lithography machine
CN309832693SActive Publication Date: 2026-03-06HANGZHOU XINJUNZHE MICROELECTRONICS CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-29
- Publication Date
- 2026-03-06
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Photolithography machine. 2. Purpose of this design: Used in the production of integrated circuits to remove the protective film from the wafer surface. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key features: the front view.
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