The upper right side of the substrate processing chamber of the coating and developing apparatus

Abstract

1. Name of the product in this design: Upper right side of the substrate processing chamber of the coating and developing apparatus. 2. Application of this design: This overall product is a coating and developing apparatus for performing coating, developing, heat treatment and other processes on substrates such as semiconductor wafers, and the protected part is the upper right side of the substrate processing chamber of the coating and developing apparatus. 3. The key design features of this product are the shape of the part to be protected. 4. The picture or photo that best illustrates the design points: Stereoscopic drawing 1. 5. The bottom surface of this product is a part that is not easily seen or cannot be seen during use, so the bottom view is omitted. 6. Other situations requiring explanation: The gray area in Figure 2 is semi-transparent. 7. Other situations requiring explanation: This design patent requires partial design protection. The parts indicated by solid lines are the parts that require protection, and the parts indicated by dashed lines are the parts that do not require protection.

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