Low pressure chemical vapor deposition (LPCVD)
CN309093701SActive Publication Date: 2025-01-28拉普拉斯(西安)科技有限责任公司
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Patent Information
- Application Number
- CN202430284548.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-14
- Publication Date
- 2025-01-28
- Estimated Expiration
- 2039-05-14
Smart Images
Figure 000007_ABST
Abstract
1. The name of the product of this design: low-pressure chemical vapor deposition coating machine (LPCVD). 2. Purpose of this design product: used for low-pressure vacuum coating. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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