Developing machine
CN309289196SActive Publication Date: 2025-05-13HONG KONG UNIV OF SCI & TECH (GUANGZHOU)
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Patent Information
- Application Number
- CN202430634366.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-09
- Publication Date
- 2025-05-13
- Estimated Expiration
- 2039-10-09
Smart Images
Figure 000007_ABST
Abstract
1. The name of the product under this design: developer. 2. Purpose of the product of this design: used to develop photoresist using a developer to control pattern formation and device structure. 3. The design key point of this appearance design product lies in the combination of shape and pattern. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1.
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