A gum removal cleaning device

Abstract

The embodiment of the present application provides a glue removing cleaning device, and relates to the technical field of photovoltaic silicon wafer processing. The glue removing cleaning device comprises a support frame, a cleaning station is arranged on the support frame, and the cleaning station is used for placing a to-be-cleaned piece; a cleaning assembly comprises a cleaning support and a nozzle arranged on the cleaning support, the cleaning support is arranged on the support frame, at least partially surrounds the cleaning station, the nozzle is suitable for spraying a cleaning working medium to the to-be-cleaned piece, and the nozzle is arranged in multiple along the extension direction of the cleaning support; and a driving mechanism is arranged on the support frame and is suitable for driving the cleaning assembly to move along the length direction of the cleaning station. The glue removing cleaning device of the embodiment of the present application realizes non-contact multi-mode cleaning, improves the glue removing thoroughness, and has small labor consumption and energy consumption.

Description

Technical Field

[0001] This application relates to the field of photovoltaic silicon wafer processing technology, and in particular to a descaling and cleaning device. Background Technology

[0002] In the photovoltaic silicon wafer manufacturing process, the crystal tray serves as the support base for the silicon wafer, and the surface cleanliness of the tray directly affects the cutting quality of the silicon wafer.

[0003] Traditional crystal tray processing typically includes the following steps: removing residual adhesive from the crystal tray surface manually or mechanically (such as scraping with a blade); cleaning the entire crystal tray using ultrasonic cleaning equipment after scraping; and drying the surface of the crystal tray using a pneumatic device after cleaning.

[0004] However, traditional crystal tray processing technology, with its contact-based adhesive scraping operation, is difficult to adapt to the surface morphology of the crystal tray, which easily leads to incomplete removal of residual adhesive. Subsequently, separate equipment such as ultrasonic cleaning machines and drying devices are required, which prolongs the production line cycle time and results in greater labor and energy consumption. Utility Model Content

[0005] This application provides an adhesive removal and cleaning device that achieves non-contact, multi-mode cleaning, improves the thoroughness of adhesive removal, and reduces labor and energy consumption.

[0006] This application provides an adhesive removal and cleaning device, comprising: a support frame with a cleaning station for placing a part to be cleaned; a cleaning assembly including a cleaning bracket and nozzles disposed on the cleaning bracket, the cleaning bracket being disposed on the support frame and at least partially surrounding the cleaning station, the nozzles being adapted to spray a cleaning agent onto the part to be cleaned, and the nozzles being a plurality of nozzles arranged along the extension direction of the cleaning bracket; and a driving mechanism disposed on the support frame for driving the cleaning assembly to move along the length direction of the cleaning station.

[0007] In one possible implementation, the cleaning medium includes a first liquid and a second liquid, and the nozzle includes a first output mode and a second output mode. In the first output mode, the nozzle is adapted to output the first liquid to remove adhesive from the part to be cleaned.

[0008] In the second output mode, the nozzle is adapted to output the second liquid to clean the part to be cleaned.

[0009] In one possible implementation, the cleaning medium further includes a gas, and the nozzle includes a third output mode in which the nozzle is adapted to output the gas to dry the part to be cleaned.

[0010] In one possible implementation, the adhesive removal cleaning device further includes a media switching valve, the outlet of which is connected to the nozzle via a pipeline. The media switching valve includes a first inlet, a second inlet, and a third inlet, wherein the first inlet is used to supply a first liquid, the second inlet is used to supply a second liquid, and the third inlet is used to supply gas.

[0011] The nozzle includes a first output mode, a second output mode, and a third output mode. The media switching valve is configured to open the first inlet in the first output mode, open the second inlet in the second output mode, and open the third inlet in the third output mode.

[0012] In one possible implementation, the cleaning assembly has a first position and a second position distributed along the length of the cleaning station, and the driving mechanism is adapted to drive the nozzle to move from one of the first position and the second position to the other.

[0013] The process of the nozzle moving from the first position to the second position and then returning to the first position is one loop path;

[0014] The drive mechanism is configured to drive the nozzle to travel 1-2 cycle paths in the first output mode; drive the nozzle to travel 1-3 cycle paths in the second output mode; and drive the nozzle to travel 2-4 cycle paths in the third output mode.

[0015] In one possible implementation, the cleaning support includes a first support and a second support, which are respectively disposed on both sides of the cleaning station in the height direction, and the nozzles include a plurality of nozzles disposed on the first support and the second support.

[0016] In one possible implementation, the cleaning bracket further includes two third brackets disposed on the second bracket, the cleaning station is located between the two third brackets, and the nozzle further includes a plurality of nozzles disposed on the third brackets.

[0017] In one possible implementation, the adhesive removal and cleaning device further includes a support plate, which is fixedly connected to the support frame; the driving mechanism includes:

[0018] The first driving component includes:

[0019] A first driving component is disposed on the support frame;

[0020] The first lead screw has one end rotatably connected to the support frame and the other end fixedly connected to the output end of the first drive unit. The first lead screw extends along the length direction of the cleaning station.

[0021] The first sliding block is slidably disposed on the support plate. The first sliding block is fixedly connected to the first bracket. The first sliding block has a first mating hole and a mating thread on the inner wall of the first mating hole. The first sliding block is adapted to form a threaded pair with the first lead screw through the mating thread.

[0022] The second driving component includes:

[0023] The second driving component is disposed on the support frame;

[0024] The second lead screw has one end rotatably connected to the support frame and the other end fixedly connected to the output end of the second drive unit. The second lead screw extends along the cleaning station in the height direction.

[0025] The second sliding block is slidably disposed on the support plate and is fixedly connected to the second bracket. The second sliding block has a second mating hole and a mating thread on the inner wall of the second mating hole. The second sliding block is adapted to form a threaded pair with the second lead screw through the mating thread.

[0026] In one possible implementation, the support plate is provided with a first guide groove and a second guide groove along the length of the cleaning station, the first sliding block is slidably disposed in the first guide groove, and the second sliding block is slidably disposed in the second guide groove.

[0027] The first guide groove and the second guide groove are configured to guide and limit the first sliding block and the second sliding block, respectively.

[0028] In one possible implementation, the nozzle is connected to a delivery pipe, which is equipped with a backflow valve adapted to regulate the power of the liquid or gas.

[0029] And / or, it also includes a protective cover, the protective cover and the support frame forming a protective cavity, the cleaning station and the nozzle being located within the protective cavity, and the drive mechanism being at least partially located within the protective cavity.

[0030] The adhesive removal and cleaning device provided in this application embodiment involves fixing the part to be cleaned at the cleaning station. A drive mechanism then moves the nozzle reciprocally along its length. The high-pressure medium output from the nozzle acts on the surface of the part to be cleaned in a non-contact manner. A preset distance can be provided between the nozzle and the surface of the part to be cleaned, ensuring that the impact force of the medium is within the effective cleaning range. The moving spray pattern allows the medium to cover the entire surface of the part to be cleaned segment by segment. Switching between different media enables continuous operations of adhesive removal, cleaning, and drying. As can be seen, the non-contact cleaning method eliminates the risk of surface damage that may result from hard contact. Multiple nozzles form a cleaning curtain covering the width of the part to be cleaned, effectively removing residual adhesive and avoiding surface damage or residue caused by hard contact. Furthermore, integrating the cleaning function into the nozzle and automating the moving cleaning process via the drive mechanism effectively shortens the production line cycle time, improves processing efficiency, and reduces labor and energy costs. Attached Figure Description

[0031] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0032] Figure 1 A schematic diagram of the adhesive removal and cleaning device provided in this application;

[0033] Figure 2 A schematic diagram showing the usage status of the cleaning components of the adhesive removal and cleaning device provided in this application;

[0034] Figure 3 for Figure 2 A schematic diagram of the cleaning component.

[0035] Explanation of reference numerals in the attached figures:

[0036] 10 - Items to be cleaned;

[0037] 100 - Support frame; 101 - Cleaning station; 110 - Fixed base;

[0038] 200 - Cleaning assembly; 210 - Cleaning bracket; 211 - First bracket; 212 - Second bracket; 213 - Third bracket;

[0039] 220 - Nozzle;

[0040] 300 - Drive mechanism; 310 - First drive assembly; 311 - First drive element; 312 - First lead screw; 313 - First sliding block; 320 - Second drive assembly; 321 - Second drive element; 322 - Second lead screw; 323 - Second sliding block;

[0041] 400 - Medium switching valve;

[0042] 500 - Support plate; 510 - First guide groove; 520 - Second guide groove;

[0043] 600 - Delivery pipe;

[0044] 700 - Protective shield.

[0045] The accompanying drawings illustrate specific embodiments of this application, which will be described in more detail below. These drawings and descriptions are not intended to limit the scope of the concept in any way, but rather to illustrate the concept of this application to those skilled in the art through reference to particular embodiments. Detailed Implementation

[0046] Exemplary embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numbers in different drawings denote the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this application. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this application as detailed in the appended claims.

[0047] In the photovoltaic silicon wafer manufacturing process, the crystal tray serves as the substrate supporting the silicon wafer, and its surface cleanliness directly affects the wafer cutting quality. Traditional crystal tray processing typically includes the following steps: removing residual adhesive from the crystal tray surface manually or through mechanical hard contact (such as scraping adhesive with a blade); cleaning the entire crystal tray using ultrasonic cleaning equipment after adhesive removal; and drying the surface moisture of the crystal tray using a pneumatic device after cleaning.

[0048] However, traditional crystal tray processing technology, with its contact-based adhesive scraping operation, is difficult to adapt to the surface morphology of the crystal tray, which easily leads to incomplete removal of residual adhesive. Subsequent independent equipment such as ultrasonic cleaning machines and drying devices are required, which prolongs the production line cycle time, consumes more manpower and energy, and is inefficient.

[0049] In addition, during the mechanical adhesive removal process, the hard blades come into direct contact with the surface of the crystal tray, which can easily cause residual adhesive due to unevenness of the crystal tray surface or wear of the blades.

[0050] To address the aforementioned issues, this application provides a glue removal and cleaning device. After the part to be cleaned is fixed at the cleaning station, a drive mechanism moves a nozzle reciprocating along its length. The high-pressure medium output from the nozzle acts on the surface of the part to be cleaned in a non-contact manner. A preset distance can be provided between the nozzle and the surface of the part to be cleaned, ensuring that the impact force of the medium is within the effective cleaning range. The moving spray pattern allows the medium to cover the entire surface of the part to be cleaned segment by segment, and the switching of different media enables continuous operations of glue removal, cleaning, and drying. It is evident that the non-contact cleaning method eliminates the risk of surface damage that may result from hard contact. Multiple nozzles form a cleaning curtain covering the width of the part to be cleaned, effectively removing residual glue and avoiding surface damage or residue caused by hard contact. Furthermore, integrating the cleaning function into the nozzle and automating the moving cleaning process via the drive mechanism effectively shortens the production line cycle time, improves processing efficiency, and reduces labor and energy costs.

[0051] The technical solution of this application and how the technical solution of this application solves the above-mentioned technical problems are described in detail below with specific embodiments. The following specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described again in some embodiments.

[0052] The embodiments of this application will now be described with reference to the accompanying drawings.

[0053] Combination Figure 1 , Figure 2 and Figure 3 This application discloses a glue removal and cleaning device, including a support frame 100, a cleaning assembly 200, and a drive mechanism 300. The support frame 100 has a cleaning station 101 for placing a part 10 to be cleaned. The cleaning assembly 200 includes a cleaning bracket 210 and nozzles 220 disposed on the cleaning bracket 210. The cleaning bracket 210 is disposed on the support frame 100 and at least partially surrounds the cleaning station 101. The nozzles 220 are adapted to spray a cleaning agent onto the part 10 to be cleaned, and multiple nozzles 220 are arranged along the extending direction of the cleaning bracket 210. The drive mechanism 300 is disposed on the support frame 100 and is adapted to drive the cleaning assembly 200 to move along the length direction of the cleaning station 101.

[0054] Optionally, the part to be cleaned 10 can be a crystal holder.

[0055] The support frame 100 can serve as a load-bearing foundation and can be formed by welding a metal frame. Optionally, the support frame 100 can be fixedly connected to a fixing seat 110, on which a cleaning station 101 is provided for placing the parts 10 to be cleaned.

[0056] Nozzle 220 can be a media spraying device, which can be a multi-hole atomizing nozzle. Different cleaning modes can be achieved by adjusting the media pressure through the return valve set on the delivery pipe 600. Drive mechanism 300 can be a linear motion control device, which can be a servo motor and a ball screw to control the movement trajectory of nozzle 220.

[0057] Specifically, after the part to be cleaned 10 is fixed at the cleaning station 101, the drive mechanism 300 drives the nozzle 220 to reciprocate along its length. The high-pressure medium output by the nozzle 220 acts on the surface of the part to be cleaned 10 in a non-contact manner. A preset distance can be provided between the nozzle 220 and the surface of the part to be cleaned 10 to ensure that the impact force of the medium is within the effective cleaning range. The moving spray mode allows the medium to cover the entire surface of the part to be cleaned 10 section by section, and the continuous operation of removing adhesive, cleaning, and drying can be achieved by switching between different media.

[0058] As can be seen, the non-contact cleaning method eliminates the risk of surface damage that may be caused by hard contact. Multiple nozzles 220 form a cleaning curtain covering the width of the part to be cleaned 10, effectively removing residual adhesive and avoiding surface damage or residual adhesive caused by hard contact. In addition, the cleaning function is integrated into the nozzles 220 and automated moving cleaning is achieved by the drive mechanism 300, which effectively shortens the production line cycle time, improves processing efficiency, and reduces labor and energy costs.

[0059] In some embodiments, combined with Figure 2 The cleaning medium includes a first liquid and a second liquid. The nozzle 220 includes a first output mode and a second output mode. In the first output mode, the nozzle 220 is adapted to output the first liquid to remove adhesive from the part 10 to be cleaned. In the second output mode, the nozzle 220 is adapted to output the second liquid to clean the part 10 to be cleaned.

[0060] The first liquid can be a medium used to remove the colloid from the surface of the part to be cleaned 10. Specifically, it can be achieved by using high-pressure water jet or chemical solvent. For example, water mixed with cutting fluid can be sprayed to remove the colloid residue through impact or dissolution.

[0061] The second liquid can be a medium used to clean impurities on the surface of the part to be cleaned 10 and the first liquid. Specifically, it can be deionized water, purified water, etc., to remove residues through rinsing.

[0062] The first output mode and the second output mode can be the media output state switched by the nozzle 220 according to the processing stage, which can be achieved by valve control or pipeline switching. Optionally, the nozzle 220 can be connected to a delivery pipe 600, and the delivery pipe 600 can be equipped with a media switching valve 400. In the first output mode, the media switching valve 400 switches to the first liquid pipeline, so that the nozzle 220 outputs the first liquid. In the second output mode, the media switching valve 400 switches to the second liquid pipeline, so that the nozzle 220 outputs the second liquid.

[0063] By integrating a first liquid and a second liquid, as well as two output modes, into the nozzle 220, the workpiece 10 to be cleaned can sequentially complete the two processes of degumming and rinsing at a single station, avoiding the transfer of workpieces between different devices, shortening the process time, and improving the overall processing efficiency.

[0064] In some embodiments, combined with Figure 2 The cleaning medium also includes gas, and the nozzle 220 includes a third output mode in which the nozzle 220 is adapted to output gas to dry the part 10 to be cleaned.

[0065] In the third output mode, nozzle 220 is configured to spray gas (such as filtered clean compressed air or nitrogen) to purge and dry the surface of the cleaned part 10. Optionally, in the first output mode, media switching valve 400 switches to the gas line, causing nozzle 220 to output gas.

[0066] This design integrates the three processes of degumming, rinsing, and air drying into nozzle 220. By sequentially executing the processes of spraying chemical solvents for degumming, spraying cleaning fluid for rinsing, and spraying gas for air drying in nozzle 220, the crystal tray processing is automated. This eliminates the time delay and secondary contamination risk caused by transferring crystal trays between different independent devices in traditional processes, shortens the production line cycle time, and improves processing efficiency and consistency.

[0067] In some embodiments, combined with Figures 1 to 3 The adhesive removal and cleaning device also includes a media switching valve 400. The outlet of the media switching valve 400 is connected to the nozzle 220 through a pipeline. The media switching valve 400 includes a first inlet, a second inlet, and a third inlet. The first inlet is used to supply a first liquid, the second inlet is used to supply a second liquid, and the third inlet is used to supply gas. The nozzle 220 includes a first output mode, a second output mode, and a third output mode. The media switching valve 400 is configured to open the first inlet in the first output mode, open the second inlet in the second output mode, and open the third inlet in the third output mode.

[0068] Optionally, the adhesive removal and cleaning device may also include a control system, with the media switching valve 400 communicatively connected to the control system.

[0069] When residual adhesive needs to be removed, the control system instructs the media switching valve 400 to connect the first liquid line, and the nozzle 220 sprays the first liquid to remove the adhesive from the crystal tray. After the adhesive removal is completed, the media switching valve 400 switches to the second liquid line, and the nozzle 220 sprays clean water to rinse away any remaining solvent and adhesive particles on the surface. Finally, the media switching valve 400 switches to the compressed air passage, and the nozzle 220 sprays a high-speed airflow to dry the moisture on the surface of the crystal tray.

[0070] The supply and switching of the first liquid, the second liquid, and the gas are controlled by the medium switching valve 400, so that the nozzle 220 can sequentially perform the functions of degumming, cleaning, and drying. The entire process is completed continuously in the nozzle 220 without the need to transfer the part to be cleaned 10, which effectively solves the problems of long production line cycle time and low efficiency caused by traditional multi-equipment decentralized processing.

[0071] In addition, the non-contact spraying method avoids damage to the surface of the part to be cleaned 10 caused by mechanical scraping of adhesive, ensuring the consistency and reliability of the cleaning effect.

[0072] In some embodiments, combined with Figure 2 The cleaning assembly 200 has a first position and a second position distributed along the length of the cleaning station 101. The drive mechanism 300 is adapted to drive the nozzle 220 to move from one of the first position and the second position to the other. The process of the nozzle 220 moving from the first position to the second position and then returning to the first position is one cycle path. The drive mechanism 300 is configured to drive the nozzle 220 to travel 1-2 cycle paths in a first output mode; drive the nozzle 220 to travel 1-3 cycle paths in a second output mode; and drive the nozzle 220 to travel 2-4 cycle paths in a third output mode.

[0073] Optionally, the first position and the second position can be two moving endpoints of the nozzle 220 along the length direction of the part 10 to be cleaned, and the distance between the first position and the second position is not less than the distance along the length direction of the cleaning station 101.

[0074] In some examples, in the first output mode, the nozzle 220 can travel two loop paths; in the second output mode, the nozzle 220 can travel two loop paths; and in the third output mode, the nozzle 220 can travel three loop paths.

[0075] Specifically, in the first output mode, the drive mechanism 300 controls the nozzle 220 to cover the surface of the part to be cleaned 10 with 1-2 reciprocating motions, ensuring that the high-pressure liquid impact force is concentrated on the area where the colloid is attached. In the second output mode, the nozzle 220 increases to 1-3 cycles to eliminate residual impurities. In the third output mode, the drive mechanism 300 increases to 2-4 cycles, ensuring that the surface of the part to be cleaned 10 is completely dried through multiple reciprocating motions.

[0076] By configuring preset cycle times for different cleaning stages, accurate allocation of cleaning resources is achieved. Adjusting the number of nozzle 220 movements allows for optimal coverage density in the three stages: high-pressure water jet removal, cleaning fluid rinsing, and air drying. Reducing the number of cycles in the removal stage concentrates energy for rapid adhesive removal; increasing the number of cycles in the cleaning stage ensures thorough cleaning without blind spots; and enhancing the number of cycles in the drying stage completely removes moisture. This process optimization improves cleaning efficiency.

[0077] In some embodiments, combined with Figure 2 and Figure 3 The cleaning support 210 includes a first support 211 and a second support 212, which are respectively located on both sides of the cleaning station 101 in the height direction. The nozzle 220 includes a plurality of nozzles located on the first support 211 and the second support 212.

[0078] The first bracket 211 and the second bracket 212 are positioned on the upper and lower sides of the cleaning station 101, respectively. Multiple nozzles 220 are mounted on the first bracket 211 and the second bracket 212, with their spray direction facing the cleaning station 101. When the part to be cleaned 10 is placed or fixed in the cleaning station 101, the nozzles 220 on the first bracket 211 and the second bracket 212 can simultaneously spray cleaning medium from both the upper and lower sides of the cleaning station 101, enabling simultaneous treatment of the upper and lower surfaces of the part to be cleaned 10 and avoiding potential dead corners that may exist in unilateral cleaning.

[0079] In addition, the impact forces exerted by the oppositely positioned nozzles 220 on the part to be cleaned 10 can cancel each other out to a certain extent, which helps to maintain the stability of the part to be cleaned 10 in the cleaning station, prevents it from shifting or overturning due to unilateral force, and ensures the effectiveness of the cleaning process.

[0080] In some embodiments, combined with Figure 2 and Figure 3 The cleaning bracket 210 also includes two third brackets 213 disposed on the second bracket 212. The two third brackets 213 are respectively located on both sides of the width direction of the cleaning station 101. The nozzle 220 also includes a plurality of nozzles disposed on the third brackets 213.

[0081] The design of the two third supports 213, together with the first support 211 and the second support 212, forms a three-dimensional cleaning space surrounding the cleaning station 101. The nozzles 220 on the first support 211 and the second support 212 clean the surface of the part to be cleaned 10 from the top and bottom sides, respectively, while the nozzles 220 on the two third supports 213 supplement from the left and right sides. This multi-directional, three-dimensional spraying layout can ensure that the cleaning medium covers the outer surface of the part to be cleaned 10 and eliminate cleaning dead corners.

[0082] In addition, the impact forces from multiple directions can be balanced with each other, which helps to keep the part to be cleaned 10 in a stable position during the cleaning process, prevents it from shifting or flipping, and ensures the uniformity and thoroughness of cleaning, as well as stability and safety.

[0083] In some embodiments, combined with Figure 2 and Figure 3 The adhesive removal and cleaning device includes a support plate 500, which is fixedly connected to the support frame 100; the drive mechanism 300 includes a first drive component 310 and a second drive component 320.

[0084] The support plate 500 can serve as the base for supporting the drive components. It can be made of metal sheet and can provide a mounting reference surface for the sliding block.

[0085] The first drive assembly 310 includes a first drive member 311, a first lead screw 312, and a first sliding block 313. The first drive member 311 is mounted on the support frame 100. One end of the first lead screw 312 is rotatably connected to the support frame 100, and the other end is fixedly connected to the output end of the first drive member 311. The first lead screw 312 extends along the length of the cleaning station 101. The first sliding block 313 is slidably mounted on the support plate 500 and is fixedly connected to the first bracket 211. The first sliding block 313 has a first mating hole, and a mating thread is provided on the inner wall of the first mating hole. The first sliding block 313 is adapted to form a threaded pair with the first lead screw 312 through the mating thread.

[0086] After the first driving component 311 is activated, it drives the first lead screw 312 to rotate around its axis. The first sliding block 313 forms a threaded pair with the first lead screw 312 through the mating thread on the inner wall of its first mating hole. The first sliding block 313 is constrained by the support plate 500 and can only slide. In this way, the rotational motion of the first lead screw 312 is converted into linear motion of the first sliding block 313 along the length direction of the cleaning station 101. This linear motion is transmitted to the first bracket 211 through the first sliding block 313, driving the nozzle 220 mounted on the first bracket 211 to reciprocate.

[0087] The rotational motion of the first driving component 311 is precisely converted into the linear motion of the nozzle 220 through the first lead screw 312, thereby automating the cleaning process and ensuring the accuracy and repeatability of the nozzle 220's movement path. Furthermore, the first sliding block 313 is slidably mounted on the support plate 500 and fixedly connected to the support frame 100 via the support plate 500, forming a stable motion guide and support structure that ensures smooth movement and makes the overall device structure compact and reliable.

[0088] The second drive assembly 320 includes a second drive member 321, a second lead screw 322, and a second sliding block 323. The second drive member 321 is mounted on the support frame 100. One end of the second lead screw 322 is rotatably connected to the support frame 100, and the other end is fixedly connected to the output end of the second drive member 321. The second lead screw 322 extends along the length of the cleaning station 101. The second sliding block 323 is slidably mounted on the support plate 500 and is fixedly connected to the second bracket 212. The second sliding block 323 has a second mating hole, and a mating thread is provided on the inner wall of the second mating hole. The second sliding block 323 is adapted to form a threaded pair with the second lead screw 322 through the mating thread.

[0089] Optionally, the second sliding block 323 can also be fixedly connected to the third bracket 213.

[0090] The second drive unit 321 drives the second lead screw 322 to rotate, and converts the rotational motion into the linear motion of the second sliding block 323 through the threaded pair, thereby driving the second bracket 212 fixed thereon and the nozzle 220 installed thereon to reciprocate along the length direction of the cleaning station 101.

[0091] Thus, by designing the first drive assembly 310 and the second drive assembly 320 independently, the complexity of multi-axis linkage mechanisms is avoided. While simplifying the equipment structure, accurate motion control is achieved, improving the uniformity and consistency of the glue removal, cleaning, and drying operations.

[0092] In addition, since the first drive assembly 310 and the second drive assembly 320 can operate independently, the nozzles 220 mounted on the first bracket 211 and the second bracket 212 can adopt different motion parameters (such as moving speed, reciprocating stroke or start-stop sequence) according to the specific morphology and degree of contamination of the surface of the part to be cleaned 10.

[0093] In addition, the design enhances the fault tolerance and maintainability of the adhesive removal and cleaning device. The first drive assembly 310 and the second drive assembly 320 are mechanically independent of each other. When one set of components needs maintenance or fails, the other set of components can usually still work normally, reducing maintenance costs.

[0094] In some embodiments, combined with Figure 2 and Figure 3The support plate 500 has a first guide groove 510 and a second guide groove 520 along the length of the cleaning station 101. The first guide groove 510 and the second guide groove 520 are spaced apart in the height direction of the cleaning station 101. The first sliding block 313 is slidably disposed in the first guide groove 510 and the second sliding block 323 is slidably disposed in the second guide groove 520. The first guide groove 510 and the second guide groove 520 are configured to guide and limit the first sliding block 313 and the second sliding block 323, respectively.

[0095] Optionally, the first guide groove 510 and the second guide groove 520 can be linear groove structures extending along the length direction of the cleaning station 101. For example, they can be made by processing rectangular or T-shaped sections. The inner wall of the groove can be provided with a wear-resistant coating to reduce frictional resistance.

[0096] Optionally, the first guide groove 510 and the second guide groove 520 can be formed on the side wall of the support plate 500, or they can be formed by at least two long rods surrounding the side wall of the support plate 500.

[0097] Optionally, the first sliding block 313 and the second sliding block 323 can also be limited by a guide rod. The guide rod is fixed to the support plate 500 along the length of the cleaning station 101. For example, the first sliding block 313 or the second sliding block 323 is square or polygonal. One end face of the first sliding block 313 or the second sliding block 323 is in contact with the guide rod, and the other end face is opposite to the support plate 500. The limiting by the guide rod restricts the rotation of the first sliding block 313 or the second sliding block 323 relative to the first lead screw 312 or the second lead screw 322, thereby realizing its movement along the length of the cleaning station 101.

[0098] Optionally, the guide rod and the support plate 500 can be matched to form a first guide groove 510 or a second guide groove 520.

[0099] By setting independent first guide groove 510 and second guide groove 520, linear motion tracks are provided for the first sliding block 313 and the second sliding block 323 respectively. The first guide groove 510 is used to constrain the motion trajectory of the first sliding block 313, ensuring that the first support 211 and its nozzle 220 driven by the first lead screw 312 move smoothly along the predetermined path; the second guide groove 520 also provides accurate guidance for the movement of the second sliding block 323 and the second support 212.

[0100] The arrangement of the first guide groove 510 and the second guide groove 520 at intervals in the height direction provides independent and spatially staggered guide tracks for the first sliding block 313 and the second sliding block 323, respectively. This layout allows the first support 211 and the second support 212, driven by the first drive assembly 310 and the second drive assembly 320 respectively, and the nozzles 220 thereon, to move independently along the length of the cleaning station 101 under their respective stable guiding constraints, avoiding mutual interference caused by spatial interference.

[0101] In some embodiments, combined with Figure 2 and Figure 3 The nozzle 220 is connected to a delivery pipe 600, and the delivery pipe 600 is equipped with a reflux valve, which is suitable for adjusting the power of liquid or gas.

[0102] The medium in the delivery pipe 600 is diverted and regulated by the return valve. When it is necessary to adjust the jet impact force, the opening of the return valve can be controlled to divert part of the medium back to the liquid supply or gas supply system, thereby reducing the flow rate and pressure of the medium delivered to the nozzle 220 and realizing stepless adjustment of the jet power.

[0103] This adjustment method allows the adhesive removal and cleaning device to flexibly adapt to the needs of different cleaning stages. In addition, the buffering effect of the reflux valve can effectively suppress the impact caused by pressure fluctuations in the system, improve the stability of equipment operation, and extend the service life of nozzle 220 and delivery pipe 600.

[0104] In some embodiments, combined with Figure 1 The adhesive removal and cleaning device also includes a protective cover 700, which, together with the support frame 100, forms a protective cavity. The cleaning station 101 and the nozzle 220 are located inside the protective cavity, and the drive mechanism 300 is at least partially located inside the protective cavity.

[0105] The protective chamber effectively contains splashed liquids, mists, and removed adhesive residues generated during the cleaning process, preventing them from contaminating the external environment and ensuring the cleanliness and safety of the workplace.

[0106] Furthermore, the protective cover 700 isolates high-speed moving components such as the first lead screw 312 and the second lead screw 322 from the outside, reducing the risk of mechanical injury to operators from contact with moving parts and improving the safety of equipment operation. In addition, the sealed structure of the protective chamber helps maintain the stability of the internal cleaning environment and reduces interference from external airflow and other factors on the jet flow field, thereby ensuring the consistency and effectiveness of the cleaning process.

[0107] Finally, it should be noted that other embodiments of this application will readily conceive of by those skilled in the art upon consideration of the specification and practice of the application disclosed herein. This application is intended to cover any variations, uses, or adaptations of this application that follow the general principles of this application and include common knowledge or customary techniques in the art not disclosed herein, and is not limited to the precise structures described above and shown in the accompanying drawings, and various modifications and alterations may be made without departing from its scope. The scope of this application is limited only by the appended claims.

Claims

1. A glue removal and cleaning device, characterized in that, include: A support frame (100) is provided with a cleaning station (101) for placing the parts (10) to be cleaned. A cleaning assembly (200) includes a cleaning bracket (210) and nozzles (220) disposed on the cleaning bracket (210), the cleaning bracket (210) being disposed on the support frame (100) and at least partially surrounding the cleaning station (101), the nozzles (220) being adapted to spray cleaning fluid onto the part to be cleaned (10), and the nozzles (220) being a plurality of those arranged along the extending direction of the cleaning bracket (210); A drive mechanism (300) is provided on the support frame (100) and is adapted to drive the cleaning assembly (200) to move along the length direction of the cleaning station (101).

2. The adhesive removal and cleaning device according to claim 1, characterized in that, The cleaning medium includes a first liquid and a second liquid. The nozzle (220) includes a first output mode and a second output mode. In the first output mode, the nozzle (220) is adapted to output the first liquid to remove adhesive from the part (10) to be cleaned; In the second output mode, the nozzle (220) is adapted to output the second liquid to clean the part (10) to be cleaned.

3. The adhesive removal and cleaning device according to claim 2, characterized in that, The cleaning medium also includes gas, and the nozzle (220) includes a third output mode. In the third output mode, the nozzle (220) is adapted to output the gas to dry the part (10) to be cleaned.

4. The adhesive removal and cleaning device according to claim 3, characterized in that, It also includes a medium switching valve (400), the outlet of which is connected to the nozzle (220) via a pipeline. The medium switching valve (400) includes a first inlet, a second inlet and a third inlet. The first inlet is used to supply a first liquid, the second inlet is used to supply a second liquid, and the third inlet is used to supply gas. The nozzle (220) includes a first output mode, a second output mode, and a third output mode. The medium switching valve (400) is configured to open the first inlet in the first output mode, open the second inlet in the second output mode, and open the third inlet in the third output mode.

5. The adhesive removal and cleaning device according to claim 3, characterized in that, The cleaning assembly (200) has a first position and a second position distributed along the length of the cleaning station (101), and the drive mechanism (300) is adapted to drive the nozzle (220) to move from one of the first position and the second position to the other. The process of the nozzle (220) moving from the first position to the second position and then returning to the first position is one cycle path; The drive mechanism (300) is configured to drive the nozzle (220) to travel 1-2 cycle paths in the first output mode; In the second output mode, the nozzle (220) is driven to travel 1-3 cycle paths; in the third output mode, the nozzle (220) is driven to travel 2-4 cycle paths.

6. The adhesive removal and cleaning apparatus according to any one of claims 1-5, characterized in that, The cleaning support (210) includes a first support (211) and a second support (212), the first support (211) and the second support (212) being respectively disposed on both sides of the cleaning station (101) in the height direction. The nozzle (220) includes a plurality of nozzles disposed on the first bracket (211) and the second bracket (212).

7. The adhesive removal and cleaning device according to claim 6, characterized in that, The cleaning support (210) also includes two third supports (213) disposed on the second support (212), the two third supports (213) being located on both sides of the width direction of the cleaning station (101). The nozzle (220) includes a plurality of nozzles disposed on the third support (213).

8. The adhesive removal and cleaning device according to claim 6, characterized in that, It also includes a support plate (500), which is fixedly connected to the support frame (100); The drive mechanism (300) includes: The first drive component (310) includes: The first driving component (311) is disposed on the support frame (100). The first lead screw (312) has one end rotatably connected to the support frame (100) and the other end fixedly connected to the output end of the first drive member (311). The first lead screw (312) extends along the length direction of the cleaning station (101). The first sliding block (313) is slidably disposed on the support plate (500). The first sliding block (313) is fixedly connected to the first bracket (211). The first sliding block (313) has a first mating hole. The inner wall of the first mating hole has a mating thread. The first sliding block (313) is adapted to form a threaded pair with the first lead screw (312) through the mating thread. The second drive component (320) includes: The second driving component (321) is provided on the support frame (100). The second lead screw (322) has one end rotatably connected to the support frame (100) and the other end fixedly connected to the output end of the second drive member (321). The second lead screw (322) extends along the length direction of the cleaning station (101). The second sliding block (323) is slidably disposed on the support plate (500). The second sliding block (323) is fixedly connected to the second bracket (212). The second sliding block (323) has a second mating hole. The inner wall of the second mating hole has a mating thread. The second sliding block (323) is adapted to form a threaded pair with the second lead screw (322) through the mating thread.

9. The adhesive removal and cleaning device according to claim 8, characterized in that, The support plate (500) is provided with a first guide groove (510) and a second guide groove (520) along the length direction of the cleaning station (101). The first guide groove (510) and the second guide groove (520) are spaced apart in the height direction of the cleaning station (101). The first sliding block (313) is slidably disposed in the first guide groove (510), and the second sliding block (323) is slidably disposed in the second guide groove (520). The first guide groove (510) and the second guide groove (520) are configured to guide and limit the first sliding block (313) and the second sliding block (323), respectively.

10. The adhesive removal and cleaning apparatus according to any one of claims 1-5, characterized in that, The nozzle (220) is connected to a delivery pipe (600), and a return valve is provided on the delivery pipe (600), which is suitable for adjusting the power of liquid or gas; And / or, it also includes a protective cover (700) that, together with the support frame (100), forms a protective cavity, the cleaning station (101) and the nozzle (220) are located within the protective cavity, and the drive mechanism (300) is at least partially located within the protective cavity.

Images