, the mounting bracket 34 can be a support cylinder adapted to the shape of the liquid storage container 312, and the liquid storage container 312 can be placed inside the support cylinder. Alternatively, the mounting bracket 34 can also be a support plate or the like, and the liquid storage container 312 can be fixed to the support plate by fasteners.

[0058] Optionally, see Figure 2 and Figure 3 The control component 32 includes an operating lever 321 movably mounted on the bracket 4. The first end of the operating lever 321 is connected to the triggering mechanism 311, and the second end of the operating lever 321 is provided with an operating part 322. The operating part 322 is configured to drive the operating lever 321 to move under external force, thereby triggering the triggering mechanism 311. That is, by controlling the movement of the operating lever 321 through the operating part 322, the operating lever 321 drives the triggering mechanism 311 to actuate, controlling the spray structure 31 to spray cleaning liquid.

[0059] Specifically, in this embodiment, refer to Figure 2By applying a downward force to the operating part 322 in the center position, the operating lever 321 moves downward relative to the bracket 4, thereby activating the trigger mechanism 311 and causing the nozzle 313 to spray out cleaning fluid.

[0060] Optionally, see Figure 1 and Figure 2 The bracket 4 is provided with a support part 42, which is spaced below the operating part 322. When the operating part 322 is manually driven to move, the support part 42 can be held to apply a downward force to the operating part 322. That is, the support part 42 can provide a point of force and reduce the difficulty of operation.

[0061] Optionally, see Figure 2 and Figure 4 The third cleaning component 3 also includes an elastic element 33. One end of the elastic element 33 is connected to the operating lever 321, and the other end is connected to the bracket 4. The operating lever 321 can be reset under the elastic force of the elastic element 33. During the process of driving the operating lever 321 to trigger the trigger mechanism 311, the elastic element 33 is compressed and generates elastic deformation. When the external force acting on the operating part 322 is removed, the elastic element 33 releases elastic potential energy, driving the operating lever 321 to reset to the initial position, removing the force of the operating lever 321 on the trigger mechanism 311, and causing the trigger mechanism 311 to reset. The setting of the elastic element 33 enables the operating lever 321 to automatically reset, facilitating the next triggering operation of the trigger mechanism 311.

[0062] Optionally, see Figure 4 The operating lever 321 has a guide rod 3211 at its bottom, and the bracket 4 has a guide groove 414. An elastic element 33 is sleeved on the guide rod 3211, with the end of the guide rod 3211 away from the operating lever 321 slidably inserted into the guide groove 414. When the operating lever 321 is driven downwards, the guide rod 3211 moves into the guide groove 414, compressing the elastic element 33. When the operating lever 321 is released, it moves upwards under the elastic force of the elastic element 33. The cooperation between the guide rod 3211 and the guide groove 414 restricts the extension and retraction direction of the elastic element 33, stably confining it between the operating lever 321 and the bracket 4. For example, the elastic element 33 can be a spring.

[0063] Optionally, the support 4 includes a lifting rod 41 with a receiving cavity 411. An operating rod 321 is movably disposed within the receiving cavity 411 along the extending direction of the lifting rod 41. That is, the operating rod 321 is movably inserted into the receiving cavity 411 within the lifting rod 41, making the exterior of the lifting rod 41 neater and facilitating its insertion into the sub-chamber of the single crystal furnace. Simultaneously, placing the operating rod 321 within the receiving cavity 411 allows for efficient use of space and reduces the overall volume of the cleaning device.

[0064] Of course, in other embodiments, the operating lever 321 may also be slidably connected to the outside of the lifting lever 41.

[0065] Optionally, see Figure 2 and Figure 3 The first end of the operating lever 321 is provided with a connecting part 323, and the lifting rod 41 is provided with a first strip-shaped hole 412 communicating with the receiving cavity 411. The first strip-shaped hole 412 extends along the moving direction of the operating lever 321. The connecting part 323 is movably inserted through the first strip-shaped hole 412 and connected to the triggering mechanism 311. When the driving operating lever 321 moves up and down in the receiving cavity 411, the connecting part 323 moves adaptively within the first strip-shaped hole 412, which can prevent the connecting part 323 from interfering with the lifting rod 41 and ensure that the operating lever 321 can smoothly trigger the triggering mechanism 311.

[0066] Optionally, see Figure 2 and Figure 4 The lifting rod 41 is provided with a second strip-shaped hole 413 communicating with the receiving cavity 411. The second strip-shaped hole 413 extends along the moving direction of the operating rod 321, and the operating part 322 is movably inserted through the second strip-shaped hole 413. When a downward force is applied to the operating part 322, the operating part 322 moves downward within the second strip-shaped hole 413, which can prevent the operating part 322 from interfering with the lifting rod 41, so as to smoothly drive the operating rod 321 to move.

[0067] In some embodiments, the spray structure 31 may also include a liquid storage tank, a power unit, a liquid pipeline, and nozzles. The liquid pipeline connects the liquid storage tank and the nozzles. The power unit may be a liquid pump, which is located in the flow path of the liquid pipeline. The power unit delivers the cleaning liquid in the liquid storage tank to the nozzles via the liquid pipeline, causing the nozzles to spray the cleaning liquid onto the inner wall of the auxiliary chamber. The selective spraying of the cleaning liquid by the nozzles can be controlled by controlling the opening and closing of the power unit. In this case, the triggering mechanism 311 is the power unit, and the control unit 32 may be a switch or controller that controls the opening and closing of the power unit.

[0068] Optionally, see Figure 1 and Figure 2 The cleaning device for the sub-chamber of the single crystal furnace also includes a support 4. The first cleaning component 1 includes a first fixed frame 13, and an airbag 11 is disposed on the first fixed frame 13. The second cleaning component 2 includes a second fixed frame 22, and a cleaning brush 21 is disposed on the second fixed frame 22. Both the first fixed frame 13 and the second fixed frame 22 are disposed on the support 4, and the second fixed frame 22 is arranged at intervals below the first fixed frame 13. That is, the first cleaning component 1 is located above the second cleaning component 2, which ensures that after the cleaning device extends into the sub-chamber of the single crystal furnace, the airbag 11 of the first cleaning component 1 inflates so that the wiping element 12 can contact the top and side walls of the sub-chamber, effectively preventing the adhering substances (such as powder and dust) on the inner wall of the sub-chamber from being pushed into the top of the sub-chamber.

[0069] In this embodiment, both the first fixing frame 13 and the second fixing frame 22 are detachably connected to the bracket 4. The first fixing frame 13 and / or the second fixing frame 22 can be installed on the bracket 4 as needed, providing greater flexibility. For example, both the first fixing frame 13 and the second fixing frame 22 are provided with through holes. The bracket 4 includes a lifting rod 41, which passes through and is fixed to the through holes of the first fixing frame 13 and the second fixing frame 22.

[0070] In other embodiments, the first fixing frame 13 and / or the second fixing frame 22 may also be fixedly mounted on the bracket 4.

[0071] Optionally, see Figure 5 The first fixing frame 13 includes a first fixing ring 131 and first supporting ribs 132 intersecting within the first fixing ring 131. An airbag 11 is annularly mounted on the first fixing ring 131, and the first supporting ribs 132 are connected to the bracket 4. The design of the first fixing ring 131 and the annular airbag 11 adapts to the shape of the single crystal furnace sub-chamber, ensuring that the wiping component 12 can uniformly contact the inner wall of the sub-chamber in the circumferential direction after the airbag 11 expands, thus guaranteeing the wiping effect. The first supporting ribs 132 provide support for the first fixing ring 131 and also provide a connection base for the connection between the first fixing frame 13 and the bracket 4.

[0072] Optionally, the outer diameter of the airbag 11 is smaller than the inner diameter of the sub-chamber of the single crystal furnace. This arrangement allows the airbag 11 to extend more smoothly into the sub-chamber, preventing the wiping member 12 from pushing the deposits on the inner wall of the sub-chamber to the top of the sub-chamber. When the airbag 11 inflates, its outer diameter can be slightly larger than the inner diameter of the sub-chamber of the single crystal furnace, so that the wiping member 12 can fully contact the inner wall of the sub-chamber, improving the wiping and cleaning effect.

[0073] For example, the wiping element 12 can be a lint-free cloth, such as a microfiber lint-free cloth, which does not shed lint and has a good cleaning effect. In other embodiments, the wiping element 12 can also be polyester (PET) non-woven fabric, etc., which can be selected according to actual needs.

[0074] Optionally, the second fixing frame 22 includes a second fixing ring and second support ribs intersecting within the second fixing ring. The cleaning brush 21 includes multiple brush groups spaced circumferentially around the second fixing ring. The second support ribs are connected to the bracket 4. The design of the second fixing ring adapts to the shape of the single crystal furnace sub-chamber, ensuring that the multiple brush groups on the second fixing ring can uniformly contact the inner wall of the sub-chamber in the circumferential direction, thus guaranteeing the cleaning effect. The second support ribs provide support for the second fixing ring and also provide a connection base for the connection between the second fixing frame 22 and the bracket 4.

[0075] In this embodiment, as Figure 1 and Figure 3As shown, multiple rings of brushes are spaced apart along the axial direction on the second fixing ring, ensuring sufficient contact area between the cleaning brush 21 and the inner wall of the auxiliary chamber, thus guaranteeing effective cleaning. For example, the second fixing ring has three rings of brushes.

[0076] Optionally, such as Figure 3 As shown, the mounting bracket 34 of the third cleaning component 3 is fixed on the second fixed bracket 22, and the nozzle 313 of the spray structure 31 is located in the area between the first fixed bracket 13 and the second fixed bracket 22, so that the nozzle 313 can spray cleaning liquid into the area between the first fixed bracket 13 and the second fixed bracket 22.

[0077] Optionally, the first cleaning component 1 includes an air source and an air supply line. One end of the air supply line is connected to the air source, and the other end is connected to the airbag 11. The air source can supply air to the airbag 11 through the air supply line. When the cleaning device extends into the sub-chamber and the airbag 11 reaches the top of the sub-chamber, air is supplied to the airbag 11 through the air source and the air supply line, causing the airbag 11 to inflate. The wiping component 12 then contacts the top and side walls of the sub-chamber. By controlling the cleaning device to move up and down, the deposits on the inner wall of the sub-chamber can be removed.

[0078] For example, the air source can be a cylinder, and controlling the cylinder can cause the air supply line to supply air to the airbag 11. In other embodiments, the air source can also be a structure such as an air pump.

[0079] Optionally, the support 4 includes a lifting rod 41 with a receiving cavity 411. The air supply line can be arranged inside the receiving cavity 411 to keep the exterior of the support 4 neat. Further, a partition structure can be provided inside the receiving cavity 411 to divide it into a first chamber and a second chamber. The operating rod 321 is arranged in the first chamber, and the air supply line is arranged in the second chamber to avoid interference between the two.

[0080] Of course, in other embodiments, the air supply line can also be arranged outside the lifting rod 41.

[0081] The general steps for using the cleaning device for the single crystal furnace auxiliary chamber provided in this embodiment are as follows:

[0082] Before cleaning, the gas in the airbag 11 is released, making the airbag 11 relaxed. A vent valve can be installed on the airbag 11 to release the gas. The entire cleaning device is inserted into the sub-chamber of the single crystal furnace. When the first cleaning component 1 reaches the top of the sub-chamber, air is supplied to the airbag 11 through the air source and air supply pipeline, causing the airbag 11 to inflate. The wiping component 12 outside the airbag 11 then comes into close contact with the inner wall of the sub-chamber. At this time, the cleaning brush 21 of the second cleaning component 2 contacts the inner wall of the sub-chamber. Before moving the cleaning device, the spray structure 31 is driven by the control component 32 to spray cleaning liquid onto the inner wall of the sub-chamber. Then, the entire cleaning device is moved up and down by the support 4. During this process, multiple brush groups of the cleaning brush 21 rub against the inner wall of the sub-chamber to brush away the deposits, while the wiping component 12 outside the airbag 11 wipes the inner wall of the sub-chamber. This process is repeated until the sub-chamber is cleaned.

[0083] Note that the above description is merely a preferred embodiment of the present invention and the technical principles employed. Those skilled in the art will understand that the present invention is not limited to the specific embodiments described herein, and various obvious changes, readjustments, and substitutions can be made without departing from the scope of protection of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments. Many other equivalent embodiments may be included without departing from the concept of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims

1. A cleaning device for a single crystal furnace auxiliary chamber, characterized in that, include: The first cleaning component (1) includes an airbag (11) and a wiping element (12), wherein the wiping element (12) is wrapped around the airbag (11), and the airbag (11) can make the wiping element (12) contact the inner wall of the single crystal furnace sub-chamber when it expands; The second cleaning component (2) is spaced apart from the first cleaning component (1) in the direction of extending into the single crystal furnace sub-chamber. The second cleaning component (2) includes a cleaning brush (21) that is capable of contacting the inner wall of the single crystal furnace sub-chamber.

2. The cleaning device for the sub-chamber of the single crystal furnace according to claim 1, characterized in that, The cleaning device for the single crystal furnace sub-chamber also includes a third cleaning component (3), which includes a spray structure (31) for spraying cleaning liquid onto the inner wall of the single crystal furnace sub-chamber.

3. The cleaning device for the sub-chamber of the single crystal furnace according to claim 2, characterized in that, The cleaning device for the single crystal furnace sub-chamber also includes a support (4), the third cleaning component (3) includes a control element (32) disposed on the support (4), the spray structure (31) is provided with a triggering mechanism (311), the control element (32) is connected to the triggering mechanism (311) and is used to trigger the triggering mechanism (311) so that the spray structure (31) sprays cleaning liquid.

4. The cleaning device for the sub-chamber of the single crystal furnace according to claim 3, characterized in that, The spray structure (31) includes a liquid storage container (312) and a nozzle (313) disposed in the liquid storage container (312). The liquid storage container (312) stores cleaning liquid. The triggering mechanism (311) is disposed in the nozzle (313). The triggering mechanism (311) can cause the nozzle (313) to spray cleaning liquid under the driving action of the control element (32).

5. The cleaning device for the sub-chamber of the single crystal furnace according to claim 4, characterized in that, The third cleaning component (3) also includes a mounting bracket (34) disposed on the support (4), and the liquid storage container (312) is disposed on the mounting bracket (34).

6. The cleaning device for the sub-chamber of the single crystal furnace according to claim 3, characterized in that, The control element (32) includes an operating lever (321) movably disposed on the bracket (4). The first end of the operating lever (321) is connected to the triggering mechanism (311), and the second end of the operating lever (321) is provided with an operating part (322). The operating part (322) is configured to drive the operating lever (321) to move under the action of an external force to trigger the triggering mechanism (311).

7. The cleaning device for the sub-chamber of a single crystal furnace according to claim 6, characterized in that, The third cleaning component (3) also includes an elastic element (33), one end of which is connected to the operating rod (321) and the other end is connected to the bracket (4). The operating rod (321) can be reset under the elastic force of the elastic element (33).

8. The cleaning device for the sub-chamber of a single crystal furnace according to claim 6, characterized in that, The bracket (4) includes a lifting rod (41) having a receiving cavity (411), and the operating rod (321) is movably disposed in the receiving cavity (411) along the extending direction of the lifting rod (41).

9. The cleaning device for the sub-chamber of a single crystal furnace according to claim 8, characterized in that, The first end of the operating lever (321) is provided with a connecting part (323), and the lifting rod (41) is provided with a first strip hole (412) communicating with the receiving cavity (411). The first strip hole (412) extends along the moving direction of the operating lever (321), and the connecting part (323) is movably inserted through the first strip hole (412) and connected to the triggering mechanism (311). The lifting rod (41) is provided with a second strip hole (413) communicating with the receiving cavity (411). The second strip hole (413) extends along the moving direction of the operating rod (321), and the operating part (322) is movably inserted through the second strip hole (413).

10. The cleaning device for the sub-chamber of a single crystal furnace according to claim 6, characterized in that, The bracket (4) is provided with a support part (42), which is spaced below the operating part (322).

11. The cleaning device for the sub-chamber of a single crystal furnace according to claim 1, characterized in that, The cleaning device for the sub-chamber of the single crystal furnace also includes a support (4). The first cleaning component (1) includes a first fixing frame (13), and the airbag (11) is disposed on the first fixing frame (13). The second cleaning component (2) includes a second fixing frame (22), and the cleaning brush (21) is disposed on the second fixing frame (22). The first fixing frame (13) and the second fixing frame (22) are both disposed on the support (4). The second fixing frame (22) is arranged at intervals below the first fixing frame (13).

12. The cleaning device for the sub-chamber of a single crystal furnace according to claim 11, characterized in that, The first fixing frame (13) includes a first fixing ring (131) and a first supporting rib (132) intersecting within the first fixing ring (131). The airbag (11) is ringed on the first fixing ring (131), and the first supporting rib (132) is connected to the bracket (4).

13. The cleaning device for the sub-chamber of a single crystal furnace according to claim 12, characterized in that, The outer diameter of the airbag (11) is smaller than the inner diameter of the single crystal furnace sub-chamber.

14. The cleaning device for the sub-chamber of a single crystal furnace according to claim 11, characterized in that, The second fixing frame (22) includes a second fixing ring and a second supporting rib arranged crosswise within the second fixing ring. The cleaning brush (21) includes a plurality of brush groups arranged circumferentially at intervals in the second fixing ring. The second supporting rib is connected to the bracket (4).

15. The cleaning apparatus for the sub-chamber of a single crystal furnace according to any one of claims 1-14, characterized in that, The first cleaning component (1) includes an air source and an air supply line. One end of the air supply line is connected to the air source, and the other end is connected to the airbag (11). The air source can supply air to the airbag (11) through the air supply line.

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