Semiconductor device part cleaning table with drying function
By setting up cleaning and shaking components on the semiconductor equipment parts cleaning table, the complex movement trajectory of the placement basket and high-pressure airflow are achieved, solving the problem of cleaning blind spots and improving the cleaning effect and equipment drying.
Patent Information
- Application Number
- CN202522587993.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-05
- Publication Date
- 2026-11-03
- Estimated Expiration
- 2035-12-05
AI Technical Summary
Existing semiconductor equipment component cleaning stations have cleaning blind spots in the area where the turntable is in close contact with the component, making it difficult to remove residual particles on the surface and affecting the ultrasonic cleaning effect.
A semiconductor device parts cleaning station with drying function was designed. By setting up cleaning components and shaking components, the placement basket can be moved laterally and swayed left and right. Combined with multi-angle blowing of high-pressure airflow, the disturbance of cleaning fluid and drying effect are enhanced.
It improves the uniformity and coverage of cleaning, effectively removes residues from the surface of parts, avoids secondary pollution, keeps the inside of the equipment dry, and reduces cleaning blind spots.
Smart Images

Figure CN224926634U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor equipment component cleaning technology, specifically a semiconductor equipment component cleaning station with drying function. Background Technology
[0002] The semiconductor industry is the core of the modern electronics industry, and the foundation of the semiconductor industry is the silicon material industry. Although various new semiconductor materials are constantly emerging, more than 90% of semiconductor devices and circuits, especially very large-scale integrated circuits, are fabricated on high-purity, high-quality silicon single-crystal polished wafers and epitaxial wafers. The importance of silicon wafer cleaning to the semiconductor industry has been highly valued since the early 1950s.
[0003] According to a public announcement (Announcement No.: CN221581321U) of a semiconductor equipment parts cleaning station with drying function, the above application includes a cleaning station, a cleaning tank is fixedly connected to the upper end of the cleaning station, an ultrasonic cleaning module is fixedly connected to the inner wall of the cleaning tank, a lead screw motor is fixedly connected to the inner wall of the cleaning tank, a lead screw is fixedly connected to the output end of the lead screw motor, a sliding module is movably connected to the outer surface of the lead screw, and a support frame is fixedly connected to the lower end of the sliding module.
[0004] Ultrasonic cleaning relies on cavitation bubbles generated in the liquid to impact the surface of the parts. However, in actual use, the rotating disk of the aforementioned parts cleaning station is in close contact with the parts, resulting in no liquid flow in the contact area. Ultrasonic waves cannot reach this area, forming a cleaning blind zone. This makes it difficult to remove residual particles on the surface, affecting the ultrasonic cleaning effect. In view of this, we propose a semiconductor equipment parts cleaning station with drying function. Utility Model Content
[0005] The purpose of this invention is to provide a semiconductor equipment parts cleaning station with drying function to solve the problems mentioned in the background art.
[0006] To achieve the above objectives, this utility model provides the following technical solution: a semiconductor equipment parts cleaning table with drying function, comprising a base, a housing fixedly connected to the top of the base, a cleaning assembly provided on the top end face of the base, the cleaning assembly including an electric push rod fixedly connected to the top end face of the base, a water tank fixedly connected to the output end of the electric push rod, an ultrasonic cleaning module fixedly connected to the bottom surface of the water tank, a drive motor fixedly connected to the side wall of the housing, a lead screw fixedly connected to the output end of the drive motor, a slider drivenly connected to the side wall of the lead screw, a hinge rod hinged to the bottom end face of the slider, a placement basket fixedly connected to the bottom end of the hinge rod, and a rocking assembly provided inside the housing, the electric push rod pushing the water tank upward, immersing the placement basket in the cleaning solution.
[0007] Preferably, a crossbar is fixedly connected to the inner wall of the housing, and the crossbar is slidably connected to the slider. The crossbar limits the slider, allowing the basket to move laterally within the housing.
[0008] Preferably, the cleaning assembly further includes a fan fixedly connected to the inner wall of the housing. The output end of the fan is fixedly connected to a nozzle. The number of nozzles is set to several groups, and the output ends of the several groups of nozzles are staggered, facing diagonally upward and diagonally downward. An electric push rod pulls the water tank upward, causing the placement basket to detach from the cleaning liquid. The nozzle blows high-pressure air onto the placement basket and the parts, blowing away the water droplets on the surface of the parts.
[0009] Preferably, the rocking assembly includes a driving gear fixedly connected to the side wall of the lead screw, a rotating rod rotatably connected to the inner wall of the housing, a driven gear fixedly connected to the side wall of the rotating rod, a half gear fixedly connected to the side wall of the rotating rod, a movable frame provided on the outer wall of the half gear, and a limit frame fixedly connected to the side wall of the movable frame.
[0010] Preferably, the driving gear meshes with the driven gear, and the inner wall of the movable frame is fixedly connected with teeth. The teeth mesh with the half gear. The rotation of the driving gear causes the driven gear to rotate, and the rotation of the driven gear drives the rotating rod and the half gear to rotate, thereby causing the movable frame to reciprocate laterally. The movable frame drives the limiting frame to move laterally, thereby causing the placement basket to sway left and right while moving laterally linearly.
[0011] Preferably, the inner wall of the housing is fixedly connected to a fixing frame, the fixing frame is movably connected to the outer wall of the movable frame, and the inner wall of the limiting frame is movably connected to a hinge rod.
[0012] Preferably, the outer wall of the water tank is provided with an outflow groove, which is arranged longitudinally on both sides of the water tank.
[0013] Compared with the prior art, the present invention provides a semiconductor equipment parts cleaning station with drying function, which has the following advantages:
[0014] 1. This semiconductor equipment parts cleaning station with drying function, through the setting of cleaning components and shaking components, the slider drives the placement basket to move laterally within the housing via the hinge rod, thereby increasing the disturbance of the cleaning fluid around the parts and improving the coverage effect of ultrasonic waves on the parts from different directions, making the cleaning more thorough. While the placement basket is driven by the lead screw to move laterally linearly, it also swings left and right under the action of the shaking component, thus forming a complex motion trajectory of lateral movement and oscillation in the cleaning fluid, achieving a multi-angle and multi-directional cleaning disturbance effect, improving the coverage and uniformity of ultrasonic cleaning. The nozzles are arranged alternately at the upper and lower angles, which can form a multi-angle high-pressure airflow impact on the parts in the placement basket. The high-pressure airflow can quickly blow away the residual water droplets attached to the surface of the parts, accelerate the drying process of the part surface, and avoid secondary pollution caused by residual water droplets.
[0015] 2. This semiconductor equipment parts cleaning station with drying function guides the cleaning liquid falling outside the water tank to the lower part of the water tank through the outflow trough, and discharges it to the external collection area or drain port along the guide path of the outflow trough. The outflow trough continuously guides the liquid formed on the side wall of the water tank, keeping the inside of the shell dry, avoiding the accumulation of liquid inside the shell, and ensuring a clean and dry internal environment of the equipment. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the main structure of the present utility model;
[0017] Figure 2 This is an exploded view of the water tank of this utility model;
[0018] Figure 3 This is a schematic diagram of the nozzle structure of this utility model;
[0019] Figure 4 This is a schematic diagram of the cross-sectional structure of the shell of this utility model;
[0020] Figure 5 This is a schematic diagram of the basket placement structure of this utility model;
[0021] Figure 6 This is a schematic diagram of the movable frame structure of this utility model.
[0022] In the diagram: 1. Base; 2. Housing; 3. Cleaning assembly; 301. Electric push rod; 302. Water tank; 303. Ultrasonic cleaning module; 304. Drive motor; 305. Lead screw; 306. Slider; 307. Hinge rod; 308. Placement basket; 309. Fan; 310. Nozzle; 4. Shaking assembly; 401. Drive gear; 402. Rotating rod; 403. Driven gear; 404. Half gear; 405. Movable frame; 406. Limiting frame; 5. Crossbar; 6. Fixed frame; 7. Outflow trough. Detailed Implementation
[0023] like Figures 1-6 As shown, this utility model provides a technical solution: a semiconductor equipment parts cleaning table with drying function, including a base 1, a housing 2 fixedly connected to the top of the base 1, a cleaning component 3 provided on the top end face of the base 1, the cleaning component 3 including an electric push rod 301 fixedly connected to the top end face of the base 1, a water tank 302 fixedly connected to the output end of the electric push rod 301, an ultrasonic cleaning module 303 fixedly connected to the inner bottom surface of the water tank 302, a drive motor 304 fixedly connected to the side wall of the housing 2, a lead screw 305 fixedly connected to the output end of the drive motor 304, a slider 306 drivenly connected to the side wall of the lead screw 305, a hinge rod 307 hinged to the bottom end face of the slider 306, a placement basket 308 fixedly connected to the bottom end of the hinge rod 307, a shaking component 4 provided inside the housing 2, the electric push rod 301 pushes the water tank 302 up, so that the placement basket 308 is immersed in the cleaning liquid.
[0024] In one embodiment of this utility model, a crossbar 5 is fixedly connected to the inner wall of the housing 2. The crossbar 5 is slidably connected to the slider 306. The crossbar 5 limits the slider 306, so that the placement basket 308 can move laterally within the housing 2.
[0025] The cleaning assembly 3 also includes a fan 309 fixedly connected to the inner wall of the housing 2. The output end of the fan 309 is fixedly connected to a nozzle 310. The number of nozzles 310 is set to several groups. The output ends of the several groups of nozzles 310 are arranged alternately facing diagonally upward and diagonally downward. The electric push rod 301 pulls the water tank 302 up, causing the placement basket 308 to be separated from the cleaning liquid. The nozzles 310 blow high-pressure air onto the placement basket 308 and the parts, blowing away the water droplets on the surface of the parts.
[0026] The rocking assembly 4 includes a drive gear 401 fixedly connected to the side wall of the lead screw 305, a rotating rod 402 rotatably connected to the inner wall of the housing 2, a driven gear 403 fixedly connected to the side wall of the rotating rod 402, a half gear 404 fixedly connected to the side wall of the rotating rod 402, a movable frame 405 provided on the outer wall of the half gear 404, and a limit frame 406 fixedly connected to the side wall of the movable frame 405.
[0027] The driving gear 401 meshes with the driven gear 403. The inner wall of the movable frame 405 is fixedly connected with teeth that mesh with the half gear 404. The rotation of the driving gear 401 causes the driven gear 403 to rotate. The rotation of the driven gear 403 drives the rotating rod 402 and the half gear 404 to rotate, thereby causing the movable frame 405 to move laterally and reciprocate. The movable frame 405 drives the limiting frame 406 to move laterally, thereby causing the placement basket 308 to swing left and right while moving laterally linearly.
[0028] A fixed frame 6 is fixedly connected to the inner wall of the housing 2. The fixed frame 6 is movably connected to the outer wall of the movable frame 405. The inner wall of the limiting frame 406 is movably connected to the hinge rod 307.
[0029] When the device is in operation, the electric push rod 301 first drives the water tank 302 upward, causing the placement basket 308, which is located inside the housing 2, to gradually descend and immerse itself in the cleaning solution in the water tank 302. As the placement basket 308 is completely submerged in the cleaning solution, the ultrasonic cleaning module 303 located at the bottom of the water tank 302 starts to work. By generating high-frequency ultrasonic cavitation, it thoroughly cleans the semiconductor equipment parts inside the placement basket 308, removing particles, oil, and tiny contaminants attached to the surface of the parts. During the cleaning process, the drive motor 304 drives the lead screw 305 to rotate, causing the slider 306, which is connected to the side wall of the lead screw 305, to move along the axial direction of the lead screw 305. Under the guidance and limiting action of the crossbar 5, the slider 306 achieves stable lateral movement. The slider 306 drives the placement basket 308 to swing laterally within the housing 2 through the hinge rod 307, thereby increasing the degree of disturbance of the cleaning solution around the parts and improving the coverage effect of the ultrasonic waves on the parts in different directions, making the cleaning more thorough.
[0030] After cleaning is completed, the electric push rod 301 reverses its direction, causing the water tank 302 to descend, so that the placement basket 308 is removed from the cleaning solution and placed in the drying area of the nozzle 310. At this time, the fan 309 starts, and the high-pressure airflow output by the fan 309 is sprayed out through the nozzle 310. The nozzle 310 is arranged alternately at an upward and downward angle, which can form a multi-angle high-pressure airflow impact on the parts in the placement basket 308. The high-pressure airflow can quickly blow away the residual water droplets attached to the surface of the parts, accelerate the drying process of the surface of the parts, and avoid secondary pollution caused by residual water droplets.
[0031] The drive motor 304 drives the lead screw 305 to rotate. The driving gear 401, which is located on the side wall of the lead screw 305, rotates synchronously with the lead screw 305. The driving gear 401 meshes with the driven gear 403, which is located on the side wall of the rotating rod 402. This causes the driven gear 403 to rotate synchronously under the drive of the driving gear 401. As the driven gear 403 rotates, the rotating rod 402 rotates synchronously, thereby driving the half gear 404, which is fixed on the side wall of the rotating rod 402, to rotate. The outer wall of the half gear 404 meshes with the teeth on the inner wall of the movable frame 405. Under the action of the rotation of the half gear 404, the movable frame 405 reciprocates laterally inside the housing 2. The movable frame 405 drives the limiting frame 406, which is fixed on its side wall, to move synchronously laterally. The movement is accompanied by the inner wall of the limiting frame 406 being movably connected to the hinge rod 307, causing the hinge rod 307 to sway left and right under the lateral drive of the limiting frame 406. While the placement basket 308 is driven by the lead screw 305 to move laterally linearly, it also sways left and right under the drive of the shaking component 4. This results in the placement basket 308 forming a complex motion trajectory of lateral movement and swaying in the cleaning fluid, achieving a multi-angle and multi-directional cleaning disturbance effect, improving the coverage and uniformity of ultrasonic cleaning. The lateral movement and swaying motion of the placement basket 308 can make the parts continuously change their posture in the cleaning fluid, which can reduce the cleaning blind spots caused by the concavity or obstruction of the part structure. It is especially suitable for semiconductor parts with cavities, grooves or complex surfaces.
[0032] In addition, the outer wall of the water tank 302 is provided with an outflow groove 7, which is arranged longitudinally on both sides of the water tank 302. The high-pressure airflow sweeps the surface of the parts at multiple angles. While blowing away the residual water droplets attached to the surface of the parts, it also blows away some of the cleaning fluid from the placement basket 308 and its surrounding area. After the cleaning fluid is blown away by the airflow, the droplets pass through the gap of the placement basket 308 and fall into the space between the shell 2 and the water tank 302. In order to prevent the liquid from accumulating in this area, both sides of the outer wall of the water tank 302 are provided with longitudinally extending outflow grooves 7. The outflow grooves 7 can guide the cleaning fluid falling on the outside of the water tank 302 to the lower part of the water tank 302 and discharge it to the external collection area or drain port along the guide path of the outflow grooves 7. The outflow grooves 7 continuously guide the liquid formed on the side wall of the water tank 302, keeping the inside of the shell 2 dry and preventing the liquid from accumulating inside the shell 2, thus ensuring that the internal environment of the equipment is clean and dry.
[0033] In this invention, during use, the electric push rod 301 raises the water tank 302, causing the placement basket 308 to descend and immerse itself in the cleaning solution. The ultrasonic cleaning module 303 activates to perform atomized cleaning of the parts. The drive motor 304 drives the lead screw 305 to rotate, causing the slider 306 to move laterally under the limit of the crossbar 5. The slider 306, through the hinge rod 307, causes the placement basket 308 to swing laterally, increasing liquid agitation and improving cleaning coverage. Subsequently, the water tank 302 descends, and the placement basket 308 enters the nozzle 3. In the drying area of section 10, the blower 309 generates high-pressure airflow at multiple angles to quickly dry the parts. The lead screw 305 rotates, driving the drive gear 401, which in turn drives the driven gear 403, the rotating rod 402, and the half gear 404 to rotate. This causes the movable frame 405 and the limiting frame 406 to reciprocate laterally, making the hinge rod 307 and the placement basket 308 swing left and right. Under the combined motion of lateral movement and swinging, the placement basket 308 continuously changes the posture of the parts, reducing blind spots in cleaning and improving cleaning uniformity and effect.
[0034] The present invention has been described in detail above. However, modifications or improvements can be made to it, which will be obvious to those skilled in the art. Therefore, any modifications or improvements that do not depart from the spirit of the present invention are within the protection scope of the present invention.
Claims
1. A semiconductor equipment parts cleaning station with drying function, comprising a base (1), wherein a housing (2) is fixedly connected to the top of the base (1), characterized in that: A cleaning assembly (3) is provided on the top end face of the seat (1). The cleaning assembly (3) includes an electric push rod (301) fixedly connected to the top end face of the seat (1). A water tank (302) is fixedly connected to the output end of the electric push rod (301). An ultrasonic cleaning module (303) is fixedly connected to the bottom surface of the water tank (302). A drive motor (304) is fixedly connected to the side wall of the housing (2). A lead screw (305) is fixedly connected to the output end of the drive motor (304). A slider (306) is drivenly connected to the side wall of the lead screw (305). A hinge rod (307) is hinged to the bottom end face of the slider (306). A placement basket (308) is fixedly connected to the bottom end of the hinge rod (307). A rocking assembly (4) is provided inside the housing (2).
2. A semiconductor equipment component cleaning station with drying function according to claim 1, characterized in that: A crossbar (5) is fixedly connected to the inner wall of the housing (2), and the crossbar (5) is slidably connected to the slider (306).
3. A semiconductor equipment parts cleaning station with drying function according to claim 1, characterized in that: The cleaning assembly (3) also includes a fan (309) fixedly connected to the inner wall of the housing (2). The output end of the fan (309) is fixedly connected to a nozzle (310). The number of nozzles (310) is set to several groups, and the output ends of the several groups of nozzles (310) are arranged alternately facing diagonally upward and diagonally downward.
4. A semiconductor equipment component cleaning station with drying function according to claim 1, characterized in that: The rocking assembly (4) includes a drive gear (401) fixedly connected to the side wall of the lead screw (305), a rotating rod (402) rotatably connected to the inner wall of the housing (2), a driven gear (403) fixedly connected to the side wall of the rotating rod (402), a half gear (404) fixedly connected to the side wall of the rotating rod (402), a movable frame (405) provided on the outer wall of the half gear (404), and a limit frame (406) fixedly connected to the side wall of the movable frame (405).
5. A semiconductor equipment parts cleaning station with drying function according to claim 4, characterized in that: The driving gear (401) meshes with the driven gear (403), and the inner wall of the movable frame (405) is fixedly connected with teeth, which mesh with the half gear (404).
6. A semiconductor equipment parts cleaning station with drying function according to claim 4, characterized in that: The inner wall of the housing (2) is fixedly connected to a fixing frame (6), the fixing frame (6) is movably connected to the outer wall of the movable frame (405), and the inner wall of the limiting frame (406) is movably connected to the hinge rod (307).
7. A semiconductor equipment component cleaning station with drying function according to claim 1, characterized in that: The outer wall of the water tank (302) is provided with an outflow groove (7), which is arranged longitudinally on both sides of the water tank (302).
Citation Information
Patent Citations
Semiconductor equipment part cleaning table with drying function
CN221581321U
