Chemical vapor deposition coating machine (plasma enhanced PECVD)

CN309100050SActive Publication Date: 2025-02-07拉普拉斯(西安)科技有限责任公司
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Patent Information

Application Number
CN202430284547.3
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2024-05-14
Publication Date
2025-02-07
Estimated Expiration
2039-05-14

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Abstract

1. The name of the product of this design: chemical vapor deposition coating machine (plasma enhanced PECVD). 2. Purpose of this design product: used for vacuum chemical vapor deposition coating. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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