A cleaning system for a gas purification device

Abstract

The utility model provides a kind of cleaning system of gas purification device, including second feed pipe, second discharge pipe, second electronic pressure regulating valve and gas purity analyzer, second electronic pressure regulating valve is set on second feed pipe, and the outlet end of second feed pipe is detachably connected to the import end of the to-be-reduced purifier, the outlet end of the to-be-reduced purifier is detachably installed second discharge pipe, and gas purity analyzer is set on second discharge pipe.The utility model discloses a kind of cleaning system of gas purification device, the main role of this system is to regenerate reduction for the gas purification device which is long used and causes the reduction of purification effect, the impurities in gas purification device are reduced by corresponding gas catalysis, and multiple branches are provided in the system, different reduction medium can be delivered into the to-be-reduced purifier, and the gas source will not be polluted, so that the to-be-reduced purifier can be cleaned without disassembly, reduce the labor intensity of staff, improve cleaning efficiency.

Description

Technical Field

[0001] This utility model belongs to the field of cleaning gas purification devices, and in particular relates to a cleaning system for gas purification devices. Background Technology

[0002] Semiconductor material manufacturing processes, such as photolithography, require ultra-high purity argon or other specialized gases. Generally, the purity of procured gases often fails to meet these requirements, containing impurities and other contaminants. For instance, semiconductor manufacturing involves atomic-level operations; insufficient gas purity introduces impurities like metal ions and particulate matter, leading to lattice defects, increased leakage current, and directly impacting chip performance and yield. For example, contact with oxygen can cause the formation of an oxide layer in metal interconnects, resulting in increased resistance and signal attenuation. Therefore, further purification of procured gases is necessary to meet industrial production requirements. Gas purifiers are commonly used in pharmaceuticals and semiconductors, where extremely high gas purity is essential.

[0003] In order to meet production needs, the purchased gas needs to be purified. During the purification process, impurities in the gas will adhere to and react in the filter element of the purification device. After long-term use, the filter element needs to be cleaned. Summary of the Invention

[0004] In view of this, the present invention aims to provide a cleaning system for a gas purification device to solve the problem that existing purification devices require manual operation during cleaning, resulting in low cleaning quality and efficiency.

[0005] To achieve the above objectives, the technical solution of this utility model is implemented as follows:

[0006] A cleaning system for a gas purification device includes a second feed pipe, a second discharge pipe, a second electronic pressure regulating valve, and a gas purity analyzer. The second feed pipe is equipped with the second electronic pressure regulating valve, and the outlet end of the second feed pipe is detachably connected to the inlet end of the purifier to be reduced. The outlet end of the purifier to be reduced is detachably installed with the second discharge pipe, and the gas purity analyzer is equipped with the second discharge pipe.

[0007] Furthermore, the purifier to be reduced is located inside a regeneration furnace.

[0008] Furthermore, a third check valve is installed on the second discharge pipe, and the third check valve is located at the rear end of the gas purity analyzer.

[0009] Furthermore, a third flow controller and a second control valve are provided on the second feed pipe. The second control valve is located at the rear end of the third flow controller, and the third flow controller is located at the rear end of the second electronic pressure regulating valve.

[0010] Furthermore, a second pressure relief pipe is provided on the second feed pipe, and the second pressure relief pipe is located between the third flow controller and the second electronic pressure regulating valve. A second safety unloading valve is provided on the second pressure relief pipe.

[0011] Furthermore, a fourth check valve is provided on the second pressure relief pipe, and the fourth check valve is located at the rear end of the second safety unloading valve.

[0012] Furthermore, the cleaning system of the gas purification device also includes a plurality of second branch pipes, and the outlet end of each second branch pipe can be connected to the inlet end of the second feed pipe.

[0013] Furthermore, a third control valve is installed on each of the second branch pipes.

[0014] Compared with the prior art, the cleaning system of the gas purification device described in this utility model has the following beneficial effects: The main function of this system is to regenerate and restore the gas purification device that has been used for a long time and whose purification effect has been reduced. The impurities in the gas purification device are reduced by the corresponding gas catalysis. Moreover, this system is set with multiple branches, which can deliver different reduction media to the purifier to be reduced together without contaminating the gas source. This allows the purifier to be reduced to be cleaned internally without disassembly, reducing the labor intensity of the staff and improving the cleaning efficiency. Attached Figure Description

[0015] The accompanying drawings, which form part of this utility model, are used to provide a further understanding of the utility model. The illustrative embodiments of the utility model and their descriptions are used to explain the utility model and do not constitute an undue limitation of the utility model. In the drawings:

[0016] Figure 1 This is a control schematic diagram of the cleaning system of a gas purification device according to an embodiment of the present invention;

[0017] Figure 2 This is a schematic diagram of the structure of a gas purification device according to an embodiment of the present invention;

[0018] Figure 3 This is a cross-sectional schematic diagram of a gas purification device according to an embodiment of the present invention;

[0019] Figure 4 This is a schematic diagram of the exploded structure of a gas purification device according to an embodiment of the present invention;

[0020] Figure 5 This is an exploded structural diagram of the fit between the adapter groove and the sealing ring at the front end of the outer shell according to an embodiment of the present invention.

[0021] Explanation of reference numerals in the attached figures:

[0022] 201-Second feed pipe; 202-Second discharge pipe; 203-Second electronic pressure regulating valve; 204-Gas purity analyzer; 205-Purifier to be reduced; 206-Regeneration furnace; 207-Third check valve; 208-Third flow controller; 209-Second control valve; 210-Second pressure relief pipe; 211-Second safety unloading valve; 212-Fourth check valve; 213-Second branch pipe; 214-Third control valve;

[0023] 300-Purifier body; 301-Outer shell; 302-Front end cover; 303-Rear end cover; 304-Filter element; 305-Connecting pipe; 306-Screw sleeve; 307-First filter screen; 308-Adaptive fitting; 309-Annular platform; 310-Sealing ring; 311-Second filter screen. Detailed Implementation

[0024] It should be noted that, unless otherwise specified, the embodiments and features described in these embodiments of the present invention can be combined with each other.

[0025] In the description of this utility model, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0026] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0027] The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0028] like Figures 2-5As shown, a gas purification device includes a housing 301, a front cover 302, a rear cover 303, and a filter element 304. The front cover 302 is detachably installed at the front end of the housing 301, and the rear cover 303 is welded to the rear end of the housing 301. Each of the front cover 302 and the rear cover 303 has an opening and closing structure, which is a needle valve or diaphragm valve of the prior art. The housing 301 is filled with a filter medium, and the filter element 304 is installed on the inner ring of the housing 301 near the rear cover 303. The filter medium sequentially includes a deoxidizer layer, a desulfurizer layer, and a dehydration layer. The deoxidizer layer is filled with a deoxidizer of the prior art, the desulfurizer layer is filled with a desulfurizer of the prior art, and the dehydration layer is filled with a molecular sieve or a desiccant. In this device, the filter medium can be easily replaced by removing the front cover 302. It is easy to operate and has a wide range of applicable working conditions.

[0029] The front cover 302 and the rear cover 303 are respectively provided with a connecting pipe 305. The connecting pipe 305 is fixedly connected to one end of the opening and closing structure. By providing the connecting pipe 305 on the front and rear covers, it is convenient to install and adapt the opening and closing structure without damaging the front and rear covers, and the service life of the front and rear covers can be improved.

[0030] The filter element 304 has a barrel-shaped structure with filter holes evenly distributed on the sidewalls. The filter element 304 is installed at one end of the connecting pipe 305 located in the middle of the rear end cover 303. The other end of the connecting pipe 305 is connected to the opening and closing structure. In this embodiment, the filter element 304 is a prior art ultrapure filter with a filtration accuracy of 0.003μm. It performs terminal ultrapure filtration on the target gas to be purified and final filtration on extremely small particles to obtain ultrapure gas. Through media filtration combined with filter element filtration, the gas purity can ultimately meet the requirements of industrial production.

[0031] The front inner ring of the outer casing 301 is provided with a first filter screen 307. The filter pore size of the first filter screen 307 is larger than that of the filter element 304. The first filter screen 307 is a fine filter membrane of the prior art, and the filtration accuracy is selectable from 1 to 2.5 μm.

[0032] To facilitate the disassembly, assembly, and support of the first filter screen 307, the first filter screen 307 is installed to the first end of the adapter 308, and the outer periphery of the first end of the adapter 308 is threaded to the inner ring of the front end of the housing 301. The second end of the adapter 308 is threaded to the inner ring of the front end cover 302. As an example, the thread adopts the American standard NPT 60° tapered thread.

[0033] To facilitate the assembly and disassembly of the adapter 308, an annular platform 309 is provided around the adapter 308. Both ends of the annular platform 309 abut against one end of the front cover 302 and the front end of the outer shell 301, respectively. A sealing ring 310 is provided between one end of the annular platform 309 and one end of the front cover 302, and between the other end of the annular platform 309 and the front end of the outer shell 301. The sealing ring 310 ensures a seal in this area. During implementation, an adapter groove is provided at each end of the annular platform 309 or at the front end of the outer shell 301 and one end of the front cover 302. The depth H of the adapter groove is less than the thickness D of the sealing ring 310. During thread tightening, the sealing ring is compressed, thereby enhancing the sealing effect. Each sealing ring 310 is installed in one adapter groove. The sealing rings are made of silicone nitride rubber, which has excellent heat resistance. A high-precision sealing thread design and a soft, high-temperature resistant gasket are used for combined sealing. This component can be disassembled to replace expired / ineffective activated materials, improving the service life of the purification device. Furthermore, the design pressure for the component thread seal in this embodiment is 5 MPa, and its sealing performance test must meet the requirement of <1×10 -10 pa·m 3 / s, for example, using American standard NPT 60° tapered thread, its sealing performance can reach 1×10 -12 pa·m 3 / s.

[0034] A second filter screen 311 is provided on the inner ring of the end of the adapter 308 near the front cover 302. The pore size of the second filter screen 311 is larger than that of the first filter screen 307. The second filter screen 311 is a micro-particle filter membrane of the prior art. The minimum particle diameter selection range is 2.5μm, which is higher than that of the external large particle filter. It belongs to secondary particulate filtration. The total thickness of the membrane and membrane sheet is 3mm. The large particle filter is installed at the inlet end of the opening and closing structure corresponding to the front cover 302. Its minimum particle diameter can be selected from 2.5μm to 5μm. It is made of a metal wire network structure and is a replaceable accessory. It is also the prior art. Similarly, in order to facilitate the disassembly, assembly and support of the second filter screen 311, the second filter screen 311 is installed in the screw sleeve 306. The outer periphery of the screw sleeve 306 is detachably connected to the adapter 308. The second filter screen 311 and the first filter screen 307 are arranged parallel to each other.

[0035] The outer shell 301 can be made of 316L SS stainless steel or Hastelloy. One end of the connecting pipe 305 is fixedly connected to the filter element 304, and the other end of the connecting pipe 305 passes through the rear cover 303 and is connected to the opening and closing structure.

[0036] The working process of a gas purification device:

[0037] The filter medium filled inside the outer shell 301 can be used to purify the application gas by deoxygenation, desulfurization, and dehydration. The second filter screen 311, the first filter screen 307 and the filter element 304 can be used to purify the application gas by physical methods such as particulate matter filtration.

[0038] In use, the gas enters the housing 301 after passing through the opening and closing structure on the front cover 302, the front cover 302, the second filter screen 311, and the first filter screen 307. After the gas reacts fully with the filter medium inside the housing 301, it is discharged to the outside of the housing 301 through the filter element 304. In order to ensure the filtration efficiency of the filter medium for the gas, the device can be placed in a high-temperature environment or the outside of the housing 301 can be heated. The first end of the adapter 308 is threaded to the inner ring of the front end of the housing 301, and the second end of the adapter 308 is threaded to the inner ring of the front cover 302. This facilitates the disassembly of the housing 301 and the end cover, and makes it easy to fill and unload the filter medium into and out of the housing 301.

[0039] Using the gas purification device described in this invention, the target application gas can be purified to meet the requirements of industrial production.

[0040] As one example, the gas used is argon, whose main impurities include: very little water, sulfides mainly composed of hydrogen sulfide, solid particulate matter, and oxygen.

[0041] The gas purifier filters in the following order: large molecular solid particles, small molecular solid particles, oxygen, sulfides, and moisture. It uses a second filter screen 311 and a first filter screen 307 for graded filtration of solid particles. Oxygen, sulfides, and moisture are removed using the filter media filled within the outer shell 301. The filter media includes, in sequence, a deoxidizer layer, a desulfurizer layer, and a dehydration layer. The deoxidizer layer is filled with a deoxidizer from the prior art, the desulfurizer layer is filled with a desulfurizer from the prior art, and the dehydration layer is filled with a molecular sieve. Before purification, the filter media needs to be heated and activated to 350°C. After passing through the filter media, the gas passes through a filter element 304 with a precision of 0.003 μm for final particle filtration of the outlet gas. In this example, the purified gas purity meets industrial production requirements.

[0042] like Figure 1As shown, a cleaning system for a gas purification device includes a second inlet pipe 201, a second outlet pipe 202, a second electronic pressure regulating valve 203, and a gas purity analyzer 204. The second electronic pressure regulating valve 203, model MY-59, is installed on the second inlet pipe 201 and is connected to a controller. The second electronic pressure regulating valve 203 is used to adjust the gas pressure of the gas medium inside the second inlet pipe 201, ensuring the pressure is at a predetermined value. The outlet end of the second inlet pipe 201 is detachably connected to the inlet end of a purifier 205, which is the aforementioned gas purification device. The outlet end of the system can be detachably installed with a second discharge pipe 202, and a gas purity analyzer 204 is installed on the second discharge pipe 202. It also includes multiple second branch pipes 213, and the outlet end of each second branch pipe 213 can be connected to the inlet end of the second feed pipe 201. The main function of this system is to regenerate and restore the gas purification device that has been used for a long time and whose purification effect has been reduced. The impurities in the gas purification device are reduced by the corresponding gas catalysis. The system is equipped with multiple branches, which can deliver different reduction media to the purifier 205 to be reduced without contaminating the gas source. This allows the purifier 205 to be reduced to be cleaned internally without disassembly, reducing the labor intensity of the staff and improving the cleaning efficiency.

[0043] The purification unit 205 is placed inside the regeneration furnace 206 to improve the reduction efficiency of the reducing agent. In this embodiment, the regeneration furnace 206 is a high-temperature box-type resistance furnace of the prior art. A temperature sensor for detecting temperature is installed inside the regeneration furnace 206. The control method in this embodiment is controlled by a controller. Any controller that can realize the functions described in the disclosure of this utility model can be used in existing products or technologies. As one example, the controller is a PLC (Programmable Logic Controller). The power supply is also common knowledge in the field. Since this article is mainly used to protect mechanical devices, the above-mentioned common technologies will not be explained in detail. A third one-way valve 207 is installed on the second discharge pipe 202. The third one-way valve 207 is located at the rear end of the gas purity analyzer 204. As one example, the model of the gas purity analyzer 204 is pTCD2222-H2. The signal of the gas purity analyzer 204 is connected to the controller.

[0044] A third flow controller 208 and a second control valve 209 are installed on the second feed pipe 201. The second control valve 209 is located at the rear end of the third flow controller 208, which is located at the rear end of the second electronic pressure regulating valve 203. The model of the third flow controller 208 is FDC-320. The second control valve 209 is a solenoid valve of the prior art. The second control valve 209 and the third flow controller 208 are connected to the control system. The second control valve 209 is used to open and close the passage at the outlet end of the second feed pipe 201, and the third flow controller 208 is used to control the flow rate of the gas medium in the second feed pipe 201.

[0045] A second pressure relief pipe 210 is installed on the second feed pipe 201, and the second pressure relief pipe 210 is located between the third flow controller 208 and the second electronic pressure regulating valve 203. A second safety unloading valve 211 is installed on the second pressure relief pipe 210, and a fourth check valve 212 is installed on the second pressure relief pipe 210, with the fourth check valve 212 located at the rear end of the second safety unloading valve 211. The second safety unloading valve 211 is model NCSV-212 and is equipped with a pressure sensor. The signal of the second electronic pressure regulating valve 203 is connected to the controller. A pressure sensor is installed after the second electronic pressure regulating valve 203 to monitor the pressure and control the opening of the second electronic pressure regulating valve 203 through the controller to achieve pressure regulation. A pressure sensor is installed before the second electronic pressure regulating valve 203 to monitor the inlet pressure. The second safety unloading valve 211 has automatic pressure relief capability, and the pressure signal monitoring of the pipeline at the rear end of the second safety unloading valve 211 is achieved through the pressure sensor installed at its rear end. If the second electronic pressure regulating valve 203 malfunctions, the second safety unloading valve 211 will automatically release pressure. The principle is that when the pressure sensor value rises, it triggers a fault alarm in the controller and closes the valves on the second feed pipe 201 and the second discharge pipe 202. In order to realize the opening and closing of the second branch, a third control valve 214 is provided on each second branch pipe 213. The third control valve 214 is a solenoid valve of the prior art, and the signal of the third control valve 214 is connected to the controller.

[0046] The usage process of a cleaning system for a gas purification device

[0047] After replacing the particulate filter membrane of a purification device deemed unusable, a cleaning system for a gas purification device regenerates the device through heating with one or more reducing agents (usually gases). (Different impurities require different reducing agents; specific impurity gases should be identified using the composition table of the applied gas, primarily based on the impurity components, including oxygen, carbon dioxide, hydrogen sulfide, sulfur dioxide, etc.) During regeneration with one or more gases, the purity of the reducing gas decreases. The specific impurity content during this continuous reduction and cleaning process is analyzed using a gas purity analyzer to monitor the reducing gas concentration. For example, if the reducing gas is 99.9% pure hydrogen, the reduction process will decrease the hydrogen purity. Once the hydrogen purity stabilizes and no longer changes, the purification device is considered regenerated.

[0048] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A cleaning system for a gas purification device, characterized in that: It includes a second feed pipe (201), a second discharge pipe (202), a second electronic pressure regulating valve (203), and a gas purity analyzer (204). The second feed pipe (201) is equipped with the second electronic pressure regulating valve (203), and the outlet end of the second feed pipe (201) is detachably connected to the inlet end of the purifier to be reduced (205). The outlet end of the purifier to be reduced (205) is detachably installed with the second discharge pipe (202), and the gas purity analyzer (204) is installed on the second discharge pipe (202).

2. The cleaning system of a gas purification device according to claim 1, characterized in that: The purification unit (205) to be reduced is placed inside the regeneration furnace (206).

3. The cleaning system of a gas purification device according to claim 1, characterized in that: A third check valve (207) is installed on the second discharge pipe (202), and the third check valve (207) is located at the rear end of the gas purity analyzer (204).

4. The cleaning system of a gas purification device according to claim 1, characterized in that: A third flow controller (208) and a second control valve (209) are installed on the second feed pipe (201). The second control valve (209) is located at the rear end of the third flow controller (208), and the third flow controller (208) is located at the rear end of the second electronic pressure regulating valve (203).

5. The cleaning system of a gas purification device according to claim 4, characterized in that: A second pressure relief pipe (210) is provided on the second feed pipe (201), and the second pressure relief pipe (210) is located between the third flow controller (208) and the second electronic pressure regulating valve (203). A second safety unloading valve (211) is provided on the second pressure relief pipe (210).

6. The cleaning system of a gas purification device according to claim 5, characterized in that: A fourth check valve (212) is installed on the second pressure relief pipe (210), and the fourth check valve (212) is located at the rear end of the second safety unloading valve (211).

7. The cleaning system of a gas purification device according to claim 1, characterized in that: It also includes multiple second branch pipes (213), and the outlet end of each second branch pipe (213) can be connected to the inlet end of the second feed pipe (201).

8. The cleaning system of a gas purification device according to claim 7, characterized in that: A third control valve (214) is installed on each second branch pipe (213).

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