Electron beam lithography machine
CN309380183SActive Publication Date: 2025-07-11ZHEJIANG QIZHEN QUANTUM TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202430725482.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-15
- Publication Date
- 2025-07-11
- Estimated Expiration
- 2039-11-15
Smart Images
Figure 000007_ABST
Abstract
1. Name of the design product: Electron beam lithography machine. 2. Use of the design product: Used for electron beam direct writing, electron beam exposure in semiconductor chip manufacturing, processing of mask plates, and direct writing of silicon wafer patterns. 3. Design key points of the design product: Lies in the shape. 4. Picture or photo that best shows the design key points: Perspective view 1.
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