reaction tube

Abstract

1. Name of the design product: reaction tube. 2. Use of the design product: The product is a reaction tube, which is provided in an electric furnace of a substrate processing apparatus for a film formation process using a CVD (Chemical Vapor Deposition) method on a semiconductor wafer, and which can accommodate a plurality of substrates therein. When the film formation process is performed, the reaction tube is used as a container for exposing the substrates to a prescribed temperature and a prescribed gas atmosphere. 3. Design points of the design product: in shape. 4. Picture or photograph best indicating the design points: perspective view.

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