Wafer-level mass inspection equipment
CN309566299SActive Publication Date: 2025-10-28深圳市壹倍科技有限公司
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Patent Information
- Application Number
- CN202530132254.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-18
- Publication Date
- 2025-10-28
- Estimated Expiration
- 2040-03-18
Smart Images
Figure 000001_ABST
Abstract
1. Name of the product in this design: Wafer-level mass inspection equipment. 2. Purpose of this design: This design is used as a detection device for detecting wafer-level Micro-LED light-emitting defects using photoluminescence methods. 3. The key point of the design of this product lies in its shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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