Rapid Thermal Processing (RTP)
CN309021796SActive Publication Date: 2024-12-20ADVANCED MATERIALS TECH & ENG INC +1
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Patent Information
- Application Number
- CN202430236044.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-24
- Publication Date
- 2024-12-20
- Estimated Expiration
- 2039-04-24
Smart Images
Figure 000007_ABST
Abstract
1. Name of the product of this design: Rapid Thermal Processing Equipment (RTP). 2. Purpose of the product of this design: RTP equipment used in semiconductor heat treatment process. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1.
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